Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
07/1998
07/09/1998WO1998029770A1 Near-ultraviolet formation of refractive-index grating using phase mask
07/09/1998CA2276100A1 Near-ultraviolet formation of refractive-index grating using phase mask
07/07/1998US5777747 Process for positioning a mask relative to a workpiece and device for performing the process
07/07/1998US5777722 Scanning exposure apparatus and method
07/07/1998US5777721 Exposure method and apparatus with control of a linear motor
07/07/1998US5777392 Semiconductor device having improved alignment marks
07/07/1998US5776645 Lithographic print bias/overlay target and applied metrology
07/01/1998EP0851451A1 Process for self-aligning, usable in microelectronics and the use for the production of a focussing grid for a microtip flat display panel
06/1998
06/30/1998US5774205 Exposure and method which tests optical characteristics of optical elements in a projection lens system prior to exposure
06/30/1998US5773836 Method for correcting placement errors in a lithography system
06/30/1998US5773180 Semiconductor wafers
06/30/1998US5772905 Nanoimprint lithography
06/23/1998US5770338 Phase shifting overlay mark that measures exposure energy and focus
06/23/1998US5770337 Focus, microscopes
06/17/1998EP0848299A2 Stage and optical projection apparatus
06/16/1998US5767948 Lithographic device with a three-dimensionally positionable mask holder
06/16/1998US5767523 Multiple detector alignment system for photolithography
06/16/1998US5766806 Simplified production of integrated circuits
06/16/1998US5766804 Method of optical lithography using phase shift masking
06/10/1998EP0846986A2 Position detector and microlithography apparatus comprising same
06/10/1998CN1038709C Colour filter of liquid crystal display device and method for manufacturing the same
06/04/1998WO1998024115A1 Aligner and method for exposure
06/02/1998USH1733 Exposure method
06/02/1998US5760881 Exposure apparatus with light shielding portion for plotosensitive elements
06/02/1998US5760879 Method of detecting coma of projection optical system
06/02/1998US5760878 Exposure apparatus and alignment discrimination method
06/02/1998US5760830 Image pick-up device having switching over means, image pick-up means, monitor means, recording means, still picture display means and control means
06/02/1998US5760564 Dual guide beam stage mechanism with yaw control
06/02/1998US5760561 Method of controlling a stage and a system such as an exposing apparatus using the same
06/02/1998US5760484 Alignment mark pattern for semiconductor process
06/02/1998US5760411 Alignment method for positioning a plurality of shot areas on a substrate
05/1998
05/26/1998US5757505 Exposure apparatus
05/26/1998US5756238 Lithographic print bias/overlay target and applied metrology
05/20/1998EP0843221A2 Projection exposure apparatus
05/19/1998US5754300 Alignment method and apparatus
05/19/1998US5754299 Inspection apparatus and method for optical system, exposure apparatus provided with the inspection apparatus, and alignment apparatus and optical system thereof applicable to the exposure apparatus
05/19/1998US5754279 Method and apparatus for changing photoprinting glass in production line
05/19/1998US5753926 Scan type exposure apparatus and method having a reference plate with marks for image detection
05/19/1998US5753416 Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
05/19/1998US5753391 Method of forming a resistor having a serpentine pattern through multiple use of an alignment keyed mask
05/19/1998US5752445 Printing mantle for printing indicia on corrugated cardboard substrates
05/13/1998EP0841594A2 Mark for position detection, mark detecting method and apparatus, and exposure system
05/12/1998US5751428 Exposure method and exposure apparatus using the same
05/12/1998US5751426 Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object
05/12/1998US5751404 Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
05/12/1998US5751403 Projection exposure apparatus and method
05/12/1998US5750294 Best focus determining method
05/06/1998CN2280935Y Mask plate with ring ruler
05/05/1998US5748323 Method and apparatus for wafer-focusing
05/05/1998US5747202 Projection exposure method
05/05/1998US5747200 Radiation exposure of wafers, photoresists and positioning and forming patterns
04/1998
04/29/1998CN1180180A Reticle pre-alignment apparatus and method thereof
04/28/1998US5745242 Position detecting system and exposure apparatus having the same
04/28/1998US5744924 Guideless stage with isolated reaction frame
04/28/1998US5744814 Method and apparatus for scanning exposure having thickness measurements of a film surface
04/22/1998EP0837371A2 Line width insensitive wafer target detection
04/21/1998US5742397 Control device of the position and slope of a target
04/21/1998US5742067 Exposure method and apparatus therefor
04/16/1998CA2216705A1 Line width insensitive wafer target detection
04/15/1998EP0836178A1 Optical disk
04/14/1998US5740065 Method for manufacturing semiconductor device
04/14/1998US5739913 Alignment system for a lithography system
04/14/1998US5739899 Projection exposure apparatus correcting tilt of telecentricity
04/14/1998US5739589 Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same
04/14/1998US5738961 Forming on substrate an alignment mark, forming blanket layer, etching to remove portion of blanket to expose alignment mark, patterning, etching, employing partially replicated alignment mark to register photolithographic mask on substrate
04/14/1998CA2095190C Exposure drum mask
04/08/1998EP0834773A2 Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
04/08/1998EP0834751A2 Optical element manufacturing method
04/07/1998US5737064 Exposure apparatus for transferring a mask pattern onto a substrate
04/07/1998US5737063 Projection exposure apparatus
04/01/1998EP0833208A2 A stage apparatus
03/1998
03/31/1998US5734594 Method and system for enhancement of wafer alignment accuracy
03/31/1998US5734478 Projection exposure apparatus
03/31/1998US5734462 Exposure apparatus and exposure method
03/31/1998US5733711 Process for forming both fixed and variable patterns on a single photoresist resin mask
03/31/1998US5733690 Adjustment marks
03/24/1998US5731877 Automated system utilizing self-labeled target by pitch encoding
03/24/1998US5731113 Method of reducing registration error in exposure step of semiconductor device
03/18/1998EP0786071A4 On-axis mask and wafer alignment system
03/17/1998US5729337 Inclination detecting apparatus
03/12/1998DE19715730A1 Semiconductor component, e.g. integrated circuit, on semiconductor substrate manufacture
03/10/1998US5726758 Position detecting system
03/10/1998US5726757 Alignment method
03/05/1998DE19635178A1 Photolithographic exposure method for plate or foil
03/04/1998EP0827035A2 Method and apparatus for aligning photoprinting plates in a production line
03/04/1998EP0827034A2 Method and apparatus for changing photoprinting glass in production line
03/04/1998EP0826165A1 Alignment device and lithographic apparatus provided with such a device
03/04/1998CN1175229A Elongate, semi-tone printing process and substrates printed thereby
03/03/1998US5723235 Method of producing photomask and exposing
02/1998
02/25/1998EP0824723A1 A method of aligning images to be scanned and a scanning apparatus for such alignment
02/25/1998EP0648154B1 Use of fresnel zone plates for material processing
02/24/1998US5721607 Alignment method and apparatus
02/24/1998US5721605 Alignment device and method with focus detection system
02/24/1998US5721079 Length of optical path is adjusted such that the magnification factor in the emission of nonexposure light matches the magnification factor in emission of exposure light
02/18/1998EP0824225A2 Alignment method
02/18/1998EP0823978A1 Process and device for adapting the position of printing plates to the deformation of the paper to be printed
02/18/1998EP0823977A1 Lithopraphic apparatus for step-and-scan imaging of a mask pattern
02/12/1998WO1998006009A1 Lithography system with remote multisensor alignment
02/11/1998EP0823667A2 Alignment apparatus and exposure apparatus equipped with same
02/11/1998EP0823662A2 Projection exposure apparatus
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