| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 03/05/2015 | WO2015029819A1 Exposure apparatus |
| 03/03/2015 | US8968630 Imprint lithography |
| 03/03/2015 | US8967992 Optically absorptive material for alignment marks |
| 03/03/2015 | US8967991 Imprint lithography template |
| 02/26/2015 | US20150055125 Measurement method of overlay mark |
| 02/24/2015 | US8965552 Method and a device for titling |
| 02/24/2015 | US8962405 Method of manufacturing semiconductor device by mounting and positioning a semiconductor die using detection marks |
| 02/17/2015 | US8956976 Methods of processing semiconductor substrates in forming scribe line alignment marks |
| 02/17/2015 | US8956946 Active pad patterns for gate alignment marks |
| 02/12/2015 | US20150042984 Methods and apparatus for determining focus |
| 02/12/2015 | US20150042969 Lithography apparatus, and article manufacturing method |
| 02/12/2015 | DE102014010870A1 Phasenkontrollierte Überlagerungsmesssysteme auf Modellbasis und Verfahren Phase Controlled overlay measurement systems and model-based method |
| 02/11/2015 | CN104345577A 对准装置 Alignment means |
| 02/11/2015 | CN104345574A 一种基于位置传感器的光刻机掩模预对准系统 Based on pre-position sensor lithography mask alignment system |
| 02/11/2015 | CN104345571A 对准标记的成像和测量装置、光刻装置 Imaging and measuring device alignment marks, lithographic apparatus |
| 02/11/2015 | CN103365099B 一种调焦调平信号处理方法 A focusing signal processing method leveling |
| 02/11/2015 | CN103197519B 一种偏置平板的调整装置 Biasing plate adjusting device |
| 02/11/2015 | CN103197517B 一种工件台平衡质量质心测试校准方法 A work station centroid mass balance test calibration method |
| 02/11/2015 | CN103135371B 基于分束偏折结构的小光斑离轴对准系统 Based on the structure of the beam deflection small spot off-axis alignment system |
| 02/11/2015 | CN103091992B 一种工件位置校正装置及其校正方法 A work position correction device and calibration method |
| 02/11/2015 | CN102749816B 一种调焦调平测量装置 One kind of focus leveling measurement device |
| 02/11/2015 | CN102725680B 基板、针对基板的曝光方法、光取向处理方法 A substrate, a substrate for the exposure method, photo-alignment treatment method |
| 02/11/2015 | CN102163002B 光刻设备和器件制造方法 Lithographic apparatus and device manufacturing method |
| 02/10/2015 | US8953250 Optical arrangement of autofocus elements for use with immersion lithography |
| 02/10/2015 | US8953175 Mark position detector, imprint apparatus, and article manufacturing method |
| 02/10/2015 | US8953173 Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate |
| 02/10/2015 | US8953146 Exposure apparatus for improving alignment accuracy of a pattern generated by light modulating elements |
| 02/10/2015 | US8951031 Imprinting apparatus and article manufacturing method |
| 02/05/2015 | WO2015014078A1 Method for manufacturing color filter and color filter |
| 02/04/2015 | CN102956477B 锗硅hbt发射极光刻对准精度优化的方法 SiGe hbt auroral emission optimization method engraved alignment accuracy |
| 02/03/2015 | US8947665 Measurement method, measurement apparatus, exposure method, and exposure apparatus |
| 02/03/2015 | US8947664 Apparatus and method for aligning a wafer's backside to a wafer's frontside |
| 02/03/2015 | US8947641 Lithographic apparatus and method |
| 02/03/2015 | US8947637 Lithographic apparatus and device manufacturing method |
| 02/03/2015 | US8947632 Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate |
| 01/29/2015 | WO2015010396A1 Alignment system |
| 01/28/2015 | CN104321703A 位置测量方法、位置测量设备、光刻设备以及装置制造方法、光学元件 Location measurement method, the position measurement apparatus, lithographic apparatus and a device manufacturing method, the optical element |
| 01/28/2015 | CN104317451A 触控显示装置的制造方法 Touch display device manufacturing method |
| 01/28/2015 | CN104317174A 一种膜层去除装置 One kind of film removal device |
| 01/28/2015 | CN102800566B 一种半导体器件中接触区引线工艺保护对准标记的方法 A semiconductor device lead process alignment mark protection method contacting zone |
| 01/28/2015 | CN102736445B 掩模与工件的对齐方法 Methods of alignment of the mask and the workpiece |
| 01/28/2015 | CN102566320B 曝光装置、曝光方法以及器件制造方法 Exposure apparatus, exposure method and device manufacturing method |
| 01/22/2015 | US20150025668 Computational process control |
| 01/22/2015 | DE102006019644B4 Übertragungseinrichung mit einem Kardangelenkmechanismus und Übertragungsverfahren unter Verwendung der Übertragungseinrichtung Übertragungseinrichung with a universal joint mechanism and transmission method using the transmission device |
| 01/21/2015 | CN204116808U 曝光框对位装置 Exposure frame alignment device |
| 01/21/2015 | CN103365124B 曝光对准方法 Exposure alignment method |
| 01/21/2015 | CN103163740B 一种倾斜物体位置测量装置 One kind of object position measuring device tilt |
| 01/21/2015 | CN103135359B 一种光机系统对心装置和方法 An optical system for cardiac devices and methods |
| 01/21/2015 | CN103105741B 对位补偿装置及曝光装置 Alignment compensation device and exposure apparatus |
| 01/21/2015 | CN103092005B 玻璃基板的曝光对位方法 Exposure to the position of a glass substrate |
| 01/21/2015 | CN103034072B 待曝光基材及底片的对位方法及影像检测对位系统 To position the substrate and the film to be exposed methods of detection and imaging alignment system |
| 01/21/2015 | CN102902165B 叠层虚拟掩模版的装置及集成硅光子集成芯片的方法 Apparatus and method for integrated silicon photonic integrated chip stack virtual reticle |
| 01/21/2015 | CN102841516B 一种硅片对准系统焦面校准方法 One kind of silicon focal plane alignment system calibration method |
| 01/21/2015 | CN102540779B 用于光刻机中的掩模版固定装置及掩模版固定方法 Lithography reticle in reticle fixing means and a method for fixing |
| 01/21/2015 | CN102290365B 基板保持装置、具备其之曝光装置及方法、元件制造方法 Substrate holding apparatus, which includes the exposure apparatus and method, device manufacturing method |
| 01/14/2015 | EP2823361A2 Lithography system and method for processing a target, such as a wafer |
| 01/14/2015 | CN104281020A 一种改善光刻对位能力的方法 A method of improving the ability of photolithography bits |
| 01/14/2015 | CN104281019A 光刻的迭对值校准方法 Diego lithography value of the calibration method |
| 01/14/2015 | CN104281001A 膜掩模校正装置 Membrane mask correction device |
| 01/14/2015 | CN103176373B 对准标记及其制备方法 Alignment mark and its preparation method |
| 01/14/2015 | CN102402129B 光刻设备、器件制造方法和施加图案到衬底上的方法 Lithographic apparatus, device manufacturing method and the method of applying a pattern onto a substrate |
| 01/13/2015 | US8934081 Method and apparatus for performing alignment using reference board |
| 01/13/2015 | US8932097 Insulating pattern, method of forming the insulating pattern, light-emitting device, method of manufacturing the light-emitting device, and lighting device |
| 01/07/2015 | CN204086815U 一种改进的曝光机靶标识别对准装置 An improved target identification other exposure machine alignment means |
| 01/07/2015 | CN104272194A 处理诸如晶圆的靶材的光刻系统和方法 Processing such as the target wafer lithography systems and methods |
| 01/07/2015 | CN104272191A 光刻设备及器件制造方法 Lithographic apparatus and device manufacturing method |
| 01/07/2015 | CN103149608B 无标记深浮雕微透镜阵列与探测器的对准方法 Unmarked deep relief microlens array and detector alignment method |
| 01/07/2015 | CN102360167B 曝光装置和曝光方法以及器件制造方法 Exposure apparatus and exposure method, and device manufacturing method |
| 01/07/2015 | CN102236273B 光掩模与基材的对位方法以及布线电路板的制造方法 Position method for a photomask to a substrate and method of manufacturing a wiring circuit board |
| 01/06/2015 | US8928882 Measurement apparatus, exposure apparatus, and device fabrication method |
| 01/01/2015 | US20150004802 Methods and Structures for Protecting One Area While Processing Another Area on a Chip |
| 12/31/2014 | CN204065660U 一种用于dwl66fs型激光直写系统样品的定位夹具 A dwl66fs laser direct writing sample positioning fixture system |
| 12/30/2014 | US8922774 Method of manufacturing device, and substrate |
| 12/30/2014 | US8922756 Position measurement system, lithographic apparatus and device manufacturing method |
| 12/30/2014 | US8922752 Method and apparatus for alignment processing |
| 12/30/2014 | US8921812 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle |
| 12/24/2014 | CN104238284A 一种基于光栅泰伯效应的检焦方法 A specimen grating focus method based on Talbot effect |
| 12/24/2014 | CN103186054B 载物装置及曝光装置 Loading apparatus and exposure apparatus |
| 12/18/2014 | US20140370719 Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor device |
| 12/17/2014 | CN103293884B 用于光刻设备的离轴对准系统及对准方法 Off-axis alignment system for a lithographic apparatus and alignment method |
| 12/17/2014 | CN103217875B Pcb曝光机及其纠偏机构 Pcb Exposure Machine and corrective institutions |
| 12/17/2014 | CN102955365B 一种干涉曝光装置及方法 An exposure apparatus and method for interference |
| 12/17/2014 | CN102809903B 二次预对准装置及对准方法 Apparatus and method for aligning the second pre-alignment |
| 12/17/2014 | CN102736432B 一种对纳米尺度元件进行套刻的方法 A kind of nanoscale elements overlay method |
| 12/17/2014 | CN102736428B 一种调焦调平装置及方法 An apparatus and method for focusing leveling |
| 12/17/2014 | CN102486995B 动态晶圆对位方法及曝光扫瞄系统 Dynamic wafer alignment method and exposure scanning system |
| 12/16/2014 | US8914143 Method and system for handling substrates |
| 12/16/2014 | US8912671 Semiconductor device having alignment mark |
| 12/11/2014 | US20140362357 Exposure apparatus and method of manufacturing article |
| 12/10/2014 | CN204009360U 菲林对位机 Film of the crew |
| 12/10/2014 | CN204009359U 一种定位pin钉 A positioning pin nails |
| 12/10/2014 | CN104204957A 曝光描绘装置及曝光描绘方法 Exposure drawing device and exposure drawing method |
| 12/10/2014 | CN104204956A 基板处理装置、处理装置以及元件制造方法 Substrate processing apparatus, processing apparatus, and device manufacturing method |
| 12/10/2014 | CN104199257A 一种精密定位平台绝对定位精度的测量及补偿方法 A precision positioning platform absolute positioning accuracy of measurement and compensation methods |
| 12/10/2014 | CN102880011B 一种层间图形对准精度的检测方法 An inter-layer pattern alignment accuracy of detection methods |
| 12/10/2014 | CN102854751B 光刻机调焦调平机构以及光刻机调平机构 Lithography focusing leveling mechanism and lithography leveling mechanism |
| 12/10/2014 | CN102754035B 光刻设备和器件制造方法 Lithographic apparatus and device manufacturing method |
| 12/09/2014 | US8908152 Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures |
| 12/09/2014 | US8908145 Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method |
| 12/09/2014 | US8907442 System comprising a semiconductor device and structure |