Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
04/2003
04/15/2003US6549268 Exposure method and apparatus
04/15/2003US6549266 Projection exposure method and apparatus
04/15/2003US6549023 Apparatus for measuring the focus of a light exposure system used for fabricating a semiconductor device
04/15/2003US6548847 Semiconductor integrated circuit device having a first wiring strip exposed through a connecting hole, a transition-metal film in the connecting hole and an aluminum wiring strip thereover, and a transition-metal nitride film between the aluminum wiring strip and the transition-metal film
04/10/2003US20030068833 Error reduction in semiconductor processes
04/10/2003US20030067604 Scan exposure apparatus and method, and device manufacturing method
04/10/2003US20030067591 Illumination optical system, exposure apparatus, and microdevice manufacturing method
04/09/2003EP1300880A2 Method for the photolithographic definition of a substrate area
04/09/2003CN1409175A Lighting optical system, exposure device and method for producing micro element
04/08/2003US6545369 Overlay error reduction by minimization of unpatterned wafer area
04/08/2003US6545284 Face position detection method and apparatus, and exposure method and exposure apparatus, a production method for an exposure apparatus and a production method for a semiconductor device
04/08/2003US6544698 For creating two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils
04/03/2003US20030064307 Process for forming latent image, process for detecting latent image, process and device for exposure, exposure apparatus, resist and substrate
04/03/2003US20030064306 For aligning a semiconductor wafer and photoresist wherein the frame is created to minimize an impact of film stack variations
04/03/2003US20030063289 Switching type dual wafer stage
04/02/2003EP1297954A2 Sheet member positioning device and image recording device
04/01/2003US6542237 Using mask; accurate pattern adjustment
04/01/2003US6542218 Photolithographic process for producing etched patterns on the surface of fine tubes, wires, or other three dimensional structures
04/01/2003US6541283 Method for determining magnification error portion of total misalignment error in a stepper
03/2003
03/27/2003WO2002023231A3 Generation of a library of periodic grating diffraction signals
03/27/2003US20030059726 Method of recording identifier and set of photomasks
03/27/2003US20030059691 Automatic measurement; calibration; adjustment accuracy; controlling exposure of optical pattern
03/27/2003US20030058423 Exposure apparatus, exposure method and process for producing device
03/27/2003US20030057452 Multilayer semiconductor wiring structure with reduced alignment mark area
03/27/2003US20030056671 Sheet member positioning device and image recording device
03/26/2003CN1406392A Exposure mask, method for manufacturing the mask, and exposure method
03/26/2003CN1405634A Mask-pattern correction method
03/25/2003US6539326 Position detecting system for projection exposure apparatus
03/25/2003US6539276 Semiconductor circuit having surface features and method of adjusting a tool with respect to this surface
03/25/2003US6538740 Adjusting method for position detecting apparatus
03/25/2003US6538721 Scanning exposure apparatus
03/25/2003US6538260 Position measuring method, and semiconductor device manufacturing method and apparatus using the same
03/25/2003US6537844 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
03/25/2003US6537836 Semiconductor structures and manufacturing methods
03/25/2003US6537835 Method of manufacturing semiconductor device and apparatus of automatically adjusting semiconductor pattern
03/20/2003US20030054574 Position detection apparatus, alignment apparatus and methods therefor, and exposure apparatus and device manufacturing method
03/20/2003US20030053678 Device for exposure of a strip-shaped workpiece with a meander correction device
03/20/2003US20030053060 Semiconductor wafer bearing alignment mark for use in aligning the wafer with exposure equipment, alignment system for producing alignment signals from the alignement mark, and method of determining the aligned state of a wafer from the alignemnt mark
03/20/2003US20030053059 Position detection apparatus and method, exposure apparatus, and device manufacturing method
03/20/2003US20030053058 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method
03/20/2003US20030053057 Position detection method and apparatus, and exposure method and apparatus
03/20/2003US20030053040 Focal point position detecting method in semiconductor exposure apparatus
03/20/2003US20030052548 Lithographic apparatus and motor for use in the apparatus
03/19/2003EP1293836A2 Device for exposure of a strip-shaped workpiece with a meander correction device
03/18/2003US6535280 Phase-shift-moiré focus monitor
03/18/2003US6535272 Position transducer and exposure apparatus with same
03/18/2003US6534777 Surface position detecting system and method having a sensor selection
03/18/2003US6534242 Multiple exposure device formation
03/18/2003US6534159 Side alignment mark
03/13/2003WO2003021360A2 Phase-shift-moire focus monitor
03/13/2003US20030048960 Exposure method and apparatus, and device manufacturing method using the same
03/13/2003US20030048444 Position measuring apparatus and exposure apparatus
03/13/2003US20030048425 Exposure apparatus, method of controlling same, and method of manufacturing devices
03/12/2003EP1291722A2 Method of recording identifier and set of photomasks
03/11/2003US6532056 Alignment system and projection exposure apparatus
03/11/2003US6531786 Durable reference marks for use in charged-particle-beam (CPB) microlithography, and CPB microlithography apparatus and methods comprising same
03/11/2003US6531706 Surface position detecting system and method having an optimum value
03/06/2003WO2003019272A2 Exposure mask
03/06/2003WO2002010721A3 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
03/06/2003US20030044698 Method for adjusting a multilevel phase-shifting mask or reticle
03/06/2003US20030043357 Vacuum chamber having instrument- mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same
03/06/2003US20030043356 Projection exposure apparatus and method
03/06/2003US20030042920 Exposure apparatus, control method for the same, and device fabricating method
03/06/2003US20030042627 Method of alignment for buried structures formed by surface transformation of empty spaces in solid state materials
03/04/2003US6529625 Position detecting method and position detecting device for detecting relative positions of objects having position detecting marks by using separate reference member having alignment marks
03/04/2003US6529274 System for processing semiconductor products
03/04/2003US6529263 Position detection apparatus having a plurality of detection sections, and exposure apparatus
03/04/2003US6528219 Dynamic alignment scheme for a photolithography system
03/04/2003US6528216 Phase shift mask and fabrication method thereof
02/2003
02/27/2003WO2003017006A2 A method of substrate processing and photoresist exposure
02/27/2003US20030039902 Method of machining glass
02/27/2003US20030039896 Exposure device, exposure method, semiconductor device manufacturing method, electro-optical device, and electronic appliance
02/26/2003EP1286220A2 Exposure apparatus and exposing method
02/26/2003EP1285223A2 Data age adjustments
02/26/2003EP1285222A1 Interferometric apparatus and method
02/26/2003EP1285221A1 In-situ mirror characterization
02/25/2003US6525818 Overlay alignment system using polarization schemes
02/25/2003US6525805 Backside alignment system and method
02/25/2003US6525804 Exposure device capable of aligning while moving mask
02/25/2003US6525802 Kinematic mounted reference mirror with provision for stable mounting of alignment optics
02/20/2003WO2003014660A1 Displacement detecting method, displacement detecting device and calibrating method thereof, and recording device of information recording medium original disk
02/20/2003WO2002082188A3 Substrate alignment
02/20/2003US20030036281 Method of substrate processing and photoresist exposure
02/20/2003US20030036270 Determining exposure time of wafer photolithography process
02/20/2003US20030035508 Exposure apparatus and exposing method
02/20/2003US20030035106 Phase-shifting alignment system
02/20/2003US20030035093 System and method for switching position signals during servo control of a device table
02/20/2003US20030034329 Lithographic method for molding pattern with nanoscale depth
02/18/2003US6522411 Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction
02/18/2003US6522003 Semiconductor device and method of manufacturing the same
02/18/2003US6521900 Alignment marks for charged-particle-beam microlithography, and alignment methods using same
02/18/2003US6521385 Using computers
02/13/2003US20030031940 Photolithographically created durable chromium-based laminate etch masks for use in microstructuring anodically bondable glass materials used in sensor fabrication, such as quartz and fused silica.
02/13/2003US20030031365 Multiple-exposure drawing apparatus and method thereof
02/11/2003US6519036 System for processing semiconductor products
02/06/2003WO2003010803A1 Exposure device, exposure method, method of producing semiconductor device, electrooptic device, and electronic equipment
02/06/2003WO2003010802A1 Stage apparatus, exposure system and exposure method, and device production method
02/06/2003US20030027064 Exposure method for correcting dimension variation in electron beam lithography, and recording medium for recording the same
02/06/2003US20030027059 Method for producing a mask and method for fabricating a semiconductor device
02/06/2003US20030025893 Projection exposure apparatus and projection exposure method
1 ... 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 ... 109