| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 12/13/2001 | US20010051302 Preferential etching |
| 12/13/2001 | US20010050437 Semiconductor device and method of manufacturing the same |
| 12/13/2001 | US20010050341 Positioning system for use in lithographic apparatus |
| 12/12/2001 | EP1162507A2 Alignment method, overlay deviation inspection method and photomask |
| 12/12/2001 | EP1161707A1 Reduction of the effects of magnification errors and reticle rotation errors on overlay errors |
| 12/11/2001 | US6330053 Image alignment method in checking reticle pattern |
| 12/11/2001 | US6329780 Electromagnetic alignment and scanning apparatus |
| 12/11/2001 | US6329306 Fine patterning utilizing an exposure method in photolithography |
| 12/11/2001 | US6329104 Detecting a reflected optical beam on markers, total internal reflection (tir), microlithography |
| 12/06/2001 | US20010049589 Alignment method and apparatus therefor |
| 12/06/2001 | US20010048145 Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof |
| 12/05/2001 | EP1161123A2 Process to manufacture tight tolerance embedded elements for printed circuit boards |
| 12/04/2001 | US6327513 Methods and apparatus for calculating alignment of layers during semiconductor processing |
| 12/04/2001 | US6327034 Apparatus for aligning two objects |
| 12/04/2001 | US6327026 Exposure apparatus and positioning apparatus |
| 12/04/2001 | US6327025 Projection exposure apparatus for transferring mask pattern onto photosensitive substrate |
| 12/04/2001 | US6326629 Projection lithography device utilizing charged particles |
| 12/04/2001 | US6326106 Overlay measuring pattern, and photomask |
| 11/29/2001 | WO2001090819A2 Method and system for selective linewidth optimization during a lithographic process |
| 11/29/2001 | WO2001090686A1 In-situ mirror characterization |
| 11/29/2001 | US20010046315 Position detecting method and position detecting device for detecting relative positions of objects having position detecting marks by separate reference member having alignment marks |
| 11/29/2001 | US20010046053 Interferometric apparatus and method(s) for precision measurement of altitude above a surface |
| 11/29/2001 | US20010046037 Position transducer and exposure apparatus with same |
| 11/29/2001 | US20010045690 Maskless laser beam patterning device and apparatus for ablation of multilayered structures with continuous monitoring of ablation |
| 11/29/2001 | US20010045526 Stage device for an exposure apparatus and semiconductor device manufacturing method wich uses said stage device |
| 11/27/2001 | US6323935 Electromagnetic alignment and scanning apparatus |
| 11/27/2001 | US6323560 Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof |
| 11/27/2001 | US6321651 Pin registration system for mounting different width printing plates |
| 11/22/2001 | WO2001088469A1 Interferometric apparatus and method |
| 11/22/2001 | WO2001088467A2 Data age adjustments |
| 11/22/2001 | US20010042838 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same |
| 11/21/2001 | CN1322972A Exposure apparatus and exposure method |
| 11/21/2001 | CN1322971A Expoure method and equipment producing method |
| 11/20/2001 | US6320659 Clearance measuring device and method for exposure |
| 11/20/2001 | US6320658 Apparatus and method for detecting the position of a surface to be examined, exposure apparatus equipped with the detecting apparatus and method of producing the exposure apparatus, and method of producing devices using the exposure apparatus |
| 11/20/2001 | US6320644 Reticle alignment system for use in lithography |
| 11/20/2001 | US6319641 Scanning exposure method utilizing alignment marks based on scanning direction |
| 11/20/2001 | US6319638 Semiconductor device manufacturing method of accurately performing alignment of patterning, mask for exposure |
| 11/15/2001 | US20010042068 Methods and apparatus for data classification, signal processing, position detection, image processing, and exposure |
| 11/15/2001 | US20010041417 Aligning method, exposure apparatus using this aligning method, and semiconductor device manufacturing method utilizing this exposure apparatus |
| 11/15/2001 | US20010040674 Projection exposure method and apparatus |
| 11/15/2001 | US20010040224 Positional deviation detecting method and device manufacturing method using the same |
| 11/15/2001 | US20010040221 Method and apparatus for forming a curved polyline on a radiation-sensitive resist |
| 11/13/2001 | US6317196 Projection exposure apparatus |
| 11/13/2001 | US6316901 Exposure apparatus and method utilizing isolated reaction frame |
| 11/08/2001 | US20010038154 Semiconductor device |
| 11/07/2001 | EP0954444B1 Printing plate |
| 11/06/2001 | US6313916 Position detecting system and projection exposure apparatus with the same |
| 11/06/2001 | US6313542 Method and apparatus for detecting edges under an opaque layer |
| 11/06/2001 | US6312872 Composite relief image printing plates |
| 11/06/2001 | US6312871 Composite relief image printing plates |
| 11/06/2001 | US6312859 Projection exposure method with corrections for image displacement |
| 11/01/2001 | US20010036582 Comprising a rectangular portion, and band-shaped portions separated from opposite sides of the rectangular portion by an equal distance and parallel to the sides; overlay shift accurately obtained even when photoresist heat shrinks |
| 11/01/2001 | US20010036581 Photolithography; positioning an exposure mask and an object to be processed to locate the object in a region where near-field light is present, and controlling light intensity as a function of aperture density of the mask |
| 11/01/2001 | US20010035959 In-situ mirror characterization |
| 10/31/2001 | EP1150249A1 Mark detecting method, exposure method, device manufacturing method, mark detector, exposure apparatus, and device |
| 10/31/2001 | EP1150173A2 Determining the position of a substrate alignment mark |
| 10/31/2001 | EP1150162A2 Exposure method and exposure apparatus using near-field light and exposure mask |
| 10/31/2001 | EP1149328A1 Method and assembly for producing printing plates |
| 10/31/2001 | CN1074165C Optical mask with vernier |
| 10/30/2001 | US6310680 Method of adjusting a scanning exposure apparatus and scanning exposure apparatus using the method |
| 10/30/2001 | US6310482 Capacitance gauge tracking apparatus used for exposure system for manufacturing semiconductor device, method for the tracking surface of semiconductor device using the same, leveling apparatus including tracking apparatus, and leveling method |
| 10/30/2001 | US6309800 Irradiating a mask to enlarge circuit pattern |
| 10/30/2001 | US6309580 Release surfaces, particularly for use in nanoimprint lithography |
| 10/25/2001 | DE10018810A1 Aligning photolithographic masks relative to wafers involves observing optical effect in plane orthogonal to z-axes caused by interaction of light with adjustment and reference marks |
| 10/24/2001 | EP1148390A2 Mark independent alignment sensor |
| 10/24/2001 | CN1318973A Positioning device for use in process for manufacturing multi-layer printed circuit board and its using method |
| 10/24/2001 | CN1073719C Point-to-point photoetch method and system used for producing circular optical grating code disk |
| 10/23/2001 | US6306548 Mask including plurality of first light sealed patterns arranged with predetermined interval to form alignment mark on substrate, plurality of second patterns disposed between adjacent first patterns with smaller interval in between |
| 10/20/2001 | CA2338479A1 Self referencing mark independent alignment sensor |
| 10/18/2001 | US20010030747 Method for aligning two objects |
| 10/18/2001 | US20010030522 Guideless stage with isolated reaction stage |
| 10/18/2001 | US20010030299 Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus |
| 10/18/2001 | US20010029755 Method of forming an alignment marker for optical devices |
| 10/18/2001 | DE10015987A1 Automatic printing plate exposure assembly has overlapping conveyor belts to carry the plates through the exposure station between plate buffer stores and moving alignment pins position the plates for exposure |
| 10/17/2001 | EP1146395A2 Lithographic apparatus, device manufacturing method, and device manufactured by said method |
| 10/17/2001 | EP1145082A1 Reticle, wafer and method for determining an alignment error in a stepper |
| 10/17/2001 | EP1145081A1 Method for determining rotational error portion of total misalignment error in a stepper |
| 10/17/2001 | EP1145080A1 Reticle, wafer, measuring stepper and methods for preventative maintenance |
| 10/17/2001 | EP1145079A2 Method for determining misalignment between a reticle and a wafer |
| 10/17/2001 | CN1318157A Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography |
| 10/16/2001 | US6304319 Exposure apparatus, method of producing the same, and method of producing devices |
| 10/11/2001 | US20010028457 Semiconductor device and alignment apparatus and alignment method for same |
| 10/11/2001 | US20010028456 Exposure method, exposure apparatus, and method for producing device |
| 10/11/2001 | US20010028446 Optical exposure apparatus of scanning exposure system and its exposing method |
| 10/11/2001 | US20010028039 Method for directing an electron beam onto a target position on a substrate surface |
| 10/11/2001 | US20010028037 Hollow-beam aperture for charged-particle-beam optical systems and microlithography apparatus, andbeam-adjustment methods employing same |
| 10/09/2001 | US6301001 Optical element manufacturing system, an illumination system, and an exposure apparatus |
| 10/09/2001 | US6300018 Photolithography mask having a subresolution alignment mark window |
| 10/09/2001 | US6299572 Print image positioning |
| 10/04/2001 | US20010026975 Method of manufacturing semiconductor device |
| 10/04/2001 | US20010026897 For manufacturing a semiconductor integrated circuit or liquid display element; high precision |
| 10/04/2001 | US20010026894 Photomask and exposure method for large scaled LCD device |
| 10/04/2001 | US20010026638 Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same |
| 10/04/2001 | US20010026368 Mark position detecting system and method for detecting mark position |
| 10/04/2001 | US20010026366 Method of measuring displacement of optical axis, optical microscope and evaluation mark |
| 10/04/2001 | US20010026358 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 10/04/2001 | US20010026357 Position transducer and exposure apparatus with same |
| 10/04/2001 | US20010026356 Scanning exposure apparatus and device manufacturing method |
| 10/04/2001 | EP1139706A2 Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same |