| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 08/22/1989 | US4860374 Apparatus for detecting position of reference pattern |
| 08/16/1989 | EP0328039A2 Device for removing inserted paper layers |
| 08/15/1989 | US4857744 Optical projection printing apparatus wherein wafer mark has a grating pitch in the sagittal plane of the first optical system |
| 08/15/1989 | US4856905 Projection exposure apparatus |
| 08/09/1989 | EP0327093A2 Electron beam exposure method and apparatus |
| 08/09/1989 | EP0327019A2 Apparatus for fabricating pre-press masking film |
| 08/09/1989 | EP0174935B1 Dissimilar superimposed grating precision alignment and gap measurement systems |
| 08/08/1989 | US4856037 Arrangement for exposing semiconductor wafers by means of a synchrotron radiation in lithographic equipment |
| 08/08/1989 | US4855792 Optical alignment system for use in photolithography and having reduced reflectance errors |
| 08/02/1989 | EP0325842A2 Film punch registration |
| 08/01/1989 | US4853745 Exposure apparatus |
| 07/19/1989 | EP0324165A1 Alignment method for patterning |
| 07/18/1989 | US4849914 Method and apparatus for registering color separation film |
| 07/18/1989 | US4849313 Method for making a reticle mask |
| 07/18/1989 | US4848911 Method for aligning first and second objects, relative to each other, and apparatus for practicing this method |
| 07/13/1989 | WO1989006430A1 Gap sensing/adjustment apparatus and method for a lithography machine |
| 07/05/1989 | EP0323242A2 Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects |
| 07/04/1989 | US4845530 Reduced projection type step- and repeat-exposure apparatus |
| 06/27/1989 | US4843563 Step-and-repeat alignment and exposure method and apparatus |
| 06/21/1989 | EP0321029A1 Process for obtaining aligned patterns on opposite sides of an opaque support |
| 06/13/1989 | US4838693 Method and apparatus for setting a gap between first and second objects to a predetermined distance |
| 05/30/1989 | US4835401 Apparatus for automatic positioning of printing film on base film |
| 05/30/1989 | US4835078 Method for aligning photomasks |
| 05/30/1989 | US4834540 Projection exposure apparatus |
| 05/30/1989 | US4834499 Optical device for forming crossed linear image elements |
| 05/30/1989 | US4833985 Apparatus for matching register marks and punching U-holes for press plate |
| 05/24/1989 | EP0316396A1 Positioning apparatus particularly for use in a vacuum environment |
| 05/23/1989 | US4833621 Method of and apparatus for aligning a substrate |
| 05/23/1989 | US4833324 Nondestructive readout of a latent electrostatic image formed on an insulating material |
| 05/16/1989 | US4831272 Apparatus for aligning a reticle mark and substrate mark |
| 05/16/1989 | US4830500 Alignment device |
| 05/16/1989 | US4830499 Optical device capable of maintaining pupil imaging |
| 05/16/1989 | US4830498 Position detecting device |
| 05/16/1989 | US4829866 Method of registering film positives or negatives/foils/masks or flats |
| 05/09/1989 | US4829419 Microcomputer control of machines |
| 05/09/1989 | US4829375 Method for punching in printed circuit board laminates and related apparatus and articles of manufacture |
| 05/09/1989 | US4829193 Projection optical apparatus with focusing and alignment of reticle and wafer marks |
| 05/09/1989 | US4828392 Exposure apparatus |
| 05/03/1989 | EP0313681A1 Phase-sensitive interferometric mask-wafer alignment |
| 05/02/1989 | US4827316 Printing frame |
| 05/02/1989 | US4825555 Apparatus for automatic forming on a film material of both a mask film pattern and a positioning hole |
| 04/26/1989 | EP0313466A2 Wafer positioning apparatus |
| 04/26/1989 | EP0313200A2 Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems |
| 04/25/1989 | US4825364 Monolithic data processor with memory refresh |
| 04/25/1989 | US4825086 Apparatus for the exact mutual alignment of a mask and semiconductor wafer in a lithographic apparatus |
| 04/25/1989 | US4824254 Slit utilized as pattern for aligning |
| 04/25/1989 | CA1253021A1 Alignment and focusing system for a scanning mask aligner |
| 04/19/1989 | EP0312341A2 High resolution imagery systems |
| 04/19/1989 | EP0311624A1 Improved registration method in photolithography and equipment for carrying out this method |
| 04/18/1989 | US4823014 Position detecting device usable with an object having a surface |
| 04/18/1989 | US4823012 Step and repeat exposure apparatus having improved system for aligning |
| 04/18/1989 | US4823011 Ion-projection lithographic apparatus with means for aligning the mask image with the substrate |
| 04/18/1989 | US4822718 Light absorbing coating |
| 04/11/1989 | US4821078 Apparatus for composing a plurality of original films on a base sheet |
| 04/11/1989 | US4820055 Apparatus for adjusting a mask with at least one adjustment mark relative to a semi-conductor wafer provided with at least one lattice structure |
| 04/06/1989 | WO1989003051A1 Method and apparatus for registering color separation film |
| 04/04/1989 | US4818879 Positioning and machining apparatus having a scanner for circularly scanning an object by a light beam |
| 04/04/1989 | US4818724 Using template to align, support and mask substrate for metal deposition by photoresist |
| 04/04/1989 | CA1252224A1 Reverse dark field alignment system for scanning lithographic aligner |
| 03/29/1989 | EP0309305A1 System for the precise positioning of an object along an axis |
| 03/29/1989 | EP0309281A2 Apparatus for controlling relation in position between a photomask and a wafer |
| 03/28/1989 | US4816903 Film checking apparatus |
| 03/28/1989 | US4815854 Method of alignment between mask and semiconductor wafer |
| 03/28/1989 | US4815850 Relative-displacement measurement method |
| 03/21/1989 | US4814829 Projection exposure apparatus |
| 03/21/1989 | US4814626 Method for high precision position measurement of two-dimensional structures |
| 03/14/1989 | US4812880 Exposure apparatus |
| 03/14/1989 | US4812662 Alignment system using an electron beam |
| 03/14/1989 | US4812661 Method and apparatus for hybrid I.C. lithography |
| 03/08/1989 | EP0306275A2 Photoelectron image projection apparatus |
| 03/07/1989 | US4811062 Method for aligning first and second objects relative to each other and apparatus for practicing this method |
| 03/07/1989 | US4811059 Alignment method |
| 02/28/1989 | US4808829 Mark position detection system for use in charged particle beam apparatus |
| 02/28/1989 | US4808807 Optical focus sensor system |
| 02/28/1989 | US4808002 Method and device for aligning first and second objects relative to each other |
| 02/21/1989 | US4805316 Method of and apparatus for aligning printed circuit carriers preparatory to the application of printed circuits |
| 02/21/1989 | CA1250139A2 Apparatus for calibrating a capacitance height gauge |
| 02/08/1989 | EP0302178A2 Position sensor |
| 02/08/1989 | EP0189435B1 Mask-to-wafer alignment utilizing zone plates |
| 02/07/1989 | US4803524 Method of and apparatus for detecting the accuracy of superposition exposure in an exposure apparatus |
| 01/31/1989 | US4801808 Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system |
| 01/31/1989 | US4801208 Projection type exposing apparatus |
| 01/17/1989 | US4798962 Multi-wavelength projection exposure and alignment apparatus |
| 01/17/1989 | US4798470 Pattern printing method and apparatus |
| 01/11/1989 | EP0298642A2 Method for aligning photomasks |
| 01/10/1989 | US4796999 Device for automatically determining the deviation between the structures of a pattern and those of an object compared therewith |
| 01/03/1989 | US4795261 Reduction projection type aligner |
| 01/03/1989 | US4795244 Projection type exposure apparatus |
| 12/28/1988 | CA1247533A Method and apparatus for registering color separation film |
| 12/28/1988 | CA1247446A Multiple registration and imaging process to form a set of registered imaged elements |
| 12/28/1988 | CA1247444A Automatic repetitive registration and imagewise exposure of sheet substrates |
| 12/28/1988 | CA1247443A Registering and exposing sheet substrates using photosensitive liquid |
| 12/28/1988 | CA1247442A Sequential automatic registration and imagewise exposure of a sheet substrate |
| 12/27/1988 | US4794648 Mask aligner with a wafer position detecting device |
| 12/27/1988 | US4794462 Method and system for patching an original at a desired angular orientation on a scanner input drum or an original patching sheet and extracting original trimming data |
| 12/27/1988 | US4794426 Alignment apparatus |
| 12/21/1988 | EP0295860A2 An exposure apparatus |
| 12/20/1988 | US4792693 Step-and-repeat exposure method |
| 12/15/1988 | WO1988009945A1 Positioning apparatus particularly for use in a vacuum environment |
| 12/13/1988 | US4790642 Integrated metrology for microlithographic objective reducing lens |