Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
10/2003
10/16/2003WO2003085456A2 Method and device for imaging a mask onto a substrate
10/16/2003US20030193655 Exposure apparatus and method
10/16/2003CA2482155A1 Method and device for imaging a mask onto a substrate
10/15/2003EP1353233A2 Lithographic apparatus and device manufacturing method
10/15/2003EP1352295A2 Template for room temperature, low pressure micro- and nano-imprint lithography
10/15/2003CN1448800A Multiply light shield putting flatwise device and method for improving superimposed micro-image
10/15/2003CN1448797A 曝光装置 Exposure device
10/15/2003CN1448785A Large-area light shield and exposure system with the same large-area light shield
10/14/2003US6633390 Focus measurement in projection exposure apparatus
10/14/2003US6633363 Scanning exposure apparatus and method
10/14/2003US6633050 Virtual gauging system for use in lithographic processing
10/09/2003WO2003083914A1 Position detection mark, mark identification method, position detection method, exposure method, and position information detection method
10/09/2003US20030190770 Method of etching substrates
10/09/2003US20030190071 Multi-layer printed circuit board fabrication system and method
10/09/2003US20030189255 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
10/08/2003EP1351231A2 Master disc manufacturing apparatus
10/08/2003CN2578864Y Anti-weld single face exposure device
10/08/2003CN1447194A Monitoring, exposure, etching method, mfg. method of semiconductor device and exposure machine
10/08/2003CN1447189A Light mark, focusing monitoring method, light exposure monitoring method, and mfg. method of semiconductor device
10/08/2003CN1447188A Image recorder
10/08/2003CN1447187A Image recorder and image recording method
10/07/2003US6630986 Scanning type exposure apparatus and a device manufacturing method using the same
10/07/2003US6630746 Semiconductor device and method of making the same
10/02/2003WO2002079880A3 Method for adjusting the overlay of two masking planes in a photolithographic process
10/02/2003US20030186141 Multi-exposure lithography method and system providing increased overlay accuracy
10/02/2003US20030186132 Optical alignment test structure patterns on photomasks used to determine field-to-field alignment of a stepper in lithography
10/02/2003US20030185664 Alignment apparatus for substrates
10/02/2003US20030184823 Image recorder
10/02/2003US20030184721 Mask substrate and its manufacturing method
10/02/2003US20030184719 Exposure apparatus
10/02/2003US20030184254 Electromagnetic alignment and scanning apparatus
10/02/2003US20030184253 Electromagnetic alignment and scanning apparatus
10/02/2003US20030183107 Image recorder and image recording method
10/01/2003EP1349201A1 Observation device and its manufacturing method, exposure device, and method for manufacturing micro device
10/01/2003EP1349011A2 Exposure apparatus
10/01/2003EP1348150A1 Method of measuring overlay
10/01/2003EP1348149A1 Method of measuring alignment of a substrate with respect to a reference alignment mark
10/01/2003EP0721608B1 Method of repetitively imaging a mask pattern on a substrate
10/01/2003CN1445612A Method for manufacturing photoetching equipment and device
10/01/2003CN1445605A Method for manufacturing device, manufactured device and affset printing device
10/01/2003CN1122981C Focusing device and optical disc using the same
09/2003
09/30/2003US6628406 Self referencing mark independent alignment sensor
09/30/2003US6628392 Optical and electro-optical apparatus comprising nanostructure apertures, in layouts for controlling intensity from light sources, used as switches or shutters
09/30/2003US6628391 Method for aligning two objects
09/30/2003US6628390 Wafer alignment sensor using a phase-shifted microlens array
09/30/2003US6627905 Charged-particle-beam mask-based exposure apparatus employing a variable mask-illumination field and alignment and calibration methods therefor
09/25/2003US20030180634 For preparing reticle used in combination with exposure tool to image chemically amplified deep ultraviolet resist layer overlying semiconductor substrate
09/25/2003US20030179849 X-ray projection exposure device, x-ray projection exposure method, and semiconductor device
09/25/2003US20030179357 Lithographic apparatus and device manufacturing method
09/25/2003US20030178579 Stage devices exhibiting reduced deformation, and microlithography systems comprising same
09/24/2003EP1347501A1 Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice
09/24/2003EP1347498A2 Stage alignment apparatus and control method therefor
09/24/2003EP1347340A2 Exposure device
09/24/2003EP1346262A1 Self-compensating mark arangement for stepper alignment
09/24/2003CN1444101A Exosure method and device
09/24/2003CN1444100A Background exposure method and equipment using said method
09/23/2003US6624879 Exposure apparatus and method for photolithography
09/23/2003US6624433 Method and apparatus for positioning substrate and the like
09/18/2003WO2003077030A2 Detection of position and estimation of surface shape
09/18/2003US20030177469 Automated manufacturing system and method for processing photomasks
09/18/2003US20030176987 Position detecting method and unit, exposure method and apparatus, control program, and device manufacturing method
09/18/2003US20030175602 Image forming method
09/18/2003US20030174330 Position detection apparatus and method
09/17/2003EP1345082A1 Lithographic apparatus and device manufacturing method
09/17/2003CN1442885A Manufacturing method of semiconductor device and manufacturing equipment of semiconductor device
09/17/2003CN1442757A Aligning method, aligning substrate, photoetching device and component manufacturing method
09/16/2003US6622061 Method and apparatus for run-to-run controlling of overlay registration
09/16/2003US6621517 Viewing and imaging systems
09/16/2003US6620565 Electron beam lithography apparatus focused through spherical aberration introduction
09/16/2003US6620564 Step is performed to change a first optical parameter and a second optical parameter, so as to adjust the positions of two side-lobes of the main feature's exposure peak and overlap with the main feature's exposure peak and two side-lobes
09/12/2003WO2003075099A2 Method and system for overlay measurement
09/12/2003WO2003074966A1 Position detecting unit, exposure system and exposure method
09/11/2003US20030169423 Method and system for overlay measurement
09/11/2003US20030169411 Exposure method and apparatus, method of making exposure apparatus, device and device manufacturing method
09/11/2003US20030168615 Lithographic projection apparatus with positioning system for use with reflectors
09/10/2003EP1341676A1 Donor element for adjusting the focus of an imaging laser
09/10/2003EP1341675A1 Backing layer of a donor element for adjusting the focus on an imaging laser
09/10/2003CN1441476A Desk rack positioning and its control and explosure device and method for producing semiconductor device
09/10/2003CN1441461A Mask base board and its producing method
09/10/2003CN1441318A Method for producing photoetching equipment and device
09/09/2003US6618120 Devices and methods for compensating for tilting of a leveling table in a microlithography apparatus
09/09/2003US6618119 Projection exposure method and apparatus
09/09/2003US6618118 Optical exposure method, device manufacturing method and lithographic projection apparatus
09/09/2003US6617669 Multilayer semiconductor wiring structure with reduced alignment mark area
09/09/2003US6617265 Photomask and method for manufacturing the same
09/09/2003US6617097 Using masking pattern
09/09/2003US6617080 Photomask, semiconductor device, and method for exposing through photomask
09/04/2003US20030164933 Projection exposure apparatus
09/04/2003US20030164930 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method
09/04/2003US20030164353 Method for manufacturing semiconductor device
09/03/2003EP1341221A1 Aligner, aligning method and method for fabricating device
09/03/2003EP1341046A2 Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
09/03/2003EP1341044A2 Positioning device with a reference frame for a measuring system
09/03/2003EP1341042A2 System and method for using a two part cover for protecting a reticle
09/03/2003EP1340126A1 Method of aligning a photolithographic mask to a crystal plane
09/03/2003EP1340123A1 Systems and methods for exposing substrate periphery
09/02/2003US6613589 Method for improving substrate alignment
09/02/2003US6613487 Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same
08/2003
08/28/2003WO2003071471A1 Overlay metrology and control method
08/28/2003WO2003071358A1 Method and system for repairing defected photomasks
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