Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
06/1999
06/03/1999WO1999027567A1 Mark detection method and mark position sensor
06/01/1999US5908719 Radiation mask adapted to be aligned with a photoresist layer and method of making the same
05/1999
05/27/1999WO1999026278A1 Exposure apparatus and method of manufacturing the same, and exposure method
05/26/1999EP0857320A4 Pin registration for screen printing
05/25/1999US5907405 Alignment method and exposure system
05/25/1999US5907390 Positioning apparatus, exposure apparatus and method of manufacturing semiconductor device
05/25/1999US5907230 Device for aligning and supporting an artwork during light exposure installation of a printed circuit board
05/25/1999US5906901 Alignment method and exposure apparatus for use in such alignment method
05/18/1999US5905699 Focusing apparatus and optical disk apparatus using the same
05/11/1999US5903356 Position detecting apparatus
05/11/1999US5902707 Mask containing alignment mark protection pattern
05/11/1999US5902705 Making phase shifting mask for transferring circuit pattern onto semiconductor wafer by optical reduction projection exposure with ultraviolet light
05/06/1999WO1999022273A1 Composite relief image printing plates
05/04/1999US5900707 Stage-drive control apparatus and method, and scan-projection type exposure apparatus
04/1999
04/29/1999WO1999021059A1 Method and apparatus for imaging a continuous web
04/28/1999EP0910816A1 Composite relief image printing plates and methods for preparing same
04/27/1999US5898594 Method and apparatus for enabling a selection of catalog items
04/27/1999US5898478 Method of using a test reticle to optimize alignment of integrated circuit process layers
04/27/1999US5898227 Alignment targets having enhanced contrast
04/22/1999DE19806579A1 Precision positioning method for printing plate
04/21/1999EP0909647A2 Control console for a printing machine
04/15/1999WO1999018612A2 Wafer level integration of multiple optical elements
04/14/1999EP0620931B1 Mask for photolithography
04/13/1999US5894350 Method of in line intra-field correction of overlay alignment
04/13/1999US5894056 Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus
04/08/1999DE19822764A1 Correcting alignment method for system for producing semiconductors
04/07/1999EP0907111A2 Exposure method and method of producing a photolithographic mask
04/07/1999EP0906590A1 Lithographic projection apparatus with off-axis alignment unit
04/06/1999US5892572 Projection exposure apparatus and method
04/06/1999US5892291 Registration accuracy measurement mark
03/1999
03/31/1999EP0905566A2 Exposure method and method of producing a photolithographic mask
03/31/1999CN1212780A Focusing device and optical disc using the same
03/30/1999US5889547 Registration detection apparatus for imaging systems
03/30/1999US5888676 Miniatuization using multiple reticle-subfield exposures per die
03/25/1999WO1999014638A1 Design rule checking system and method
03/17/1999EP0902330A1 Photomask and alignment method
03/16/1999US5884242 Focus spot detection method and system
03/16/1999US5883932 Substrate holding device and exposing apparatus using the same
03/16/1999US5883703 Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
03/16/1999US5883701 Scanning projection exposure method and apparatus
03/16/1999US5881987 Vibration damping apparatus
03/10/1999EP0901096A2 Peeker detection and correction
03/10/1999EP0737330B1 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
03/09/1999US5881188 Optical fiber having core segment with refractive-index grating
03/09/1999US5881165 Process for the positioning of a mask relative to a workpiece and device for executing the process
03/09/1999US5880820 Light exposure installation of a double-sided printed circuit plate through artworks
03/09/1999US5879845 Projection exposure method utilizing correction for change in optical characteristic
03/09/1999US5879843 Method of reducing registration error in exposure step of semiconductor device
03/03/1999CN1209643A Alignment method
03/02/1999US5877845 Scanning exposure apparatus and method
03/02/1999US5877562 Photo alignment structure
03/02/1999US5877036 Overlay measuring method using correlation function
03/02/1999US5876884 Method of fabricating a flat-panel display device and an apparatus therefore
03/02/1999US5876819 Crystal orientation detectable semiconductor substrate, and methods of manufacturing and using the same
02/1999
02/23/1999US5874820 Window frame-guided stage mechanism
02/23/1999US5874190 Using alignment marks on back of workpiece, positioning of the mask to the workpiece by means of light from light radiation device without the workpiece being in place, positioning marks relative to marks of workpiece, projecting pattern, exposing
02/23/1999US5874189 Coating a layer of photoresist to the wafer, optimizing the number of semiconductors imprinted on a wafer in symmetrical arrangement in order to optimize fabrication cost by varying the side/length ratio, aligning mask over wafer for etching
02/18/1999WO1999008315A1 Scanning exposure method, scanning aligner, method of manufacturing the scanning aligner, and synchronization error analysing method
02/18/1999WO1999008314A1 Semiconductor integrated circuit device and method of fabrication thereof
02/16/1999US5872618 For projecting a transfer pattern on a mask onto a photosensitive substrate
02/09/1999US5870198 Stage position measuring apparatus capable of restricting generation of temperature fluctuations to a measured value
02/09/1999US5869386 Method of fabricating a composite silicon-on-insulator substrate
02/09/1999US5868560 Reticle, pattern transferred thereby, and correction method
02/04/1999WO1999005707A1 Focusing method, exposure method, and aligner
02/02/1999US5866281 Multi-layer microstructure fabrication; accurate adjustment between x-ray mask and substrate
01/1999
01/28/1999WO1999004417A1 Position sensing method and position sensor
01/27/1999EP0893738A2 Scanning exposure apparatus and device manufacturing method
01/26/1999US5864386 Exposure apparatus
01/26/1999US5863680 Exposure method utilizing alignment of superimposed layers
01/26/1999US5862583 Panel positioning method and apparatus
01/19/1999US5861679 Pattern and method for measuring alignment error
01/19/1999US5861320 Position detection mark and position detection method
01/13/1999EP0890983A1 Measurement pattern set and method for measuring dimension accuracy and overlay accuracy of circuit pattern
01/13/1999EP0890880A1 Device for processing printing plates
01/12/1999US5859707 Position detection apparatus and aligner comprising same
01/12/1999US5859439 Apparatus for aligning semiconductor wafer using mixed light with different wavelengths
01/12/1999US5858587 Positioning system and method and apparatus for device manufacture
01/12/1999US5857667 Vacuum chuck
01/07/1999WO1999000828A1 Method of manufacturing semiconductor device
01/05/1999USH1774 Projecting exposure apparatus and method of exposing a circuit substrate
01/05/1999US5856054 Method of alignment in exposure step through array error and shot error determinations
12/1998
12/30/1998EP0887860A1 Formation of alignment mark and structure covering the same
12/30/1998EP0887709A2 Method and appartus for manufacturing a device using a photolithograpic mask
12/29/1998US5854672 In an exposure frame useful in lithography and the printing arts
12/29/1998US5853927 Method of aligning a mask in photolithographic process
12/23/1998EP0886267A1 Focusing apparatus and optical apparatus using the same
12/22/1998US5852497 Method and apparatus for detecting edges under an opaque layer
12/17/1998WO1998057363A1 Exposure system, process for manufacturing the exposure system, and process for fabricating devices
12/17/1998WO1998057362A1 Sensor and method for sensing the position of the surface of object, aligner provided with the sensor and method of manufacturing the aligner, and method of manufacturing devices by using the aligner
12/17/1998WO1998057361A1 Substrate for device manufacturing, process for manufacturing the substrate, and method of exposure using the substrate
12/15/1998US5850291 Projection exposure apparatus and method for controlling a stage on the basis of a value corrected by ABBE error
12/15/1998US5850279 Alignment method, projection exposure method, and projection exposure apparatus
12/15/1998US5849441 Alignment method utilizing plurality of marks, discriminable from each other, capable of effecting alignment individually
12/09/1998EP0883281A1 Method and apparatus for selectively drawing air from a plurality of vacuum channels
12/09/1998EP0883279A1 Method and apparatus for holding recording media onto a media support surface
12/09/1998EP0882581A2 Registration detection apparatus for imaging systems
12/08/1998US5847974 Measuring method and apparatus for measuring system having measurement error changeable with time
12/08/1998US5847468 Alignment mark for use in making semiconductor devices
12/08/1998US5846691 Composite relief image printing plates and methods for preparing same
12/03/1998DE19754867A1 Projection illuminator for semiconductor component manufacture
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