| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 04/17/1996 | CN1120683A Exposure method and exposure apparatus |
| 04/16/1996 | US5508527 Method of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method |
| 04/10/1996 | EP0706093A1 Method and apparatus for aligning a mask and a workpiece |
| 04/09/1996 | US5506684 Projection scanning exposure apparatus with synchronous mask/wafer alignment system |
| 04/09/1996 | US5504999 Method and apparatus for compensating for process variations in an automatic positioning system |
| 04/04/1996 | DE4442596C1 Position measuring error correction system for lithography device |
| 04/02/1996 | US5502993 Method of and apparatus for punching and bending a lithographic plate |
| 04/02/1996 | US5502899 Staging apparatus |
| 03/26/1996 | US5502563 Transporter for optical spectrum analyzer in alignment system |
| 03/26/1996 | US5502313 Exposure apparatus and method having a measuring unit for measuring distances between a mask surface and a projection optical system |
| 03/26/1996 | US5502311 Method of and apparatus for detecting plane position |
| 03/20/1996 | EP0702272A1 Exposure apparatus and exposure method |
| 03/19/1996 | US5500736 Method of detecting positions |
| 03/14/1996 | WO1996007870A1 Simple light probe for large area lithography alignment system |
| 03/13/1996 | EP0701174A1 Alignment mark and exposure process using the same |
| 03/13/1996 | EP0700761A1 Punch apparatus for an image recording device |
| 03/12/1996 | US5499099 Alignment method and alignment system |
| 03/07/1996 | WO1996006738A1 Apparatus and method for precisely drilling alignment pin register holes in pre-marked flexible printing plates |
| 03/05/1996 | US5496777 Method of arranging alignment marks |
| 03/05/1996 | US5496669 System for detecting a latent image using an alignment apparatus |
| 02/28/1996 | EP0698916A2 Method of optical lithography using phase shift masking |
| 02/28/1996 | EP0698826A1 Off axis alignment system for scanning photolithography |
| 02/28/1996 | EP0698812A2 Method for alignment of manufacturing semiconductor apparatus |
| 02/28/1996 | CN1117652A Vernier |
| 02/27/1996 | US5495336 Position detecting method for detecting a positional relationship between a first object and a second object |
| 02/27/1996 | US5495279 Method and apparatus for exposure of substrates |
| 02/20/1996 | US5493403 Method and apparatus for the alignment of a substrate |
| 02/20/1996 | US5493402 EGA alignment method using a plurality of weighting coefficients |
| 02/18/1996 | CA2155045A1 Off axis alignment system for scanning photolithography |
| 02/15/1996 | WO1996004592A1 Method of repetitively imaging a mask pattern on a substrate |
| 02/14/1996 | EP0696762A1 Exposing apparatus with mask alignment system and method of aligning, exposing, and transferring work |
| 02/08/1996 | DE19521390A1 Focusing method for step and repeat photoengraving on semiconductor chips using miniature projection lens |
| 02/06/1996 | US5489986 Position detecting apparatus |
| 02/06/1996 | US5489966 Projection exposure apparatus |
| 01/31/1996 | CN1115876A Method of optical lithography using phase shift masking |
| 01/30/1996 | US5488230 Double-beam light source apparatus, position detecting apparatus and aligning apparatus |
| 01/24/1996 | CN1115419A Pattern alignment mark of semiconductor device |
| 01/24/1996 | CN1115416A Reticle and method for measuring rotation error of reticle by use of the reticle |
| 01/24/1996 | CN1115413A Reticle |
| 01/23/1996 | US5487172 Transform processor system having reduced processing bandwith |
| 01/23/1996 | US5485679 Image registration board and compressible pin assembly |
| 01/16/1996 | US5485272 Radiation-source unit for generating a beam having two directions of polarisation and two frequencies |
| 01/10/1996 | EP0691033A1 Bright field wafer target |
| 01/09/1996 | US5483349 Apparatus for detecting positions of marks in projection aligner wherein an auxiliary pattern is constructed to produce a signal level that is independent of the surface condition of a substrate |
| 01/09/1996 | US5483348 Apparatus for optically detecting a position of a mark |
| 01/09/1996 | US5483345 Alignment system for use in lithography utilizing a spherical reflector having a centered etched-on projection object |
| 01/09/1996 | US5483056 Method of projecting exposure with a focus detection mechanism for detecting first and second amounts of defocus |
| 01/02/1996 | US5481363 Positional deviation detecting method |
| 01/02/1996 | US5481362 Apparatus for projecting a mask pattern on a substrate |
| 01/02/1996 | US5481332 Projection exposure method and apparatus for improved image transfer from photomask having periodic and non-periodic patterns |
| 01/02/1996 | US5480746 Photomask and method of forming resist pattern using the same |
| 01/02/1996 | US5479723 Image registration board |
| 12/26/1995 | US5479270 Method and apparatus for aligning depth images |
| 12/26/1995 | US5479238 High resolution imagery systems and methods |
| 12/19/1995 | US5477309 Alignment apparatus |
| 12/19/1995 | US5477058 Attenuated phase-shifting mask with opaque reticle alignment marks |
| 12/19/1995 | US5477057 Off axis alignment system for scanning photolithography |
| 12/14/1995 | WO1995034025A1 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method |
| 12/12/1995 | US5475490 Method of measuring a leveling plane |
| 12/05/1995 | US5473424 Tilting apparatus |
| 12/05/1995 | US5473166 Inclination detecting apparatus having an intensity adjusting unit |
| 11/29/1995 | EP0684523A1 Stage device and exposure apparatus using the same |
| 11/21/1995 | US5469263 Method for alignment in photolithographic processes |
| 11/21/1995 | US5469260 Stage-position measuring apparatus |
| 11/21/1995 | US5468671 Method for fabricating stacked capacitor of semiconductor memory device |
| 11/21/1995 | US5468580 Condition optimization method for measuring overlay accuracy of pattern |
| 11/16/1995 | DE4416882A1 Mutual alignment of film and circuit board for printing |
| 11/16/1995 | DE4416845A1 Adjusting of superposed test samples for accurate alignment |
| 11/07/1995 | US5465148 Apparatus and method for detecting the relative positional deviation between two diffraction gratings |
| 11/07/1995 | US5464715 Method of driving mask stage and method of mask alignment |
| 10/31/1995 | US5462836 Thermal removal of soft rubber from edges of plate, then punching register holes for pins to hold film during exposure, accuracy, efficiency |
| 10/24/1995 | US5461237 Surface-position setting apparatus |
| 10/24/1995 | US5459941 For use in printing |
| 10/17/1995 | US5459846 Computer architecture system having an imporved memory |
| 10/17/1995 | US5459573 Light quantity controlling apparatus |
| 10/17/1995 | US5459546 Method and apparatus for accurate alignment of semiconductor wafers in photo printers |
| 10/17/1995 | US5458715 Alignment transfer method |
| 10/05/1995 | DE19511533A1 Fine measuring appts. for properties in semiconductor mfr |
| 10/03/1995 | US5455679 Position detecting system |
| 10/03/1995 | US5455144 Reduction projection exposure of pattern onto positive photosensitive resist film, then transferring second pattern onto negative resist film, for improving resolution of fine patterns |
| 10/03/1995 | US5454247 Method of and apparatus for punching and bending a lithographic plate |
| 09/28/1995 | DE19510449A1 Rotation error detection reticule for correcting photolithographic mask orientation |
| 09/26/1995 | US5452521 Workpiece alignment structure and method |
| 09/20/1995 | EP0245431B1 Photoimaging processes and compositions |
| 09/19/1995 | US5452090 Microlithography system |
| 09/19/1995 | US5451479 Method of forming a pattern of a multilayer type semiconductor device |
| 09/13/1995 | EP0671658A2 Exposure apparatus and reflection type mask to be used in the same |
| 09/05/1995 | US5448357 Position detecting system for detecting a position of an object by detecting beat signals produced through interference of diffraction light |
| 09/05/1995 | US5448333 Exposure method |
| 09/05/1995 | US5448332 Exposure method and apparatus |
| 08/29/1995 | US5446587 Projection method and projection system and mask therefor |
| 08/29/1995 | US5446565 Compound objective lens having two focal points |
| 08/29/1995 | US5446542 Mark position determining apparatus for use in exposure system |
| 08/29/1995 | US5446519 Stage device |
| 08/23/1995 | EP0668539A2 Thinfilm materials for the preparation of attenuating phase shift masks |
| 08/22/1995 | US5443932 Exposure method |
| 08/15/1995 | US5442445 Registration method and apparatus therefor |
| 08/15/1995 | US5442418 Exposure method |
| 08/09/1995 | EP0461254B1 Composite color illumination method and band light illumination in a double-focus detector utilizing chromatic aberration |
| 08/08/1995 | US5440397 Apparatus and method for exposure |