Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
11/1999
11/02/1999US5976737 Exposure of pattern using projector lens
10/1999
10/28/1999WO1999054922A1 Exposure method and exposure system
10/28/1999WO1999054785A1 Method for measuring the position of structures on a surface of a mask
10/26/1999US5973766 Exposure method and exposure device
10/26/1999US5972772 Electron beam drawing process
10/26/1999US5972542 Depositing a solidifiable material selected so that the phase mask is at least half as transmissive as it is absorptive of light characterized by a spectral line having a wavelength between 275 and 390 nm. the material is solidified and removed
10/26/1999US5970774 Apparatus and method for corner cutting and edge bending of lithographic plates
10/20/1999EP0951054A1 Aligner and method for exposure
10/20/1999EP0950925A2 Plate making apparatus, printing method and printing apparatus, packing sheet material for printing plate material, and plate material placement method and apparatus
10/19/1999US5970310 Method for manufacturing multilayer wiring board and wiring pattern forming apparatus
10/19/1999US5969820 Surface position detecting system and exposure apparatus using the same
10/19/1999US5969800 Scanning exposure apparatus and method
10/19/1999US5969428 Alignment mark, manufacturing method thereof, exposing method using the alignment mark, semiconductor device manufactured using the exposing method
10/19/1999US5968693 Lens system with photoresists for latent images, interrogation and adjustment
10/19/1999US5967048 Method and apparatus for the multiple imaging of a continuous web
10/12/1999US5966216 For use in aligning a mask and wafer in lithography
10/12/1999US5966215 Photolithographic alignment system
10/12/1999US5966201 Mark for position detection, and mark detecting method and apparatus
10/12/1999US5965307 Position detecting method with observation of position detecting marks
10/12/1999US5965303 Method of fabricating a phase shift mask utilizing a defect repair machine
10/07/1999WO1999050893A1 Exposure method and exposure system
10/07/1999WO1999050712A1 Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device
10/06/1999EP0574459B1 Registration system
10/05/1999US5963788 Method for integrating microelectromechanical devices with electronic circuitry
09/1999
09/28/1999US5960296 Method for aligning the device layers in a semiconductor device
09/28/1999US5959721 Projection exposure apparatus and projection exposure method
09/28/1999US5959719 Image registration process, an image control board and control board cover useful in the process
09/28/1999US5959304 Semiconductor exposure apparatus
09/28/1999US5958633 Exposure mask adapted for position detecting with oblique incident light
09/28/1999US5958632 Method of making mask pattern utilizing sizing dependent on mask material and mask formed through the method
09/21/1999US5956564 Method of making a side alignment mark
09/21/1999US5955739 Surface position detection device
09/15/1999EP0942332A1 Exposure method and apparatus
09/14/1999US5953105 Positioning device with a reference frame for a measuring system, and a lithographic device provided with such a positioning device
09/14/1999US5952135 Determining the position of alignment structures by observing the wavelength-dependent contrast in the intensity of light reflected off the illuminated wafer; multiple wavelengths provide contrast for accurate resolution
09/14/1999US5952132 Method for forming a stepper focus pattern through determination of overlay error
09/10/1999WO1999045581A1 Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
09/10/1999WO1999045580A1 Exposure device and method of manufacturing semiconductor device
09/08/1999EP0940723A2 Sample table for pattern exposure machine
09/07/1999US5948572 Alignment marks
08/1999
08/31/1999US5945239 Adjustment method for an optical projection system to change image distortion
08/24/1999US5943638 Position detecting method by reflected scattered light of a laser beam applied to a position-detected object
08/24/1999US5943587 Method for making offset alignment marks
08/24/1999US5943135 Position detecting method and position detecting system using the same
08/24/1999US5942871 Double flexure support for stage drive coil
08/24/1999US5942357 Aligning a substrate pattern on a photosensitive surface of a substrate with an image of a mask pattern to be formed by exposing radiation through a projection optical system using an alignment sensor detecting a positional relationship
08/17/1999US5940789 Stage control method and apparatus with varying stage controller parameter
08/17/1999US5940528 Process for positioning of a mask relative to another mask, or masks relative to a workpiece and device for executing the process
08/17/1999US5939225 Multilayer element with substrate and silicon, nitrogen withmetal layer
08/12/1999WO1999040613A1 Method of adjusting position detector
08/12/1999WO1999040487A1 Stage control method, stage utilizing the same, and exposure apparatus
08/12/1999DE19910412A1 Computer image alignment method for exposure of photoresist during circuit board manufacture
08/10/1999US5936712 Exposure method and apparatus including focus control
08/10/1999US5936711 Projection exposure method and projection exposure apparatus
08/10/1999US5936710 Scanning type exposure apparatus, position control apparatus, and method therefor
08/10/1999US5936253 Position detector and microlithography apparatus comprising same
08/10/1999US5935741 Method for forming a color filter
08/05/1999WO1999039376A1 Surface position sensor and position sensor
08/05/1999WO1999039374A1 Exposure method and device
08/03/1999US5933743 Method of improving alignment signal strength by reducing refraction index at interface of materials in semiconductors
08/03/1999US5932395 Prevent positional shift during exposure using multilayer mask
08/03/1999US5932376 Phase-shifting mask structure
08/03/1999CA2078930C Register mark
07/1999
07/29/1999WO1999018612A3 Wafer level integration of multiple optical elements
07/27/1999US5930324 Exposure apparatus and device manufacturing method using the same
07/27/1999US5929997 Alignment-mark measurements on the backside of a wafer for synchronous wafer alignment
07/27/1999US5929978 Projection exposure apparatus
07/27/1999US5929973 Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate
07/27/1999US5928822 Method for confirming optimum focus of stepper
07/22/1999DE19837037A1 Reticle for stepwise and repetition illumination in semiconductor manufacture
07/22/1999DE19801025A1 Identification of printing machine plates
07/21/1999CN1223388A Positioning device for printing in making personal certificate
07/21/1999CN1223387A Automatic scanning figure registration device and method
07/20/1999US5925937 Semiconductor wafer, wafer alignment patterns
07/15/1999WO1999035537A1 Exposure method and scanning-type aligner
07/13/1999US5923990 Process for positioning a mask relative to a workpiece
07/08/1999WO1999034417A1 Exposure method and exposure apparatus
07/08/1999WO1999034416A1 Projection exposure apparatus and exposure method
07/08/1999WO1999034258A1 Alignment device and lithographic apparatus comprising such a device
07/08/1999WO1999034257A1 Positioning device having three coil systems mutually enclosing angles of 120°, and lithographic device comprising such a positioning device
07/06/1999US5920430 Lensless joint transform optical correlator for precision industrial positioning systems
07/06/1999US5920398 Surface position detecting method and scanning exposure method using the same
07/06/1999US5920396 Line width insensitive wafer target detection
07/06/1999US5920378 Projection exposure apparatus
07/01/1999WO1999032940A1 Repetitively projecting a mask pattern using a time-saving height measurement
06/1999
06/30/1999CN1221209A Method of implementing electron beam lithography using uniquely positioned alignment marks and wafer with such alignment marks
06/29/1999US5917604 Alignment device and lithographic apparatus provided with such a device
06/29/1999US5917294 Synchronization control apparatus and method
06/29/1999US5917205 Photolithographic alignment marks based on circuit pattern feature
06/24/1999WO1999031462A1 Stage device and exposure apparatus
06/22/1999US5914774 Projection exposure apparatus with function to measure imaging characteristics of projection optical system
06/22/1999US5913267 Process and device for adapting the position of printing plates to the deformation of the paper to be printed
06/16/1999EP0823978B1 Process and device for adapting the position of printing plates to the deformation of the paper to be printed
06/15/1999US5912726 Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system
06/10/1999WO1999028957A1 Substrate retaining apparatus and exposure apparatus using the same
06/09/1999EP0921555A2 A method of implementing electron beam lithography using uniquely positioned alignment marks and a wafer with such alignment marks
06/08/1999US5910847 For producing a pattern on a substrate
06/08/1999US5910843 Positioning apparatus and method thereof, and exposure apparatus
06/08/1999US5910830 Liquid crystal display panels including alignment keys in the active regions thereof, and methods for manufacturing
06/04/1999CA2246877A1 Reproduction equipment for printing newspapers
1 ... 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 ... 109