| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
|---|
| 07/11/2002 | US20020089340 Method for measuring reticle leveling in stepper |
| 07/10/2002 | EP1221073A1 A photolithography mask having a subresolution alignment mark window |
| 07/09/2002 | US6417927 Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
| 07/09/2002 | US6417922 Alignment device and lithographic apparatus comprising such a device |
| 07/09/2002 | US6417076 Automated combi deposition apparatus and method |
| 07/09/2002 | US6416913 Scanning mask and work-piece to transfer pattern and changing imaging characteristics to correct for changes caused by thermal properties; reduced magnification error and distortion |
| 07/09/2002 | US6416912 Simultaneously detecting alignment marks and computing position information to align circuit patterns; accuracy; high speed |
| 07/04/2002 | WO2002052623A1 Electron beam exposure system and electron beam irradiation position calibrating member |
| 07/04/2002 | WO2002052622A1 Exposure mask, method for manufacturing the mask, and exposure method |
| 07/04/2002 | WO2002052620A1 Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice |
| 07/04/2002 | WO2002052351A1 Method of measuring overlay |
| 07/04/2002 | WO2002052350A1 Method of measuring alignment of a substrate with respect to a reference alignment mark |
| 07/04/2002 | US20020085757 Surface position detecting method |
| 07/04/2002 | US20020085189 Reticle alignment system for use in lithography |
| 07/04/2002 | US20020085188 Apparatus and method for compensating for distortion of a printed circuit workpiece substrate |
| 07/04/2002 | US20020084422 Particle-optical component and system comprising a particle-optical component |
| 07/03/2002 | EP1164352A9 Position sensing method and position sensor, exposing method and exposing apparatus, and device and device manufacturing method |
| 07/02/2002 | US6414744 Mask handling apparatus for lithographic projection apparatus |
| 07/02/2002 | US6414366 Thin-film magnetic head wafer and manufacturing method of thin-film magnetic head |
| 06/27/2002 | US20020082801 Shape measuring method, shape measuring unit, exposure method, exposure apparatus and device manufacturing method |
| 06/27/2002 | US20020081506 Method for producing a semiconductor device |
| 06/27/2002 | US20020081017 Image registration using binned substrate parameters |
| 06/27/2002 | US20020080365 Method of measuring alignment of a substrate with respect to a reference alignment mark |
| 06/27/2002 | US20020080364 Method of measuring overlay |
| 06/27/2002 | US20020079467 Alignment-mark patterns defined on a stencil reticle and detectable, after lithographic transfer to a substrate, using an optical-based detector |
| 06/27/2002 | US20020079462 Alignment mark detection method, and alignment method, exposure method and device, and device production method, making use of the alignment mark detection method |
| 06/27/2002 | US20020079276 Substrate positioning apparatus and exposure apparatus |
| 06/26/2002 | EP1217448A2 Exposure method and system |
| 06/26/2002 | EP1216435A1 Method for synchronising positioning and exposure processes |
| 06/25/2002 | USRE37762 Scanning exposure apparatus and exposure method |
| 06/25/2002 | US6411387 Stage apparatus, projection optical apparatus and exposure method |
| 06/20/2002 | WO2002049083A1 Position measuring method, exposure method and system thereof, device production method |
| 06/20/2002 | WO2002048798A1 Self-compensating mark arangement for stepper alignment |
| 06/20/2002 | WO2002047919A1 Backing layer of a donor element for adjusting the focus on an imaging laser |
| 06/20/2002 | WO2002047918A1 Donor element for adjusting the focus of an imaging laser |
| 06/20/2002 | US20020076896 Method of alignment for buried structures formed by surface transformation of empty spaces in solid state materials |
| 06/20/2002 | US20020076629 Exposure method and exposure system the same |
| 06/19/2002 | CN1354395A Regulating device and method of position deviation optical detecting device |
| 06/18/2002 | US6407814 Method for correcting alignment, method for manufacturing a semiconductor device and a semiconductor device |
| 06/18/2002 | US6406820 Transferring pattern formed on a mask onto a substrate |
| 06/18/2002 | US6406583 Wafer level creation of multiple optical elements |
| 06/13/2002 | WO2002047133A1 Substrate, position measuring method, position measuring device, exposure method and exposure system and device production method |
| 06/13/2002 | WO2002047132A1 X-ray projection exposure device, x-ray projection exposure method, and semiconductor device |
| 06/13/2002 | WO2002047131A1 Electron beam exposure system, irradiating position detecting method, and electron detector |
| 06/13/2002 | WO2002047130A1 Observation device and its manufacturing method, exposure device, and method for manufacturing micro device |
| 06/13/2002 | WO2002046843A1 Method of aligning a photolithographic mask to a crystal plane |
| 06/13/2002 | US20020072193 Method of aligning a photolithographic mask to a crystal plane |
| 06/13/2002 | US20020070355 Exposure method and apparatus, method of making exposure apparatus, device and device manufacturing method |
| 06/13/2002 | US20020070354 Manufacturing method of mask for electron beam proximity exposure and mask |
| 06/11/2002 | US6405096 Method and apparatus for run-to-run controlling of overlay registration |
| 06/11/2002 | US6404505 Positioning stage system and position measuring method |
| 06/11/2002 | US6403973 Electron beam exposure method and apparatus and semiconductor device manufactured using the same |
| 06/11/2002 | US6403477 Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reduction |
| 06/06/2002 | US20020067490 Pattern inspecting apparatus, pattern inspecting method, aligner, and method of manufacturing electronic device |
| 06/06/2002 | US20020067473 Reference plate, exposure apparatus, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 06/06/2002 | DE10044199A1 Teilchenoptische Komponente und System mit Teilchenoptischer Komponente A particle component and system with particle-component |
| 06/05/2002 | EP1210652A2 Method and system for selective linewidth optimization during a lithographic process |
| 06/04/2002 | US6400456 Plane positioning apparatus |
| 06/04/2002 | US6400445 Method and apparatus for positioning substrate |
| 06/04/2002 | US6400441 Projection exposure apparatus and method |
| 06/04/2002 | US6399285 Method for forming a thin film and for manufacturing a thin film |
| 06/04/2002 | US6399281 Composite relief image printing plates |
| 06/04/2002 | US6399256 Reticle having accessory pattern divided into sub-patterns |
| 05/30/2002 | WO2002043123A1 Aligner, aligning method and method for fabricating device |
| 05/30/2002 | US20020066070 Semiconductor structures and manufacturing methods |
| 05/30/2002 | US20020064890 Thin-film magnetic head wafer and manufacturing method of thin-film magnetic head |
| 05/30/2002 | US20020064718 Mark is formed in layer of photoresist for positioning mask prior to radiation exposure |
| 05/30/2002 | US20020063974 Alignment mark system for mass transport processes |
| 05/30/2002 | US20020063865 Exposure apparatus and a device manufacturing method using the same |
| 05/29/2002 | EP1208592A1 Method and apparatus for run-to-run controlling of overlay registration |
| 05/28/2002 | US6396568 Exposure apparatus and method |
| 05/28/2002 | US6395617 Method of manufacturing semiconductor device |
| 05/28/2002 | US6395432 Forming semiconductor using mask; detection radiation intensity profile |
| 05/23/2002 | WO2002041373A1 Electron beam correction method and electron beam exposure system |
| 05/23/2002 | WO2002041082A1 Method for aligning a semiconductor wafer |
| 05/23/2002 | US20020062204 Position measuring device, position measurement method, exposure apparatus, exposure method, and superposition measuring device and superposition measurement method |
| 05/23/2002 | US20020060793 Optical positional displacement measuring apparatus and adjustment method thereof |
| 05/23/2002 | US20020060296 Lithographic apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured thereby |
| 05/22/2002 | EP1207426A1 Method for aligning a semiconductor wafer |
| 05/21/2002 | US6392752 Phase-measuring microlens microscopy |
| 05/21/2002 | US6392300 Semiconductor device having an alignment mark formed on the uppermost layer of a multilayer wire |
| 05/21/2002 | US6392240 Sample table for pattern exposure machine |
| 05/21/2002 | US6391502 Photolithographic process for producing etched patterns on the surface of fine tubes, wires or other three dimensional structures |
| 05/16/2002 | WO2002039794A2 System and method for fabricating printed circuit boards |
| 05/16/2002 | WO2002039793A2 Multi-layer printed circuit board fabrication system and method |
| 05/16/2002 | WO2002039326A1 System and method for monitoring and improving dimensional stability and registration accuracy of multi-layer pcb manufacture |
| 05/16/2002 | WO2002039182A1 Systems and methods for exposing substrate periphery |
| 05/16/2002 | WO2002039066A1 Position measuring device and method for determining a position |
| 05/16/2002 | US20020058400 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 05/16/2002 | US20020057424 Exposure apparatus, method of manufacturing semiconductor devices, semiconductor manufacturing plant, method of maintaining exposure apparatus, and position detector |
| 05/16/2002 | US20020056813 Target locking system for electron beam lithography |
| 05/16/2002 | US20020056205 Alignment marks |
| 05/15/2002 | EP1205807A1 Exposure apparatus and exposure method |
| 05/15/2002 | EP1204875A1 System for aligning rectangular wafers |
| 05/14/2002 | US6388735 Projection exposure system |
| 05/14/2002 | US6388341 Semiconductor device |
| 05/14/2002 | US6387579 Method for direct image processing of printed circuit boards |
| 05/10/2002 | WO2002037555A1 Wafer prealignment apparatus, its method for judging wafer presence, method for sensing wafer edge position, computer-readable record medium with recorded program for executing this position sensing method, apparatus for sensing wafer edge position, and prealignment sensor |
| 05/09/2002 | US20020055789 System and method for side to side registration in a printed circuit imager |
| 05/09/2002 | US20020055048 For transferring a pattern onto a photosensitive layer by a photolithography process |