| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/27/2002 | EP1182508A2 Method of exposing a layout comprising several levels on a wafer |
| 02/27/2002 | EP1182133A1 Stern tube sealing apparatus |
| 02/21/2002 | WO2002014955A1 Virtual gauging system and method for lithography |
| 02/21/2002 | US20020022353 Semiconductor device and manufacturing method thereof |
| 02/21/2002 | US20020021449 Data age adjustments |
| 02/21/2002 | US20020021433 scanning exposure apparatus |
| 02/21/2002 | US20020021431 Projection exposure apparatus |
| 02/21/2002 | US20020021428 Charged-particle-beam microlithography stage including actuators for moving a reticle or substrate relative to the stage, and associated methods |
| 02/21/2002 | US20020021427 Cantilever reticle stage for electron beam projection lithography system |
| 02/20/2002 | EP1180251A1 Wafer alignment |
| 02/14/2002 | WO2000065301A9 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry |
| 02/14/2002 | US20020019065 Shot averaging for fine pattern alignment with minimal throughput loss |
| 02/14/2002 | US20020018207 Alignment method, alignment apparatus, profiler, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 02/14/2002 | US20020018206 Semiconductor structures and manufacturing methods |
| 02/14/2002 | US20020017890 Electromagnetic alignment and scanning apparatus |
| 02/14/2002 | US20020017889 Exposure apparatus and method utilizing isolated reaction frame |
| 02/14/2002 | US20020017669 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
| 02/14/2002 | US20020017616 Exposure apparatus and method |
| 02/13/2002 | CN1335742A Method for producing severe tolerance imbedded elements for printing circuit board |
| 02/12/2002 | US6347291 Substrate position location system |
| 02/12/2002 | US6346961 Device for producing a printing form |
| 02/07/2002 | WO2002010721A2 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
| 02/07/2002 | US20020016646 Method of aligning dies of wafer(s) with exposure equipment in the fabricating of semiconductor devices |
| 02/07/2002 | US20020015158 Focus measurement in projection exposure apparatus |
| 02/07/2002 | US20020015156 Position detecting method and system for use in exposure apparatus |
| 02/07/2002 | US20020014601 Position detection method and position detector, exposure method and exposure apparatus, and device and device manufacturing method |
| 02/07/2002 | US20020014600 Scanning exposure method |
| 02/06/2002 | EP1177444A1 Process to create biomolecule arrays on metal surfaces |
| 02/05/2002 | US6344892 Exposure apparatus and device manufacturing method using same |
| 02/05/2002 | US6344697 Semiconductor device comprising layered positional detection marks and manufacturing method thereof |
| 02/05/2002 | US6344365 Arc coating on mask quartz plate to avoid alignment error on stepper or scanner |
| 01/31/2002 | US20020012858 Variations of exposure fields; overlapping; increased accuracy |
| 01/31/2002 | US20020011164 Pin registration system for mounting different width printing plates |
| 01/30/2002 | CN1078738C Composite silicon-on-insulator substrate and method of fabricating the same |
| 01/29/2002 | US6342944 Vertical alignment table mechanism |
| 01/29/2002 | US6342943 Exposure apparatus |
| 01/29/2002 | US6342735 Dual use alignment aid |
| 01/29/2002 | US6342703 Exposure apparatus, exposure method, and device manufacturing method employing the exposure method |
| 01/29/2002 | US6342426 Method for protecting stepper alignment marks |
| 01/29/2002 | US6342412 Having a dram (dynamic random access memory), having a capacity as high as 16 mbits; improve the alpha-ray soft error withstand voltage; misfet |
| 01/29/2002 | US6342323 Alignment methodology for lithography |
| 01/24/2002 | WO2001038939A3 Method for determining misalignment between a reticle and a wafer |
| 01/24/2002 | WO2001033300A3 High precision orientation alignment and gap control stages for imprint lithography processes |
| 01/24/2002 | US20020009175 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 01/24/2002 | EP1145079A3 Method for determining misalignment between a reticle and a wafer |
| 01/23/2002 | CN1332470A Exposure device, surface position regulating unit and method for making mask and device |
| 01/23/2002 | CN1078134C Elongate, semi-tone printing process and substrates printed thereby |
| 01/22/2002 | US6341011 Exposure method |
| 01/22/2002 | US6341007 Exposure apparatus and method |
| 01/22/2002 | US6340821 Projection eyepiece and method for aligning pattern areas on opposing substrate |
| 01/22/2002 | US6340547 Method of forming circuit patterns on semiconductor wafers using two optical steppers having nonaligned imaging systems |
| 01/17/2002 | US20020006713 Optical article, exposure apparatus or optical system using it, and process for producing it |
| 01/17/2002 | US20020006561 Projection exposure apparatus and method |
| 01/17/2002 | US20020006560 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
| 01/17/2002 | US20020005940 Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing microdevice |
| 01/17/2002 | US20020005939 Lithographic projection apparatus, supporting assembly and device manufacturing method |
| 01/16/2002 | EP0823977B1 Lithopraphic apparatus for step-and-scan imaging of a mask pattern |
| 01/15/2002 | US6339471 Projection exposure apparatus |
| 01/15/2002 | US6338971 Method of correcting alignment |
| 01/15/2002 | US6338926 Masking a pattern composed of a rectangle, gravity, separation, bars, over exposure and fitting |
| 01/10/2002 | WO2001050523A3 Method to measure alignment using latent image grating structures |
| 01/10/2002 | US20020004283 Method of forming an alignment feature in or on a multi-layered semiconductor structure |
| 01/10/2002 | US20020003629 Positioning stage system and position measuring method |
| 01/10/2002 | US20020003615 Alignment system and projection exposure apparatus |
| 01/10/2002 | US20020003216 Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method |
| 01/09/2002 | EP1170636A2 Exposure apparatus and surface position adjustment unit |
| 01/08/2002 | US6337735 Exposure apparatus for photoengraving stamps |
| 01/08/2002 | US6337733 Apparatus including a motor-driven stage for exposing a photosensitive substrate, and method of making such apparatus |
| 01/08/2002 | US6337484 Positioning device and lithographic projection apparatus comprising such a device |
| 01/08/2002 | US6337162 Method of exposure, photomask, method of production of photomask, microdevice, and method of production of microdevice |
| 01/03/2002 | US20020001761 Micro devices manufacturing method and apparatus therefor |
| 01/03/2002 | US20020001086 Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
| 01/03/2002 | US20020001083 Apparatus and method for measuring pattern alignment error |
| 01/03/2002 | US20020000520 Surface position detection device and exposure apparatus and exposure method achieved by utilizing detection device |
| 01/02/2002 | EP1168085A2 Reference plate for exposure apparatus |
| 01/02/2002 | EP1168082A2 Device for exposure of the peripheral area of a film circuit board |
| 01/02/2002 | EP1166816A2 A photolithographic process for the formation of a one-piece needle |
| 01/02/2002 | CN1329357A Aligning method, alignment checking method and photomask |
| 01/02/2002 | CN1329287A Photoetching device and exposure method |
| 01/02/2002 | CN1329286A 曝光装置 Exposure device |
| 01/01/2002 | US6335791 Apparatus for detecting positions of wafer and mask and deformation error detecting method |
| 01/01/2002 | US6335784 Scan type projection exposure apparatus and device manufacturing method using the same |
| 01/01/2002 | US6335537 Projection exposure apparatus and exposure method |
| 12/29/2001 | CA2351797A1 A photolithographic process for the formation of a one-piece needle |
| 12/27/2001 | WO2001098761A1 Overlay alignment mark design |
| 12/27/2001 | US20010055720 Alignment method, overlay deviation inspection method and photomask |
| 12/27/2001 | US20010055117 Alignment method, exposure method, exposure apparatus and device manufacturing method |
| 12/27/2001 | US20010055100 Exposure apparatus |
| 12/26/2001 | CN1076836C Pattern alignment mark of semiconductor device |
| 12/25/2001 | US6333786 Aligning method |
| 12/25/2001 | US6333572 Article positioning apparatus and exposing apparatus having the article positioning apparatus |
| 12/20/2001 | US20010053962 Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method |
| 12/20/2001 | US20010053488 Automated, flow-through, dual side, laser direct imaging process and apparatus which provides capability to simultaneously register and image both sides of substrate in continuous flow-through process |
| 12/20/2001 | US20010053487 Automated, flow-through, dual side, laser direct imaging process and apparatus which provides capability to simultaneously register and image both sides of substrate in continuous flow-through process |
| 12/20/2001 | US20010052970 Stage apparatus, exposure apparatus, and device manufacturing method |
| 12/19/2001 | EP1164639A2 Alignment marks for manufacturing semiconductor device |
| 12/19/2001 | EP1164352A1 Position sensing method and position sensor, exposing method and exposing apparatus, and device and device manufacturing method |
| 12/19/2001 | EP1163549A1 Display screen and method of manufacture therefor |
| 12/18/2001 | US6331709 Alignment mark detection method, and alignment method, exposure method and device, and device production method making use of the alignment mark detection method |
| 12/18/2001 | US6331369 Exposure methods for overlaying one mask pattern on another |