| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 05/06/2004 | US20040086787 Alternating aperture phase shift photomask having plasma etched isotropic quartz features |
| 05/06/2004 | US20040086786 Radiation correction method for electron beam lithography |
| 05/06/2004 | US20040086785 AISixOy as a new bi-layer high transmittance attenuating phase shifting mask material for 193 nanometer lithography |
| 05/06/2004 | US20040084642 System and method for squeeze film damping precision assemblies |
| 05/06/2004 | EP1416327A1 Inspection method and device manufacturing method |
| 05/06/2004 | EP1415197A2 Optical proximity correction for phase shifting photolithographic masks |
| 05/04/2004 | US6732004 Program controlling measuring tool to measure position of alignment mark on substrate overlaid with deposited material, calculating corrected position of mark on basis of measured position and model of process apparatus involved in deposition |
| 05/04/2004 | US6731438 System comprising substrate that has been subjected to mass transport process, lens alignment structure on substrate that yields light pattern when substrate or near plane is imaged, and metal layer aligned to light pattern from lens structure |
| 05/04/2004 | US6731372 Multiple chamber fluid mount |
| 05/04/2004 | US6730920 Abbe arm calibration system for use in lithographic apparatus |
| 05/04/2004 | US6730608 Full image exposure of field with alignment marks |
| 05/04/2004 | US6730528 Mask set for measuring an overlapping error and method of measuring an overlapping error using the same |
| 05/04/2004 | US6730447 Manufacturing system in electronic devices |
| 04/29/2004 | US20040081917 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 04/29/2004 | US20040081915 Flexibility of making either surprint proofs or overlay proofs with the same equipment and the same set of consumable materials. |
| 04/29/2004 | US20040081898 Mask can be used independently of its height tolerances and of the membrane holder to be mounted thereon for a distortion-free lithographic imaging |
| 04/29/2004 | US20040081896 Mask repair using multiple exposures |
| 04/29/2004 | US20040081351 Multi-layer printed circuit board fabrication system and method |
| 04/29/2004 | US20040080737 Off-axis levelling in lithographic projection apparatus |
| 04/29/2004 | US20040080733 Projection exposure method with luminous flux distribution |
| 04/29/2004 | DE10295954T5 Belichtungsverfahren unter Verwendung einer komplementär unterteilten Maske, Belichtungsvorrichtung, Halbleiterbauteil und Verfahren zum Herstellen desselben Of the same exposure method using a complementarily divided mask, exposure apparatus, semiconductor device and methods for making |
| 04/29/2004 | DE10295952T5 Maske, Verfahren zum Herstellen derselben sowie Verfahren zum Herstellen eines Halbleiterbauteils Mask, method for producing the same as well as method of manufacturing a semiconductor device |
| 04/28/2004 | EP1413928A2 Apparatus and method for scanning exposure |
| 04/28/2004 | EP1412694A1 Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components |
| 04/28/2004 | CN1492285A Optical mask with alignment measurnig mark and its detecting method |
| 04/27/2004 | US6727978 Projection exposure apparatus and projection exposure method |
| 04/27/2004 | US6727565 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 04/27/2004 | US6727048 Selectively removing a lacquer layer so that so that the remaining lacquer is disposed in the sub-pixel areas of a display device, resulting in a smooth, highly reflective aluminum layer that is electrically and mechanically robust |
| 04/27/2004 | US6727029 Method for making reticles with reduced particle contamination and reticles formed |
| 04/27/2004 | US6726814 Process for producing optical article |
| 04/22/2004 | WO2004034446A1 Exposure device, alignment method, and semiconductor device manufacturing method |
| 04/22/2004 | WO2004034149A1 Casing for a projection lens used for microphotography provided with adjusting surface for mounting and adjusting said casing |
| 04/22/2004 | US20040076893 Mask comprising: a transparent substrate; and a light shielding layer having at least two rectangular opening patterns arranged with a predetermined interval to define a single trench. |
| 04/22/2004 | US20040076834 Reticle with antistatic coating |
| 04/22/2004 | US20040075179 Structural design of alignment mark |
| 04/22/2004 | US20040075099 Position detecting method and apparatus |
| 04/22/2004 | US20040075064 Method for correcting a proximity effect, an exposure method, a manufacturing method of a semiconductor device and a proximity correction module |
| 04/22/2004 | DE10246828A1 Objective, in particular projection objective for microlithography used in the manufacture of semiconductor components has one housing for optical elements provided with mating surfaces |
| 04/22/2004 | DE10233205A1 Method for correction of local loading effects when etching photo masks for manufacturing integrated circuits based on knowledge from position dependent structural densities |
| 04/21/2004 | CN1490675A Hoods with exposure meter for graduated exposion plate method and determining method thereof |
| 04/21/2004 | CN1490674A Hoods for graduated exposion plate method and determining method thereof |
| 04/21/2004 | CN1490671A Method for designing mask and manufacturing face plate |
| 04/20/2004 | US6724486 Helium- Neon laser light source generating two harmonically related, single- frequency wavelengths for use in displacement and dispersion measuring interferometry |
| 04/20/2004 | US6724464 Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method |
| 04/20/2004 | US6723614 Semiconductor device comprising layered positional detection marks and manufacturing method thereof |
| 04/15/2004 | WO2004032212A1 Stage device and exposure device |
| 04/15/2004 | WO2004031856A2 Photomask assembly incorporating a porous frame and method for making it |
| 04/15/2004 | US20040073884 Phase shifting mask topography effect correction based on near-field image properties |
| 04/15/2004 | US20040072438 Method for defining alignment marks in a semiconductor wafer |
| 04/15/2004 | US20040072086 Exposure method and exposure apparatus using complementary division mask, and semiconductor device and method for making the same |
| 04/15/2004 | US20040072083 For use in photolithography |
| 04/15/2004 | US20040072082 Photomask, method of manufacturing a photomask, and method of manufacturing an electronic product |
| 04/15/2004 | US20040072081 Methods for etching photolithographic reticles |
| 04/15/2004 | US20040071262 Method of alignment |
| 04/15/2004 | US20040070741 Alignment system and projection exposure apparatus |
| 04/15/2004 | US20040069757 Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same |
| 04/15/2004 | DE10296416T5 Verfahren und Vorrichtung zur Registrierungssteuerung in der Produktion durch Belichten Method and apparatus for registration control in production by exposure |
| 04/15/2004 | DE10240085A1 Process for structuring a masking layer for semiconductor production uses ideal and correcting mask patterns to allow for lateral distortion |
| 04/14/2004 | CN1488999A Exposure device detecting method and exposure device |
| 04/14/2004 | CN1488998A Optical etching device and manufacturing method |
| 04/14/2004 | CN1146019C Phase-shift mask and manufacture thereof |
| 04/13/2004 | US6721940 Exposure processing method and exposure system for the same |
| 04/13/2004 | US6721938 Optical proximity correction for phase shifting photolithographic masks |
| 04/13/2004 | US6721036 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/13/2004 | US6720117 Exposure mask with appended mask error data |
| 04/13/2004 | US6720116 Process flow and pellicle type for 157 nm mask making |
| 04/13/2004 | US6720115 Exposure method and exposure apparatus using near-field light and exposure mask |
| 04/08/2004 | US20040067443 Reduce or eliminate ridges at the edges of printing plate, by reducing UV exposure to the edges, spraying masking material, automatic control the spray movement by computer, materials handling |
| 04/08/2004 | US20040066518 Self referencing mark independent alignment sensor |
| 04/08/2004 | US20040066498 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 04/07/2004 | EP1406126A1 Device manufacturing method |
| 04/07/2004 | CN1487368A Aligning apparatus and method, offset press, components producing method and produced device |
| 04/07/2004 | CN1487367A Frequency domain phase collimator |
| 04/07/2004 | CA2407381A1 Edge treatment of flexographic printing elements |
| 04/06/2004 | US6718227 System and method for determining a position error in a wafer handling device |
| 04/06/2004 | US6717685 In situ proximity gap monitor for lithography |
| 04/06/2004 | US6717296 Lithographic apparatus and motor for use in the apparatus |
| 04/06/2004 | US6717159 Low distortion kinematic reticle support |
| 04/06/2004 | US6716649 Method for improving substrate alignment |
| 04/01/2004 | WO2004027684A2 Photolithography mask repair |
| 04/01/2004 | US20040063037 Irradiating far ultraviolet or vacuum ultraviolet exposure light from a second major surface side of a mask substrate; reduction-projecting, by a projection optical system, exposure light which has transmitted through mask substrate |
| 04/01/2004 | US20040062998 Etched-multilayer phase shifting masks for EUV lithography |
| 04/01/2004 | US20040061857 Periodic patterns and technique to control misalignment between two layers |
| 03/31/2004 | CN1485694A Step-by-step projection photo-etching machine double set shifting exposure ultra-sophisticated positioning silicon chip bench system |
| 03/31/2004 | CN1144263C Exposure device and method for exposure |
| 03/30/2004 | US6714691 Exposure method and apparatus, and device manufacturing method using the same |
| 03/30/2004 | US6714282 Position detecting method optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method |
| 03/30/2004 | US6714281 Exposure apparatus and device manufacturing method |
| 03/30/2004 | US6712003 Sheet member positioning device and image recording device |
| 03/25/2004 | US20040059541 Position detecting method and apparatus |
| 03/25/2004 | US20040059540 Position detecting device and position detecting method |
| 03/25/2004 | US20040058540 Position detecting method and apparatus |
| 03/25/2004 | US20040056216 Wafer prealignment apparatus, its method for judging wafer presence, method for sensing wafer edge position, computer-readable record medium with recorded program for executing this position sensing method, apparatus for sensing wafer edge position, and prelignment sensor |
| 03/25/2004 | US20040056215 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
| 03/25/2004 | DE10324866A1 Verfahren zum Herstellen einer resistiven Halbleiterspeichervorrichtung A method of manufacturing a resistive semiconductor memory device |
| 03/24/2004 | EP1400860A2 Lithographic marker structure, lithographic projection apparatus comprising such a lithographic marker structure and method for substrate alignment using such a lithographic marker structure |
| 03/24/2004 | EP1400859A2 Alignment system and methods for lithographic systems using at least two wavelengths |
| 03/24/2004 | EP1400855A2 Device inspection |
| 03/24/2004 | EP1400854A2 Alignment systems and methods for lithographic systems |
| 03/24/2004 | CN1484099A System and method for automated focus measnring of lithography tool |