| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/10/1998 | US5717492 Position detecting apparatus and a method for manufacturing semiconductor devices using the apparatus |
| 02/10/1998 | US5716889 Method of arranging alignment marks |
| 02/10/1998 | US5716742 Real time alignment system for a projection electron beam lithographic system |
| 02/04/1998 | EP0822455A2 Process for positioning a mask relative to a workpiece and device for executing the process |
| 02/04/1998 | EP0821812A1 Method of determining the radiation dose in a lithographic apparatus, and test mask and apparatus for performing the method |
| 02/03/1998 | US5715063 Projection exposure method |
| 02/03/1998 | US5715037 Scanning exposure apparatus |
| 01/27/1998 | US5712708 Aligner for timing the alignment of a wafer and mask with a shutter to protect the wafer during alignment |
| 01/20/1998 | US5710624 Aligner and contamination detecting method |
| 01/20/1998 | US5710620 Projection exposure method and apparatus |
| 01/20/1998 | US5709139 Punching apparatus for moving a punching unit in a circumferential direction of a cylindrical inner surface scanner |
| 01/15/1998 | WO1998001792A1 Composite relief image printing plates and methods for preparing same |
| 01/14/1998 | CN1170149A Light exposure installation of double-sided printed circuit plate through artworks |
| 01/13/1998 | US5708505 Laser interferometer having a sheath for the laser beam |
| 01/13/1998 | US5708276 Electron-beam exposure device and a method of detecting a mark position for the device |
| 01/06/1998 | US5706091 Apparatus for detecting a mark pattern on a substrate |
| 01/06/1998 | US5705320 Patterns for insulation layers on semiconductor wafers and integrated circuits, etching |
| 12/31/1997 | WO1997050111A1 Semiconducteur chip and reticle for manufacturing semiconductor |
| 12/30/1997 | US5703685 For controlling an exposure position of a wafer |
| 12/30/1997 | US5702848 Mask for optical lithography using phase shift masking and integrated circuit produced therefrom |
| 12/30/1997 | US5702567 Plurality of photolithographic alignment marks with shape, size and spacing based on circuit pattern features |
| 12/23/1997 | US5701170 System for automatically exposing and labeling a plurality of lithographic plates |
| 12/23/1997 | US5700732 Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns |
| 12/23/1997 | US5699621 Positioner with long travel in two dimensions |
| 12/17/1997 | EP0813235A2 Method for manufacturing multilayer wiring board and wiring pattern forming apparatus |
| 12/17/1997 | EP0813115A2 Scanning exposure apparatus with surface position detecting system |
| 12/16/1997 | US5699146 Scanning exposure apparatus with velocity calculating means for stage elements |
| 12/10/1997 | EP0811881A2 Exposure apparatus and method |
| 12/10/1997 | EP0811487A2 Printing plate mounting system and method employing the same |
| 12/10/1997 | EP0810914A1 A method and a device for applying perforations |
| 12/09/1997 | US5696590 Position control method position control apparatus, and semiconductor manufacturing apparatus |
| 12/09/1997 | US5696374 Optical encoder using doubled diffraction angle based on first and second diffraction gratings |
| 12/09/1997 | US5696373 Optical encoder with dual diffraction grating |
| 12/09/1997 | US5695897 Alignment method and semiconductor exposure method |
| 12/04/1997 | WO1997045773A1 Interferometric broadband imaging |
| 12/02/1997 | US5693439 Exposure method and apparatus |
| 11/27/1997 | WO1997044816A1 Method and apparatus for positioning a substrate |
| 11/27/1997 | DE19620234A1 Verfahren und Vorrichtung zum Positionieren eines Substrats Method and apparatus for positioning a substrate |
| 11/26/1997 | CN2268944Y Strap clamping X ray etching alignment instrument |
| 11/26/1997 | CN1165981A Device for supporting artwork for light exposure installation of flat piece |
| 11/25/1997 | US5691115 Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices |
| 11/25/1997 | US5690785 Lithography control on uneven surface |
| 11/19/1997 | EP0807856A1 Device for double-sided exposure of printed circuit boards using masks |
| 11/19/1997 | EP0807855A1 Mask holder for a flat panel exposure device |
| 11/19/1997 | EP0807854A1 Exposure method and apparatus |
| 11/18/1997 | US5689339 For an exposure apparatus |
| 11/11/1997 | US5686999 Punch apparatus for improved registration of image receiving material in an image forming device |
| 11/11/1997 | US5686991 Positioning apparatus having the interferometer and accelerometer positioned such that there signals are in phase |
| 11/11/1997 | US5686211 Removing photoresist layer from semiconductors |
| 11/11/1997 | US5685232 Positioning stage device exposure apparatus and device manufacturing method utilizing the same |
| 11/04/1997 | US5684856 Stage device and pattern transfer system using the same |
| 11/04/1997 | US5684595 Alignment apparatus and exposure apparatus equipped therewith |
| 11/04/1997 | US5684569 Position detecting apparatus and projection exposure apparatus |
| 11/04/1997 | US5684565 Pattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure system |
| 11/04/1997 | US5684333 Wafer structure in a semiconductor device manufacturing process |
| 10/28/1997 | US5682243 Method of aligning a substrate |
| 10/28/1997 | US5682239 Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters |
| 10/28/1997 | US5682228 Alignment method and apparatus in an exposing process |
| 10/28/1997 | US5681638 Substrate, and method and apparatus for holding the substrate |
| 10/21/1997 | US5680200 Image-forming optical system |
| 10/14/1997 | US5677091 Lithographic print bias/overlay target and applied metrology |
| 10/14/1997 | US5676058 Printing plate mounting system and method employing the same |
| 10/09/1997 | WO1997037267A1 Lens focus shift sensor |
| 10/08/1997 | EP0799439A1 Positioning device with a force actuator system for compensating centre-of-gravity displacements |
| 10/08/1997 | EP0799132A1 Elongate, semi-tone printing process and substrates printed thereby |
| 10/07/1997 | US5675418 Pattern alignment mark of semiconductor device |
| 10/07/1997 | US5675140 Autofocus control device with a light source |
| 10/07/1997 | US5674651 Alignment method for use in an exposure system |
| 10/07/1997 | US5674650 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method |
| 09/30/1997 | US5673208 Computer-implemented method |
| 09/30/1997 | US5673101 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method |
| 09/30/1997 | US5672520 Method of checking alignment accuracy in photolithography |
| 09/25/1997 | WO1997035234A1 Alignment device and lithographic apparatus provided with such a device |
| 09/23/1997 | US5671165 Method of determining position offset of a pattern |
| 09/23/1997 | US5671057 For use with an exposure apparatus |
| 09/17/1997 | CN1159602A Automatic diaphragm device |
| 09/17/1997 | CN1159593A Automatic focusing controller with light source |
| 09/16/1997 | US5668042 Method for aligning micro patterns of a semiconductor device |
| 09/16/1997 | US5667941 Photolithography, resolution |
| 09/12/1997 | WO1997033276A1 Focusing apparatus and optical apparatus using the same |
| 09/12/1997 | WO1997033204A1 Lithopraphic apparatus for step-and-scan imaging of a mask pattern |
| 09/10/1997 | EP0794465A2 Photolithographic method of producing a semiconductor device, using an alignment correction method |
| 09/09/1997 | US5665645 Method of manufacturing a semiconductor device using reticles |
| 09/04/1997 | WO1997032241A1 Method of determining the radiation dose in a lithographic apparatus, and test mask and apparatus for performing the method |
| 09/03/1997 | EP0793147A1 Overlay measuring method using correlation function |
| 09/03/1997 | EP0793073A2 Surface position detecting method and scanning exposure method using the same |
| 08/28/1997 | WO1997030819A1 Positioner with long travel in two dimensions |
| 08/27/1997 | EP0791189A1 Positioning device with a vibration-free object table |
| 08/27/1997 | CN1158004A Composite silicon-on-insulator substrate and method of fabricating the same |
| 08/26/1997 | US5661601 Projection method and projection system and mask therefor |
| 08/26/1997 | US5661548 Projection exposure method and apparatus including a changing system for changing the reference image-formation position used to generate a focus signal |
| 08/26/1997 | US5661388 Positioning method and positioning system |
| 08/26/1997 | US5661295 Optical encoder with dual diffraction gratings |
| 08/21/1997 | WO1997030378A1 Positional measurements |
| 08/19/1997 | US5659384 Position detection apparatus and method |
| 08/14/1997 | WO1997029404A1 Methods and apparatus for detecting and compensating for focus errors in a photolithography tool |
| 08/12/1997 | US5657130 Exposure apparatus and method |
| 08/12/1997 | US5657129 Method and apparatus for the alignment of a substrate |
| 08/12/1997 | US5656402 Method for alignment of manufacturing semiconductor apparatus |
| 08/12/1997 | US5656229 Method for removing a thin film layer |