Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2009
11/10/2009US7615745 Method for separating a minute sample from a work piece
11/10/2009US7615132 Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
11/10/2009US7615131 Plasma etching chamber and plasma etching system using same
11/05/2009WO2009134663A1 Plasma-based air purification device including carbon pre-filter and/or self-cleaning electrodes
11/05/2009WO2009133842A1 Transmission electron microscope, and method of observing specimen
11/05/2009WO2009133193A1 Plasma treatment apparatus and method for plasma-assisted treatment of substrates
11/05/2009WO2009133189A1 Plasma processing apparatus and method for the plasma processing of substrates
11/05/2009WO2009132822A2 Device and method for pretreating and coating bodies
11/05/2009WO2009053479A3 Application of high power magnetron sputtering to through silicon via metallization
11/05/2009US20090272918 System and method of performing uniform dose implantation under adverse conditions
11/04/2009EP2113937A1 Vacuum processing apparatus and film forming method using vacuum processing apparatus
11/04/2009EP2113127A1 Selective absorber for converting sunlight into heat, and method and device for the production thereof
11/04/2009EP2002458B1 Particle-beam exposure apparatus with overall-modulation of a patterned beam
11/04/2009EP1261022B1 Apparatus for detecting defect in device and method of detecting defect
11/04/2009CN201341268Y Nozzle electrode
11/03/2009US7614027 Methods for forming a MRAM with non-orthogonal wiring
11/03/2009US7612866 Lithography system
11/03/2009US7612351 Ion implanter with function of compensating wafer cut angle and ion implantation method using the same
11/03/2009US7612348 Transverse magnetic field voltage isolator
11/03/2009US7612347 Charged particle beam apparatus and charged particle beam resolution measurement method
11/03/2009US7612346 Non-axisymmetric charged-particle beam system
11/03/2009US7612337 Focused ion beam system and a method of sample preparation and observation
11/03/2009US7612336 Scanning electron microscope having a monochromator
11/03/2009US7612334 Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same
11/03/2009US7611993 Plasma processing method and plasma processing apparatus
11/03/2009US7611975 Method of implanting a substrate and an ion implanter for performing the method
11/03/2009US7611640 Minimizing arcing in a plasma processing chamber
10/2009
10/29/2009WO2009131714A2 Low contamination, low energy beamline architecture for high current ion implantation
10/29/2009WO2009131693A1 Ion source with adjustable aperture
10/29/2009WO2009130424A1 Magnetron source for a glow discharge spectrometer
10/29/2009WO2009130148A1 Method for manufacturing workpieces with ion-etched surface
10/29/2009WO2009092729A3 Apparatus, carrier and method for the plasma treatment of molds
10/29/2009WO2008052705A8 Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma
10/29/2009DE112008000120T5 Plasmaversorgungseinrichtung Plasma power supply
10/29/2009CA2721249A1 Method for manufacturing workpieces with ion-etched surface
10/28/2009EP2111630A1 Ion beam accelerating apparatus with electrodes mounted in a movable mount
10/28/2009EP2111478A2 Method of diffusion-bond powder metallurgy sputtering target
10/28/2009EP2111342A1 A method for marking an item based on colour centres
10/28/2009CN101567304A Gas distributing device and semiconductor processing device applying same
10/28/2009CN100555551C Beam uniformity and angular distribution measurement system
10/28/2009CN100555550C Method and apparatus for an improved upper electrode plate in a plasma processing system
10/27/2009US7609003 Ion implantation system and control method
10/27/2009US7608844 Charged particle beam drawing apparatus
10/27/2009US7608843 Method and apparatus for scanning a workpiece through an ion beam
10/27/2009US7608821 Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method
10/27/2009US7608798 Plasma catalyst
10/27/2009US7608528 Substrate cover, and charged particle beam writing apparatus and method
10/27/2009US7608162 Plasma processing apparatus and method
10/22/2009WO2009127659A2 Beamlet blanker arrangement
10/22/2009WO2009127658A1 Projection lens arrangement
10/22/2009WO2009127294A1 Apparatus and method for inner surface treatment of hollow bodies
10/22/2009WO2009080825A3 Apparatus and method for investigating and/or modifying a sample
10/22/2009US20090261266 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens
10/22/2009US20090260762 Process gas introducing mechanism and plasma processing device
10/22/2009DE112007002570T5 Multi-direktionales, mechanisches Scannen in einem Ionen-Implanter Multi-directional, mechanical scanning in an ion implanter
10/22/2009DE102009013801A1 Musterschreibesystem und Parameterüberwachungsverfahren für eine Musterschreibevorrichtung Write pattern system and parameter monitoring method for pattern writing device
10/22/2009DE102009001972A1 Plasmaätzverfahren und computerlesbares Speicherungsmedium Plasma etching method and computer-readable storage medium
10/21/2009EP2110844A1 Contactless measurement of beam current in charged partical beam system
10/21/2009EP2110843A1 Stable emission gas ion source and method of operation thereof
10/21/2009EP2109876A1 Substrate plasma treatment using magnetic mask device
10/21/2009EP2109875A2 Apparatus support
10/21/2009EP2109874A2 Apparatus support structure
10/21/2009CN101563752A Technique for matching performance of ion implantation devices using an in-situ mask
10/21/2009CN101563751A Techniques for low temperature ion implantation
10/21/2009CN101563750A Technique for improved ion beam transport
10/21/2009CN101563749A Terminal structure of an ion implanter
10/21/2009CN100552889C Plasma treatment apparatus
10/21/2009CN100552878C Plasma processing device and electrode used
10/21/2009CN100552871C Plasma treatment apparatus and plasma treatment method
10/21/2009CN100552867C Electron beam generating apparatus for generating flat-plate shape plasma
10/21/2009CN100552866C Ion beam irradiation apparatus and ion beam irradiation method
10/21/2009CN100552865C Ion implanting apparatus
10/21/2009CN100552864C A transmission electron microscope measurement support grid based on phase change materials
10/20/2009US7605383 Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium
10/20/2009US7605382 Ion implanter
10/20/2009US7605381 Charged particle beam alignment method and charged particle beam apparatus
10/20/2009US7605086 Plasma spraying liquid crystalline polymer on surface of component by feeding liquid crystalline polymer powder into plasma flame to form molten or heat-softened particles, where liquid crystalline polymer particles form plasma sprayed coating on outermost surface of component; minimizes contamination
10/20/2009US7604881 diamond-like carbon film contains a glass substrate, a semiconductor, an integrated circuit, a machine tool, an optic, a magnetic recording head, or a magnetic recording media; diamond-like protective coatings; high mechanical hardness, low friction, optical transparency, and chemical resistance
10/20/2009US7604849 Plasma processing method and apparatus
10/20/2009US7604716 Methods and apparatus for generating high-density plasma
10/20/2009US7604709 Plasma processing apparatus
10/20/2009US7604708 Cleaning of native oxide with hydrogen-containing radicals
10/20/2009US7604701 Method and apparatus for removing external components from a process chamber without compromising process vacuum
10/15/2009WO2009125603A1 Specimen observation method and device, and inspection method and device using the method and device
10/15/2009WO2009125189A1 Biased plasma assisted processing
10/15/2009WO2009085954A3 Rf electron source for ionizing gas clusters
10/15/2009US20090258166 Device and method for patterning structures on a substrate
10/15/2009US20090257910 Intravenous catheter connection point disinfection
10/15/2009US20090256082 Ion implanting apparatus
10/15/2009US20090255809 Method of cleaning the surface of a material coated with an organic substance and generator and device for carrying out said method
10/15/2009US20090255631 Plasma Processing Apparatus and the Upper Electrode Unit
10/15/2009DE102008018902A1 Vorrichtung und Verfahren zur inneren Oberflächenbehandlung von Hohlkörpern Apparatus and method for inner surface treatment of hollow bodies,
10/14/2009EP2109003A2 Table for vacuum use guided with aerostatic bearing elements
10/14/2009EP2108947A2 Apparatus and method for inspection
10/14/2009EP2108714A1 Microwave plasma cvd system
10/14/2009CN101558469A System and magnetic scanning and correction of an ion beam
10/14/2009CN101556911A Substrate processer
10/14/2009CN100550338C Polluting device for anti-slipping sheet
10/14/2009CN100550274C Control of plasma transitions in sputter processing systems
10/14/2009CN100550273C Dual frequency RF match
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