Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
12/1998
12/01/1998US5844666 Positioning device with a vibration-free object table, and lithographic device provided with such a positioning device
12/01/1998US5844664 Positioning device with a force actuator system for compensating center-of-gravity displacements, and lithographic device provided with such a positioning device
12/01/1998US5844247 Position measuring method
12/01/1998US5843831 Process independent alignment system
12/01/1998US5843600 Use of sub divided pattern for alignment mark recovery after inter-level dielectric planarization
12/01/1998US5842397 Punching apparatus and punching method for cylindrical inner surface scanner
11/1998
11/25/1998EP0880078A2 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same
11/25/1998EP0879400A1 Multiple field of view calibration plate for use in semiconductor manufacturing
11/24/1998US5841520 Exposure apparatus and method that use mark patterns to determine image formation characteristics of the apparatus prior to exposure
11/17/1998US5838450 Direct reticle to wafer alignment using fluorescence for integrated circuit lithography
11/17/1998US5838449 Optical apparatus
11/17/1998US5838443 Exposure apparatus implementing priority speed setting arrangement
11/17/1998US5838013 Method for monitoring resist charging in a charged particle system
11/12/1998WO1998050937A1 X-ray tube and microelectronics alignment process
11/10/1998US5835201 Original holder adaptable for both laterally long and vertically long images
11/10/1998US5835196 System and method for alignment of integrated circuits multiple layers
11/10/1998US5835195 Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
11/10/1998US5834785 Method and apparatus to compensate for thermal expansion in a lithographic process
11/10/1998US5834767 For detecting a surface position of an object
11/10/1998US5832620 Staging apparatus
11/05/1998WO1998042510A3 Viewing and imaging systems
11/03/1998US5831739 Alignment method
10/1998
10/27/1998US5827629 Position detecting method with observation of position detecting marks
10/27/1998US5827624 Mask modification for focal plane on contact photolithography tool
10/27/1998US5826513 Method and apparatus for punching and imaging a continuous web
10/20/1998US5825483 Multiple field of view calibration plate having a reqular array of features for use in semiconductor manufacturing
10/20/1998US5825469 Auto focus system using twice reflection
10/20/1998US5825468 For a semiconductor device
10/20/1998US5825043 Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
10/14/1998EP0871072A2 Multiple detector alignment system for photolithography
10/13/1998US5822389 Alignment apparatus and SOR X-ray exposure apparatus having same
10/13/1998US5822043 Exposure method and projection exposure apparatus using the same
10/09/1998CA2234532A1 Multiple detector alignment system for photolithography
10/08/1998DE19736959A1 Intermediate mask for pattern transfer in semiconductor manufacture
10/07/1998EP0810914B1 A method and a device for applying perforations
10/06/1998US5817242 Stamp for a lithographic process
10/01/1998WO1998042510A2 Viewing and imaging systems
09/1998
09/30/1998EP0867776A2 Exposure method, exposure apparatus and method for making an exposure apparatus
09/30/1998EP0867775A2 Proximity exposure device with distance adjustment device
09/30/1998EP0867771A2 Exposure apparatus, exposure method, and circuit making method
09/29/1998US5815594 Semiconductor exposure method and apparatus
09/29/1998US5815293 Compound objective lens having two focal points
09/29/1998US5815243 Electronic prepress apparatus for producing lithographic printing plates
09/29/1998US5814826 Method and apparatus for aligning photoprinting plates in a production line
09/29/1998US5813342 Multilayer printing plates with supports and polymer layers
09/24/1998WO1998041902A1 Method and device for positioning a sheet-like element on a support
09/23/1998EP0866375A2 Article positioning apparatus and exposing apparatus having the same
09/22/1998US5812271 Reticle pre-alignment apparatus and method thereof
09/22/1998US5812244 Reticle assembly having non-superposed position measurement patterns
09/22/1998US5811316 Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring
09/17/1998WO1998040792A1 System and method for optically aligning films and substrates used in printed circuit boards
09/16/1998EP0864929A2 Determining method of movement sequence and alignment apparatus for executing the same
09/15/1998US5808910 On a substrate
09/15/1998US5808796 Projection method and projection system and mask therefor
09/15/1998US5808742 Optical alignment apparatus having multiple parallel alignment marks
09/15/1998US5808724 Illumination method and system having a first optical element at a position optically conjugate with an object and a second optical element closer to the object and on a pupil plane of the system
09/11/1998WO1998039689A1 Lithographic projection apparatus with off-axis alignment unit
09/08/1998US5805866 Alignment method
09/03/1998DE19808707A1 Exposure mask alignment method for semiconductor wafer
09/01/1998US5801835 Surface position detection apparatus and method
09/01/1998US5801832 Method of and device for repetitively imaging a mask pattern on a substrate using five measuring axes
09/01/1998US5801816 Projection exposure apparatus
09/01/1998US5801815 Projection exposure apparatus
09/01/1998US5801390 Position-detection method and apparatus with a grating mark
09/01/1998US5801389 To split a light beam incident into two light beams of different frequencies
09/01/1998US5800951 Exposure method and exposure mask with monitoring patterns
09/01/1998US5800949 Mask, method of producing a device using the mask and aligner with the mask
08/1998
08/25/1998US5798822 Exposure apparatus
08/25/1998US5798530 Method and apparatus for aligning a mask and a set of substrates to be exposed
08/25/1998US5798292 Method of forming wafer alignment patterns
08/25/1998US5798283 Method for integrating microelectromechanical devices with electronic circuitry
08/25/1998US5798193 Test pattern is used to calibrate the coordinate system of each processing machine on which the photomask is mounted
08/25/1998US5797674 Illumination optical system, alignment apparatus, and projection exposure apparatus using the same
08/19/1998CN1190790A Semiconductor substrate and method for making semiconductor device
08/18/1998US5796483 Method and apparatus for position sensing
08/18/1998US5796469 Exposure apparatus and device manufacturing method using the same
08/18/1998US5796468 Apparatus used to align and mark wafers
08/18/1998US5796467 Scanning projection exposure method and apparatus using substrate position adjustment based on mask pattern positioin during scanning exposure
08/18/1998US5796114 Exposure apparatus and method for positioning with a high accuracy
08/18/1998US5795687 Projection exposure method and alignment
08/12/1998EP0857320A1 Pin registration for screen printing
08/11/1998US5793472 Exposure method using reference marks on both the mask and the substrate and capable of providing high alignment precision even after multiple exposures
08/11/1998US5792580 Method of aligning reticle pattern
08/06/1998WO1998033651A1 Printing plate
08/04/1998US5790258 Position detecting device
08/04/1998US5790257 Alignment device for an exposure system using a CCD camera
08/04/1998US5790253 Method and apparatus for correcting linearity errors of a moving mirror and stage
08/04/1998US5789734 Exposure apparatus that compensates for spherical aberration of an image forming device
07/1998
07/30/1998WO1998033097A1 Method and apparatus for wafer-focusing
07/28/1998US5786931 For a photoelectric position measuring instrument
07/28/1998US5786897 Method and device for measuring pattern coordinates of a pattern formed on a pattern surface of a substrate
07/28/1998US5786267 Method of making a semiconductor wafer with alignment marks
07/28/1998US5786114 Attenuated phase shift mask with halftone boundary regions
07/22/1998CN1188328A Process for manufacturing optical shade of zero level of integrated circuit
07/21/1998US5784166 In a precision motion system
07/21/1998US5783833 Method and apparatus for alignment with a substrate, using coma imparting optics
07/21/1998US5783342 Method and system for measurement of resist pattern
07/21/1998US5783341 Alignment for layer formation through determination of target values for translation, rotation and magnification
07/21/1998US5783340 Method for photolithographic definition of recessed features on a semiconductor wafer utilizing auto-focusing alignment
07/14/1998US5780882 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
1 ... 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 ... 109