Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
02/2010
02/02/2010US7655922 Techniques for confining electrons in an ion implanter
02/02/2010US7655907 Charged particle beam apparatus and pattern measuring method
02/02/2010US7655906 Method and apparatus for scanning and measurement by electron beam
02/02/2010US7654224 Method and apparatus for cleaning a CVD chamber
02/02/2010US7654159 MEMS nanoindenter
01/2010
01/28/2010WO2010011252A1 Method and apparatus for measurement of beam angle in ion implantation
01/28/2010WO2010010771A1 Charged corpuscular ray apparatus
01/28/2010US20100021655 plasma electrode
01/28/2010US20100019172 Multi-column electron beam exposure apparatus and multi-column electron beam exposure method
01/28/2010US20100019149 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted from the sample
01/28/2010US20100019148 Inspection apparatus for circuit pattern
01/28/2010US20100019147 Method and apparatus for charged particle beam inspection
01/28/2010US20100018649 Plasma Processing Apparatus And Method
01/28/2010US20100018464 Dlc coating system and process and apparatus for making coating system
01/28/2010DE102008033904A1 Antriebsendblock für eine Magnetronanordnung mit einem rotierenden Target Drive end block for a magnetron with a rotating target
01/28/2010DE102006009160B4 Anordnung für die Separation von Partikeln aus einem Plasma Arrangement for the separation of particles from a plasma
01/27/2010EP2148359A2 Specimen holder, specimen inspection apparatus, and specimen inspection method
01/27/2010EP2148354A1 Electron source
01/27/2010EP2147452A2 Treatment system for flat substrates
01/27/2010CN101636813A Novel plasma system for improved process capability
01/27/2010CN101636812A Apparatus and method for surface finishing of metals and metalloids, metal oxides and metalloid oxides, and metal nitrides and metalloid nitrides
01/27/2010CN101636811A Method of reducing particle contamination for ion implanters
01/27/2010CN100585828C Substrate carrying platform, substrate processing device and temperature control method
01/27/2010CN100585795C Chamber isolation valve RF grounding
01/27/2010CN100585794C Method for replacing electrode assembly of plasma reaction chamber
01/27/2010CN100585787C Method of determining dose uniformity of a scanning ion implanter
01/27/2010CN100585786C Method for performing focusing in a particle-optical device with the aid of astigmatism in the particle beam
01/27/2010CN100585785C Field emission electron gun and electron beam apparatus using the same
01/27/2010CN100584387C Device for sterilizing objects
01/26/2010US7652774 Interferometric endpoint determination in a substrate etching process
01/26/2010US7652271 Charged-particle beam lithography with grid matching for correction of beam shot position deviation
01/26/2010US7652269 Laser atom probe methods
01/26/2010US7652265 Air treatment system
01/26/2010US7652263 Focussing lens for charged particle beams
01/26/2010US7651586 Particle removal apparatus and method and plasma processing apparatus
01/26/2010US7651552 Gas port assembly
01/26/2010US7650853 Device for applying electromagnetic microwave radiation in a plasma cavity
01/21/2010WO2010008924A2 Increasing current in charged particle sources and systems
01/21/2010WO2010008467A2 System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
01/21/2010WO2010008458A1 Post-decel magnetic energy filter for ion implantation systems
01/21/2010WO2010008455A2 Low- inertia multi -axis multi -directional mechanically scanned ion implantation system
01/21/2010WO2010008307A2 Electron detection unit and a scanning electron microscope
01/21/2010WO2010007368A2 Ion source with device for oxidising a sample
01/21/2010WO2009132822A3 Device and method for pretreating and coating bodies
01/21/2010US20100015537 Beam dose computing method and writing method and record carrier body and writing apparatus
01/21/2010US20100012861 Method and apparatus for measurement of beam angle in ion implantation
01/21/2010DE112007003418T5 Elektronenkanone und Elektronenstrahlbelichtungsgerät Electron gun and electron beam exposure apparatus
01/21/2010DE102008033902A1 Endblock für eine Magnetronanordnung mit einem rotierenden Target und Vakuumbeschichtungsanlage End block for a magnetron with a rotating target and vacuum coating system
01/21/2010DE102008031846A1 Method for producing electron beam between cathode and anode, involves removing gases from inner area of housing, in which gases are ionized in active micro ion getter pump, where ionized gases are bonded
01/21/2010CA2730782A1 Ion source with device for oxidising a sample
01/20/2010EP2145717A1 Chamber assembly for an electron beam processing device with a slide and a rotating disc
01/20/2010EP1964148B1 Fluorine based cleaning of an ion source
01/20/2010EP1274877B1 A method and a device for determining the end point of a cleaning operation of a cvd apparatus
01/20/2010CN201387866Y Plasma treatment device
01/20/2010CN101630624A Dual frequency RF match
01/20/2010CN101630623A Inspection apparatus by charged particle beam and method for manufacturing device using inspection apparatus
01/20/2010CN101630622A Hybrid phase plate
01/20/2010CN100583377C Controlled dose ion implantation
01/20/2010CN100583376C Method of implanting a substrate and an ion implanter for performing the method
01/20/2010CN100583375C Electrostatic lens for ion beams
01/20/2010CN100583374C Portable electron microscope using micro-column
01/20/2010CN100583373C Method and system for ion beam containment in an ion beam guide
01/20/2010CN100583372C Electronic gun with oil immersion and water cooling device
01/20/2010CN100582291C Mechanism for compensating the spacing between sputter magnetron and target
01/19/2010US7649172 Charged particle beam equipment with magnification correction
01/19/2010US7648916 Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
01/19/2010US7648611 Plasma etching equipment
01/19/2010US7648610 Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate
01/19/2010US7647887 Thin film forming apparatus
01/14/2010WO2010004275A2 Sample holder
01/14/2010WO2010003266A1 Remote plasma cleaning method and apparatus for applying said method
01/14/2010US20100007062 Method and device for producing three-dimensional objects
01/14/2010US20100006779 Ion implantation apparatus and ion implantation method
01/14/2010US20100006755 Charged particle beam alignment method and charged particle beam apparatus
01/14/2010US20100006560 Substrate heating apparatus and substrate heating method
01/14/2010US20100006227 Microwave Plasma Reactor
01/14/2010DE102008033282A1 Verfahren zur Entfernung einer Oberflächenschicht, Formkörper und Verwendung des Formkörpers A process for removing a surface layer, molded articles and the use of the shaped body
01/14/2010DE102008033280A1 Verfahren zur Modifizierung von expandiertem Graphit und Verwendung des modifizierten expandierten Graphits A method for the modification of expanded graphite and use of the modified expanded graphite
01/13/2010EP2144274A1 Method of preparing an ultra sharp tip, apparatus for preparing an ultra sharp tip, and use of an apparatus
01/13/2010EP2143126A2 Plasma source with segmented magnetron cathode
01/13/2010EP2143125A1 Apparatus
01/13/2010EP2142959A1 Triangulating design data and encoding design intent for microlithographic printing
01/13/2010EP2142681A2 Arrangement for producing coatings on substrates in vacuo
01/13/2010EP2142679A2 Method and device for the plasma-assisted surface treatment of large-volume components
01/13/2010EP1216483B1 Electron-optical lens arrangement with a displaceable axis
01/13/2010EP1204507B1 Arc-free electron gun
01/13/2010EP0939969B1 Scanning electron microscope
01/13/2010CN101627454A Plasma source with liner for reducing metal contamination
01/13/2010CN101625954A Repairing method of electrostatic sucking electrode
01/13/2010CN101625953A Substrate holder
01/13/2010CN101625952A In-chamber member temperature control method, in-chamber member, substrate mounting table and plasma processing apparatus including same
01/13/2010CN100580870C Heat-conducting gas supply mechanism, supply method and substrate processing device and method
01/13/2010CN100580865C Apparatus and method for investigating or modifying surface with charged particle beam
01/13/2010CN100580858C Microwave ion source
01/12/2010US7646003 Focusing apparatus and lithography system using the same
01/12/2010US7645999 Method and apparatus for creating a plasma
01/12/2010US7645988 Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus
01/12/2010US7645526 Member for plasma etching device and method for manufacture thereof
01/12/2010US7645495 Method and apparatus for treating a substrate
01/12/2010US7645356 Method of processing wafers with resonant heating