| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 06/11/1985 | US4523290 Data processor architecture |
| 06/11/1985 | US4522489 Device for photolithographically treating a thin substrate |
| 06/04/1985 | US4521114 Useful in a semiconductor wafer photoexposure system |
| 06/04/1985 | US4521082 For projecting a pattern from a first body onto a second body |
| 05/08/1985 | EP0140022A1 Optical self-alignment system |
| 05/07/1985 | US4516253 Lithography system |
| 05/07/1985 | US4515481 Apparatus for processing a signal for aligning |
| 05/07/1985 | US4515480 Pattern alignment system and method |
| 04/30/1985 | US4514858 Lithography system |
| 04/25/1985 | WO1985001834A1 Optical exposure apparatus |
| 04/24/1985 | EP0138602A2 Method of fabricating a photomask pattern |
| 04/23/1985 | US4513203 Mask and system for mutually aligning objects in ray exposure systems |
| 04/23/1985 | US4512642 Automatic focusing apparatus in optical drawing machine |
| 04/03/1985 | EP0135597A1 Process and device for mutually aligning objects |
| 03/27/1985 | EP0134843A1 Photographic exposure apparatus including a means for the relative positioning of a photographic material and an original in sheet form |
| 03/26/1985 | US4507597 Electro-magnetic alignment assemblies |
| 03/26/1985 | US4506977 Transfer apparatus provided with an auto-focusing mechanism |
| 03/19/1985 | US4506205 Electro-magnetic alignment apparatus |
| 03/19/1985 | US4506204 Electro-magnetic apparatus |
| 03/19/1985 | US4505580 Method and apparatus for generating exposure masks |
| 03/12/1985 | US4504148 System for detecting a signal for aligning two bodies and signal _processing method |
| 03/12/1985 | US4504144 Simple electromechanical tilt and focus device |
| 02/12/1985 | US4498762 Projection type exposure apparatus |
| 02/05/1985 | US4498009 Optical lithographic system having a dynamic coherent optical system |
| 01/29/1985 | US4496970 Arrangement for the automatic adjustment of at least one object |
| 01/29/1985 | US4496241 Process and device for relatively aligning the image and object surfaces in optical copying systems |
| 01/29/1985 | US4496239 Projection exposure apparatus |
| 01/16/1985 | EP0131155A2 Electro-magnetic alignment apparatus |
| 01/15/1985 | US4493555 High sensitivity focal sensor for electron beam and high resolution optical lithographic printers |
| 01/09/1985 | EP0130819A2 A method of positioning a beam to a specific portion of a semiconductor wafer |
| 01/09/1985 | EP0130691A2 Method of aligning two members utilizing marks provided thereon |
| 01/09/1985 | EP0130358A1 Electro-magnetic alignment device |
| 01/09/1985 | EP0130357A1 Electro-magnetic alignment assemblies |
| 01/08/1985 | US4492459 Projection printing apparatus for printing a photomask |
| 01/08/1985 | US4492180 Apparatus for indexing and registering a selected deposition mask to a substrate and method therefor |
| 01/01/1985 | US4491930 Memory system using filterable signals |
| 01/01/1985 | US4491313 Suction device for holding plates |
| 12/19/1984 | EP0128433A2 Electro-magnetic alignment apparatus |
| 12/11/1984 | US4487505 Apparatus for processing a signal for alignment |
| 12/04/1984 | US4486850 Data processing system |
| 11/28/1984 | EP0126621A2 Alignment marks on semiconductor wafers and method of manufacturing the marks |
| 11/28/1984 | EP0126072A1 Focusing device for photo-exposure system |
| 11/27/1984 | US4485339 Electro-magnetic alignment device |
| 11/07/1984 | EP0123982A2 Continuous alignment target pattern and signal processing |
| 10/30/1984 | US4479711 Mask aligner |
| 10/30/1984 | US4479435 Device for fixing by suction an offset printing plate or like plate in planar state |
| 10/24/1984 | EP0122456A2 Method of and apparatus for determining the image section of documents for the reproduction in the printing technique |
| 10/17/1984 | EP0121969A2 Lithography system |
| 10/16/1984 | US4477926 Process for inspecting and automatically sorting objects showing patterns with constant dimensional tolerances and apparatus for carrying out said process |
| 10/16/1984 | US4477185 Optical imaging apparatus |
| 10/16/1984 | US4477183 Automatic focusing apparatus |
| 10/02/1984 | US4475223 Exposure process and system |
| 10/02/1984 | US4475122 Automatic wafer alignment technique |
| 10/02/1984 | US4474465 Method and apparatus for making a mask conforming to a ceramic substrate metallization pattern |
| 09/25/1984 | US4473293 Step-and-repeat projection alignment and exposure system |
| 09/19/1984 | EP0118438A1 Phase contrast alignment system for a semiconductor manufacturing apparatus |
| 09/18/1984 | US4472824 Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography |
| 09/11/1984 | US4471385 Electro-optical illumination control system |
| 09/11/1984 | US4470875 Semiconductors |
| 08/29/1984 | EP0116953A2 Alignment apparatus |
| 08/29/1984 | EP0116940A2 Pattern transfer device and method |
| 08/28/1984 | CA1173416A1 Precision lamp positioner |
| 08/08/1984 | EP0115184A1 An automatic focus control device |
| 08/07/1984 | US4463673 Method and apparatus for registration of planar members and the like through the employment of an intermediate alignment sheet |
| 08/01/1984 | EP0114712A2 Device for photolithographically treating a thin substrate |
| 07/31/1984 | US4463373 Previewing apparatus of flats |
| 07/31/1984 | CA1171974A1 Two stage wafer prealignment system for an optical alignment and exposure machine |
| 07/24/1984 | US4461567 Method of and apparatus for the positioning of disk-shaped workpieces, particularly semiconductor wafers |
| 07/24/1984 | CA1171555A1 Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| 07/18/1984 | EP0113633A1 Method and device for the optical alignment of motives in close planes in an exposing apparatus provided with a diverging radiation source |
| 07/04/1984 | EP0112399A1 Interferential measuring method for surfaces |
| 06/27/1984 | EP0111661A2 Photometric printing apparatus |
| 06/27/1984 | EP0111660A2 Photometric printing apparatus |
| 06/27/1984 | EP0111648A1 Alignment and focusing system for a scanning mask aligner |
| 06/27/1984 | EP0111635A2 Method of selecting the optimum focusing adjustment for an optical instrument |
| 06/12/1984 | US4454209 High resolution soft x-ray or ion beam lithographic mask |
| 06/05/1984 | US4452526 Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
| 05/30/1984 | EP0109718A1 Displacement device, particularly for the photolithographic treatment of a substrate |
| 05/30/1984 | EP0109634A1 Exposure device |
| 05/24/1984 | WO1984002012A1 Focusing device for photo-exposure system |
| 05/22/1984 | US4450358 Optical lithographic system |
| 05/16/1984 | EP0108514A2 Alignment aid |
| 05/01/1984 | US4445775 Registration blocks for a photomask assembly |
| 04/25/1984 | EP0106346A1 Pattern detector |
| 04/24/1984 | US4445189 Analog memory for storing digital information |
| 04/24/1984 | US4444492 Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| 04/24/1984 | CA1166363A1 Wafer tilt compensation in zone plate alignment system |
| 04/10/1984 | US4442388 X-Y Addressable workpiece positioner having an improved X-Y address indicia sensor |
| 04/10/1984 | US4441808 Focusing device for photo-exposure system |
| 04/10/1984 | US4441250 Apparatus for registering a mask pattern in a photo-etching apparatus for semiconductor devices |
| 04/03/1984 | US4441206 Pattern detecting apparatus |
| 04/03/1984 | US4441020 Method for tracing an object |
| 03/28/1984 | EP0103671A2 Method and apparatus for forming a subsequent metallization pattern on a ceramic substrate |
| 03/27/1984 | CA1164551A1 Pattern recognition system and method |
| 03/20/1984 | US4437758 Alignment apparatus |
| 03/15/1984 | WO1984001024A1 Phase contrast alignment system for a semiconductor manufacturing apparatus |
| 03/06/1984 | US4435732 Electro-optical illumination control system |
| 02/28/1984 | US4433911 Method of evaluating measure precision of patterns and photomask therefor |
| 02/28/1984 | CA1162777A1 Alignment and exposure system with an indicium of an axis of motion of the system |
| 02/28/1984 | CA1162776A1 Step-and-repeat projection alignment and exposure system |