| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 03/24/2004 | CN1484097A Photographic corrosion mfg method for mixing type photo mask |
| 03/23/2004 | US6711732 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
| 03/23/2004 | US6710884 Apparatus and method for measuring mirrors in situ |
| 03/23/2004 | US6710855 Projection exposure apparatus and method |
| 03/23/2004 | US6710850 Exposure apparatus and exposure method |
| 03/23/2004 | US6710849 Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method |
| 03/23/2004 | US6710848 Projection exposure apparatus and method |
| 03/23/2004 | US6709797 Precision patterning |
| 03/18/2004 | WO2004023534A1 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 03/18/2004 | WO2003075099A3 Method and system for overlay measurement |
| 03/18/2004 | DE10339986A1 System und Verfahren zum Verbessern von Justiermarken System and method for improving alignment marks |
| 03/17/2004 | EP1398672A2 Optimisation of a parameter in an exposure apparatus |
| 03/17/2004 | EP1398670A2 A method of aligning a substrate, a computer program and a device manufacturing method |
| 03/17/2004 | EP1398666A2 Method of achieving CD linearity control for full chip chromeless phase lithography manufacturing |
| 03/16/2004 | US6707535 Device for exposure of a peripheral area |
| 03/16/2004 | US6707533 Detection apparatus and exposure apparatus using the same |
| 03/16/2004 | US6706609 Method of forming an alignment feature in or on a multi-layered semiconductor structure |
| 03/16/2004 | US6705228 Uv light from a light source that is modified by a projection unit with respect to direction and/or intensity, trigger signals are evaluated by a receiver formed as the higher-level unit. |
| 03/11/2004 | WO2004021081A2 Method for the production of a phase mask |
| 03/11/2004 | WO2003021360A3 Phase-shift-moire focus monitor |
| 03/11/2004 | WO2002079882A3 Lithography method |
| 03/11/2004 | US20040048469 Hole forming by cross-shape image exposure |
| 03/11/2004 | US20040048400 Reticle focus measurement method using multiple interferometric beams |
| 03/11/2004 | US20040048174 Reticle focus measurement system using multiple interferometric beams |
| 03/11/2004 | US20040048169 For use in irradiating a wafer with an electron beam for cell projection |
| 03/11/2004 | US20040048166 Contact printing as second exposure of double exposure attenuated phase shift mask process |
| 03/11/2004 | US20040046965 Interferometric stage metrology system |
| 03/10/2004 | EP1396761A2 An alignment tool, a lithographic apparatus, an alignment method and a device manufacturing method |
| 03/10/2004 | EP1396757A2 Reticle focus measurement system and method using multiple interferometric beams |
| 03/10/2004 | CN1481535A System and method for monitoring and improving dimensional stability and registration accuracy of multi-layer PCB manufacture |
| 03/10/2004 | CN1480788A Analyzing system of exposuring device, analyzing method, and program, and semiconductor element mfg. method |
| 03/09/2004 | US6704094 Correction of leveling tilt induced by asymmetrical semiconductor patterns |
| 03/09/2004 | US6704092 Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane |
| 03/09/2004 | US6704091 Exposure apparatus and exposure method |
| 03/09/2004 | US6704089 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
| 03/09/2004 | US6703328 Semiconductor device manufacturing method |
| 03/04/2004 | WO2004019389A1 Mark position detection device, mark position detection method, superimposing measurement device, and superimposing measurement method |
| 03/04/2004 | WO2004019135A1 Method for aligning a substrate on a stage |
| 03/04/2004 | WO2004018443A1 Ultraviolet-permeable fluoropolymers and pellicles made by using the same |
| 03/04/2004 | US20040043310 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 03/04/2004 | US20040041994 Balanced positioning system for use in lithographic apparatus |
| 03/04/2004 | US20040041283 System and method of enhancing alignment marks |
| 03/04/2004 | US20040041103 Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method |
| 03/04/2004 | US20040041101 Exposure apparatus |
| 03/04/2004 | US20040040648 Method for replicating optical elements, particularly on a wafer level, and replicas formed thereby |
| 03/04/2004 | US20040040456 System and method for registering media in an imaging system |
| 03/04/2004 | DE10310597A1 Beschichtungsverfahren für ein Farbfilter sowie Ausrichtungs-Zusammenbauverfahren unter Verwendung desselben Of the same coating method for a color filter, and alignment assembly method using |
| 03/04/2004 | DE10237344A1 Verfahren zur Herstellung einer Phasenmaske A method of manufacturing a phase mask |
| 03/03/2004 | EP1394616A1 An alignment tool, a lithographic apparatus, an alignment method and a device manufacturing method |
| 03/03/2004 | EP1394614A1 System and method for registering media in an imaging system. |
| 03/03/2004 | EP1393127A1 Backside alignment system and method |
| 03/03/2004 | CN1479940A Observation device and its manufacturing method, exposure device and method for manufacturing micro-device |
| 03/03/2004 | CN1479073A Distortion measurement method and exposure equipment |
| 03/02/2004 | US6701197 System and method for side to side registration in a printed circuit imager |
| 03/02/2004 | US6700600 Beam positioning in microlithography writing |
| 03/02/2004 | US6699628 Synchronize movable stage, calibration plate, detectable label |
| 03/02/2004 | US6699425 Device and method for transferring microstructures |
| 02/26/2004 | WO2004017140A1 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank |
| 02/26/2004 | WO2003085456A3 Method and device for imaging a mask onto a substrate |
| 02/26/2004 | US20040038539 Reticle for creating resist-filled vias in a dual damascene process |
| 02/26/2004 | US20040038137 Coating method for a color filter and aligning-assembling method by using the same |
| 02/26/2004 | US20040038134 Radiation-patterning tools, and methods of printing structures |
| 02/26/2004 | US20040036879 Mark position detecting apparatus |
| 02/26/2004 | US20040036850 Substrate attracting and holding system for use in exposure apparatus |
| 02/26/2004 | US20040036849 Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method |
| 02/26/2004 | US20040036098 Semiconductor device including a capacitor |
| 02/26/2004 | US20040036035 Positioning system for use in lithographic apparatus |
| 02/25/2004 | EP1390692A1 Periodic patterns and technique to control misalignment |
| 02/25/2004 | CN1477677A Crystallizer, crystalline method, film transitior and display device |
| 02/25/2004 | CN1477448A Method for mfg. photoetching device and component |
| 02/24/2004 | US6697145 Substrate processing apparatus for coating photoresist on a substrate and forming a predetermined pattern on a substrate by exposure |
| 02/24/2004 | US6696220 Template for room temperature, low pressure micro-and nano-imprint lithography |
| 02/24/2004 | US6696008 Maskless laser beam patterning ablation of multilayered structures with continuous monitoring of ablation |
| 02/19/2004 | WO2002069053A3 Method and apparatus for registration control in production by imaging |
| 02/19/2004 | US20040033448 Misalignment is automatically detected and corrected, eliminating the need for reworking |
| 02/19/2004 | US20040033427 Thermally imageable layer on the front side of the base element and a light attenuated layer on the back side of the base element |
| 02/19/2004 | US20040033426 Alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers. |
| 02/19/2004 | US20040032931 X-ray alignment system for fabricaing electronic chips |
| 02/19/2004 | US20040032575 Exposure apparatus and an exposure method |
| 02/19/2004 | DE10157850B4 Verfahren und Vorrichtung zur hochpräzisen Bestimmung der Topographie einer Oberfläche Method and apparatus for high-precision measurement of the topography of a surface |
| 02/18/2004 | CN1476629A Aligner, aligning method and method for fabricating device |
| 02/17/2004 | US6693713 Mark detection method, exposure method, device manufacturing method, mark detection apparatus, exposure apparatus, and device |
| 02/17/2004 | US6693700 Scanning projection exposure apparatus |
| 02/17/2004 | US6693402 Electromagnetic alignment and scanning apparatus |
| 02/17/2004 | US6693284 Stage apparatus providing multiple degrees of freedom of movement while exhibiting reduced magnetic disturbance of a charged particle beam |
| 02/12/2004 | WO2004013904A1 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 02/12/2004 | US20040031013 Methods of forming patterned reticles |
| 02/12/2004 | US20040029029 Error reduction in semiconductor processes |
| 02/12/2004 | US20040029028 Window between pattern layout; projecting laser beams; determination, calibration reflection |
| 02/12/2004 | US20040029025 Method for exposing at least one or at least two semiconductor wafers |
| 02/12/2004 | US20040027573 Position measuring method, exposure method and system thereof, device production method |
| 02/12/2004 | US20040027549 Observation apparatus and method of manufacturing the same, exposure apparatus, and method of manufacturing microdevice |
| 02/12/2004 | US20040026360 Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument |
| 02/11/2004 | EP0786071B1 On-axis mask and wafer alignment system |
| 02/10/2004 | US6690021 Method of aligning a wafer in a photolithography process |
| 02/10/2004 | US6689520 Exposure method for correcting dimension variation in electron beam lithography |
| 02/05/2004 | US20040023466 Stacked wafer aligment method |
| 02/05/2004 | US20040023138 Using a microscope, which has a visible and an ultraviolet light source; uses the visible light source for aligning the wafer and for exposing a region in the first resist layer above the alignment mark without using a mask |
| 02/05/2004 | US20040023133 Photoresist pattern and forming method thereof |
| 02/05/2004 | US20040023127 Correcting a mask pattern using multiple correction grids |