| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/05/2004 | US20040021866 Scatterometry alignment for imprint lithography |
| 02/05/2004 | US20040021801 Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
| 02/05/2004 | US20040021254 Alignment methods for imprint lithography |
| 02/05/2004 | DE10233491A1 Kompakte Einrichtung zur Bebilderung einer Druckform Compact device for imaging a printing forme |
| 02/04/2004 | CN1472776A Optical masks, manufacture thereof and manufacture of electronic elements |
| 02/04/2004 | CN1472604A Optical approaching correcting method |
| 02/04/2004 | CN1472603A Scanning exposuring device and method, manufacture of scanning exposuring device |
| 02/03/2004 | US6686991 Wafer stage assembly, servo control system, and method for operating the same |
| 02/03/2004 | US6686214 Method of aligning a photolithographic mask to a crystal plane |
| 02/03/2004 | US6686107 Method for producing a semiconductor device |
| 01/28/2004 | EP1385058A1 Lithographic apparatus and device manufacturing method |
| 01/28/2004 | EP1385057A2 Compact device for exposing a printing form |
| 01/28/2004 | CN1470947A Proximity effect correction method of electronic beam exposure and use thereof |
| 01/28/2004 | CN1470943A Light cover combination and exposure method for forming threadlet pattern therewith |
| 01/28/2004 | CN1470900A Compact device for printing-plate imaging |
| 01/27/2004 | US6683684 Device for measuring relative position error |
| 01/27/2004 | US6683673 Alignment system and projection exposure apparatus |
| 01/27/2004 | US6683433 Exposure apparatus and method utilizing isolated reaction frame |
| 01/22/2004 | WO2004008246A2 Method and system for context-specific mask writing |
| 01/22/2004 | WO2004008245A2 Method and system for context-specific mask inspection |
| 01/22/2004 | US20040013957 Resist is exposed to light by deviating a focus of the light by a given distance in relation to a semiconductor wafer, and after development of the resist, resist patterns for measurement are formed |
| 01/22/2004 | US20040013954 Alignment sensor having an electron beam source for impinging an alignment marker on a substrate and a back-scattered electron detector |
| 01/22/2004 | US20040013950 Photolithographic process used in semiconductor manufacturing |
| 01/21/2004 | EP1383007A1 Lithographic apparatus, and device manufacturing method |
| 01/21/2004 | CN1469990A Position detection method, position detection device, exposure method, exposure system, control program, and device production method |
| 01/21/2004 | CN1469449A Mark position detecting apparatus and mark position detecting method |
| 01/21/2004 | CN1469193A Objective table apparatus and exposure apparatus |
| 01/20/2004 | US6680162 VLSI-based system for durable high-density information storage |
| 01/15/2004 | US20040009416 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| 01/15/2004 | US20040008332 Exposure device |
| 01/15/2004 | DE10229818A1 Verfahren zur Fokusdetektion und Abbildungssystem mit Fokusdetektionssystem Method of focus detection and imaging system with focus detection system |
| 01/15/2004 | DE10227304A1 Verfahren zum Belichten eines Halbleiterwafers in einem Belichtungsapparat A method of exposing a semiconductor wafer in an exposure apparatus |
| 01/14/2004 | EP1381039A2 Compound objective lens having two focal points and apparatus using the lens |
| 01/14/2004 | EP1381038A2 Compound objective lens having two focal points and apparatus using the lens |
| 01/14/2004 | EP1381034A2 Compound objective lens having two focal points and apparatus using the lens |
| 01/14/2004 | EP1379923A2 Substrate alignment |
| 01/14/2004 | CN1467569A Projection exposure equipment |
| 01/13/2004 | US6677601 Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus |
| 01/13/2004 | US6677107 Resist film is made to function as a light screening film, wherein the information detecting ability of the photo mask can be enhanced |
| 01/08/2004 | WO2004003469A1 Pattern detector and its using method, measuring method and apparatus, position measuring method, exposing method and device, and method for fabricating device |
| 01/08/2004 | WO2003088319A3 Method of etching substrates |
| 01/08/2004 | WO2002097534A3 Apparatus and method for aligning an article with a reference object |
| 01/08/2004 | US20040006443 Position measuring device and method for determining a position |
| 01/08/2004 | US20040004700 Exposure apparatus and exposure method for use in forming a pattern of a semiconductor device |
| 01/08/2004 | US20040004297 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method |
| 01/07/2004 | EP1377881A2 Scanning probe based lithographic alignment |
| 01/06/2004 | US6674510 Off-axis levelling in lithographic projection apparatus |
| 01/02/2004 | EP1376558A2 Compound objective lens having two focal points and apparatus using the lens |
| 01/02/2004 | EP1376236A2 Process for exposing a semiconductor wafer in an exposure device |
| 01/02/2004 | EP1376052A2 System and method for automated focus measuring of a lithography tool |
| 01/02/2004 | EP1373982A2 Method for adjusting the overlay of two masking planes in a photolithographic process for the production of an integrated circuit |
| 01/01/2004 | US20040001192 System and method for automated focus measuring of a lithography tool |
| 01/01/2004 | US20040001191 Scanning exposure apparatus and method |
| 01/01/2004 | US20040000729 Alignment marks of semiconductor device |
| 01/01/2004 | US20040000627 Method for focus detection and an imaging system with a focus-detection system |
| 12/31/2003 | WO2004001820A1 Exposure apparatus and method |
| 12/31/2003 | WO2004001508A2 Method and apparatus for maskless photolithography |
| 12/30/2003 | US6671049 Article of manufacture bearing a universal alignment target |
| 12/30/2003 | US6671048 Method for determining wafer misalignment using a pattern on a fine alignment target |
| 12/30/2003 | US6671036 Balanced positioning system for use in lithographic apparatus |
| 12/30/2003 | US6670632 Reticle and method of fabricating semiconductor device |
| 12/25/2003 | US20030235330 Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate |
| 12/25/2003 | US20030234939 Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 12/24/2003 | WO2003017006A3 A method of substrate processing and photoresist exposure |
| 12/24/2003 | WO2002079880A9 Method for adjusting the overlay of two masking planes in a photolithographic process |
| 12/24/2003 | CN1463032A Identifying method of mark on semiconductor device |
| 12/23/2003 | US6668075 Position detection apparatus and method |
| 12/23/2003 | US6667806 Process and apparatus for manufacturing semiconductor device |
| 12/23/2003 | US6667253 Alignment mark and exposure alignment system and method using the same |
| 12/23/2003 | US6666611 Three degree of freedom joint |
| 12/18/2003 | WO2003105217A1 Wafer pre-alignment apparatus and method |
| 12/18/2003 | WO2003104929A2 Use of overlay diagnostics for enhanced automatic process control |
| 12/18/2003 | WO2003104746A1 Position measurement method, exposure method, exposure device, and device manufacturing method |
| 12/18/2003 | US20030230730 Semiconductor exposure apparatus, control method therefor, and semiconductor device manufacturing method |
| 12/17/2003 | EP1372041A2 Control of an apparatus for exposing a semiconductor device |
| 12/17/2003 | EP1372040A2 Lithographic apparatus and device manufacturing method |
| 12/17/2003 | CN1462471A Method of measuring image characteristics and exposure method |
| 12/17/2003 | CN1462065A Wiring forming system and wiring forning method for wiring on wiring board |
| 12/17/2003 | CN1461977A Projection exposure device, position alignment device and position alignment method |
| 12/17/2003 | CN1461972A Graphic writer and graphic write method |
| 12/17/2003 | CN1461971A Exposure method, exposure device and manufacture method of device |
| 12/16/2003 | US6665050 Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis |
| 12/16/2003 | US6664999 Image-recording device and method |
| 12/16/2003 | US6664551 Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform same |
| 12/16/2003 | US6664012 Projection imaging of microelectronics using mask and substrate mounted on scanning platform; optical path from light source, refractive elements, reverser, reflector, lens and fold mirror |
| 12/16/2003 | US6662725 Positioning method and positioning device for positioning printing plate relative to surface plate |
| 12/16/2003 | US6662720 Apparatus for adjusting the position of a cylindrical image carrier relative to a scanning head and a method for adjusting the position of a cylindrical image carrier relative to a scanning head |
| 12/11/2003 | WO2003102691A1 Patterning method |
| 12/11/2003 | WO2003065119A3 Overlay measurements using periodic gratings |
| 12/11/2003 | WO2002101464A3 Optical proximity correction for phase shifting photolithographic masks |
| 12/11/2003 | US20030228527 Method for compensating for scatter/reflection effects in particle beam lithography |
| 12/11/2003 | US20030227625 Wafer alignment device and method |
| 12/11/2003 | US20030227608 Exposure device |
| 12/11/2003 | US20030227605 System and method for using a two part cover for protecting a reticle |
| 12/11/2003 | US20030227604 Lithographic apparatus, alignment method and device manufacturing method |
| 12/11/2003 | US20030226976 Stage-actuators that do not generate fluctuating magnetic fields, and stage devices comprising same |
| 12/10/2003 | CN1460895A Processing method, mfg. method and processing device for semiconductor |
| 12/09/2003 | US6661517 Shot averaging for fine pattern alignment with minimal throughput loss |
| 12/09/2003 | US6661105 Alignment mark structure |
| 12/09/2003 | US6660438 A halftone phase-shift pattern on an optically transmissive plate and a resist film outside the pattern formation area, is illuminated, transferring the pattern to a photosensitive film |