| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 09/26/2002 | US20020137240 Reducing asymmetrically deposited film induced registration error |
| 09/26/2002 | US20020137237 Reducing asymmetrically deposited film induced registration error |
| 09/26/2002 | US20020136971 Manufacturing system in electronic devices |
| 09/26/2002 | US20020135745 Multibeam scanning device for scanning a photosensitive material with a multi-spot array, and method of correcting the position of image points of the multi-spot array |
| 09/25/2002 | EP1243969A1 Lithographic projection apparatus and positioning system |
| 09/25/2002 | EP1090329A4 Alignment simulation |
| 09/25/2002 | CN1371028A Exposure equipment with interferometer system |
| 09/24/2002 | US6456953 Method for correcting misalignment between a reticle and a stage in a step-and-repeat exposure system |
| 09/24/2002 | US6456378 Semiconductor wafer alignment methods and semiconductor wafer alignment tools |
| 09/24/2002 | US6456374 Exposure apparatus and a device manufacturing method using the same |
| 09/24/2002 | US6456360 Projection exposure apparatus and method |
| 09/24/2002 | US6455214 Utilizing configuration which can effectively prevent color inconsistencies from occurring due to defocusing upon exposure |
| 09/24/2002 | US6455212 Mark is formed in layer of photoresist for positioning mask prior to radiation exposure |
| 09/24/2002 | US6455211 Pattern transfer method and apparatus, and device manufacturing method |
| 09/19/2002 | US20020132409 Substrate processing apparatus |
| 09/19/2002 | US20020132172 Semiconductor mask alignment system |
| 09/19/2002 | US20020131632 Method and apparatus of registering a printed circuit board |
| 09/19/2002 | US20020130425 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 09/18/2002 | EP1240557A1 Imaging method using phase boundary masking with modified illumination |
| 09/18/2002 | EP1240550A2 High precision orientation alignment and gap control stages for imprint lithography processes |
| 09/18/2002 | CN1369747A Exposure method and exposure device |
| 09/17/2002 | US6453000 Exposure method, exposure device and semiconductor device manufacturing method |
| 09/12/2002 | US20020128733 Moving/guiding apparatus and exposure apparatus using the same |
| 09/12/2002 | US20020127865 Lithography method for forming semiconductor devices with sub-micron structures on a wafer and apparatus |
| 09/12/2002 | US20020127815 Method for forming protrusive alignment-mark |
| 09/12/2002 | US20020127486 Suitable for a pattern formation on a semiconductor wafer |
| 09/12/2002 | US20020127483 For use in semiconductor device |
| 09/11/2002 | CN1368661A Optical nearby correcting method based on contact hole model |
| 09/10/2002 | US6449030 Balanced positioning system for use lithographic apparatus |
| 09/10/2002 | US6449029 Apparatus for providing levelling and focusing adjustments on a semiconductor wafer |
| 09/06/2002 | WO2002069053A2 Method and apparatus for registration control in production by imaging |
| 09/06/2002 | WO2002069049A2 Simultaneous imaging of two reticles |
| 09/06/2002 | WO2002069047A1 Method for exposing at least one or at least two semiconductor wafers |
| 09/05/2002 | US20020123012 For simultaneously imaging at least two reticles onto a substrate; lithographic system |
| 09/05/2002 | US20020122163 Position Detecting method optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method |
| 09/03/2002 | US6444995 Focussing method and system of exposure apparatus |
| 08/29/2002 | WO2002067055A2 Template for room temperature, low pressure micro- and nano-imprint lithography |
| 08/29/2002 | WO2002039794A3 System and method for fabricating printed circuit boards |
| 08/29/2002 | US20020118350 Method and apparatus for registration control in production by imaging |
| 08/29/2002 | US20020118349 Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method |
| 08/29/2002 | US20020118347 Aligner |
| 08/29/2002 | US20020117903 Linear motor and stage apparatus, exposure apparatus, and device manufacturing method using the same |
| 08/28/2002 | EP1235116A1 Determining a corrected position from a measured position of an alignment mark |
| 08/28/2002 | EP1235109A1 Method for exposing at least one or at least two semiconductor wafers |
| 08/28/2002 | EP1234216A1 Method and apparatus for aligning a crystalline substrate |
| 08/27/2002 | US6440821 Method and apparatus for aligning wafers |
| 08/27/2002 | US6440620 Electron beam lithography focusing through spherical aberration introduction |
| 08/22/2002 | US20020115002 Template for room temperature, low pressure micro-and nano-imprint lithography |
| 08/22/2002 | US20020113218 Method and apparatus for positioning substrate and the like |
| 08/20/2002 | US6437852 Exposure system |
| 08/20/2002 | US6437463 Wafer positioner with planar motor and mag-lev fine stage |
| 08/20/2002 | US6437354 Exposure method and scanning-type exposure apparatus |
| 08/20/2002 | US6437347 Target locking system for electron beam lithography |
| 08/15/2002 | US20020110754 Dielectrics; radiation transparent; chemical resistance |
| 08/15/2002 | US20020109850 Exposure apparatus including interferometer system |
| 08/15/2002 | US20020109827 Exposure apparatus and method |
| 08/15/2002 | US20020109825 Lithographic apparatus |
| 08/15/2002 | US20020109824 Exposure apparatus and exposure method |
| 08/14/2002 | EP1231769A2 Multiple beam scanning apparatus for scanning photosensitive material with a multi spot array and method of correcting the positions of picture elements produced thereby |
| 08/14/2002 | EP1231513A1 Lithographic projection apparatus with adjustable focal surface |
| 08/14/2002 | DE10105978A1 Mehrstrahl-Abtastvorrichtung zur Abtastung eines fotoempfindlichen Materials mit einem Multi-Spot-Array sowie Verfahren zur Korrektur der Position von Bildpunkten des Multi-Spot-Arrays Multi-beam scanning device for scanning a photosensitive material with a multi-spot array and method for correcting the position of pixels of the multi-spot array |
| 08/14/2002 | CN1364246A Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 08/13/2002 | US6433872 Exposure method and apparatus |
| 08/13/2002 | US6433352 Method of positioning semiconductor wafer |
| 08/13/2002 | US6433351 Exposure apparatus and control method for correcting an exposure optical system on the basis of an estimated magnification variation |
| 08/13/2002 | US6432790 Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device |
| 08/08/2002 | WO2002061367A1 Method and device for detecting position, method and device for exposure, and program and information recording medium |
| 08/08/2002 | US20020106830 Process for producing optical article |
| 08/08/2002 | US20020106818 Method of manufacturing semiconductor device and apparatus of automatically adjusting semiconductor pattern |
| 08/07/2002 | EP1228402A1 Composite relief image printing elements |
| 08/07/2002 | CN1088854C Reticle |
| 08/06/2002 | US6430464 Stepper alignment process |
| 08/01/2002 | WO2002059696A1 Method of alignment |
| 08/01/2002 | WO2001088469A8 Interferometric apparatus and method |
| 08/01/2002 | US20020102812 Method for improving alignment precision in forming color filter array |
| 08/01/2002 | US20020102477 Semiconductor device manufacturing method |
| 08/01/2002 | US20020101572 Projection exposure method and apparatus |
| 08/01/2002 | CA2434978A1 Method of alignment |
| 07/31/2002 | CN1361450A Optical proximity effect correcting method |
| 07/30/2002 | US6426788 Stage device and exposure apparatus using the same |
| 07/30/2002 | US6426508 Surface-position detection device, a projection exposure apparatus using the device, and a device manufacturing method using the apparatus |
| 07/30/2002 | US6425280 Wafer alignment jig for wafer-handling systems |
| 07/25/2002 | US20020100013 Exposure processing method and exposure system for the same |
| 07/25/2002 | US20020098707 Design of lithography alignment and overlay measurement marks on CMP finished damascene surface |
| 07/25/2002 | US20020097386 Detection apparatus and exposure apparatus using the same |
| 07/24/2002 | EP1225493A2 Alignment apparatus and method |
| 07/23/2002 | US6424404 Multi-stage microlens array |
| 07/18/2002 | US20020095234 Marke detection method and unit, exposure method and apparatus, and device manufacturing method and device |
| 07/18/2002 | US20020094679 Alignment mark and exposure alignment system and method using the same |
| 07/18/2002 | US20020093635 Position detection apparatus having a plurality of detection sections, and exposure apparatus |
| 07/18/2002 | US20020093122 camouflaging surface treatments having reduced visibility to vision enhancing devices, and surfaces providing reduced muffling |
| 07/18/2002 | US20020093110 Reticle and method of fabricating semiconductor device |
| 07/17/2002 | EP1223471A1 Substrate positioning apparatus and exposure apparatus |
| 07/17/2002 | EP1223469A1 Lithographic apparatus |
| 07/17/2002 | EP1115545B1 Device and method for transferring microstructures |
| 07/17/2002 | CN1359533A Method and apparatus for detecting mark, exposure method and apparatus, and production method for device and device |
| 07/16/2002 | US6421124 Position detecting system and device manufacturing method using the same |
| 07/16/2002 | US6421123 Position detecting apparatus |
| 07/11/2002 | WO2002054462A1 Stage device, exposure device, method of adjusting multipoint position detection system, exposure method, and device manufacturing method |
| 07/11/2002 | US20020091986 Process window based optical proximity correction of lithographic images |