G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
11/2002
11/28/2002	US20020176096 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/28/2002	US20020176082 Exposure method and apparatus
11/28/2002	US20020175300 Position detection method and apparatus
11/28/2002	US20020175295 Method for aligning electron beam projection lithography tool
11/28/2002	DE10122843A1 Exposure mask has alignment pattern with outer radiation transmissive area of row section and adjacent area of pattern at greater or lesser distance than adjacent areas within section
11/27/2002	EP1260871A2 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/27/2002	EP1260870A1 Alignment mark
11/27/2002	EP1260869A1 Substrate provided with an alignment mark in a substantially transparent process layer
11/27/2002	EP1260865A2 Device for exposure of a peripheral area of a wafer
11/27/2002	CN1095095C Device for supporting artwork for light exposure installation of flat piece
11/26/2002	US6486956 Reducing asymmetrically deposited film induced registration error
11/26/2002	US6486955 Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device
11/26/2002	US6486954 Overlay alignment measurement mark
11/26/2002	US6485153 Exposure apparatus and method
11/26/2002	CA2105653C Registration system
11/21/2002	WO2002093626A1 Aligning method and aligner, and method and system for conveying substrate
11/21/2002	WO2002093567A2 Focus error correction method and apparatus
11/21/2002	WO2002093485A1 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
11/21/2002	WO2002093464A1 Automatic template generation and searching method
11/21/2002	WO2002093253A1 Backside alignment system and method
11/21/2002	US20020172876 Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby
11/21/2002	US20020171818 Optical exposure method, device manufacturing method and lithographic projection apparatus
11/21/2002	US20020171028 Focus error correction method and apparatus
11/21/2002	US20020170880 Scanning probe based lithographic alignment
11/20/2002	EP1258834A1 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
11/19/2002	US6483936 Monitor pattern for photolithography
11/19/2002	US6483572 Reticle alignment system for use in lithography
11/19/2002	US6483571 Exposure apparatus and method for transferring a pattern from a plurality of masks onto at least one substrate
11/19/2002	US6482713 Shot averaging for fine pattern alignment with minimal throughput loss
11/19/2002	US6482572 Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication
11/19/2002	US6481720 Stern tube sealing apparatus
11/14/2002	US20020167651 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/14/2002	US20020167649 Backside alignment system and method
11/14/2002	US20020167117 Depositing film on substrate to provide a mold having a protruding feature and recess; urging mold into film whereby thickness of film under protruding feature is reduced and thin region is formed in film; removing mold; processing relief
11/14/2002	US20020166982 Exposure method, plane alignment method, exposure apparatus, and device manufacturing method
11/14/2002	US20020166978 Aligner
11/13/2002	EP1256849A1 Method of calibrating a lithographic apparatus
11/13/2002	EP1256843A1 Method of calibrating a lithographic apparatus
11/13/2002	CN1379866A Beam positioning in microlithographic writing
11/13/2002	CN1094252C 半导体器件和制造半导体器件的方法 The method of manufacturing a semiconductor device and a semiconductor device
11/12/2002	US6481003 Alignment method and method for producing device using the alignment method
11/12/2002	US6479991 Stage mechanism, exposure apparatus and device manufacturing method in which a coil unit of a driving mechanism is moved substantially in synchronism with a stage
11/12/2002	US6479904 Semiconductor device with registration accuracy measurement mark
11/12/2002	US6479832 Surface height detecting apparatus and exposure apparatus using the same
11/12/2002	US6479201 Optical exposure apparatus of scanning exposure system and its exposing method
11/07/2002	US20020163628 Transfer apparatus and transfer method
11/06/2002	CN1378662A Composite relief image printing elements
11/06/2002	CN1378102A Method for reducing optical proximity effect
11/06/2002	CN1093945C Device for light exposure double-sided printed circuit plate through wiring artworks
11/05/2002	US6474236 Plate material placement apparatus and method
10/2002
10/31/2002	US20020160274 Method of reshaping a patterned organic photoresist surface
10/31/2002	US20020158185 Method and system for improving focus accuracy in a lithography system
10/31/2002	DE10064292C1 Vorrichtung zum Transportieren eines Filmes An apparatus for transporting a film
10/30/2002	EP1253471A2 Method and system for improving focus accuracy in a lithography system
10/30/2002	EP1252554A1 Nonlinear image distortion correction in printed circuit board manufacturing
10/29/2002	US6473161 Lithographic projection apparatus, supporting assembly and device manufacturing method
10/29/2002	US6473156 Scanning exposure apparatus and device manufacturing method
10/29/2002	US6472777 Capacitive sensor calibration method and apparatus for opposing electro-magnetic actuators
10/29/2002	US6472121 Photocurable elements
10/29/2002	US6472112 Method for measuring reticle leveling in stepper
10/24/2002	WO2002084719A1 Electron beam exposing device and exposure method
10/24/2002	WO2002084213A1 Periodic patterns and technique to control misalignment
10/24/2002	WO2002039793A3 Multi-layer printed circuit board fabrication system and method
10/24/2002	DE10115888A1 Individual mark calibration method for photo-masks used in semiconductor integrated circuit production where an offset value is first determined by measurement of the same structure optically and using an SEM or AFM
10/24/2002	DE10115281A1 Verfahren zur Overlayeinstellung zweier Maskenebenen bei einem photolithographischen Prozess zur Herstellung einer integrierten Schaltung Method for setting overlay of two mask layers in a photolithographic process for manufacturing an integrated circuit
10/23/2002	EP1250630A1 Mountable and removable sensor
10/23/2002	CN1376276A A photolithography mask having a subresolution alignment mark window
10/23/2002	CN1375860A System for making electronic apparatus
10/22/2002	US6470489 Design rule checking system and method
10/22/2002	US6469830 Display screen and method of manufacture therefor
10/22/2002	US6469793 Multi-channel grating interference alignment sensor
10/22/2002	US6469775 Photolithographic device is registered to the wafer-in-process to prevent radiant energy from being directly transmitted into the photoresist material overlaying the vias.
10/22/2002	US6468704 Method for improved photomask alignment after epitaxial process through 90° orientation change
10/17/2002	WO2002082188A2 Substrate alignment
10/17/2002	US20020151118 Thin-film magnetic head wafer and manufacturing method of thin-film magnetic head
10/17/2002	US20020149755 Scanning exposure apparatus
10/17/2002	US20020149122 Alignment mark and aligning method using the same
10/15/2002	US6466301 Transfer apparatus and transfer method
10/15/2002	US6465897 Method for photo alignment after CMP planarization
10/10/2002	WO2002079882A2 Lithography method
10/10/2002	WO2002079880A2 Method for adjusting the overlay of two masking planes in a photolithographic process
10/10/2002	WO2002067055A3 Template for room temperature, low pressure micro- and nano-imprint lithography
10/10/2002	US20020147520 Computer program for determining a corrected position of a measured alignment mark, device manufacturing method, and device manufactured thereby
10/10/2002	US20020146889 Process for implanting a deep subcollector with self-aligned photo registration marks
10/10/2002	US20020145722 Lithographic projection apparatus positioning system, method of manufacturing, device manufactured thereby and computer program
10/10/2002	US20020145716 Exposure method and apparatus, and device manufacturing method
10/09/2002	EP1248152A2 X/Y stage and exposure apparatus using the same
10/08/2002	US6463184 Method and apparatus for overlay measurement
10/08/2002	US6462818 Overlay alignment mark design
10/08/2002	US6460265 Double-sided wafer exposure method and device
10/03/2002	WO2002077922A1 Image detection method, image detection apparatus, and wafer treatment apparatus
10/03/2002	WO2002077911A1 Automatic detection of alignment or registration marks
10/03/2002	WO2002077716A2 Scanning probe based lithographic alignment
10/03/2002	WO2002077485A1 Multiple chamber fluid mount
10/03/2002	US20020142561 Method for improving a stepper signal in a planarized surface over alignment topography
10/03/2002	US20020142511 Method of fabricating semiconductor device having alignment mark
10/03/2002	US20020142235 Photo mask for fabricating semiconductor device having dual damascene structure
10/03/2002	US20020140916 Multiple chamber fluid mount
10/02/2002	EP1105780A4 Reaction force isolation system for a planar motor
09/2002
09/26/2002	US20020137303 Reducing asymmetrically deposited film induced registration error

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