Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
01/2010
01/12/2010US7645341 Showerhead electrode assembly for plasma processing apparatuses
01/07/2010WO2010002632A1 System and method to fabricate magnetic random access memory
01/07/2010WO2010001953A1 Electron source device, ion source device and charged particle source device
01/07/2010WO2010001790A1 Charged particle beam device
01/07/2010WO2009048850A3 Methods utilizing organosilicon compounds for manufacturing pre-seasoned components and plasma reaction apparatuses having pre-seasoned components
01/07/2010US20100003826 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
01/07/2010US20100003770 Elemental analysis method and semiconductor device manufacturing method
01/07/2010US20100001183 Phase Plate, Imaging Method, and Electron Microscope
01/07/2010DE112007002611T5 Mechanischer Scanner Mechanical scanner
01/07/2010CA2727268A1 System and method to fabricate magnetic random access memory
01/06/2010EP2141725A1 Surface emission type electron source and drawing device
01/06/2010EP2140543A2 Magnetron plasma system
01/06/2010EP2140476A1 Vacuum arc vaporization source, and an arc vaporization chamber with a vacuum arc vaporization source
01/06/2010EP2140475A2 Anode for producing a plasma by way of electric arc discharges
01/06/2010EP2140226A2 Nanorobot module automation and exchange
01/06/2010EP1356501B1 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
01/06/2010CN101620972A plasma processing apparatus
01/06/2010CN100578732C Vacuum processing apparatus
01/06/2010CN100578724C Vacuum sputtering cathode
01/06/2010CN100577881C Method for removal of copper oxide film from substrate processing surface
01/06/2010CN100577856C Power coupling for high-power sputtering
01/06/2010CN100577855C Sputter method and device for the production of residual stress optimized coatings
01/05/2010US7642532 Aperture design for improving critical dimension accuracy and electron beam lithography throughput
01/05/2010US7642531 Apparatus and method for reducing particulate contamination in gas cluster ion beam processing equipment
01/05/2010US7642530 Ion implantation apparatus and ion implanting method
01/05/2010US7642529 Method of determining angle misalignment in beam line ion implanters
01/05/2010US7642514 Charged particle beam apparatus
01/05/2010US7642513 Device for obtaining the image and/or spectra of electron energy loss
01/05/2010US7642180 Semiconductor on insulator vertical transistor fabrication and doping process
01/05/2010US7641382 Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program
12/2009
12/31/2009US20090325328 Plasma processing apparatus and plasma processing method
12/31/2009US20090324848 Metal film production apparatus
12/31/2009US20090323895 Method and Apparatus for Treating Workpieces
12/31/2009US20090321634 Multi-beam ion/electron spectra-microscope
12/31/2009US20090321632 System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
12/31/2009US20090321630 Post-decel magnetic energy filter for ion implantation systems
12/31/2009US20090321018 Peripherally engaging electrode carriers and assemblies incorporating the same
12/31/2009DE19756774B4 Mikrowellenplasmaquelle Microwave plasma source
12/30/2009WO2009158249A2 Particle trap for a plasma source
12/30/2009WO2009157358A1 Transmission electron microscope apparatus comprising electron spectroscope, sample holder, sample stage, and method for acquiring spectral image
12/30/2009WO2009157182A1 Semiconductor inspecting apparatus
12/30/2009WO2009157054A1 Multicolumn electron beam exposure apparatus and magnetic field generating apparatus
12/30/2009WO2009156242A1 Method to produce a field-emitter array with controlled apex sharpness
12/30/2009WO2009156121A1 Arrangement for coating tape-shaped film substrates
12/30/2009WO2009131714A3 Low contamination, low energy beamline architecture for high current ion implantation
12/30/2009EP2139300A1 Plasma electron temperature measuring method and device
12/30/2009EP2139019A1 Method to produce a field-emitter array with controlled apex sharpness
12/30/2009EP2137336A2 Method and arrangement for photon ablation of a target
12/30/2009EP2137329A1 Melting furnace including wire-discharge ion plasma electron emitter
12/30/2009EP1161309B1 A method for a repetitive ion beam processing with a by carbon containing ion beam
12/30/2009CN201374309Y Device for scanning electron microscope or ion sputtering film coating and etching in vacuum equipment
12/30/2009CN201374308Y Manual-auto integrated focusing electron microscope
12/30/2009CN100576438C Plasma confinement baffle and flow equalizer for enhanced magnetic control of plasma radial distribution
12/30/2009CN100576416C Configurable vacuum system and method
12/30/2009CN100576415C Ion implantation device and method for obtaining uneven ion implant energy
12/30/2009CN100576414C Electron beam irradiation device and drawing device
12/29/2009US7639350 Apparatus and method for testing defects
12/29/2009US7638780 UV cure equipment with combined light path
12/29/2009US7638777 Imaging system with multi source array
12/29/2009CA2507319C Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
12/24/2009US20090319031 Bioabsorbable Polymeric Stent With Improved Structural And Molecular Weight Integrity
12/24/2009US20090317565 Plasma cvd equipment
12/24/2009US20090314963 Method for forming trench isolation
12/24/2009US20090314962 Method and apparatus for controlling beam current uniformity in an ion implanter
12/24/2009US20090314956 Writing utensil sterilization apparatus
12/24/2009US20090314435 Plasma processing unit
12/23/2009WO2009155275A1 Sample imaging with charged particles
12/23/2009WO2009155272A2 Cross-section systems and methods
12/23/2009WO2009155266A1 Apparatus and method for wafer level arc detection
12/23/2009WO2009155166A2 Techniques for measuring ion beam emittance
12/23/2009WO2009154954A2 Isotope ion microscope methods and systems
12/23/2009WO2009154953A2 Sample inspection methods, systems and components
12/23/2009WO2009154631A1 Ion sources, systems and methods
12/23/2009WO2009153939A1 Charged particle beam apparatus, and method of controlling the same
12/23/2009EP2136388A2 Deposition of Materials
12/23/2009EP2135625A1 Microwave plasma sterilizing device and method
12/23/2009EP2135493A1 A plasma system
12/23/2009EP1494512B1 Ecr plasma source and ecr plasma device
12/23/2009EP1349698B1 Friction fit target assembly for high power sputtering operation
12/23/2009EP1336191B1 Stepped upper electrode for plasma processing uniformity
12/23/2009CN101609790A Processing device
12/23/2009CN101609780A Microwave plasma processing apparatus and method of supplying microwaves using the apparatus
12/23/2009CN101609779A Focus ring and plasma processing apparatus
12/23/2009CN101609771A Method for preparing transmission electron microscope micro-grids
12/23/2009CN100573829C Silicon slice etching equipment
12/23/2009CN100573827C Electromagnetic field supply apparatus and plasma processing device
12/23/2009CN100573816C Reaction cavity lining and reaction cavity including the same
12/23/2009CN100573803C Vacuum processing chamber for very large area substrates
12/23/2009CN100573802C Vacuum arc source comprising a device for generating a magnetic field
12/23/2009CN100573801C Motioning equipment for electron column
12/23/2009CN100573800C Rod shaped probe type DC gas activation device in low pressure
12/23/2009CN100573777C Field emission electronic source and its manufacturing method
12/22/2009US7635851 Electron beam apparatus and method of generating an electron beam irradiation pattern
12/22/2009US7635850 Ion implanter
12/17/2009WO2009151458A1 Ion sources, systems and methods
12/17/2009WO2009150556A1 A device for and a method of monitoring an etching procedure
12/17/2009WO2009150226A2 Apparatus and method for the treatment of semiconductor substrates
12/17/2009WO2009150080A1 Sensor head for an x-ray detector and x-ray detector containing said sensor head
12/17/2009WO2009149526A1 Plasma process and reactor for treating metallic pieces
12/17/2009US20090311866 Method and apparatus for production of metal film or the like