| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 03/03/1993 | EP0529944A1 Method and apparatus for aligning phototools for photoprocessing of printed circuit board panels |
| 03/02/1993 | US5191465 Optical apparatus for alignment of reticle and wafer in exposure apparatus |
| 03/02/1993 | US5191200 Imaging apparatus having a focus-error and/or tilt detection device |
| 02/23/1993 | US5189494 Position detecting method and apparatus |
| 02/23/1993 | US5188026 Pin register system for screen printers |
| 02/16/1993 | US5187372 Apparatus for and a method of transverse position measurement in proximity lithographic systems |
| 02/03/1993 | EP0526280A1 Process and device for positionning a printing plate on a form cylinder |
| 02/03/1993 | EP0526039A1 Method for exposing a pattern plate having an alignment pattern |
| 02/02/1993 | US5184196 Projection exposure apparatus |
| 01/26/1993 | US5182615 Exposure apparatus |
| 01/26/1993 | US5182610 Position detecting method and device therefor as well as aligning device |
| 01/26/1993 | US5182455 Method of detecting relative positional deviation between two objects |
| 01/20/1993 | EP0523673A2 Photosensitive material printing apparatus |
| 01/19/1993 | US5181257 Method and apparatus for determining register differences from a multi-color printed image |
| 01/19/1993 | CA1312760C Method for manufacturing an optical filter |
| 01/13/1993 | EP0522557A1 Optical heterodyne measuring method and apparatus |
| 01/04/1993 | WO1993006618A1 Method and apparatus for forming pattern |
| 12/30/1992 | EP0520625A1 Alignment device |
| 12/30/1992 | EP0520598A1 Plate for printing press or the like |
| 12/15/1992 | US5172190 Alignment patterns for two objects to be aligned relative to each other |
| 12/15/1992 | US5172189 Exposure apparatus |
| 12/15/1992 | US5172160 Optical lithographic device having a machine frame with force compensation |
| 12/15/1992 | US5171999 Adjustable beam and interference fringe position |
| 12/09/1992 | EP0517479A1 Method for automatically inspecting an exposed and bent lithographic plate |
| 12/08/1992 | US5170058 Apparatus and a method for alignment verification having an opaque work piece between two artwork masters |
| 12/08/1992 | US5168805 Screen printing method and method of producing screen printing plates |
| 12/07/1992 | CA2070217A1 Method of and apparatus for automatically inspecting an exposed and bent lithographic plate |
| 12/03/1992 | DE4218076A1 Automatic alignment of print carrier esp. for colour printing press - printing alignment accuracy reference marks in colour and black and evaluating their separation to determine alignment errors for other colours |
| 12/02/1992 | EP0516317A2 Method of locating work in automatic exposing apparatus |
| 12/01/1992 | US5168513 X-ray metrology and alignment detection system |
| 12/01/1992 | US5168456 Incremental frequency domain correlator |
| 12/01/1992 | US5168306 Exposure apparatus |
| 11/24/1992 | US5166754 Alignment system |
| 11/17/1992 | US5165062 Automatic printing system |
| 11/17/1992 | CA1310205C Quantitative lense analysis technique |
| 11/10/1992 | US5162926 Registration method |
| 11/10/1992 | US5162656 Position detecting device employing marks and oblique projection |
| 11/10/1992 | US5162642 Device for detecting the position of a surface |
| 11/04/1992 | EP0511847A2 Length-measuring device and exposure apparatus |
| 11/03/1992 | US5161176 Exposure apparatus |
| 11/03/1992 | US5161114 Method of manufacturing a reticule |
| 11/03/1992 | US5160959 Device and method for the alignment of masks |
| 11/03/1992 | US5160957 Alignment and exposure apparatus |
| 11/03/1992 | US5160849 Diffraction-type displacement detector for alignment of mask and wafer |
| 11/03/1992 | US5160848 Device for detecting the relative position between opposed first and second objects |
| 10/28/1992 | EP0510641A1 Alignment apparatus for use in exposure system for optically transferring pattern onto object |
| 10/28/1992 | CN1018866B Method for aligning interrelated position of first body and second body and apparatus for achieving the method |
| 10/27/1992 | US5159496 Lens system with four meniscus lenses made of anomalous dispersion glass |
| 10/21/1992 | EP0509797A2 Projection exposure apparatus |
| 10/21/1992 | EP0509148A1 Silver halide print-out material suitable as mounting aid and position proof |
| 10/20/1992 | US5156943 Reducing the number of elements while introducing at the critical aperture a blazed transmission grating having rings of low bending power defined by multiple plateaus |
| 10/13/1992 | US5155557 Optical alignment detection apparatus |
| 10/13/1992 | US5155370 Device for detecting the relative position of first and second objects |
| 10/06/1992 | US5153916 Method and apparatus for detecting focal plane |
| 10/06/1992 | US5153678 Method of determining regularity of a pattern array to enable positioning of patterns thereof relative to a reference position |
| 09/29/1992 | US5151754 Method and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objects |
| 09/29/1992 | US5151750 Alignment apparatus |
| 09/29/1992 | US5151749 Method of and apparatus for measuring coordinate position and positioning an object |
| 09/22/1992 | US5150392 For providing precise alignment |
| 09/22/1992 | US5150391 Exposure apparatus |
| 09/22/1992 | US5150173 Method and apparatus for alignment and exposure |
| 09/22/1992 | US5150153 Lithographic device with a suspended object table |
| 09/17/1992 | WO1992016090A1 Registration system |
| 09/17/1992 | DE4108578A1 Redn. of masking errors in semiconductor mfr. - using a control system based on prodn. of high-contrast adjustment marks |
| 09/17/1992 | DE4108577A1 Image reception plane setting system for IC mfg. process - uses evaluation of structure obtained for sample IC substrate to provide correction values for setting elements |
| 09/17/1992 | DE4108576A1 Exposure process for structurising wafer with highly accurate control - by exposing position error mark in each field and correction before exposing circuit |
| 09/15/1992 | US5148214 Mark detecting device |
| 09/15/1992 | US5148038 Device for detecting positional relationship between two objects |
| 09/15/1992 | US5148037 Position detecting method and apparatus |
| 09/15/1992 | US5148036 Multi-axis wafer position detecting system using a mark having optical power |
| 09/15/1992 | US5148035 Device for detecting a positional relationship |
| 09/09/1992 | EP0502679A1 Semiconductor integrated circuit fabrication utilizing latent imagery |
| 09/09/1992 | EP0502583A1 Imaging apparatus comprising a focus-error and/or tilt detection device |
| 09/09/1992 | EP0502578A1 Optical lithographic device having a machine frame with force compensation |
| 09/02/1992 | EP0501454A1 Apparatus for printing a photosensitive material and positioning device |
| 09/01/1992 | US5144363 Apparatus for and method of projecting a mask pattern on a substrate |
| 09/01/1992 | US5143793 Image drawn from dots of inks |
| 08/25/1992 | US5142156 Alignment method for printing a pattern of an original onto different surface areas of a substrate |
| 08/25/1992 | US5141322 Illumination methods with plural wavelength rays and with wavelength-band rays for use in a double-focus detector utilizing chromatic aberration |
| 08/25/1992 | US5141321 Image receiving apparatus and alignment method for controlling frequency of pulsed emission illuminating light |
| 08/18/1992 | US5140366 Exposure apparatus with a function for controlling alignment by use of latent images |
| 08/13/1992 | DE4203410A1 Lithography device for wafer structuring - has wafer support table, SXM base with reference structure, and jibs, each with STM sensor |
| 08/12/1992 | EP0498499A1 Method of and device for repetitively imaging a mask pattern on a substrate |
| 08/12/1992 | EP0498496A1 Lithographic device with a suspended object table |
| 08/12/1992 | EP0498006A1 Superheterodyning technique in the spatial frequency domain and structure for pattern registration measurement |
| 08/12/1992 | EP0205571B1 Establishing and/or evaluating alignment by means of alignment marks |
| 08/11/1992 | US5138667 Process and device for detecting print registration marks on a web from a multi-color printing press |
| 08/11/1992 | US5138176 Projection optical apparatus using plural wavelengths of light |
| 08/11/1992 | US5137363 Projection exposure apparatus |
| 08/11/1992 | US5137349 Projection-type optical apparatus |
| 08/05/1992 | EP0496891A1 Method and device for optical exposure |
| 08/04/1992 | US5136149 Method of focusing optical head on object body and automatic focusing device for optical inspection system including tilt detection |
| 07/28/1992 | USRE34010 Position detection apparatus |
| 07/28/1992 | US5133603 Device for observing alignment marks on a mask and wafer |
| 07/15/1992 | EP0494789A2 Alignment method |
| 07/08/1992 | EP0493655A2 Apparatus for and method of transverse position measurement in proximity lithographic systems |
| 07/08/1992 | EP0349632B1 Gap sensing/adjustment apparatus and method for a lithography machine |
| 07/07/1992 | US5128975 X-ray exposure system |
| 07/07/1992 | US5128280 Sharp edges, molybdenum silicide |
| 06/23/1992 | US5124927 Latent-image control of lithography tools |