| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 06/24/2004 | US20040119960 Scanning exposure apparatus and method |
| 06/24/2004 | US20040119956 Distortion measurement method and exposure apparatus |
| 06/24/2004 | US20040119026 Electron beam exposure equipment and electron beam exposure method |
| 06/23/2004 | EP1432009A2 Electron beam exposure equipment and electron beam exposure method |
| 06/23/2004 | EP1431834A1 A lithographic projection mask, a device manufacturing method using a lithographic projection mask and a device manufactured thereby |
| 06/23/2004 | EP1431833A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/23/2004 | EP1431832A1 Lithographic apparatus and device manufacturing method |
| 06/23/2004 | CN1506768A Alignment system and method for photoetching system |
| 06/22/2004 | US6754303 Exposure apparatus and exposing method |
| 06/22/2004 | US6753963 Method of calibration of magnification of optical devices |
| 06/22/2004 | US6753617 Method for improving a stepper signal in a planarized surface over alignment topography |
| 06/22/2004 | US6753131 Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element |
| 06/17/2004 | WO2003077030A3 Detection of position and estimation of surface shape |
| 06/17/2004 | US20040115539 Masking; printing a pattern using; determination, calibration, adjustment |
| 06/17/2004 | US20040114792 Mark position detecting apparatus and mark position detecting method |
| 06/17/2004 | US20040114143 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus |
| 06/16/2004 | CN1505127A Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
| 06/16/2004 | CN1505102A Manufacturing method of photo mask and semiconductor device |
| 06/15/2004 | US6750950 Scanning exposure method, scanning exposure apparatus and making method for producing the same, and device and method for manufacturing the same |
| 06/15/2004 | US6750464 Having pattern elements defined as apertures in stencil reticle, each element split into portions separated by girders formed from membrane of reticle and configured for transfer to substrate using single exposure shot of charged particle beam |
| 06/10/2004 | WO2004049063A2 Photomask and method for creating a protective layer on the same |
| 06/10/2004 | US20040110073 Methods of manufacturing photomask blank and photomask |
| 06/10/2004 | US20040110072 Process for manufacturing half-tone phase shifting mask blanks |
| 06/10/2004 | US20040109165 Automated overlay metrology system |
| 06/10/2004 | US20040109148 Exposure apparatus |
| 06/10/2004 | US20040108466 Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby |
| 06/09/2004 | EP1426820A2 Methods of manufacturing photomask blank and photomask |
| 06/09/2004 | EP1426462A2 Mask vapor deposition method and apparatus, mask, process for manufacturing display panel, display panel and electronic device |
| 06/09/2004 | CN1503056A Phase-width balanced alternating phase shift mask design |
| 06/08/2004 | US6747732 Method of making exposure apparatus with dynamically isolated reaction frame |
| 06/08/2004 | US6747282 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/08/2004 | US6746966 Method to solve alignment mark blinded issues and a technology for application of semiconductor etching at a tiny area |
| 06/08/2004 | US6746805 Forming support structure including substrate with plurality of windows, filling windows with temporary fill material, forming additional windows in unfilled portions of substrate, filling windows, forming mask over substrate, removing fill |
| 06/03/2004 | WO2004047156A1 Position measurement method, position measurement device, exposure method, and exposure device |
| 06/03/2004 | US20040107412 Method and system for context-specific mask writing |
| 06/03/2004 | US20040105961 Intra-cell mask alignment for improved overlay |
| 06/03/2004 | US20040105577 Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
| 06/03/2004 | US20040104641 Method of separating a template from a substrate during imprint lithography |
| 06/03/2004 | DE10352740A1 Hilfsstrukturmerkmale mit einer unter der Auflösung liegenden Grösse Auxiliary structural features with a sub-resolution size |
| 06/03/2004 | DE10307381B3 Printing plate recording device with pivoted sensor finger for detecting edge of printing plate incorporated in surface of printing plate exposure drum |
| 06/02/2004 | EP1424723A2 Ion beam for target recovery |
| 06/02/2004 | EP1424537A1 DISPLACEMENT DETECTING METHOD, DISPLACEMENT DETECTING DEVICE AND CALIBRATING METHOD THEREOF, AND RECORDING DEVICE OF INFORMATION RECORDING MEDIUM ORIGINAL DISK |
| 06/02/2004 | CN1501173A Lithographic apparatus and device manufacturing method |
| 06/02/2004 | CN1501172A Lithographic apparatus and device manufacturing method |
| 06/02/2004 | CN1501171A 曝光装置 Exposure device |
| 06/02/2004 | CN1501165A Device manufacturing method with reversed alignment markers |
| 06/01/2004 | US6744851 Linear filament array sheet for EUV production |
| 06/01/2004 | US6744512 Such as semiconductor devices or liquid crystal displays |
| 05/27/2004 | WO2004044967A1 Method for manufacturing transfer mask substrate, transfer mask substrate, and transfer mask |
| 05/27/2004 | WO2004044966A1 Aligning method and aligning device in proximity exposure |
| 05/27/2004 | WO2000066969A3 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 05/27/2004 | US20040102863 Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method |
| 05/27/2004 | US20040101984 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer |
| 05/27/2004 | US20040101769 Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit |
| 05/27/2004 | US20040100593 Method for designing mask and fabricating panel |
| 05/27/2004 | US20040099819 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus |
| 05/27/2004 | US20040099638 Ion beam for target recovery |
| 05/27/2004 | US20040099168 Image exposure apparatus |
| 05/27/2004 | US20040099165 Image exposure apparatus |
| 05/27/2004 | DE10349087A1 Half-tone-type phase shift mask blank manufacturing method involves sputtering reactive gas onto substrate, to form half-tone film with desired optical characteristic, irrespective of change of gas flow amount |
| 05/26/2004 | CN1499299A Substrate calibrating appts, its processing device and delivery appts. |
| 05/26/2004 | CN1499298A Lightscribing device and mfg. method of such device |
| 05/26/2004 | CN1499293A Checking method and element mfg. method |
| 05/25/2004 | US6741358 Exposure apparatus and device production method in which position of reference plate provided on substrate stage is measured |
| 05/25/2004 | US6741331 Lithographic apparatus with improved exposure area focus, device manufacturing method, and device manufactured thereby |
| 05/25/2004 | US6741330 Exposure device |
| 05/20/2004 | US20040096759 Feed forward leveling |
| 05/20/2004 | US20040096755 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/20/2004 | US20040096752 Phase-width balanced alternating phase shift mask design |
| 05/20/2004 | US20040095565 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
| 05/20/2004 | US20040095564 Exposure device |
| 05/20/2004 | US20040095085 Window frame-guided stage mechanism |
| 05/20/2004 | US20040094847 Multi-layered semiconductor structure |
| 05/19/2004 | EP1420449A1 Device manufacturing method with reversed alignment markers |
| 05/19/2004 | EP1420300A2 Lithographic apparatus and device manufacturing method |
| 05/19/2004 | EP1420298A2 Immersion lithographic apparatus and device manufacturing method |
| 05/18/2004 | US6738128 Exposure apparatus |
| 05/18/2004 | US6737658 Pattern observation apparatus and pattern observation method |
| 05/18/2004 | US6737206 Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same |
| 05/18/2004 | US6737205 Arrangement and method for transferring a pattern from a mask to a wafer |
| 05/18/2004 | US6737199 Avoids the formation of resist residue. |
| 05/13/2004 | WO2002093253A9 Backside alignment system and method |
| 05/13/2004 | US20040092081 Method of manufacturing alignment mark and aligning method using the same |
| 05/13/2004 | US20040092080 Marks and method for multi-layer alignment |
| 05/13/2004 | US20040091791 Scatter dots |
| 05/13/2004 | US20040091790 Reducing corner rounding and image shortening |
| 05/13/2004 | US20040091789 Subtractive attenuation and phase shifting; accurate opening depth; simplified manufacturing |
| 05/13/2004 | US20040091788 Reduced darkening upon repeated exposures |
| 05/13/2004 | US20040090607 Position detecting method, position detecting apparatus, exposure method, exposure apparatus, making method thereof, and device and device manufacturing method |
| 05/13/2004 | US20040090129 Positioning apparatus and charged-particle-beam exposure apparatus |
| 05/12/2004 | EP1417542A2 A method of substrate processing and photoresist exposure |
| 05/12/2004 | CN1495540A Alignment system of photoetching system utilizing at least two wavelengths and its method |
| 05/12/2004 | CN1495538A Alignment method of array optical probe scanning integrated circuit photoetching system and its equipment |
| 05/12/2004 | CN1495536A Method for aligning with base, computer program, production method of device and device made up by using said method |
| 05/12/2004 | CN1495521A Method for implementing key size linear control in whole-chip chrome-less photoetching technique production |
| 05/12/2004 | CN1495444A Method for designing phase raster graphics and method for making photomask system containing it |
| 05/06/2004 | WO2004038504A2 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication |
| 05/06/2004 | US20040088071 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device |
| 05/06/2004 | US20040087249 Alignment mark and exposure alignment system and method using the same |
| 05/06/2004 | US20040086792 Lithographic mask for semiconductor devices with a polygonal-section etch window, in particular having a section of at least six sides |