| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 07/20/2000 | WO2000042618A1 Maskless, microlens euv lithography system |
| 07/19/2000 | EP1020916A2 Method for making an integrated circuit including alignment marks |
| 07/18/2000 | US6091481 Positioning method and projection exposure apparatus using the method |
| 07/11/2000 | US6088103 Optical interference alignment and gapping apparatus |
| 07/11/2000 | US6087797 Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame |
| 07/06/2000 | DE19859631A1 Verfahren zur Herstellung von großformatigen Verbund-Reliefdruckformen durch Laserpositionierung und anschließende Bebilderung mittels Laser A process for the production of large-format composite relief printing plates by laser positioning and subsequent imaging by means of laser |
| 07/05/2000 | EP1016931A1 Exposure method and apparatus and alignment discrimination method and apparatus |
| 07/04/2000 | US6084679 Universal alignment marks for semiconductor defect capture and analysis |
| 07/04/2000 | US6084678 Method of alignment between mask pattern and wafer pattern |
| 07/04/2000 | US6084673 Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders |
| 07/04/2000 | US6084244 Scanning exposure apparatus that compensates for positional deviation caused by substrate inclination |
| 07/04/2000 | US6083806 Method of forming an alignment mark |
| 07/04/2000 | US6083650 Device manufacturing method utilizing concentric fan-shaped pattern mask |
| 06/28/2000 | EP1014201A2 Process for making large-size composite relief printing elements using laser-based positioning followed by image-wise exposure using a laser |
| 06/28/2000 | EP1014199A2 Stage control apparatus and exposure apparatus |
| 06/28/2000 | EP1011973A2 Viewing and imaging systems |
| 06/27/2000 | US6081659 Comparing aerial image to actual photoresist pattern for masking process characterization |
| 06/27/2000 | US6081614 Surface position detecting method and scanning exposure method using the same |
| 06/27/2000 | US6080990 Position measuring apparatus |
| 06/27/2000 | US6080517 Method of projection exposure |
| 06/27/2000 | US6080515 Forming colored photoresist on substrate; exposure; devlopment |
| 06/27/2000 | US6080513 Mask and method for modification of a surface |
| 06/20/2000 | US6078738 Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization |
| 06/20/2000 | US6078640 X-ray exposure apparatus |
| 06/20/2000 | US6076464 System for making printing plates for newspaper printing |
| 06/13/2000 | US6074786 Reticle for alignment and pitch determination |
| 06/07/2000 | EP1006413A2 Alignment method and exposure apparatus using the same |
| 06/07/2000 | EP0910816A4 Composite relief image printing plates and methods for preparing same |
| 06/06/2000 | US6072915 Process for pattern searching and a device for positioning of a mask to a workpiece |
| 06/06/2000 | US6072561 Exposure method and apparatus |
| 06/06/2000 | US6072184 Charged-particle-beam projection methods |
| 06/06/2000 | US6072183 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device |
| 06/06/2000 | US6071656 Photolithography technique utilizing alignment marks at scribe line intersections |
| 05/30/2000 | US6069683 Scanning exposure method and apparatus |
| 05/30/2000 | US6068954 Having a set of alignment pattern openings and circuitry openings formed therethrough. |
| 05/30/2000 | US6068952 Second pattern consists of a plurality of said first patterns so that it receives the same influence of aberration as said first pattern when irradiated with light. |
| 05/25/2000 | WO2000030163A1 Exposure method and device |
| 05/25/2000 | DE19925175C1 Apparatus for transferring microstructures from a tool onto a substrate comprises a measuring system moving between carriers |
| 05/18/2000 | WO2000028385A2 Method and device for aligning two photo masks with each other and optionally, an unexposed printed circuit board blank, and for subsequent simultaneous exposure in the production of double-sided printed circuit boards |
| 05/17/2000 | EP1001457A1 Sensor and method for sensing the position of the surface of object, aligner provided with the sensor and method of manufacturing the aligner, and method of manufacturing devices by using the aligner |
| 05/17/2000 | EP1001313A1 Scan type projection exposure apparatus and device manufacturing method using the same |
| 05/16/2000 | US6064486 Systems, methods and computer program products for detecting the position of a new alignment mark on a substrate based on fitting to sample alignment signals |
| 05/16/2000 | US6064475 Real time local defocus monitor system using maximum and mean angles of focus correction |
| 05/16/2000 | US6063531 The test focus monitor structure includes densely packed parallel lines, an isolated line, an orthogonal line and rectangular islands and are approximately the critical dimension and is placed on a reticle or mask |
| 05/11/2000 | DE19851575A1 Verfahren und Vorrichtung zum Ausrichten zweier Fotomasken zueinander und gegebenenfalls eines unbelichteten Leiterplatten-Rohlings und zum anschließenden simultanen Belichten bei der Herstellung von doppelseitigen Leiterplatten Method and apparatus for aligning two photomasks with each other and optionally an unexposed PCB blank and subsequent to simultaneous exposure in the production of double-sided printed circuit boards |
| 05/10/2000 | EP0999475A2 Position detecting system and exposure apparatus using the same |
| 05/10/2000 | EP0821812B1 Method of determining the radiation dose in a lithographic apparatus, and test mask and apparatus for performing the method |
| 05/10/2000 | EP0772800B1 Lithographic device with a three-dimensionally positionable mask holder |
| 05/09/2000 | US6060785 Method of improving alignment signal strength by reducing refraction index at interface of materials in semiconductors |
| 05/03/2000 | EP0997782A1 Reticle having mark for detecting alignment and method for detected alignment |
| 05/03/2000 | EP0996862A4 Near-ultraviolet formation of refractive-index grating using phase mask |
| 05/03/2000 | EP0996862A1 Near-ultraviolet formation of refractive-index grating using phase mask |
| 04/27/2000 | WO2000024057A1 Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with a grating and an at least partially recessed oxide pattern |
| 04/27/2000 | DE19848455A1 Vorrichtung zur Einstellung der Position eines zylindrischen Bildträgers in Bezug auf einen Abtastkopf Means for adjusting the position of a cylindrical image carrier in respect of a scanning head |
| 04/26/2000 | EP0996277A2 Device for adjusting the position of a cylindrical image carrier in relation to a scanning head |
| 04/25/2000 | US6054784 Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device |
| 04/25/2000 | US6054361 Preserving the zero mark for wafer alignment |
| 04/20/2000 | WO2000022376A1 Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device |
| 04/19/2000 | EP0994378A2 Proximity exposure method by oblique irradiation with light |
| 04/18/2000 | US6051843 Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement |
| 04/18/2000 | CA2078731C Positional deviation measuring device and method thereof |
| 04/12/2000 | EP0992988A2 Optical disk apparatus |
| 04/12/2000 | EP0992856A2 Image registration process, an image control board and control board cover useful in the process |
| 04/12/2000 | EP0992855A1 Apparatus for and method of projecting a mask pattern on a substrate |
| 04/12/2000 | EP0496891B1 Method and device for optical exposure |
| 04/11/2000 | US6049383 Aligner detector including an electrooptic modulator for each diffraction order |
| 04/11/2000 | US6049373 Position detection technique applied to proximity exposure |
| 04/11/2000 | US6049372 Exposure apparatus |
| 04/11/2000 | US6049186 Method for making and operating an exposure apparatus having a reaction frame |
| 04/11/2000 | US6048650 Half tone phase shift mask comprising second pattern layer on backside of substrate |
| 04/11/2000 | US6047733 Method and apparatus for selectively drawing air from a plurality of vacuum channels |
| 04/06/2000 | WO2000019497A1 Alignment method and method for producing device using the alignment method |
| 04/06/2000 | WO2000019277A1 Method and assembly for producing printing plates |
| 04/05/2000 | EP0799132B1 Elongate, semi-tone printing process |
| 04/04/2000 | US6046508 Position detecting method with observation of position detecting marks |
| 04/04/2000 | US6046094 Method of forming wafer alignment patterns |
| 03/30/2000 | WO2000017710A1 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 03/30/2000 | DE19829986C1 Verfahren zur Direktbelichtung von Leiterplattensubstraten Process for the direct exposure of circuit board substrates |
| 03/30/2000 | CA2342195A1 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 03/29/2000 | EP0989596A1 Substrate for device manufacturing, process for manufacturing the substrate, and method of exposure using the substrate |
| 03/28/2000 | US6043892 Exposure field sensor of a chip leveling apparatus having an aperture for changing at least one dimension of the incident light of the sensor |
| 03/28/2000 | US6043864 Alignment method and apparatus using previous layer calculation data to solve critical alignment problems |
| 03/28/2000 | US6043500 Exposure apparatus and its control method |
| 03/28/2000 | US6042976 Method of calibrating WEE exposure tool |
| 03/28/2000 | US6042975 Multiple exposures at different thickness levels are made using photomasks aligned with a latent image of alignment marks formed during the first exposure; latent image is visible to the alignment system of commercial steppers |
| 03/28/2000 | US6042972 Opaque material on substrate surface, reflective material configured to provide first alignment detection indication on portion of surface, second alignment detection indication is distributed among spaced regions on a second surface |
| 03/23/2000 | WO2000000868A9 Surfaces with release agent |
| 03/21/2000 | US6040909 Surface position detecting system and device manufacturing method using the same |
| 03/21/2000 | US6040096 Measuring thermal expansion of mask substrate loosely supported to allow free thermal expansion, adjusting alignment of the mask substrate and the photosensitive substrate in response to the expansion amount |
| 03/16/2000 | WO2000014766A1 Projection lithography device utilizing charged particles |
| 03/15/2000 | EP0985528A1 Improvements in and relating to the manufacture of printing plates |
| 03/14/2000 | US6038358 Alignment method and system for use in manufacturing an optical filter |
| 03/14/2000 | US6038029 Method and apparatus for alignment of a wafer |
| 03/14/2000 | US6038013 Vibration isolator and exposure apparatus |
| 03/14/2000 | US6037671 Stepper alignment mark structure for maintaining alignment integrity |
| 03/14/2000 | US6037670 Alignment mark and structure covering the same |
| 03/14/2000 | US6037087 Writing a test pattern containing a first reference point on a non-productive area of a photomask, mounting the photomask on the first machine, initializing the coordinate system to the first reference point; determining the defects location |
| 03/08/2000 | EP0984329A2 Position detection apparatus having a plurality of detection sections, and exposure apparatus |
| 03/08/2000 | CN1050253C Method for detecting state of focusing |
| 03/08/2000 | CA2281996A1 System for making printing plates for newspaper printing |