Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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02/21/1984 | US4432635 Temperature-controlled support for semiconductor wafer |
02/15/1984 | EP0100526A2 Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography |
02/14/1984 | US4431923 Alignment process using serial detection of repetitively patterned alignment marks |
01/25/1984 | EP0098984A1 Step-and-repeat projection alignment and exposure system |
01/18/1984 | EP0025036B1 Process for focusing a mask image onto a workpiece |
01/17/1984 | US4426152 Method and machine for positioning films on base sheets |
01/10/1984 | US4425537 X-Y Addressable workpiece positioner and mask aligner using same |
01/10/1984 | US4425043 Device for detecting the position of an object |
01/10/1984 | US4425037 For use in a microlithography system |
01/04/1984 | EP0097380A2 A system for positioning a utilization device |
01/03/1984 | US4423959 Positioning apparatus |
12/27/1983 | US4423127 Relative alighment of three or more superimposed patterns |
12/27/1983 | US4422763 Automatic photomask alignment system for projection printing |
12/27/1983 | CA1159579A2 Method for automatic mask alignment |
12/27/1983 | CA1159578A2 Target for use in mask alignment |
12/21/1983 | EP0096294A2 Alignment apparatus |
12/21/1983 | EP0096224A1 Positioning method for mask set used in IC fabrication |
12/13/1983 | US4420233 Projecting apparatus |
12/13/1983 | US4420223 Optical apparatus having a mirror |
12/06/1983 | US4419013 Phase contrast alignment system for a semiconductor manufacturing apparatus |
12/06/1983 | US4418467 Semiconductor wafer with alignment marks and method for manufacturing semiconductor device |
11/22/1983 | CA1157313A1 Device for transporting and positioning printing plates |
11/16/1983 | EP0094041A1 Reduction projection aligner system |
11/15/1983 | US4414749 Alignment and exposure system with an indicium of an axis of motion of the system |
11/15/1983 | CA1157128A1 Automatic wafer focusing and flattening system |
10/13/1983 | WO1983003484A1 A method and apparatus for captivating a substrate within a holder |
10/12/1983 | EP0091234A2 Auto focus alignment and measurement system and method |
10/12/1983 | EP0091233A2 Auto focus alignment and measurement system and method |
10/12/1983 | EP0091199A1 Projection alignment apparatus |
10/12/1983 | EP0091106A1 Process for eliminating undesired appearances of diffraction and/or interference, as well as process and apparatus for aligning |
10/11/1983 | US4408885 Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask |
10/11/1983 | US4408874 Projection aligner with specific means for bending mirror |
10/04/1983 | US4407933 Alignment marks for electron beam lithography |
09/27/1983 | US4406546 Photoelectric detecting device |
09/20/1983 | US4405238 Alignment method and apparatus for x-ray or optical lithography |
09/20/1983 | US4405229 Method of projecting printing on semiconductor substrate and workpiece including such substrate |
09/20/1983 | CA1154175A1 Method and apparatus for mask/wafer alignment |
09/14/1983 | EP0088691A1 Alignment apparatus for machines making integrated circuits |
09/06/1983 | US4403336 X-Ray exposure apparatus |
09/06/1983 | US4402610 Optical system for the automatic alignment of two motifs comprising alignment marks of the grating type, particularly in direct photorepetition on silicon |
09/06/1983 | US4402596 Projection type exposure device |
08/16/1983 | US4398824 Wafer tilt compensation in zone plate alignment system |
08/09/1983 | US4397543 Mask for imaging a pattern of a photoresist layer, method of making said mask, and use thereof in a photolithographic process |
08/09/1983 | US4397078 Method and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits |
08/09/1983 | EP0078323A4 Apparatus for projecting a series of images onto dies of a semiconductor wafer. |
08/02/1983 | US4396976 System for interfacing a computer to a machine |
07/26/1983 | US4395117 Printing apparatus having an in-focus detector |
07/26/1983 | CA1150850A1 Registration process |
07/20/1983 | EP0083710A1 Alignment system for lithographic proximity printing |
07/19/1983 | CA1150418A1 Automatic mask alignment |
07/12/1983 | US4393131 Method for captivating a substrate within a holder |
07/05/1983 | US4391511 Light exposure device and method |
07/05/1983 | US4391494 Apparatus for projecting a series of images onto dies of a semiconductor wafer |
07/05/1983 | US4391034 Thermally compensated shadow mask |
07/04/1983 | EP0073235A4 Reregistration system for a charged particle beam exposure system. |
06/28/1983 | US4390929 Precise lamp positioner |
06/28/1983 | US4390279 Alignment device in an IC projection exposure apparatus |
06/21/1983 | US4389094 Process for casting on a support the faithfull reproduction of a mask pierced with periodically distributed slits |
06/21/1983 | US4389084 Observing apparatus |
06/21/1983 | CA1148392A1 Optical focusing system |
06/15/1983 | EP0081233A1 Automatic focusing apparatus |
06/14/1983 | US4388386 Mask set mismatch |
05/31/1983 | US4385839 Automatic alignment system |
05/31/1983 | US4385838 Alignment device |
05/24/1983 | US4385238 Reregistration system for a charged particle beam exposure system |
05/18/1983 | EP0079070A1 Automatic wafer alignment method, method for determining the location of edges and wafer alignment system |
05/17/1983 | US4383760 Device for positioning an object relative to a carrier means |
05/17/1983 | US4383757 Optical focusing system |
05/11/1983 | EP0078461A2 Printing frame for positioning exactly visually-manually and for holding a plate-like workpiece |
05/11/1983 | EP0078323A1 Apparatus for projecting a series of images onto dies of a semiconductor wafer. |
05/10/1983 | US4382676 Positioning machine of original films on a base sheet |
05/04/1983 | EP0077888A2 Method and device for manufacturing microfiche masks |
05/04/1983 | EP0077878A1 Exposure process for transferring a mask pattern to a wafer |
04/26/1983 | US4380946 Film punch registration |
04/19/1983 | US4380395 Reduction projection aligner system |
04/12/1983 | US4379818 Artwork alignment for decorating machine |
03/22/1983 | US4377627 Reference marker pattern on semiconductor, radiation beam |
03/22/1983 | US4377028 Method for registering a mask pattern in a photo-etching apparatus for semiconductor devices |
03/15/1983 | US4376584 Pattern printing including aligning masks and monitoring such alignment |
03/15/1983 | US4376581 Method of positioning disk-shaped workpieces, preferably semiconductor wafers |
03/15/1983 | US4376580 Projection aligner with bending mirror |
03/09/1983 | EP0073235A1 Reregistration system for a charged particle beam exposure system |
03/01/1983 | US4375285 Device for transporting and positioning printing plates |
03/01/1983 | CA1142276A1 Wafer orienting apparatus |
02/22/1983 | US4374915 High contrast alignment marker for integrated circuit fabrication |
02/09/1983 | EP0071171A1 Suction device |
02/01/1983 | US4371953 Analog read only memory |
02/01/1983 | US4371923 Computer system architecture |
02/01/1983 | US4371264 Optical system for aligning two patterns and photo-repeater using such a system |
02/01/1983 | CA1140373A1 Process for casting on a support the faithful shadow of a mask pierced with periodically distributed slits, and the application of this process particularly in photolithography |
01/25/1983 | US4370720 Coordinate rotation for numerical control system |
01/25/1983 | US4370059 Method and machine for positioning an object photoelectrically using a register mark |
01/19/1983 | EP0069823A1 Process and apparatus for the mutual positioning (registration) of objects in X-ray and ion beam lithography |
01/12/1983 | EP0069529A2 Chip alignment method |
01/11/1983 | CA1139441A1 Optical imaging system provided with an opto-electronic detection system for determining a deviation between the image plane of the imaging system and a second plane on which an image is to be formed |
01/04/1983 | US4367046 Optical system for aligning two patterns and a photorepeater embodying such a system |
01/04/1983 | US4367009 Optical scanning apparatus with beam splitter to provide plural light beams |
12/28/1982 | US4365500 Web bending fixture |
12/14/1982 | US4364110 Computerized machine control system |
12/14/1982 | US4363962 Focussing apparatus with plural emitter-detector pairs |