Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
12/2003
12/04/2003US20030224540 Recognition method of a mark provided on a semiconductor device
12/04/2003US20030224266 High-precision that can perform the design, testing, and formation of wiring easily and at high speed, can reduce the cost involved in the formation and design, can accommodate further miniaturization, and can cope with design changes.
12/04/2003US20030224264 Projection exposure device and position alignment device and position alignment method
12/04/2003US20030224262 Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
12/04/2003US20030224260 Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs
12/04/2003US20030224251 Method for photo-imageable lacquer deposition for a display device
12/04/2003US20030223630 Overlay metrology and control method
12/04/2003US20030223543 Linear filament array sheet for EUV production
12/04/2003US20030222966 Pattern writing apparatus and pattern writing method
12/03/2003EP1367871A2 Wiring forming system and wiring forming method for forming wiring on wiring board
12/03/2003EP1367447A2 Projection exposure device and position alignment device and position alignment method
12/03/2003EP1367445A1 Linear filament array sheet for EUV production
12/03/2003EP1367443A2 Exposure apparatus
12/02/2003US6658314 System and method for three dimensional model printing
12/02/2003US6657703 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory
12/02/2003US6657203 Misalignment inspection method, charge beam exposure method, and substrate for pattern observation
12/02/2003US6656815 Process for implanting a deep subcollector with self-aligned photo registration marks
12/02/2003US6656568 Ordered arrays of nanoclusters
11/2003
11/27/2003WO2003042759A3 Manufacture of optical devices
11/27/2003US20030219655 Photomask having a focus monitor pattern
11/27/2003US20030218728 System and method for using a two part cover for protecting a reticle
11/27/2003US20030218141 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/26/2003EP1364257A1 Simultaneous imaging of two reticles
11/26/2003EP1046185B1 Projection lithography device utilizing charged particles
11/25/2003US6654098 Stage apparatus, exposure apparatus, and device production method
11/25/2003US6654097 Projection exposure apparatus
11/25/2003US6654096 Exposure apparatus, and device manufacturing method
11/25/2003US6653032 Exposure method
11/20/2003US20030215725 Method for determining depth of focus
11/20/2003US20030215724 Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit
11/20/2003US20030213382 Microcontact printing
11/19/2003EP1362263A1 Method of alignment
11/19/2003EP1362261A1 Method for exposing at least one or at least two semiconductor wafers
11/19/2003CN1456938A System and method for protecting templates by two-piece cover
11/19/2003CN1128464C Step-by-step analysis method and system
11/18/2003US6650419 Interferometric apparatus for precision measurement of altitude to a surface
11/18/2003US6649923 Positional deviation detecting method and device manufacturing method using the same
11/18/2003US6649529 Method of substrate processing and photoresist exposure
11/18/2003US6649484 Aligning method, exposure apparatus using this aligning method, and semiconductor device manufacturing method utilizing this exposure apparatus
11/13/2003WO2003094582A2 A system and method for manufacturing printed circuit boards employing non-uniformly modified images
11/13/2003WO2003094212A1 Alignment system, alignment method and production method for semiconductor device
11/13/2003US20030212525 Overlay measurements using periodic gratings
11/13/2003US20030211410 Exposure method, exposure apparatus, and method of production of device
11/13/2003US20030211409 Through-the-lens alignment for photolithography
11/13/2003US20030211404 Liquid crystal display; photolithography; radiation transparent substrate, adjustment of masking patterns
11/13/2003US20030209814 Method of alignment for buried structures formed by surface transformation of empty spaces in solid state materials
11/13/2003US20030209812 Method of aligning a wafer and masks
11/13/2003US20030209680 Edge position detector
11/12/2003EP0799439B2 Positioning device with a force actuator system for compensating centre-of-gravity displacements
11/11/2003US6647137 Characterizing kernel function in photolithography based on photoresist pattern
11/11/2003US6646721 Lithographic projection apparatus positioning system, method of manufacturing, device manufactured thereby and computer program
11/11/2003US6646714 Exposure apparatus, imaging performance measurement method, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
11/11/2003US6645823 Reticle and method of fabricating semiconductor device
11/11/2003US6645684 Error reduction in semiconductor processes
11/11/2003US6645676 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
11/06/2003WO2003090969A1 Positioning device, especially for offset plates
11/06/2003WO2002077716A3 Scanning probe based lithographic alignment
11/06/2003US20030208740 System and method for monitoring and improving dimensional stability and registration accuracy of multi-layer PCB manufacture
11/06/2003US20030206303 Overlay alignment mark design
11/05/2003EP1359470A2 Management system and apparatus, method therefor, and device manufacturing method
11/05/2003EP1359468A2 Management system
11/05/2003EP1359467A2 Arrangement and method for transferring a pattern from a mask to a wafer
11/05/2003CN1454333A Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
11/05/2003CN1453646A Offset printing equipment, device producing method and produced device thereby
11/05/2003CN1127087C Mask for exposure and exposure method thereof with the same mask of exposure
11/04/2003US6642995 Mask-to-wafer alignment system
11/04/2003US6642528 Alignment mark detection method, and alignment method, exposure method and device, and device production method, making use of the alignment mark detection method
11/04/2003US6642525 Particle-optical component and system comprising a particle-optical component
11/04/2003US6641962 Micro devices manufacturing method utilizing concave and convex alignment mark patterns
10/2003
10/30/2003US20030204488 Management system, management method and apparatus, and management apparatus control method
10/30/2003US20030204282 Management system and apparatus, method therefor, and device manufacturing method
10/30/2003US20030203295 Wafer exposure apparatus includes special wafer cooling unit, an air showerhead, for controlling temperature of wafer which is to be transferred from wafer pre-alignment system to wafer stage of photolithography exposure equipmment
10/30/2003US20030203288 Method and apparatus capable of accurately measuring overlay shift between overlay measuring pattern used for transfer to lower target transfer film and overlay measuring pattern used for transfer to upper target transfer film
10/30/2003US20030202182 Management system, apparatus, and method, exposure apparatus, and control method therefor
10/30/2003US20030202181 Arrangement and method for transferring a pattern from a mask to a wafer
10/30/2003US20030201405 System and method for monitoring the topography of a wafer surface during lithographic processing
10/30/2003US20030201404 Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
10/29/2003EP1357435A1 Lithographic apparatus and device manufacturing method
10/29/2003CN1452017A Exposure device and method
10/29/2003CN1452010A Mask and electroluminescent device and method for mfg. same, and electronic apparatus
10/28/2003US6639677 Position measuring method and position measuring system using the same
10/28/2003US6639676 Method for determining rotational error portion of total misalignment error in a stepper
10/28/2003US6639320 Reticle for creating resist-filled vias in a dual damascene process
10/28/2003US6638670 Etching photoresist layers formed on substrate surfaces having magnetoresistive thin films to form magnetic recording media such as magnetic heads
10/23/2003WO2003088319A2 Method of etching substrates
10/23/2003US20030199131 Wafer alignment mark for image processing, image processing alignment method and method of manufacturing semiconductor device
10/23/2003US20030198787 Device manufacturing method, device manufactured thereby and lithographic apparatus therefor
10/23/2003US20030197848 Exposure apparatus, exposure method, and device manufacturing method
10/23/2003US20030197136 Position detection method and position detector, exposure method and exposure apparatus, and device and device manufacturing method
10/23/2003US20030197134 Electron beam drawing apparatus
10/22/2003EP1354358A2 Design of lithography alignment and overlay measurement marks on damascene surface
10/22/2003CN1450412A Lighographic apparatus, alignment method and device mfg method
10/21/2003US6636311 Alignment method and exposure apparatus using the same
10/21/2003US6636293 Exposure method and apparatus having a decreased light intensity distribution
10/21/2003US6635887 Positioning system for use in lithographic apparatus
10/21/2003US6635884 Method for directing an electron beam onto a target position on a substrate surface
10/21/2003US6635567 Method of producing alignment marks
10/21/2003US6635549 Method of producing exposure mask
10/21/2003US6635396 Photoresist latent image adjustment marks; laser adjustment beams
10/21/2003US6635395 Method for exposing a layout comprising multiple layers on a wafer
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