Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
11/2000
11/21/2000US6151115 Phase-shifting point diffraction interferometer focus-aid enhanced mask
11/21/2000US6151105 Exposure apparatus having dynamically isolated support structure
11/21/2000US6151102 Projection exposure apparatus
11/21/2000US6151100 Positioning system
11/21/2000US6150787 Exposure apparatus having dynamically isolated reaction frame
11/21/2000US6150231 Overlay measurement technique using moire patterns
11/15/2000EP1052683A1 Exposure method and device
11/09/2000WO2000067291A2 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
11/09/2000WO2000067028A1 Process to create biomolecule arrays on metal surfaces
11/09/2000WO2000066969A2 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance
11/09/2000CA2370261A1 Process to create biomolecule arrays on metal surfaces
11/09/2000CA2336557A1 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
11/07/2000US6144719 Exposure method, exposure device and device producing method
11/07/2000US6144109 Method for improving a stepper signal in a planarized surface over alignment topography
11/07/2000US6143622 Method for forming alignment mark
11/02/2000WO2000065302A1 Interferometric apparatus and method that compensate refractive index fluctuations
11/02/2000WO2000065301A1 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry
11/02/2000EP1049084A2 Compound objective lens having two focal points and apparatus using the lens
10/2000
10/31/2000US6141108 Position control method in exposure apparatus
10/31/2000US6141107 Apparatus for detecting a position of an optical mark
10/31/2000US6141082 Alignment method, exposure method, and exposure apparatus
10/31/2000US6139995 Method of manufacturing schottky gate transistor utilizing alignment techniques with multiple photoresist layers
10/25/2000EP1046192A1 Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with an alignment grating and an at least partially recessed oxide pattern
10/25/2000EP1046185A1 Projection lithography device utilizing charged particles
10/24/2000US6137562 Substrate adjuster, substrate holder and substrate holding method
10/24/2000US6137561 Exposure apparatus for aligning photosensitive substrate with image plane of a projection optical system
10/24/2000US6137186 Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns
10/24/2000US6136662 Semiconductor wafer having a layer-to-layer alignment mark and method for fabricating the same
10/24/2000US6136481 Color filter manufacturing method capable of assuring a high alignment accuracy of color filter and alignment mark therefor
10/18/2000EP1045427A2 Target locking system for electron beam lithography
10/17/2000US6134007 Method for measuring orthogonality having a third interferometer which is not orthogonal
10/17/2000US6133936 Method and apparatus for holding recording media onto a media support surface
10/17/2000US6133641 Semiconductor substrate and method of manufacturing semiconductor device
10/17/2000US6133111 Method of making photo alignment structure
10/17/2000US6132910 Method of implementing electron beam lithography using uniquely positioned alignment marks and a wafer with such alignment marks
10/12/2000WO2000060412A1 Display screen and method of manufacture therefor
10/12/2000WO2000028385A3 Method and device for aligning two photo masks with each other and optionally, an unexposed printed circuit board blank, and for subsequent simultaneous exposure in the production of double-sided printed circuit boards
10/12/2000DE10013454A1 Printing form production appliance and method involve sources of radiation, slide piece with holes in, and housing
10/12/2000CA2369033A1 Display screen and method of manufacture therefor
10/11/2000EP1043761A1 Projection exposure apparatus and exposure method
10/11/2000CN1269600A Improved alignment mark pattern and overlapping accracy measuring pattern and their formation method
10/10/2000US6130751 Positioning method and apparatus
10/10/2000US6130747 Method of measuring aberrations of lens
10/04/2000EP1041630A2 Method of accurately performing alignment of patterning in the manufaturing of a semiconductor device, and mask for exposure
10/04/2000EP1041608A1 Mark detection method and mark position sensor
10/04/2000EP1041357A1 Stage device and exposure apparatus
10/03/2000US6127255 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
10/03/2000US6127129 Process to create biomolecule and/or cellular arrays on metal surfaces and product produced thereby
09/2000
09/30/2000CA2303019A1 Semiconductor device manufacturing method of accurately performing alignment of patterning, and mask for exposure
09/28/2000WO2000057126A1 Position determining device, position determining method and exposure device, exposure method and alignment determining device, and alignment determining method
09/27/2000EP1039510A1 Exposure apparatus and method of manufacturing the same, and exposure method
09/26/2000US6124933 Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus
09/26/2000US6124924 Focus error correction method and apparatus
09/26/2000US6124922 Exposure device and method for producing a mask for use in the device
09/26/2000US6124601 Position sensor having a reflective projecting system and device fabrication method using the sensor
09/21/2000WO2000055686A1 Passive shaped chuck for correcting field curvature
09/20/2000EP1037117A2 Off-axis levelling in lithographic projection apparatus
09/20/2000EP1036415A2 Wafer level integration of multiple optical elements
09/19/2000US6122059 Scanning exposure apparatus and device fabrication method in which multiple laser interferometers use a respective laser head
09/19/2000US6122036 Projection exposure apparatus and method
09/19/2000US6120950 Optical element manufacturing method
09/14/2000WO2000054108A1 Reduction of the effects of magnification errors and reticle rotation errors on overlay errors
09/14/2000WO2000054005A1 Improved registration of sheet materials using statistical targets and method
09/13/2000EP0799439B1 Positioning device with a force actuator system for compensating centre-of-gravity displacements
09/12/2000US6118517 Mask pattern for alignment
09/12/2000US6118516 Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns
09/12/2000US6118515 Scanning exposure method
09/12/2000US6118128 Alignment mark for electron beam lithography
09/12/2000US6117599 Alignment and exposure process utilizing split beam for exposure and alignment
09/12/2000US6117598 Scanning exposure method with alignment during synchronous movement
09/12/2000US6115910 Misregistration fidutial
09/07/2000DE10002316A1 Photomask has transparent base and shading structure contg. polygonal circuit structure with inclined line printed out as series of steps with number of rectangles of defined width
09/05/2000US6114072 Reticle which can prevent degradation in registration accuracy caused by shot rotation error or shot magnification error without increasing area of the dicing region
09/05/2000US6112664 Plate making apparatus with a cutter and punch mechanism formed in one piece
08/2000
08/29/2000US6111646 Null test fourier domain alignment technique for phase-shifting point diffraction interferometer
08/29/2000US6110647 Method of manufacturing semiconductor device
08/29/2000US6110626 Microlithography using an energy beam such as a charged particle beam.
08/29/2000US6110021 Micro devices manufacturing method and apparatus therefor
08/24/2000WO2000049367A1 Position sensing method and position sensor, exposing method and exposing apparatus, and device and device manufacturing method
08/22/2000US6108089 Position detecting apparatus and method for projection exposure apparatus
08/22/2000US6106980 Having test pattern which is used to calibrate the coordinate system of each processing machine on which the photomask is mounted and is also used as a reference for other metrology measurements
08/15/2000US6103433 Exposure method using reticle remount for temperature influence correction
08/09/2000EP1026550A2 Lithographic projection apparatus
08/09/2000EP1025464A1 Composite relief image printing plates
08/08/2000US6101267 Position detecting method and apparatus, and exposure method and apparatus
08/08/2000US6100987 Position detecting apparatus
08/02/2000EP1023641A1 Design rule checking system and method
08/02/2000EP1023640A1 Data hierarchy layout correction and verification method and apparatus
08/02/2000EP1023639A1 Method and apparatus for data hierarchy maintenance in a system for mask description
08/01/2000USRE36799 Projection optical apparatus using plural wavelengths of light
08/01/2000US6097495 Aligning method
08/01/2000US6097473 Exposure apparatus and positioning method
08/01/2000US6096571 Method of improving alignment signal strength by reducing refraction index at interface of materials in semiconductors
08/01/2000US6096155 Method of dicing wafer level integrated multiple optical elements
07/2000
07/27/2000WO2000043731A1 Multiple alignment mechanisms near shared processing device
07/27/2000WO2000010058A9 Reaction force isolation system for a planar motor
07/25/2000US6094268 Projection exposure apparatus and projection exposure method
07/25/2000US6094255 Projection exposure apparatus and method that floats a plate
07/25/2000US6093640 Overlay measurement improvement between damascene metal interconnections
07/20/2000WO2000042640A1 Pattern matching method and device, position determining method and device, position aligning method and device, exposing method and device, and device and its production method
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