| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 07/10/2001 | US6259164 Offset alignment marks method and apparatus |
| 07/10/2001 | US6258611 Method for determining translation portion of misalignment error in a stepper |
| 07/10/2001 | US6258495 Process for aligning work and mask |
| 07/10/2001 | US6258446 Printing masking sheet and manufacturing method therefor |
| 07/05/2001 | WO2000067291A3 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
| 07/05/2001 | US20010006764 Using masking pattern |
| 07/05/2001 | US20010006763 Plurality electrodes arranged along baseplate; transportation means; controllers |
| 07/05/2001 | US20010006419 Optical measurement arrangement and method for inclination measurement |
| 07/05/2001 | US20010006413 Interferometric alignment system for use in vacuum-based lithographic apparatus |
| 07/05/2001 | US20010006216 Misalignment inspection method, charge beam exposure method, and substrate for pattern observation |
| 07/05/2001 | DE19963345A1 Optische Messanordnung und Verfahren zur Neigungsmessung Optical device and method for inclination measurement |
| 07/03/2001 | USH1972 Autofocus system using common path interferometry |
| 07/03/2001 | US6256085 Exposure apparatus |
| 07/03/2001 | US6255796 Electromagnetic alignment and scanning apparatus |
| 07/03/2001 | US6255795 Electromagnetic alignment and scanning apparatus |
| 07/03/2001 | US6255189 Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with an alignment grating and an at least partly recessed oxide pattern |
| 06/28/2001 | WO2001047001A1 Exposure method and apparatus |
| 06/27/2001 | EP1111473A2 Lithographic apparatus with vacuum chamber and interferometric alignment system |
| 06/27/2001 | EP1111472A2 Position detection system for a lithographic apparatus |
| 06/27/2001 | EP1110437A1 Scanner system |
| 06/26/2001 | US6252649 Aligner |
| 06/26/2001 | US6252647 Projection exposure apparatus |
| 06/26/2001 | US6252370 Electromagnetic alignment and scanning apparatus |
| 06/26/2001 | US6252314 Linear motor and stage system, and scanning exposure apparatus using the same |
| 06/26/2001 | US6252234 Reaction force isolation system for a planar motor |
| 06/21/2001 | US20010004105 Crash prevention in positioning apparatus for use in lithographic projection apparatus |
| 06/19/2001 | US6249337 Alignment mechanism and process for light exposure |
| 06/19/2001 | US6249336 Projection exposure system |
| 06/19/2001 | US6248484 Hybrid alignment marks for optimal alignment of three-dimensional layers |
| 06/19/2001 | US6247404 Method of making newspaper printing plates |
| 06/14/2001 | US20010003382 Semiconductor device comprising layered positional detection marks and manufacturing method therof |
| 06/13/2001 | EP1107039A2 System for compensating direction and position variations of laser produced illumination |
| 06/13/2001 | EP1105780A1 Reaction force isolation system for a planar motor |
| 06/13/2001 | DE19959742A1 System zur Kompensation von Richtungs- und Positionsschwankungen eines von einem Laser erzeugten Lichtes System for compensating for the direction and position fluctuations of a light generated from a laser |
| 06/12/2001 | US6246204 Electromagnetic alignment and scanning apparatus |
| 06/12/2001 | US6246202 Method of making exposure apparatus with dynamically isolated reaction frame |
| 06/12/2001 | US6246053 Non-contact autofocus height detector for lithography systems |
| 06/12/2001 | US6245585 Method of providing levelling and focusing adjustments on a semiconductor wafer |
| 06/07/2001 | WO2001040876A1 Method and apparatus for aligning a crystalline substrate |
| 06/07/2001 | US20010003027 Exposure method |
| 06/07/2001 | CA2392710A1 Method and apparatus for aligning a crystalline substrate |
| 06/05/2001 | US6243158 Projection exposure apparatus and method |
| 06/05/2001 | US6242816 Method for improving a stepper signal in a planarized surface over alignment topography |
| 06/05/2001 | US6242754 Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus |
| 05/31/2001 | WO2001038939A2 Method for determining misalignment between a reticle and a wafer |
| 05/31/2001 | US20010002303 Driving stage toward target position, measuring position of stage, based upon measured position, correcting for nonlinear dynamics of stage |
| 05/31/2001 | US20010001900 Double-sided wafer exposure method and device |
| 05/30/2001 | EP1103860A1 Electron-beam lithography system and alignment method |
| 05/30/2001 | EP0826165B1 Alignment device and lithographic apparatus provided with such a device |
| 05/29/2001 | US6239443 Apparatus for emitting a beam to a sample used for manufacturing a semiconducor device |
| 05/29/2001 | US6239031 Stepper alignment mark structure for maintaining alignment integrity |
| 05/29/2001 | US6238851 Exposure method |
| 05/29/2001 | US6238824 Method for designing and making photolithographic reticle, reticle, and photolithographic process |
| 05/29/2001 | US6237393 Wafer center alignment device and method of wafer alignment |
| 05/25/2001 | WO2001037051A1 Beam positioning in microlithographic writing |
| 05/24/2001 | US20010001577 Exposure apparatus and device manufacturing method including measuring position and/or displacement of each of a base and a stage with respect to a support |
| 05/24/2001 | US20010001571 Method and apparatus for removing residual material from an alignment mark of a semiconductor wafer |
| 05/23/2001 | DE10000759C1 Production of justifying marks in a structure with integrated circuits comprises applying a first planar metal layer over a semiconductor substrate, applying an insulating layer, inserting metal and depositing a second metal layer |
| 05/22/2001 | US6236448 Projection exposure system |
| 05/22/2001 | US6236447 Exposure method and apparatus, and semiconductor device manufactured using the method |
| 05/22/2001 | US6235437 For integrated circuits |
| 05/16/2001 | CN1295268A Device for measuring relative position error |
| 05/15/2001 | US6233494 Method of measuring overlay offset |
| 05/15/2001 | US6233043 Position detection technique applied to proximity exposure |
| 05/15/2001 | US6233042 Projection exposure apparatus and device manufacturing method using the same |
| 05/15/2001 | US6233041 Exposure method utilizing diffracted light having different orders of diffraction |
| 05/15/2001 | US6231715 Elongate, semi-tone printing process |
| 05/10/2001 | WO2001033504A1 Method and apparatus for locating objects using universal alignment targets |
| 05/10/2001 | WO2001033300A2 High precision orientation alignment and gap control stages for imprint lithography processes |
| 05/10/2001 | US20010001077 Alignment mark strategy for oxide CMP |
| 05/10/2001 | US20010001056 Mask pattern is transferred onto a wafer by exposure with a mask stage and a wafer stage being moved synchronously |
| 05/09/2001 | EP1098556A1 Device for measuring a positioning error |
| 05/09/2001 | EP1098360A1 Position sensing method, position sensor, exposure method, exposure apparatus, and production process thereof, and device and device manufacturing method |
| 05/09/2001 | CN1294319A Method for coorecting optical approach effect |
| 05/08/2001 | US6228743 Alignment method for semiconductor device |
| 05/08/2001 | US6228542 Photomask method of manufacture method of test/repair and method of use therefor |
| 05/03/2001 | CA2324913A1 A device for measuring relative position error |
| 05/01/2001 | US6226087 Method for measuring the positions of structures on a mask surface |
| 05/01/2001 | US6225012 Method for positioning substrate |
| 05/01/2001 | US6223654 Printing plate |
| 04/26/2001 | WO2001029619A1 Reticle, wafer and method for determining an alignment error in a stepper |
| 04/26/2001 | WO2001029618A1 Method for determining rotational error portion of total misali gnment error in a stepper |
| 04/26/2001 | WO2001029617A1 Reticle, wafer, measuring stepper and methods for preventative maintenance |
| 04/26/2001 | DE10028019A1 Photo mask for semiconductor device manufacture, has comparison-on mask and test-on mask patterns of same shape, arranged adjacently on mask top photoengraving process test mask area of photo mask substrate |
| 04/24/2001 | US6222198 System and method for aligning pattern areas on opposing substrate surfaces |
| 04/24/2001 | US6221541 Photolithography; preparing masks having segment patterns corresponding to fan-shapes particularly suitable for manufacture of a diffractive optical element for use in an optical system |
| 04/24/2001 | US6221540 Marking; illuminating grid with light source |
| 04/24/2001 | US6219899 Panel positioning method |
| 04/19/2001 | WO2001027697A1 Composite relief image printing elements |
| 04/17/2001 | US6219130 Position detecting apparatus |
| 04/12/2001 | WO2001026023A1 System and method for three dimensional printing |
| 04/12/2001 | DE19949009A1 Mutual alignment of mask pattern and substrate for semiconductor chip manufacture |
| 04/11/2001 | EP1091385A1 Electron-beam lithography system and alignment method |
| 04/11/2001 | EP1091256A1 Alignment method and semiconductor exposure method |
| 04/11/2001 | EP1091255A2 Method of aligning mask and workpiece in exposure device |
| 04/11/2001 | EP1090329A1 Alignment simulation |
| 04/10/2001 | US6215896 System for enabling the real-time detection of focus-related defects |
| 04/10/2001 | US6215548 Nested glass exposure tool registration device |
| 04/10/2001 | US6213020 Drawing apparatus and drawing method |
| 04/05/2001 | WO2001024264A1 Wafer alignment marks and manufacturing methods |