| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 04/04/2001 | EP1089327A1 Exposure device and method of manufacturing semiconductor device |
| 04/03/2001 | US6212252 X-ray mask provided with an alignment mark and method of manufacturing the same |
| 04/03/2001 | US6211965 Photolithographic position measuring laser interferometer with relitively moving measuring intereometer |
| 04/03/2001 | US6211949 Method of aligning images to be scanned and a scanning apparatus for such alignment |
| 04/03/2001 | US6211944 Projection exposure method and apparatus |
| 03/29/2001 | WO2001022171A1 A photolithography mask having a subresolution alignment mark window |
| 03/29/2001 | WO2001022167A1 Method for synchronising positioning and exposure processes |
| 03/27/2001 | US6208707 X-ray projection exposure apparatus |
| 03/27/2001 | US6208407 Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
| 03/27/2001 | US6207966 Mark protection with transparent film |
| 03/27/2001 | US6207529 Semiconductor wafer,wafer alignment patterns and method of forming wafer alignment patterns |
| 03/27/2001 | US6207330 Formation of punch inspection masks and other devices using a laser |
| 03/22/2001 | WO2001020651A1 Exposure device with laser device |
| 03/22/2001 | DE19944759A1 Verfahren zur Synchronisation von Positionier- und Belichtungsvorgängen Method for synchronization of positioning and exposure operations |
| 03/22/2001 | DE10015698C1 Semiconductor device has additional marking detected for increasing overly alignment of photomask employed during exposure step of semiconductor manufacture |
| 03/21/2001 | EP1085382A2 Positioning method and positioning device |
| 03/21/2001 | EP1084378A1 Methods and apparatus for confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation |
| 03/14/2001 | EP1083462A1 Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device |
| 03/14/2001 | CN1287380A Production of device by electron beam illumination method |
| 03/07/2001 | EP1080393A1 Method for measuring the position of structures on a surface of a mask |
| 03/06/2001 | US6198535 Wafer alignment system |
| 03/06/2001 | US6198527 Projection exposure apparatus and exposure method |
| 03/06/2001 | US6197679 Semiconductor device and manufacturing method therefor |
| 03/06/2001 | US6197481 Oxidizing surface of blank wafer and etching zero layer alignment pattern into wafer at first and second chip sites; depositing photoresist, exposing with circuit pattern; removing exposed photoresit |
| 02/28/2001 | CN1285612A Electronic Beam exposure mask, Exposure method and equipment and method for making semiconductor device |
| 02/27/2001 | US6195619 System for aligning rectangular wafers |
| 02/27/2001 | US6195154 Projection exposure apparatus for transferring mask pattern onto photosensitive substrate |
| 02/27/2001 | US6194101 Photomask, and process and apparatus for determining condition of photomask |
| 02/27/2001 | US6193899 System and method for optically aligning films and substrates used in printed circuit boards |
| 02/22/2001 | WO2001013176A1 Methods of determining alignment in the forming of phase shift regions in the fabrication of a phase shift mask |
| 02/22/2001 | DE19939687A1 Large-area electron beam radiation exposure dose determination for microelectronics layout, involves dividing the total surface area into several disjunctive part-areas with different structural widths |
| 02/21/2001 | EP1077393A2 Substrate attracting and holding system for use in exposure apparatus |
| 02/21/2001 | CN1284740A Method for electronic beam exposing and method for maaufacture of semiconductor device |
| 02/20/2001 | US6191858 Position detecting method and apparatus using optical system with oblique optical axes |
| 02/20/2001 | US6191844 Scanning exposure apparatus in which light exposure is a function of the speed of the mask or substrate stage |
| 02/20/2001 | US6191843 Exposure device, method of making and using same, and objects exposed by the exposure device |
| 02/20/2001 | US6191429 Projection exposure apparatus and method with workpiece area detection |
| 02/20/2001 | US6190810 Mark focusing system for steppers |
| 02/20/2001 | US6190807 Used in a semiconductor fabrication process, and more particularly, to a mask that is compatible with steppers of different manufacturers. |
| 02/15/2001 | WO2001011678A1 Method and apparatus for run-to-run controlling of overlay registration |
| 02/14/2001 | EP1076264A2 Multi-channel grating interference alignment sensor |
| 02/13/2001 | US6188467 Method and apparatus for fabricating semiconductor devices |
| 02/13/2001 | US6188195 Exposure method, and method of making exposure apparatus having dynamically isolated support structure |
| 02/10/2001 | CA2314512A1 Multi-channel grating interference alignment sensor |
| 02/08/2001 | WO2001009927A1 Semiconductor structures and manufacturing methods |
| 02/08/2001 | WO2001009630A1 System for aligning rectangular wafers |
| 02/06/2001 | US6184104 Alignment mark strategy for oxide CMP |
| 02/06/2001 | US6183918 Alignment method and system for use in manufacturing an optical filter |
| 02/01/2001 | WO2001007885A2 Phase-shifting point diffraction interferometer focus-aid enhanced mask |
| 02/01/2001 | DE10025218A1 Multi-layer connection process transfer-marking structure e.g. for fabrication of semiconductor devices, has transfer marking lined up with transfer point used in preceding step |
| 01/30/2001 | US6181097 High precision three-dimensional alignment system for lithography, fabrication and inspection |
| 01/30/2001 | US6180498 Alignment targets having enhanced contrast |
| 01/25/2001 | DE19933395A1 Adjustment method for board manufacture, involves successively aligning conductor pattern and circuit board relative to each other taking account of first and then other position markers |
| 01/24/2001 | CN1281257A 半导体器件 Semiconductor devices |
| 01/24/2001 | CN1281165A 曝光方法及其装置 Exposure method and device |
| 01/23/2001 | US6177978 Stage device and exposure apparatus using the same |
| 01/23/2001 | US6177330 Method for correcting alignment, method for manufacturing a semiconductor device and a semiconductor device |
| 01/17/2001 | CN1280316A Explosure device for double side printed circuit board |
| 01/17/2001 | CN1280314A Method for producing semiconductor device |
| 01/16/2001 | US6175418 Multiple alignment mechanism in close proximity to a shared processing device |
| 01/16/2001 | US6175404 Exposure apparatus having dynamically isolated reaction frame |
| 01/16/2001 | US6174631 Polymeric transmissive attenuated embedded phase shifter photomask comprising at least one polymeric material selected from the group consisting of polysiloxane polymers and polysiloxane polymers doped with a chromophore |
| 01/11/2001 | WO2001002908A1 Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 01/11/2001 | DE10017836A1 Printing plate processing device with a procedure for determination of adjustment marks on the left and right edges of a printing plate using a CCD camera |
| 01/10/2001 | EP1067438A1 Exposure device for double-sided printed circuit boards |
| 01/09/2001 | US6172757 Lever sensor for stepper field-by-field focus and leveling system |
| 01/09/2001 | US6172739 Exposure apparatus and method |
| 01/09/2001 | US6172373 Stage apparatus with improved positioning capability |
| 01/09/2001 | US6170396 Printing method and device for mounting printing plates via cooperating holes and protrusions |
| 01/04/2001 | WO2001001463A1 Method and apparatus for detecting mark, exposure method and apparatus, and production method for device and device |
| 01/02/2001 | US6169324 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
| 12/26/2000 | US6166812 Stage apparatus |
| 12/26/2000 | US6166392 Exposure for performing synchronized off-axis alignment |
| 12/20/2000 | EP1061561A1 Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device |
| 12/20/2000 | EP1061417A2 Method and apparatus for overlay measurement |
| 12/20/2000 | CN1277681A Composite relief image printing plates |
| 12/19/2000 | US6163376 Alignment apparatus, aberration measuring method and aberration measuring mark |
| 12/19/2000 | US6163369 Plane position detecting method and exposing method and exposure apparatus using same |
| 12/19/2000 | US6163366 Exposure method and apparatus |
| 12/19/2000 | US6162745 Film forming method |
| 12/19/2000 | US6162736 Process for fabricating a semiconductor integrated circuit utilizing an exposure method |
| 12/19/2000 | US6161480 Control desk for a printing press with a device for producing printing forms |
| 12/14/2000 | WO2000075729A1 Exposure device capable of aligning while moving mask |
| 12/13/2000 | CN1276916A Wafer level integration of multiple optical elements |
| 12/12/2000 | US6160628 Interferometer system and method for lens column alignment |
| 12/12/2000 | US6160622 Alignment device and lithographic apparatus comprising such a device |
| 12/12/2000 | US6160619 Projection exposure apparatus having compact substrate stage |
| 12/12/2000 | US6160612 Scanning type exposure apparatus, position control apparatus, and method therefor |
| 12/07/2000 | WO2000073035A1 Device and method for transferring microstructures |
| 12/06/2000 | CN1059278C Process for manufacturing optical shade of zero level of integrated circuit |
| 12/05/2000 | US6157452 Position detecting apparatus |
| 12/05/2000 | US6156220 System and method for optically aligning films and substrates used in printed circuit boards |
| 11/30/2000 | WO2000072093A1 Optical gap measuring apparatus and method using two-dimensional grating mark with chirp in one direction |
| 11/28/2000 | US6154281 Position detecting system and device manufacturing method using the same |
| 11/28/2000 | US6153941 Semiconductor registration measurement mark |
| 11/28/2000 | US6153886 Alignment apparatus in projection exposure apparatus |
| 11/28/2000 | US6153357 Exposure, forming pattern, phase shifting cycles |
| 11/28/2000 | US6151792 Registration system and method |
| 11/21/2000 | US6151121 Position detecting system and device manufacturing method using the same |
| 11/21/2000 | US6151120 Exposure apparatus and method |