| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 10/04/2001 | EP1137970A2 Method and device for aligning two photo masks with each other and optionally, an unexposed printed circuit board blank, and for subsequent simultaneous exposure in the production of double-sided printed circuit boards |
| 10/02/2001 | US6297877 Methods for compensating for lens heating resulting from wafer reflectance in micro-photolithography equipment |
| 10/02/2001 | US6297876 Lithographic projection apparatus with an alignment system for aligning substrate on mask |
| 10/02/2001 | US6297124 Method of improving alignment signal strength by reducing refraction index at interface of materials in semiconductors |
| 09/27/2001 | US20010024278 Position detecting method and apparatus, exposure method, exposure apparatus and manufacturing method thereof, computer-readable recording medium, and device manufacturing method |
| 09/27/2001 | US20010023927 Reaction force isolation system for a planar motor |
| 09/27/2001 | US20010023918 Alignment apparatus, alignment method, exposure apparatus and exposure method |
| 09/26/2001 | EP1135789A2 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
| 09/25/2001 | US6295120 Position detection technique applied to proximity exposure |
| 09/25/2001 | US6294296 Method and device for mutually aligning a mask pattern formed in a mask and a substrate |
| 09/19/2001 | EP1134793A1 Exposure method and exposure apparatus |
| 09/19/2001 | EP1134618A2 Alignment for lithography |
| 09/18/2001 | US6292254 Projection exposure method and apparatus |
| 09/13/2001 | WO2001067181A1 Wafer alignment |
| 09/13/2001 | US20010021548 Alignment mark set and method of measuring alignment accuracy |
| 09/13/2001 | US20010020687 Surface position detecting system and method |
| 09/13/2001 | US20010020684 Reaction force isolation system |
| 09/13/2001 | DE10011202A1 Verfahren zur Ausrichtung eines Elektronenstrahls auf eine Zielposition an einer Substratoberfläche A method for aligning an electron beam to a target position on a substrate surface |
| 09/13/2001 | DE10011201A1 Photosensitive resist exposure method for electron beam lithography uses stepped displacement of substrate in coordinate directions with regulation of electron beam energy after each displacement |
| 09/12/2001 | EP1132945A2 Method and device for producing curved lines on an irradiation sensitive resist |
| 09/12/2001 | EP1132944A2 Method of aligning an electron beam with a target position on a substrate surface |
| 09/11/2001 | USRE37361 Scanning type exposure apparatus and exposure method |
| 09/11/2001 | USRE37359 Projection exposure method and apparatus capable of performing focus detection with high accuracy |
| 09/11/2001 | US6288773 Method and apparatus for removing residual material from an alignment mark of a semiconductor wafer |
| 09/11/2001 | US6288772 Scanning exposure method and scanning type exposure apparatus |
| 09/11/2001 | US6288556 Method of electrical measurement of misregistration of patterns |
| 09/11/2001 | US6288454 Semiconductor wafer having a layer-to-layer alignment mark and method for fabricating the same |
| 09/11/2001 | US6287876 Reticle-substrate alignment methods for charged-particle-beam microlithography, and associated semiconductor-device manufacturing methods |
| 09/11/2001 | US6287735 Drive the wafer towrd target; measuring position |
| 09/11/2001 | US6287734 Transferring pattern formed on mask using projection optical system |
| 09/07/2001 | WO2001065591A1 Position measuring apparatus and aligner |
| 09/06/2001 | US20010019880 Method of producing alignment marks |
| 09/06/2001 | US20010019412 Semiconductor wafer alignment methods and semiconductor wafer alignment tools |
| 09/06/2001 | US20010019404 Projection exposure system for microlithography and method for generating microlithographic images |
| 09/06/2001 | US20010019401 Exposure apparatus, microdevice, photomask, and exposure method |
| 09/06/2001 | US20010019250 Exposure apparatus and method utilizing isolated reaction frame |
| 09/06/2001 | US20010019111 Surface position detecting system and method |
| 09/06/2001 | DE10010131A1 Microlithography projection exposure with tangential polarization involves using light with preferred direction of polarization oriented perpendicularly with respect to plane of incidence |
| 09/05/2001 | EP1130473A2 A system, method and article of manufacture for direct image processing of printed circuit boards |
| 09/05/2001 | EP1130470A2 Microlithographic projection illumination with tangential polarisation |
| 09/05/2001 | CN1311626A Vertical correcting working table mechanism |
| 09/04/2001 | US6285457 Exposure apparatus and device manufacturing method including measuring position and/or displacement of each of a base and a stage with respect to a support |
| 09/04/2001 | US6285455 Mark detection method, optical system and mark position detector |
| 09/04/2001 | US6285439 Position detection technique applied to proximity exposure |
| 09/04/2001 | US6285033 Positional deviation detecting method and device manufacturing method using the same |
| 08/30/2001 | US20010017939 Position detecting method, position detecting apparatus, exposure method, exposure apparatus and making method thereof, computer readable recording medium and device manufacturing method |
| 08/29/2001 | EP1128219A2 Exposure method and apparatus |
| 08/29/2001 | EP1128215A2 Alignment mark set and method of measuring alignment accuracy |
| 08/28/2001 | US6281966 Exposure apparatus and device manufacturing method |
| 08/28/2001 | US6281965 Exposure method and exposure system using the exposure method |
| 08/28/2001 | US6281654 Method for making apparatus with dynamic support structure isolation and exposure method |
| 08/28/2001 | US6280887 Complementary and exchange mask design methodology for optical proximity correction in microlithography |
| 08/28/2001 | US6279881 Method and apparatus which exposes a second object with a pattern formed on a first object and which performs statistical calculation based on position information of marks on the first object |
| 08/23/2001 | US20010016293 Method for positioning substrate |
| 08/23/2001 | US20010015799 Stage apparatus, exposure apparatus, and device production method |
| 08/22/2001 | EP1126323A2 Exposure method and exposure apparatus |
| 08/22/2001 | EP1125166A1 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 08/22/2001 | CN1309784A Surfaces with release agent |
| 08/22/2001 | CN1309759A Method and apparatus for confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation |
| 08/22/2001 | CN1309332A Exposure method and device, and method for mfg. device |
| 08/21/2001 | US6278957 Alignment method and apparatus therefor |
| 08/21/2001 | US6278515 Method and apparatus for adjusting a tilt of a lithography tool |
| 08/21/2001 | US6277533 Projecting image of a pattern onto a mask |
| 08/16/2001 | WO2001007885A3 Phase-shifting point diffraction interferometer focus-aid enhanced mask |
| 08/16/2001 | US20010014170 Object positioning method for a lithographic projection apparatus |
| 08/16/2001 | EP1124163A2 Alignment using polarised light |
| 08/16/2001 | EP1124162A2 Method of positioning an object in a lithographic projection apparatus |
| 08/15/2001 | CN1308837A Scanner system |
| 08/14/2001 | US6272763 Staging apparatus and method, and method for manufacturing the staging apparatus, and exposing apparatus using the staging apparatus |
| 08/09/2001 | US20010012593 Wafer alignment marks protected by photoresist |
| 08/09/2001 | US20010012098 Scan type projection exposure apparatus and device manufacturing method using the same |
| 08/09/2001 | US20010011712 Position detection system for use in lithographic apparatus |
| 08/08/2001 | EP1122612A2 Position detection |
| 08/07/2001 | US6271923 Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
| 08/07/2001 | US6271919 Semiconductor device and alignment apparatus and alignment method for same |
| 08/07/2001 | US6271910 Projection exposure apparatus and method |
| 08/07/2001 | US6271640 Exposure apparatus having reaction frame |
| 07/31/2001 | US6269322 System and method for wafer alignment which mitigates effects of reticle rotation and magnification on overlay |
| 07/31/2001 | US6268920 Registration of sheet materials using statistical targets and method |
| 07/31/2001 | US6268907 Elimination of standing waves in photoresist |
| 07/26/2001 | US20010009281 Phase shift mask and fabrication method thereof |
| 07/25/2001 | EP1118835A1 Clearance measuring device and method for exposure |
| 07/24/2001 | US6266130 Position detecting method and position detecting system |
| 07/24/2001 | US6265234 Alignment system for a spherical device |
| 07/24/2001 | US6265119 Method for producing semiconductor devices |
| 07/19/2001 | US20010008790 Semiconductor device and alignment method |
| 07/19/2001 | US20010008442 Positioning mark and alignment method using the same |
| 07/19/2001 | US20010008273 Abbe arm calibration system for use in lithographic apparatus |
| 07/18/2001 | EP1117131A2 Method of forming alignment marks |
| 07/18/2001 | EP1117010A2 Lithographic apparatus with system for determining the Abbe arm |
| 07/18/2001 | EP1115545A1 Device and method for transferring microstructures |
| 07/17/2001 | US6262792 Optical exposure apparatus of scanning exposure system and its exposing method |
| 07/17/2001 | US6261938 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 07/17/2001 | US6261918 Method for creating and preserving alignment marks for aligning mask layers in integrated circuit manufacture |
| 07/12/2001 | WO2001050523A2 Method to measure alignment using latent image grating structures |
| 07/12/2001 | US20010007786 Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns |
| 07/12/2001 | US20010007734 Position detecting method, position detecting unit, exposure method, exposure apparatus, a computer readable recording medium, and device manufacturing method |
| 07/11/2001 | EP1115032A2 Scanning exposure apparatus, exposure method using the same, and device manufacturing method |
| 07/11/2001 | EP1114979A1 Uncoupled wafer inclination measurement with an ellipsometer with spectral photometer and measurement of focus by a reflecting objective |
| 07/10/2001 | US6259525 Semiconductor wafer alignment tools |