Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2009
11/26/2009WO2009141428A1 Imaging system
11/26/2009WO2009141143A1 Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp
11/26/2009WO2009122145A3 Phase plate for electron microscope
11/26/2009WO2009053689A3 Ion beam extraction assembly in an ion implanter
11/26/2009US20090291564 Apparatus and method for plasma processing
11/26/2009US20090289186 Small electron gun
11/26/2009US20090289035 Plasma Processing Apparatus And Plasma Processing Method
11/26/2009DE102008014578B3 Streufeldarme Magnetfalle sowie diese enthaltender Röntgendetektor Stray field magnetic trap arms and those containing X-ray detector
11/25/2009EP2124245A1 Ultra high precision measurement tool
11/25/2009EP2124244A1 Ultra high precision measurement tool with control loop
11/25/2009EP2123791A1 Deep-pot-shaped copper sputtering target and process for producing the same
11/25/2009EP2122658A2 Power source arrangement for multiple-target sputtering system
11/25/2009EP2122657A1 Method for controlling ion energy in radio frequency plasmas
11/25/2009EP2122656A1 Novel plasma system for improved process capability
11/25/2009EP2122655A2 High throughput sem tool
11/25/2009EP2122006A2 Methods and apparatus for forming diamond-like coatings
11/25/2009EP1949408B1 Method and device for colouring a metal strip in vacuum by magnetron sputtering
11/25/2009EP1110232B1 Automated set up of an energy filtering transmission electron microscope
11/25/2009CN201352541Y Plasma treatment system
11/25/2009CN101589451A RF substrate bias with high power impulse magnetron sputtering (HIPIMS)
11/25/2009CN101589450A Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)
11/25/2009CN101589449A Technique for improving the performance and extending the lifetime of an ion source with gas dilution
11/25/2009CN101587821A Electrode plate
11/25/2009CN101587820A Plasma etching method and device for improving depth difference of grooves
11/25/2009CN101587815A Double-sided ion source
11/25/2009CN101587814A A plasma processing apparatus and a processed air supply apparatus it uses
11/25/2009CN101587813A A loading station mechanism, a plasma processing apparatus and a pressure exertion method
11/25/2009CN101587156A Method and apparatus for measuring electron density of plasma and plasma processing apparatus
11/25/2009CN100562974C Etching reaction system
11/24/2009US7622725 Impurity introducing apparatus and impurity introducing method
11/24/2009US7622714 Standard specimen for a charged particle beam apparatus, specimen preparation method thereof, and charged particle beam apparatus
11/24/2009US7622151 Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions
11/19/2009WO2009139461A1 Electrode unit and charged particle beam device
11/19/2009WO2009138348A1 A rotatable sputtering magnetron with high stiffness
11/19/2009WO2009138134A1 Particle radiation unit having cleaning device
11/19/2009WO2009115838A3 Specimen holder assembly
11/19/2009WO2008110151A3 Method and device for the plasma-assisted surface treatment of large-volume components
11/19/2009US20090285998 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
11/19/2009US20090283705 Ion implanter for photovoltaic cell fabrication
11/19/2009DE112008000170T5 Rasterelektronenmikroskop mit Längenmessfunktion und Größenmessverfahren Scanning electron microscope with length measurement function and size measurement method
11/19/2009DE102009019426A1 Verfahren zum Inspizieren der Einregelzeit eines Ablenkungsverstärkers und Verfahren zum Beurteilen des Versagens eines Ablenkungsverstärkers A method for inspecting the settling time of a deflection amplifier and method for judging the failure of a deflection amplifier
11/19/2009DE102008023027A1 Electrode arrangement for plasma-supported, magnetically-guided deposition or removal of thin layers on/from substrate surface in vacuum, has insulated element arranged in intermediate space between bases of backplate electrode and screen
11/19/2009DE102008022145A1 Vorrichtung und Verfahren zum Hochleistungs-Puls-Gasfluß-Sputtern Apparatus and method for high-power pulse sputtering gas flow
11/19/2009DE102005058207B4 Therapeutische Teilchenstrahl-Vorrichtung und Verfahren zur Erzeugung einer spiralförmigen Strahltrajektorie Therapeutic particle beam device and method for generating a spiral-shaped beam trajectory
11/18/2009EP2120254A2 Plasma processing apparatus
11/18/2009EP2119811A1 Continuous film forming apparatus
11/18/2009EP2119810A2 Magnetron sputtering source
11/18/2009EP2119526A1 Method of and apparatus for removal of surface oxides by electron attachment using two groups of electrodes electrically connected to opposed sources
11/18/2009EP0847590B1 A scanning probe microscope having automatic probe exchange and alignment
11/18/2009CN201348980Y Special composite support for scanning electronic microscope sample stages
11/18/2009CN101584256A Device for forming a film by deposition from a plasma
11/18/2009CN101584020A Method of forming a film by deposition from a plasma
11/18/2009CN101584019A Magnetic monitoring of a Faraday cup for an ion implanter
11/18/2009CN101584018A Ion implantation device with a dual pumping mode and method thereof
11/18/2009CN101584017A Techniques for confining electrons in an ion implanter
11/18/2009CN101583737A Film deposition of amorphous films by electron cyclotron resonance
11/18/2009CN101582375A Capacity coupling plasma reactor with temperature uniform distribution wafer supporting
11/18/2009CN101582367A Pulse type large beam spot electronic beam generating device
11/18/2009CN101582366A Nonmagnetic bimetallic strip driver used in transmission electron microscope
11/18/2009CN101582364A Double cup cover ion source filament seat structure for preventing metal spraying
11/18/2009CN101580267A Method for growing nanometer zinc oxide structure through low-temperature heating of zinc and catalyst and application thereof
11/18/2009CN100562209C Power supply unit for generating plasma and plasma apparatus including the same
11/18/2009CN100561680C Plasma processing apparatus, process vessel for plasma processing apparatus and dielectric plate
11/18/2009CN100561670C Plasma doping method
11/18/2009CN100561655C A measurement method for plasma dynamic sheath layer diagnosis
11/17/2009US7619729 Method for detecting particles and defects and inspection equipment thereof
11/17/2009US7619230 Charged particle beam writing method and apparatus and readable storage medium
11/17/2009US7619228 Technique for improved ion beam transport
11/17/2009US7619225 Multifunction electron microscope specimen holder
11/17/2009US7619219 Scanning electron microscope
11/17/2009US7619218 Charged particle optical apparatus with aberration corrector
11/17/2009US7619199 Time-resolved measurement apparatus and position-sensitive election multiplier tube
11/17/2009US7618686 Method and apparatus for sequential plasma treatment
11/12/2009WO2009136441A1 Electron beam lithography system and method for electron beam lithography
11/12/2009WO2009135919A1 A system for analysing plasma
11/12/2009WO2009135652A1 Device and method for high-performance pulsed gas flow sputtering
11/12/2009WO2009135471A1 Plasma generator and method for controlling a plasma generator
11/12/2009WO2009117077A3 Method and apparatus allowing simultaneous direct observation and electron capture of scintillation images in an electron microscope
11/12/2009US20090278287 Substrate processing with reduced warpage and/or controlled strain
11/12/2009US20090278059 Apparatus for detecting film delamination and a method thereof
11/12/2009US20090277585 Plasma processing appratus and method and apparatus for measuring dc potential
11/12/2009DE102008018609A1 Antriebsendblock für ein rotierendes Magnetron Drive end block for a rotating magnetron
11/11/2009EP2117035A1 Mask for multicolumn electron beam exposure, electron beam exposure device and exposure method employing mask for multicolumn electron beam exposure
11/11/2009EP2117029A1 Device for modifying substrate surfaces
11/11/2009EP2116113A1 Door for vacuum chamber
11/11/2009EP1665321B1 A method for measuring diffraction patterns from a transmission electron microscopy to determine crystal structures and a device therefor
11/11/2009CN101578683A Method and apparatus for forming a film by deposition from a plasma
11/11/2009CN101578682A Technique for reducing magnetic fields at an implant location
11/11/2009CN101578681A Techniques for providing ion source feed materials
11/11/2009CN101578680A Techniques for removing molecular fragments from an ion implanter
11/11/2009CN101578388A Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance
11/11/2009CN101577211A Reaction chamber component resisting plasma corrosion, preparation method thereof and plasma reaction chamber comprising same
11/11/2009CN100559546C Hollow type cathode discharging device
11/11/2009CN100559155C Method for the removal of a microscopic sample from a substrate
11/11/2009CN100558931C Ion implantation method and ion implantation device
11/11/2009CN100558849C Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device
11/10/2009USRE40963 Positioning substrate in processing chamber, supplying high frequency power to spiral antenna generating induced electric field within, generating plasma and shaping electric field uniform distribution
11/10/2009US7615764 Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus
11/10/2009US7615763 System for magnetic scanning and correction of an ion beam
11/10/2009US7615747 Sampling feedback system