| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/06/2003 | US20030025891 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/05/2003 | EP1025464A4 Composite relief image printing plates |
| 02/04/2003 | US6515733 Pattern exposure apparatus for transferring circuit pattern on semiconductor wafer and pattern exposure method |
| 02/04/2003 | US6515295 Device for exposure of the peripheral area of a film circuit board |
| 02/04/2003 | US6514851 Method of fabrication of multilayer semiconductor wiring structure with reduced alignment mark area |
| 02/04/2003 | US6514122 System for manufacturing semiconductor device utilizing photolithography technique |
| 01/30/2003 | WO2001088467A9 Data age adjustments |
| 01/30/2003 | US20030022077 Wafer is located in a plane where spherical aberrations of the projection column reduce a negative defocussing effect caused by chromatic aberrations in the projection column |
| 01/30/2003 | US20030020891 Substrate holding apparatus and exposure apparatus using the same |
| 01/30/2003 | US20030020889 Stage unit, measurement unit and measurement method, and exposure apparatus and exposure method |
| 01/30/2003 | US20030020184 Substrate provided with an alignment mark, method of designing a mask, computer program, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 01/29/2003 | EP1280188A2 Substrate holding apparatus and exposure apparatus |
| 01/29/2003 | EP0980583A4 X-ray tube and microelectronics alignment process |
| 01/28/2003 | US6512780 System for compensating directional and positional fluctuations in light produced by a laser |
| 01/23/2003 | US20030016342 Aligner |
| 01/22/2003 | EP1278104A1 Grating-grating interferometric alignment system |
| 01/22/2003 | EP1278103A1 Lithographic apparatus |
| 01/21/2003 | US6509953 Apparatus for exposing a pattern onto an object with controlled scanning |
| 01/21/2003 | US6509952 Method and system for selective linewidth optimization during a lithographic process |
| 01/21/2003 | US6509577 Systems and methods for exposing substrate periphery |
| 01/21/2003 | US6509571 Proximity exposure method by oblique irradiation with light |
| 01/21/2003 | US6509247 Semiconductor device and alignment method |
| 01/16/2003 | WO2003004967A1 Position detection apparatus, position detection method, and electr5onic part convey apparatus |
| 01/16/2003 | WO2003004966A1 Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components |
| 01/16/2003 | US20030013303 Full image exposure of field with alignment marks |
| 01/16/2003 | US20030013267 Shot averaging for fine pattern alignment with minimal throughput loss |
| 01/16/2003 | US20030011889 Wafer level creation of multiple optical elements |
| 01/16/2003 | US20030011771 Exposure apparatus and exposure method |
| 01/16/2003 | US20030010936 Optically detectable alignment marks producing an enhanced signal-amplitude change from scanning of a detection light over the alignment mark, and associated alighment-detection methods |
| 01/15/2003 | EP1276014A1 Method of detecting a raised area of a semiconductor wafer |
| 01/14/2003 | US6507405 Fiber-optic interferometer employing low-coherence-length light for precisely measuring absolute distance and tilt |
| 01/14/2003 | US6507388 Interferometric alignment system for use in vacuum-based lithographic apparatus |
| 01/14/2003 | US6506544 Exposure method and exposure apparatus and mask |
| 01/09/2003 | WO2003003457A2 Design of lithography alignment and overlay measurement marks on damascene surface |
| 01/09/2003 | WO2002093567A3 Focus error correction method and apparatus |
| 01/09/2003 | US20030007596 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 01/09/2003 | US20030007156 Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components |
| 01/09/2003 | US20030007153 Alignment system of semiconductor exposure apparatus and diaphragm unit of the alignment system |
| 01/08/2003 | EP1274121A1 Wafer chuck for supporting a semiconductor wafer |
| 01/07/2003 | US6504608 Optical measurement arrangement and method for inclination measurement |
| 01/07/2003 | US6504599 Nm-order alignment precision; spring constants. |
| 01/07/2003 | US6504160 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device |
| 01/07/2003 | US6503664 Thin film materials for the preparation of attenuating phase shift masks |
| 01/07/2003 | US6502511 Printing plate processing apparatus and method of detecting the location of a register mark on a printing plate |
| 01/02/2003 | US20030005405 Method for improving substrate alignment |
| 01/02/2003 | US20030003677 Alignment method, exposure apparatus and device fabrication method |
| 01/02/2003 | US20030003676 Ultra-fine alignment system and method using acoustic-AFM interaction |
| 01/02/2003 | US20030003384 Aligning method, exposure method, exposure apparatus, and device manufacturing method |
| 01/02/2003 | US20030002973 Wafer handling system and wafer handling method |
| 01/02/2003 | US20030002043 Periodic patterns and technique to control misalignment |
| 01/02/2003 | US20030001107 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 12/31/2002 | US6501533 Scanning type exposure apparatus and method |
| 12/31/2002 | US6501189 Alignment mark of semiconductor wafer for use in aligning the wafer with exposure equipment, alignment system for producing alignment signals from the alignment mark, and method of determining the aligned state of a wafer from the alignment mark |
| 12/31/2002 | US6501188 Method for improving a stepper signal in a planarized surface over alignment topography |
| 12/31/2002 | US6500591 Forming plurality of latent images in resist on substrate which cover printing field of lens system of lithographic tool, each image having associated focus, determining scattered energy as function of associated focus, averaging |
| 12/26/2002 | US20020197819 Method of manufacturing semiconductor device including a step of forming element isolation trench and semiconductor device |
| 12/26/2002 | US20020197548 Especially for use with a scanning-type exposure apparatus. |
| 12/26/2002 | US20020196421 Stage device, exposure apparatus and method |
| 12/26/2002 | US20020196416 Projection exposure method and apparatus |
| 12/24/2002 | US6498685 Maskless, microlens EUV lithography system |
| 12/24/2002 | US6498640 Method to measure alignment using latent image grating structures |
| 12/24/2002 | US6498401 Alignment mark set and method of measuring alignment accuracy |
| 12/24/2002 | US6498352 Method of exposing and apparatus therefor |
| 12/24/2002 | US6498350 Crash prevention in positioning apparatus for use in lithographic projection apparatus |
| 12/24/2002 | US6497995 Method of machining glass |
| 12/24/2002 | US6497994 Photolithographic process for the formation of a one-piece needle |
| 12/19/2002 | WO2002101464A2 Optical proximity correction for phase shifting photolithographic masks |
| 12/19/2002 | WO2000043731A9 Multiple alignment mechanisms near shared processing device |
| 12/19/2002 | US20020192926 High contrast lithography alignment marks for semiconductor manufacturing |
| 12/19/2002 | US20020192577 Forming first separated features on a surface, forming second separated features on surface interleaved between first separated features, and illuminating first and second separated features and detecting an interference pattern |
| 12/19/2002 | US20020192573 Exposure mask, method for manufacturing the mask, and exposure method |
| 12/19/2002 | US20020191180 Exposure apparatus and a device manufacturing method using the same |
| 12/19/2002 | US20020191173 Balanced positioning system for use in lithographic apparatus |
| 12/18/2002 | EP1267212A2 Lithographic apparatus and device manufacturing method |
| 12/17/2002 | US6495928 Transfer mark structure for multi-layer interconnecting and method for the manufacture thereof |
| 12/17/2002 | US6495847 Stage control apparatus and exposure apparatus |
| 12/16/2002 | CA2357430A1 Media improvements to enhance optical auto-focus performance |
| 12/12/2002 | US20020188924 Optical proximity correction for phase shifting photolithographic masks |
| 12/12/2002 | US20020187410 Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication |
| 12/12/2002 | US20020187409 Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication |
| 12/11/2002 | EP1265271A1 X-ray projection exposure device, x-ray projection exposure method, and semiconductor device |
| 12/11/2002 | EP1265107A2 Position detection method and apparatus |
| 12/11/2002 | CN1096173C Automatic scanning figure registration device and method |
| 12/10/2002 | US6493065 Alignment system and alignment method in exposure apparatus |
| 12/10/2002 | US6493064 Method and apparatus for registration control in production by imaging |
| 12/10/2002 | US6493059 Installation for exposing a double-sided printed circuit card to light |
| 12/10/2002 | US6492071 Wafer scale encapsulation for integrated flip chip and surface mount technology assembly |
| 12/10/2002 | US6492068 Etching method for production of semiconductor devices |
| 12/05/2002 | WO2002097534A2 Apparatus and method for aligning an article with a reference object |
| 12/05/2002 | WO2002097366A1 Observation device using light and x-ray, exposure system and exposure method |
| 12/05/2002 | WO2002097363A1 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus |
| 12/05/2002 | US20020184605 Method and apparatus of evaluating layer matching deviation based on CAD information |
| 12/05/2002 | US20020182821 Method of manufacturing an alignment mark |
| 12/05/2002 | US20020182545 Exposing a partial area of a resist film formed on a surface of a substrate to light of different intensities; developing the resist film exposed |
| 12/05/2002 | US20020182518 High reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, comprising scattering structures for scattering and absorbing radiation |
| 12/05/2002 | US20020180983 Shape measuring apparatus, shape measuring method, and aligning method |
| 12/05/2002 | US20020180067 Semiconductor device and alignment sensing method for semiconductor device |
| 12/05/2002 | US20020178600 Method of manufacturing alignment mark |
| 12/04/2002 | EP1263028A1 Exposure mask, method for manufacturing the mask, and exposure method |
| 12/03/2002 | US6490026 Method and system for aligning object to be processed with predetermined target article |