Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
03/2000
03/07/2000US6034780 Surface position detection apparatus and method
03/07/2000US6034378 Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
02/2000
02/24/2000WO2000010058A1 Reaction force isolation system for a planar motor
02/23/2000EP0980583A1 X-ray tube and microelectronics alignment process
02/22/2000US6028659 Scanning projection-exposure apparatus and methods
02/15/2000US6025688 Alignment apparatus
02/09/2000EP0978765A2 Positioning mark and alignment method using the same
02/09/2000EP0791189B1 Positioning device with a vibration-free object table
02/09/2000CN1244030A Phase-shift mask and manufacture thereof
02/08/2000US6023321 Projection exposure apparatus and method
02/08/2000US6023320 Scanning exposure apparatus with surface position detecting system
02/08/2000US6022809 Silicon dioxide
02/08/2000US6022650 Substrate box; photoresist layer; rotation
02/08/2000US6022649 Align a reticle
02/03/2000WO2000005683A1 Mark detecting method, exposure method, device manufacturing method, mark detector, exposure apparatus, and device
02/01/2000US6020710 Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame
02/01/2000US6020249 Method for photo alignment after CMP planarization
02/01/2000US6020109 Irradiating integrated circuit pattern; transferring onto photoresist
01/2000
01/25/2000US6018395 Alignment system
01/25/2000US6018384 Projection exposure system
01/25/2000US6016752 Print image positioning
01/19/2000CN1242104A Aligner and method for exposure
01/18/2000US6016186 Alignment device and method with focus detection system
01/13/2000WO2000002424A1 Scanner system
01/06/2000WO2000001001A1 Scanning exposure method, scanning exposure apparatus and method for producing the same, and device and method for manufacturing the same
01/06/2000WO2000000868A1 Surfaces with release agent
01/05/2000EP0969328A2 Position detection apparatus and exposure apparatus
01/04/2000US6011629 Method of positional alignment of substrate and screen mask in electrical paste screen printing
01/04/2000US6010827 Electron beam exposure utilizing pre-processed mask pattern
12/1999
12/29/1999EP0967524A2 Projection exposure method and apparatus
12/29/1999EP0824723B1 A method of aligning images to be scanned and a scanning apparatus for such alignment
12/29/1999CN1239817A Step-by-step analysis method and system
12/28/1999US6008880 Exposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinate
12/28/1999US6008610 Position control apparatus for fine stages carried by a coarse stage on a high-precision scanning positioning system
12/28/1999US6007951 Etching alignment guide using etchmask into semiconductor substrate; analyzing undercutting to determine pattern structure; selecting alignment aperture in second mask corresponding to pattern structure; aligning aperture
12/28/1999US6007949 Method of extracting a mask pattern for an electron beam exposure
12/23/1999WO1999066543A1 Position sensing method, position sensor, exposure method, exposure apparatus, and production process thereof, and device and device manufacturing method
12/23/1999WO1999066542A1 Exposure method and exposure apparatus
12/22/1999EP0965889A2 Overlay measurement technique using moire patterns
12/22/1999EP0965884A2 Phase shift mask and methods of manufacture
12/22/1999CN1239322A Overlay measurement technique using moive patterns
12/21/1999US6005666 Apparatus for and method of optical inspection in total internal reflection holographic imaging system
12/21/1999US6005295 Semiconductor device and manufacturing method therefor
12/21/1999US6005294 Method of arranging alignment marks
12/21/1999US6004726 Method of forming a lithographic pattern utilizing charged beam particles between 0.1 and 5.0 ev
12/21/1999US6003223 Common alignment target image field stitching method for step and repeat alignment in photoresist
12/15/1999EP0964308A2 Exposure method and apparatus and device manufacturing method using the same
12/15/1999EP0963573A1 Alignment device and lithographic apparatus comprising such a device
12/15/1999EP0963572A1 POSITIONING DEVICE HAVING THREE COIL SYSTEMS MUTUALLY ENCLOSING ANGLES OF 120o, AND LITHOGRAPHIC DEVICE COMPRISING SUCH A POSITIONING DEVICE
12/14/1999US6002487 Alignment method for performing alignment between shot areas on a wafer
12/09/1999WO1999063300A1 Methods and apparatus for confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation
12/08/1999EP0961954A1 Repetitively projecting a mask pattern using a time-saving height measurement
12/07/1999US5999589 Substrate holding device and exposing apparatus using the same
12/07/1999US5999270 Projection exposure apparatus and microdevice manufacturing method using the same
12/07/1999US5999245 Proximity exposure device with distance adjustment device
12/01/1999EP0602200B1 Method for forming an immage of a mask pattern
11/1999
11/30/1999US5995234 Method and apparatus for the alignment of a substrate
11/30/1999US5995225 Method for measuring orthogonality in a stage of an exposure apparatus
11/30/1999US5995205 Light exposure installation of a double-sided printed circuit plate through artworks
11/30/1999US5995203 Scanning exposure apparatus in which light exposure is a function of the speed of the mask or substrate stage
11/30/1999US5995199 Position measurement method for measuring a position of an exposure mask and exposure method for transferring an image of the pattern formed in an exposure mask
11/30/1999US5995198 Exposure apparatus
11/30/1999US5994009 Computer aided design
11/30/1999US5994006 Projection exposure methods
11/25/1999DE19922758A1 Production of a lithographic drawing using electron or ion beam
11/25/1999DE19908980A1 Verfahren und Vorrichtung zum Ausrichten eines Wafers Method and apparatus for aligning a wafer
11/23/1999US5991007 Step and scan exposure system and semiconductor device manufactured using said system
11/23/1999US5991004 Lens focus shift sensor
11/23/1999US5990650 Method and apparatus for orienting a disk via edge contact
11/23/1999US5989764 Creating a plurality of latent images in the resist, each image being characterized by at least one lithographic parameter, interrogating the latent images and utilizing the results of the interrogation to form additional latent images
11/23/1999US5989762 Method of producing a semiconductor device
11/23/1999US5989761 Exposure methods for overlaying one mask pattern on another
11/17/1999CN1235351A Mask and expoure method thereof
11/16/1999US5986766 Alignment method and alignment system
11/16/1999US5985764 Layer independent alignment system
11/16/1999US5985680 Method and apparatus for transforming a substrate coordinate system into a wafer analysis tool coordinate system
11/16/1999US5983513 Staging apparatus and method, and method for manufacturing the staging apparatus, and exposing apparatus using the staging apparatus
11/10/1999EP0955566A2 Semiconductor device and alignment method
11/10/1999EP0954768A1 Method and apparatus for wafer-focusing
11/10/1999EP0954444A1 Printing plate
11/09/1999US5982489 Method and apparatus for measuring depth of a depression in a pattern by light interference from crossed light beams
11/09/1999US5982128 Lithography apparatus with movable stage and mechanical isolation of stage drive
11/09/1999US5982044 Alignment pattern and algorithm for photolithographic alignment marks on semiconductor substrates
11/09/1999US5981304 Self-alignment process usable in microelectronics, and application to creating a focusing grid for micropoint flat screens
11/09/1999US5981119 Exposing the resist to first monochromatic light of first frequency, a respective first machine focus is determined for first light, interrogating each latent image, determining maximum scattered energy, then averaging
11/09/1999US5981117 Scanning exposure method utilizing identical scan direction across multiple mask pattern layers
11/09/1999US5981116 A pattern of mask is transferred onto a photosensitive substrate by scanning the mask and photosensitive substrate in a synchronous manner
11/09/1999US5981075 For optical lenses, mirrors; durability
11/04/1999WO1999056308A1 Exposure system and method of manufacturing micro device
11/04/1999WO1999056174A1 Alignment simulation
11/04/1999DE19817714A1 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface
11/03/1999EP0879400A4 Multiple field of view calibration plate for use in semiconductor manufacturing
11/03/1999CN1233847A Testing bench used for image exposure apparatus
11/02/1999US5978138 Projection exposure systems
11/02/1999US5978094 Alignment device and method based on imaging characteristics of the image pickup system
11/02/1999US5978081 Multiple field of view calibration plate for use in semiconductor manufacturing
11/02/1999US5978071 Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage
11/02/1999US5978069 Exposure apparatus and methods
11/02/1999US5978068 Apparatus for protecting a reference mark used in exposure equipment
11/02/1999US5976738 Exposure and alignment method
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