| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 05/09/2002 | US20020054231 Exposure method, exposure apparatus, and process of production of device |
| 05/09/2002 | US20020054209 Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects |
| 05/09/2002 | US20020053644 Exposure apparatus and control method for correcting an exposure optical system on the basis of an estimated magnification variation |
| 05/08/2002 | DE10054070A1 Precision process to determine the position of moving wafer bench and photo mask bench relative to each other |
| 05/08/2002 | CN1348602A Exposure method and device |
| 05/07/2002 | US6384899 Lithographic projection apparatus |
| 05/07/2002 | US6383888 Method and apparatus for selecting wafer alignment marks based on film thickness variation |
| 05/02/2002 | WO2002035288A1 System and method for facilitating wafer alignment by mitigating effects of reticle rotation on overlay |
| 05/02/2002 | US20020052100 Photomask and method for manufacturing the same |
| 05/02/2002 | US20020052091 Automated combi deposition apparatus and method |
| 05/02/2002 | US20020052088 Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| 05/02/2002 | US20020051943 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 05/02/2002 | US20020051913 Method and apparatus for making photomasks with improved inside corner resolution |
| 04/30/2002 | US6381002 Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| 04/30/2002 | US6380049 Semiconductor substrate and method of manufacturing semiconductor device |
| 04/25/2002 | WO2002033352A1 Method and device for shape measurement, method and device for exposure, control program, and device manufacturing method |
| 04/25/2002 | WO2002033351A1 Position detection method, position detection device, exposure method, exposure system, control program, and device production method |
| 04/25/2002 | US20020048857 System for manufacturing semiconductor device utilizing photolithography technique, method of manufacturing semiconductor device, and semiconductor device manufactured thereby |
| 04/25/2002 | US20020048020 Process and apparatus for manufacturing semiconductor device |
| 04/25/2002 | US20020048009 Balanced positioning system for use lithographic apparatus |
| 04/25/2002 | US20020048006 Scan type projection exposure apparatus and device manufacturing method using the same |
| 04/23/2002 | US6376329 Semiconductor wafer alignment using backside illumination |
| 04/23/2002 | US6376134 Automated, flow-through, dual side, laser direct imaging process and apparatus which provides capability to simultaneously register and image both sides of substrate in continuous flow-through process |
| 04/18/2002 | WO2002031868A1 Stacked wafer alignment method |
| 04/18/2002 | WO2000072093A9 Optical gap measuring apparatus and method using two-dimensional grating mark with chirp in one direction |
| 04/18/2002 | WO2000066969A9 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 04/18/2002 | US20020045107 Reticle for creating resist-filled vias in a dual damascene process |
| 04/18/2002 | US20020045106 Isolated areas that contrast with a background and represent features to be printed, arranged generally in an array; and a plurality of assist features smaller than said isolated areas and positioned so as to make said array more symmetric. |
| 04/18/2002 | US20020044268 Pattern forming apparatus and pattern forming method |
| 04/18/2002 | US20020043163 Low distortion kinematic reticle support |
| 04/17/2002 | EP0539384B1 Process for producing a marker indicating the orientation of the crystal lattice of a wafer |
| 04/16/2002 | US6373976 Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems |
| 04/16/2002 | US6373555 Apparatus for projecting a mask pattern onto a wafer with reduced degradation of optical elements |
| 04/16/2002 | US6372646 Optical article, exposure apparatus or optical system using it, and process for producing it |
| 04/16/2002 | US6372395 Exposure method for overlaying one mask pattern on another |
| 04/16/2002 | US6370793 Apparatus for controlling the temperature of a wafer located at a pre-alignment stage |
| 04/11/2002 | WO2002029869A1 Projection aligner and method of producing device using this aligner |
| 04/11/2002 | WO2002029867A1 Method for correcting electron beam and electron beam exposure system |
| 04/11/2002 | WO2002029866A1 Electron beam exposure system and method for calibrating irradiating position of electron beam |
| 04/11/2002 | WO2002029495A1 Mountable and removable sensor |
| 04/11/2002 | US20020042664 Evaluation method, position detection method, exposure method and device manufacturing method, and exposure apparatus |
| 04/11/2002 | US20020041380 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/11/2002 | US20020041367 Position detection apparatus having a plurality of detection sections, and exposure apparatus |
| 04/10/2002 | EP1195796A1 Method and apparatus for detecting mark, exposure method and apparatus, and production method for device and device |
| 04/10/2002 | EP1195647A1 Surface position detecting method and scanning exposure method using the same |
| 04/10/2002 | EP1194731A1 Interferometric apparatus and method that compensate refractive index fluctuations |
| 04/09/2002 | US6369877 System, method and article of manufacture for direct image processing of printed circuit boards |
| 04/09/2002 | US6368972 Method for making an integrated circuit including alignment marks |
| 04/09/2002 | US6368761 Procedure of alignment for optimal wafer exposure pattern |
| 04/04/2002 | WO2002027410A1 Contrast enhancement for lithography alignment mark recognition |
| 04/04/2002 | US20020039828 Method for exposing a layout comprising multiple layers on a wafer |
| 04/04/2002 | US20020039694 On-the-Fly leveling is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor |
| 04/04/2002 | US20020039516 Three degree of freedom joint |
| 04/04/2002 | US20020039179 Stage apparatus providing multiple degrees of freedom of movement while exhibiting reduced magnetic disturbance of a charged particle beam |
| 04/03/2002 | EP1192410A1 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry |
| 04/02/2002 | US6366361 Peeker detection and correction |
| 03/28/2002 | WO2002025711A1 Method of measuring image characteristics and exposure method |
| 03/28/2002 | US20020038161 Methods and apparatus for calculating alignment of layers during semiconductor processing |
| 03/28/2002 | US20020037625 Method of producing exposure mask |
| 03/28/2002 | US20020037460 Stage unit, measurement unit and measurement method, and exposure apparatus and exposure method |
| 03/28/2002 | US20020036777 Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant |
| 03/28/2002 | US20020036357 Semiconductor device comprising layered positional detection marks and manufacturing method thereof |
| 03/21/2002 | WO2002023231A2 Generation of a library of periodic grating diffraction signals |
| 03/21/2002 | WO2001090819A3 Method and system for selective linewidth optimization during a lithographic process |
| 03/21/2002 | WO2001088467A3 Data age adjustments |
| 03/21/2002 | US20020035455 Generation of a library of periodic grating diffraction signals |
| 03/21/2002 | US20020034831 Alignment method and exposure apparatus using the method |
| 03/21/2002 | US20020033936 Projection exposure method and apparatus |
| 03/21/2002 | US20020033935 Exposure apparatus, imaging performance measurement method, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 03/20/2002 | EP1188184A2 Method to measure alignment using latent image grating structures |
| 03/19/2002 | US6360134 Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations |
| 03/19/2002 | US6359678 Exposure apparatus, method for producing the same, and exposure method |
| 03/14/2002 | US20020031725 Exposure method, exposure apparatus, and device manufacturing method |
| 03/14/2002 | US20020031712 Photomask making method and alignment method |
| 03/14/2002 | US20020030796 Photolithographic process for producing etched patterns on the surface of fine tubes, wires, or other three dimensional structures |
| 03/14/2002 | US20020030496 Apparatus for measuring the focus of a light exposure system used for fabricating a semiconductor device |
| 03/14/2002 | US20020030165 Proximity exposure method by oblique irradiation with light |
| 03/14/2002 | DE10136747A1 Image correction during print forme exposure, with forme exposed to position compensating temperature profile during exposure |
| 03/13/2002 | EP1187186A1 Exposure method and device |
| 03/13/2002 | EP1187169A2 Corpuscular optical components and assembly using same |
| 03/13/2002 | EP1186959A2 Method for calibrating a lithographic projection apparatus |
| 03/12/2002 | US6356616 Apparatus and methods for detecting position of an object along an axis |
| 03/12/2002 | US6356343 Mark for position detection and mark detecting method and apparatus |
| 03/12/2002 | US6354204 Printing method and device |
| 03/07/2002 | WO2002019415A1 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 03/07/2002 | WO2002018871A1 Improved overlay alignment measurement mark |
| 03/07/2002 | US20020028528 Alignment marks and method of forming the same |
| 03/07/2002 | US20020027646 Exposure system |
| 03/07/2002 | US20020026878 Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method |
| 03/06/2002 | EP1184896A1 Pattern matching method and device, position determining method and device, position aligning method and device, exposing method and device, and device and its production method |
| 03/06/2002 | EP1184891A1 Electron beam lithography |
| 03/05/2002 | US6352904 Alignment mark strategy for oxide CMP |
| 03/05/2002 | US6352815 Production of large-format composite relief printing plates by laser positioning and subsequent image recording by means of a laser |
| 02/28/2002 | US20020025588 Position detection mark and position detection method |
| 02/28/2002 | US20020025492 Composite relief image printing elements |
| 02/28/2002 | US20020025482 Exposure method |
| 02/28/2002 | US20020025479 Resolution |
| 02/28/2002 | US20020024648 Exposure apparatus and exposure method |
| 02/28/2002 | US20020024644 Alignment system and alignment method in exposure apparatus |
| 02/27/2002 | EP1182509A2 Lithographic apparatus |