| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 08/05/1997 | US5654553 Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate |
| 07/30/1997 | EP0786702A2 Process for pattern searching and a device for positioning of a mask to a workpiece |
| 07/30/1997 | EP0786071A1 On-axis mask and wafer alignment system |
| 07/23/1997 | EP0785472A2 Scan type projection exposure apparatus and device manufacturing method using the same |
| 07/22/1997 | US5650840 Focus detecting method and apparatus |
| 07/15/1997 | US5648854 Alignment system with large area search for wafer edge and global marks |
| 07/15/1997 | US5648189 Pin registration for screen printing |
| 07/15/1997 | US5648188 Real time alignment system for a projection electron beam lithographic system |
| 07/08/1997 | US5646413 Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement |
| 07/02/1997 | EP0782377A2 Board center registration for solder paste deposition |
| 07/01/1997 | US5643699 Method and device for the mutual alignment of a film and a printed circuit board |
| 06/26/1997 | WO1997022900A1 Dual beam automatic focus system |
| 06/26/1997 | WO1997022858A1 Multiple field of view calibration plate for use in semiconductor manufacturing |
| 06/25/1997 | EP0780886A1 Improvements in or relating to semiconductor processing |
| 06/24/1997 | US5641609 Method for manufacturing pattern layer having different minimum feature sizes |
| 06/18/1997 | CN1152137A Superhigh density servo information polar-coordinate photoetching system, method and equipment |
| 06/17/1997 | US5640243 Position detection method |
| 06/17/1997 | US5640227 Exposure apparatus and exposure method for minimizing defocusing of the transferred pattern |
| 06/10/1997 | US5638211 Method and apparatus for increasing the resolution power of projection lithography exposure system |
| 06/03/1997 | US5635722 Projection exposure method and apparatus capable of performing focus detection with high accuracy |
| 06/03/1997 | US5635336 Method for the preparation of a pattern overlay accuracy-measuring mark |
| 05/28/1997 | CN1150660A Control device of position and slope of target |
| 05/27/1997 | US5633721 Surface position detection apparatus |
| 05/27/1997 | US5633720 Stage movement control apparatus and method therefor and projection exposure apparatus and method therefor |
| 05/27/1997 | US5633698 Exposure apparatus |
| 05/27/1997 | US5633505 Semiconductor wafer incorporating marks for inspecting first layer overlay shift in global alignment process |
| 05/27/1997 | US5633103 Photolithography, patterning integrated circuits |
| 05/14/1997 | EP0772801A1 A positioning device with a reference frame for a measuring system |
| 05/14/1997 | EP0772800A1 Lithographic device with a three-dimensionally positionable mask holder |
| 05/07/1997 | DE19600427A1 Semiconductor wafer aligner with marker |
| 05/06/1997 | US5627871 X-ray tube and microelectronics alignment process |
| 05/06/1997 | US5627624 Integrated circuit test reticle and alignment mark optimization method |
| 05/06/1997 | US5627378 Die set for automatic UV exposure system |
| 05/01/1997 | WO1997015867A1 Pin registration for screen printing |
| 05/01/1997 | CA2224283A1 Pin registration for screen printing |
| 04/29/1997 | US5625583 Analog memory system having an integrated circuit frequency domain processor |
| 04/29/1997 | US5625453 System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating |
| 04/29/1997 | US5625436 Scanning type exposure apparatus and exposure method |
| 04/23/1997 | EP0769726A2 Process for projection exposure of a workpiece with alignment marks on the rear side and device for executing the process |
| 04/22/1997 | US5623343 For exposing a pattern of a photo-mask on a photosensitive substrate |
| 04/16/1997 | EP0768575A2 Method of optimising the arrangement of semiconductor elements on a semiconductor wafer |
| 04/15/1997 | US5621822 Method of detecting focus position of object from variable gray level image of object |
| 04/15/1997 | US5621813 Pattern recognition alignment system |
| 04/15/1997 | US5621529 Apparatus and method for projecting laser pattern with reduced speckle noise |
| 04/08/1997 | US5619445 Analog memory system having a frequency domain transform processor |
| 04/01/1997 | US5617211 Exposure apparatus |
| 03/26/1997 | EP0764885A2 Process for positioning of a mask relative to a workpiece and device for executing the process |
| 03/25/1997 | US5615380 Integrated circuit computer system having a keyboard input and a sound output |
| 03/25/1997 | US5615142 Analog memory system storing and communicating frequency domain information |
| 03/25/1997 | US5614767 Alignment accuracy check pattern |
| 03/18/1997 | US5612118 Elongate, semi-tone printing process and substrates printed thereby |
| 03/18/1997 | CA2061659C Media handling system for photoplotter and method of use |
| 03/12/1997 | EP0762216A2 Exposure method and apparatus and alignment evaluation method and apparatus |
| 03/12/1997 | EP0762215A1 Surface position detecting method and apparatus and scanning exposure method and apparatus |
| 03/11/1997 | US5610718 Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes |
| 03/11/1997 | US5610715 Displacement detecting system, an expose apparatus, and a device manufacturing method employing a scale whose displacement is detected by a selected detection head |
| 03/11/1997 | US5610686 Exposure apparatus including an antivibration control system |
| 03/06/1997 | WO1997008588A1 Mask structure having offset patterns for alignment |
| 03/04/1997 | US5608576 Projection method and projection system and mask therefor |
| 02/25/1997 | US5606172 Exposing apparatus and exposing method of works |
| 02/20/1997 | WO1997006012A1 Stamp for a lithographic process |
| 02/19/1997 | CN1143201A Multifunctional light receiver |
| 02/18/1997 | US5604779 Optical exposure method and device formed by the method |
| 02/18/1997 | US5604579 Method and apparatus for electronically creating imposition data, including dummy data for original film and platemaking |
| 02/18/1997 | US5604354 Masks for a double-side exposure machine |
| 02/11/1997 | US5602999 Memory system having a plurality of memories, a plurality of detector circuits, and a delay circuit |
| 02/11/1997 | US5602644 Alignment apparatus utilizing a plurality of wavelengths |
| 02/11/1997 | US5602620 Scanning exposure apparatus and exposure method |
| 02/11/1997 | US5602400 Surface position detecting method and apparatus including detection and correction of errors, such as surface position errors or tilt, in exposure regions |
| 02/11/1997 | US5602399 Surface position detecting apparatus and method |
| 02/11/1997 | US5601957 Micro devices manufacturing method comprising the use of a second pattern overlying an alignment mark to reduce flattening |
| 02/05/1997 | EP0745211A4 Grating-grating interferometric alignment system |
| 02/04/1997 | US5600698 X-ray exposure apparatus |
| 01/29/1997 | EP0756207A2 Process for positioning of a mask relative to another mask or a workpiece and device for executing the process |
| 01/29/1997 | EP0756206A2 Scanning exposure apparatus and exposure method using the same |
| 01/28/1997 | US5597590 Apparatus for removing a thin film layer |
| 01/21/1997 | US5596413 Sub-micron through-the-lens positioning utilizing out of phase segmented gratings |
| 01/21/1997 | US5596204 Method for aligning processing areas on a substrate with a predetermined position in a static coordinate system |
| 01/14/1997 | US5594549 Position detecting method and projection exposure apparatus using the same |
| 01/14/1997 | US5592746 Image registration board and compressible spacer assembly |
| 01/14/1997 | CA2039257C Measuring method and apparatus |
| 01/09/1997 | WO1997001184A1 Positioning method |
| 01/02/1997 | DE19625669A1 Compatibility precision measurement mark for semiconductor photomask manufacture |
| 12/24/1996 | US5587794 Surface position detection apparatus |
| 12/17/1996 | US5585925 Alignment method |
| 12/17/1996 | US5585923 Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means |
| 12/17/1996 | US5585904 Drum type image transfer apparatus |
| 12/17/1996 | US5585886 Apparatus for printing a photosensitive material and positioning device |
| 12/10/1996 | US5583609 Projection exposure apparatus |
| 12/05/1996 | WO1996038767A1 Positioning device with a vibration-free object table |
| 12/05/1996 | WO1996038766A1 Positioning device with a force actuator system for compensating centre-of-gravity displacements |
| 12/05/1996 | WO1996038765A1 A positioning device with a reference frame for a measuring system |
| 12/05/1996 | WO1996038764A1 Lithographic device with a three-dimensionally positionable mask holder |
| 12/05/1996 | WO1996038706A1 Interferometric broadband imaging |
| 12/04/1996 | EP0745211A1 Grating-grating interferometric alignment system |
| 12/03/1996 | US5580831 Sawcut method of forming alignment marks on two faces of a substrate |
| 11/26/1996 | US5578423 Method for the preparation of a pattern overlay accuracy-measuring mark |
| 11/21/1996 | DE19517842A1 Verfahren zur Messung von Meßmarken A method for measurement of measurement marks |
| 11/14/1996 | DE19619280A1 Non-contact mask to wafer relative position determn. method for semiconductor mfr. |
| 11/13/1996 | EP0742455A1 Phase grating and method of fabricating a phase grating |