| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 06/17/2003 | US6581202 System and method for monitoring and improving dimensional stability and registration accuracy of multi-layer PCB manufacture |
| 06/17/2003 | US6580505 Overlay alignment mark design |
| 06/17/2003 | US6580494 Method and system of distortion compensation in a projection imaging expose system |
| 06/17/2003 | US6580491 Apparatus and method for compensating for distortion of a printed circuit workpiece substrate |
| 06/17/2003 | US6579738 Method of alignment for buried structures formed by surface transformation of empty spaces in solid state materials |
| 06/12/2003 | US20030107802 Display screen and method of manufacture therefor |
| 06/12/2003 | US20030107719 Correction of leveling tilt induced by asymmetrical semiconductor patterns |
| 06/11/2003 | CN1423831A Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice |
| 06/10/2003 | US6578190 Process window based optical proximity correction of lithographic images |
| 06/10/2003 | US6577994 Design rule generation system and recording medium recording program thereof |
| 06/10/2003 | US6577020 High contrast alignment marks having flexible placement |
| 06/10/2003 | US6576529 Method of forming an alignment feature in or on a multilayered semiconductor structure |
| 06/10/2003 | US6576378 Photomask and exposure method for large scaled LCD device |
| 06/05/2003 | WO2003046963A1 Exposure method and exposure apparatus using complementary division mask, and semiconductor device and method for making the same |
| 06/05/2003 | US20030104640 Method for improving substrate alignment |
| 06/05/2003 | US20030104292 Semiconductor device and fabrication method therefor |
| 06/05/2003 | US20030103196 Exposure method and exposure apparatus |
| 06/05/2003 | US20030102440 Method of aligning a wafer in a photolithography process |
| 06/04/2003 | CN1422395A Self-compensating mark arrangement for stepper alignment |
| 06/04/2003 | CN1421937A Position mask part of combine mask provided for producing organic luminous diode |
| 06/04/2003 | CN1421746A 曝光方法 Exposure method |
| 06/03/2003 | US6574524 Method of aligning dies of wafer(s) with exposure equipment in the fabricating of semiconductor devices |
| 06/03/2003 | US6573514 Method for aligning electron beam projection lithography tool |
| 06/03/2003 | US6573151 Method of forming zero marks |
| 06/03/2003 | US6573013 Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication |
| 05/30/2003 | WO2002069049A3 Simultaneous imaging of two reticles |
| 05/29/2003 | US20030098124 Aligning mask segments to provide a stitched mask for producing oled devices |
| 05/28/2003 | EP1315218A2 Aligning mask segments to provide a stitched mask for producing oled devices |
| 05/28/2003 | EP1314198A1 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 05/27/2003 | US6570641 Projection exposure apparatus |
| 05/27/2003 | US6569579 Exposure apparatus for a semiconductor wafer; photomask alignment |
| 05/22/2003 | WO2003042759A2 Manufacture of optical devices |
| 05/22/2003 | WO2003003457A3 Design of lithography alignment and overlay measurement marks on damascene surface |
| 05/22/2003 | US20030095241 Interferometric alignment system for use in vacuum-based lithographic apparatus |
| 05/22/2003 | US20030093894 Double layer patterning and technique for making a magnetic recording head |
| 05/21/2003 | EP1312474A1 Printing method and printing apparatus, and packing sheet material for printing plate material |
| 05/21/2003 | CN1419275A Marked location detector |
| 05/21/2003 | CN1419267A Focusing, position measuring, exposure and element making method and exposure device |
| 05/21/2003 | CN1419266A Exposure device, exposure method and element making method |
| 05/20/2003 | US6567719 Method and apparatus for creating an improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations |
| 05/20/2003 | US6566157 Alignment marks and method of forming the same |
| 05/20/2003 | US6566022 Forming adjustment mark; overcoating; flattening; coating with photosensitive materials; projecting masking pattern |
| 05/15/2003 | US20030093766 Alternating phase shift mask design with optimized phase shapes |
| 05/15/2003 | US20030090675 Interferometric methods and apparatus for determining object position while taking into account rotational displacements and warping of interferometer mirrors on the object |
| 05/15/2003 | US20030090662 Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same |
| 05/15/2003 | US20030090661 Focusing method, position-measuring method, exposure method, method for producing device, and exposure apparatus |
| 05/15/2003 | US20030090642 Alignment system and projection exposure apparatus |
| 05/15/2003 | US20030090640 Exposure method and apparatus |
| 05/14/2003 | EP1309897A2 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
| 05/14/2003 | EP0745211B1 Grating-grating interferometric alignment system |
| 05/13/2003 | US6563594 Mark position detecting system and method for detecting mark position |
| 05/13/2003 | US6563573 Method of evaluating imaging performance |
| 05/13/2003 | US6562691 Method for forming protrusive alignment-mark |
| 05/13/2003 | US6562528 Especially for use with a scanning-type exposure apparatus. |
| 05/08/2003 | US20030087193 Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography |
| 05/08/2003 | US20030087167 Method for fabricating a mask for semiconductor structures |
| 05/08/2003 | US20030087166 Reticle and a method for manufacturing a semiconductor device using the same |
| 05/08/2003 | US20030087073 Methods for producing pattern-forming body |
| 05/08/2003 | US20030086616 Automatic template generation and searching method |
| 05/08/2003 | US20030086600 Multi-layer printed circuit board fabrication system and method |
| 05/08/2003 | US20030086068 Mask-to-wafer alignment system |
| 05/08/2003 | US20030085363 Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform same |
| 05/07/2003 | EP1308789A2 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 05/07/2003 | CN1416019A 曝光方法和曝光装置 Exposure method and exposure apparatus |
| 05/06/2003 | USRE38113 Semiconductor element, a liquid crystal display element, a thin film magnetic head |
| 05/06/2003 | US6559927 Gap adjusting method in exposure apparatus |
| 05/06/2003 | US6559926 Pattern forming apparatus and pattern forming method |
| 05/06/2003 | US6559924 Alignment method, alignment apparatus, profiler, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 05/06/2003 | US6559465 Surface position detecting method having a detection timing determination |
| 05/06/2003 | US6558852 Exposure method, reticle, and method of manufacturing semiconductor device |
| 05/02/2003 | EP1307079A1 Marking apparatus used in a process for producing multi-layered printed circuit board |
| 05/02/2003 | EP1306213A2 Method and apparatus for detection of an edge of a printing plate mounted on a drum imaging system |
| 05/02/2003 | EP0910816B1 Composite relief image printing plates and methods for preparing same |
| 05/01/2003 | US20030082466 Wafer handling system and method for use in lithography patterning |
| 05/01/2003 | US20030081719 Marking apparatus used in a process for producing multi-layered printed circuit board |
| 05/01/2003 | US20030081213 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 05/01/2003 | US20030081192 Exposure apparatus and method using light having a wavelength less than 200 nm |
| 05/01/2003 | US20030081189 Apparatus and method for exposure |
| 05/01/2003 | US20030081188 That allows easy determination of the alignment marks when the mask is positioned to the workpiece, as well as an increase in the production rate capacity of the stepper without using an exposure device by which a fine pattern is formed |
| 05/01/2003 | US20030080472 Lithographic method with bonded release layer for molding small patterns |
| 05/01/2003 | US20030080471 Lithographic method for molding pattern with nanoscale features |
| 04/30/2003 | CN1414431A Marking equipment used in manufacturing process of multi-layer printed circuit board |
| 04/24/2003 | US20030077530 Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-partical-beam microlithography apparatus |
| 04/24/2003 | US20030077528 Photoresist latent image adjustment marks; laser adjustment beams |
| 04/24/2003 | US20030075696 Method and apparatus for detection of an edge of a printing plate mounted on a drum imaging system |
| 04/23/2003 | EP1304727A2 Wafer handling system and method for use in lithography patterning |
| 04/23/2003 | EP1304597A1 Lithographic apparatus and device manufacturing method |
| 04/23/2003 | EP1304596A2 Control system and semiconductor exposure apparatus |
| 04/23/2003 | CN1412622A Equipment management system and method, semiconductor exposure apparatus and management method, method for mfg. semiconductor |
| 04/22/2003 | US6552798 Position detecting method and system for use in exposure apparatus |
| 04/22/2003 | US6552790 Accuracy |
| 04/22/2003 | US6552775 Optical projecting system for projecting and synchronously scanning mask pattern; enhancing fineness |
| 04/22/2003 | US6552352 Aligner |
| 04/17/2003 | US20030071981 Devices and methods for compensating for tilting of a leveling table in a microlithography apparatus |
| 04/17/2003 | US20030071980 Apparatus control system, apparatus control method, semiconductor exposure apparatus, semiconductor exposure apparatus control method and semiconductor device manufacturing method |
| 04/17/2003 | US20030071542 Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same |
| 04/17/2003 | US20030071369 High contrast alignment marks having flexible placement |
| 04/17/2003 | US20030071231 Electron beam exposing method and exposure apparatus |
| 04/17/2003 | US20030071192 Thermal imaging medium absorbs radiation to suppress spurious reflections |
| 04/15/2003 | US6549269 Exposure apparatus and an exposure method |