Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
08/2003
08/28/2003US20030163794 Method and apparatus for prepareing patterns used for manufacture of semiconductor device
08/28/2003US20030160195 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using said exposure apparatus
08/27/2003EP1338924A2 Lithographic apparatus, alignment method and device manufacturing method
08/27/2003EP1337943A1 System and method for monitoring and improving dimensional stability and registration accuracy of multi-layer pcb manufacture
08/27/2003EP0906590B1 Lithographic projection apparatus with off-axis alignment unit
08/26/2003US6611316 Method and system for dual reticle image exposure
08/26/2003US6610461 Reticle having accessory pattern divided into sub-patterns
08/26/2003US6610448 Multilayer; multiple adjustment marks; accuracy
08/26/2003US6610166 Method for replicating optical elements, particularly on a wafer level, and replicas formed thereby
08/21/2003WO2003069276A1 Position measuring method, exposure method, and device producing method
08/21/2003US20030158710 Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus
08/21/2003US20030158701 Alignment method and apparatus therefor
08/21/2003US20030157780 Method of alignment for buried structures formed by surface transformation of empty spaces in solid state materials
08/21/2003US20030157416 Micro devices manufacturing method utilizing concave and convex alignment mark patterns
08/20/2003EP1336899A1 Lithographic apparatus, alignment method and device manufacturing method
08/19/2003US6608681 Exposure method and apparatus
08/19/2003US6608666 Reference plate, exposure apparatus, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
08/19/2003US6606792 Process to manufacturing tight tolerance embedded elements for printed circuit boards
08/14/2003US20030153114 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
08/13/2003EP1335249A1 Lithographic apparatus and device manufacturing method
08/13/2003EP1334330A1 Position measuring device and method for determining a position
08/13/2003EP1285221A4 In-situ mirror characterization
08/12/2003US6606145 Exposure apparatus, microdevice, photomask, and exposure method
08/12/2003US6605516 Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns
08/12/2003US6604465 Pin registration system for mounting different width printing plates
08/07/2003WO2003065120A2 Microcontact printing
08/07/2003WO2003065119A2 Overlay measurements using periodic gratings
08/07/2003US20030148197 Method for patterning semiconductors through adjustment of image peak side lobes
08/07/2003US20030147077 Mask alignment method
08/07/2003US20030147062 Stage control apparatus, exposure apparatus, and device manufacturing method
08/06/2003EP1333246A1 Position detection method, position detection device, exposure method, exposure system, control program, and device production method
08/06/2003CN1434932A Nonlinear image distortion correction in printed circuit board manufacturing
08/06/2003CN1434567A Etching method, etched product, piezoelectric vibration device and making method thereof
08/05/2003US6603882 Automatic template generation and searching method
08/05/2003US6602641 Wafer's zero-layer and alignment mark print without mask when using scanner
08/05/2003US6601314 Method of manufacturing alignment mark
07/2003
07/31/2003WO2003062919A1 Lacquer layer deposition
07/31/2003US20030143469 Grade tie bar only (GTO) and graded grade tie bar only (GGTO) aperture masks
07/31/2003US20030142321 Positioning stage device
07/31/2003US20030142313 Position detection apparatus and exposure apparatus
07/31/2003US20030142286 Exposing pattern on a semiconductor substrate in a shape adjusted with a first degree of freedom; exposing exposing a second pattern, while second pattern is aligned with first pattern, in a shape adjusted with a second degree of freedom
07/31/2003US20030142284 Optical lithographic exposure apparatus; suitable for double-exposure procedures in the manufacture of integrated circuits
07/31/2003US20030141656 Recording plate or film loading device
07/30/2003EP1331186A2 Recording plate or film loading device
07/30/2003EP1330681A1 System and method for facilitating wafer alignment by mitigating effects of reticle rotation on overlay
07/30/2003CN1433533A Method and apparatus for aligning crystalline substrate
07/30/2003CN1432828A Method of making patterned passive delay and thus made delay
07/29/2003US6600561 Overlappingly formed on semiconductor; alignment reference mark
07/29/2003US6600166 Scanning exposure method
07/24/2003US20030138709 Using an imaging system to capture a digital image of the wafer below the surface of the obscuring layer; the reflected image of the alignment marks below differs from the reflected image; scanning electron microscope; accuracy; semiconductors
07/24/2003US20030137654 Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparautus, and method for manufacturing micro device
07/24/2003US20030137626 Method of making a passive patterned retarder and retarder made by such a method
07/24/2003US20030136512 Device manufacturing-related apparatus, reticle, and device manufacturing method
07/23/2003EP1328774A1 Improved overlay alignment measurement mark
07/23/2003CN1115719C Alignment method
07/22/2003US6597757 Marking apparatus used in a process for producing multi-layered printed circuit board
07/22/2003US6597459 Data age adjustments
07/22/2003US6597434 Lithographic apparatus, device manufacturing method, and device manufactured thereby
07/22/2003US6596603 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method
07/17/2003US20030134208 Method for producing a semiconductor device
07/17/2003US20030133125 Alignment stage, exposure apparatus, and semiconductor device manufacturing method
07/17/2003US20030133114 System for processing semiconductor products
07/17/2003US20030133088 Scanning exposure apparatus
07/17/2003US20030132401 Surface position detecting method
07/16/2003EP0772801B1 A positioning device with a reference frame for a measuring system
07/15/2003US6593585 Optical apparatus comprising lenses, masking and substrate holders, light sources and mirrors for shaping and focusing radiation beams
07/10/2003US20030130812 Alignment method and parameter selection method
07/10/2003US20030128361 Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof
07/10/2003US20030128345 Scanning type exposure apparatus and a device manufacturing method using the same
07/10/2003US20030128277 Camera system, control method thereof, device manufacturing apparatus, exposure apparatus, and device manufacturing method
07/10/2003US20030127751 Alignment mark structure
07/09/2003EP1326141A2 Alignment method and parameter selection method
07/08/2003US6591155 Data processing
07/08/2003US6590657 Semiconductor structures and manufacturing methods
07/08/2003US6590637 Exposure apparatus and method
07/08/2003US6590634 Exposure apparatus and method
07/08/2003US6589382 Aligning mask segments to provide a stitched mask for producing OLED devices
07/03/2003US20030124868 Pattern forming method
07/03/2003US20030123035 Lithographic apparatus and device manufacturing method
07/03/2003US20030122919 Image-recording device and method
07/02/2003EP1228402A4 Composite relief image printing elements
07/02/2003EP1011973B1 Viewing and imaging systems
07/01/2003US6586143 Chemical mechanical polishing (CMP) process and automatically compensating for alignment of a wafer stepper based on the position checking is described. A wafer is provided having an alignment mark thereon for the purpose of aligning a reticle
06/2003
06/26/2003WO2003052803A1 Mask and method for making the same, and method for making semiconductor device
06/26/2003US20030118925 Scanning projection exposure apparatus and aligning method therefor
06/26/2003US20030118918 Photomask, production method of semiconductor laser element, and semiconductor laser element
06/26/2003US20030117607 Projection aligner
06/26/2003US20030117604 Projection aligner
06/26/2003US20030117603 Projection aligner
06/26/2003US20030117602 Projection aligner
06/26/2003US20030117599 Exposing method
06/26/2003US20030117597 Device for exposure of a peripheral area
06/25/2003EP1149328A4 Method and assembly for producing printing plates
06/24/2003US6583856 Exposure apparatus and fabrication method of semiconductor device using the same
06/24/2003US6583430 Electron beam exposure method and apparatus
06/24/2003US6582978 Position detection mark and position detection method
06/24/2003US6582861 Etching using gaseous oxygen plasma; process control
06/19/2003US20030111614 Stage devices including linear motors that produce reduced beam-perturbing stray magnetic fields, and charged-particle-beam microlithography systems comprising same
06/18/2003EP1319974A2 Aligner
06/18/2003EP1319191A2 Generation of a library of periodic grating diffraction signals
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