| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 08/05/2004 | US20040151988 EUV mask blank defect mitigation |
| 08/05/2004 | US20040150824 Alignment method and apparatus and exposure apparatus |
| 08/05/2004 | US20040150823 Exposure apparatus and aligning method |
| 08/05/2004 | US20040149687 Method of manufacturing a vacuum chuck used in imprint lithography |
| 08/05/2004 | DE10302342A1 Production of substrate used in the production of mask or optical component comprises preparing a base layer, applying a first covering layer on the base layer, and post-treating the covering layer |
| 08/05/2004 | DE10297154T5 Phasenverschiebungs-Moiré-Fokusmonitor Phase shift Moiré FokusMonitor |
| 08/04/2004 | CN1517799A Perfluoropolyether liquid film and method for cleaning mask using perfluoropolyether liquid |
| 08/04/2004 | CN1517798A Horizon sensor for photoetching device |
| 08/04/2004 | CN1517797A Detecting assembly and photoetching projector with the detecting assembly |
| 08/04/2004 | CN1160762C Electronic beam exposure mask, exposure method and equipment and method for making semiconductor device |
| 08/03/2004 | US6772084 Overlay measurements using periodic gratings |
| 08/03/2004 | US6770890 Stage devices including linear motors that produce reduced beam-perturbing stray magnetic fields, and charged-particle-beam microlithography systems comprising same |
| 08/03/2004 | US6770402 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 07/29/2004 | WO2004063814A2 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 07/29/2004 | WO2004047156B1 Position measurement method, position measurement device, exposure method, and exposure device |
| 07/29/2004 | US20040146792 Dimensional variations in the original pattern are produced by bending the mold, defining a varied pattern |
| 07/29/2004 | US20040146789 based on discovery that the flatness of the mask substrate was degraded after chucked depending on the surface shape of the mask substrate, and found that such degraded flatness was a major cause to lower the product yield |
| 07/29/2004 | US20040146788 Method of manufacturing a photo mask and method of manufacturing a semiconductor device |
| 07/28/2004 | EP1441258A2 Alignment method and apparatus and exposure apparatus |
| 07/27/2004 | US6768539 Lithographic apparatus |
| 07/27/2004 | US6768213 Automated combi deposition apparatus and method |
| 07/27/2004 | US6767673 Creating a layer of protective semiconductor material over the surface of pattern of phase shifter material provided over surface of faulty element |
| 07/27/2004 | US6767170 Wafer handling system and wafer handling method |
| 07/27/2004 | US6766742 Image exposure apparatus |
| 07/22/2004 | WO2003065120A3 Microcontact printing |
| 07/22/2004 | US20040142256 Alternate side lithographic substrate imaging |
| 07/22/2004 | US20040142254 high-quality color filter for multi-scene displays' forming a first density area corresponding to transmissive image reproduction and a second density area corresponding to a second density area |
| 07/22/2004 | US20040142252 Method of machining glass |
| 07/22/2004 | US20040142249 making integrated circuits using absorbent transmission masks that can be repaired |
| 07/22/2004 | US20040142108 electrostatic chucking for attracting a subject for deposition using electrostatic attraction |
| 07/22/2004 | US20040141163 Device for holding a template for use in imprint lithography |
| 07/22/2004 | DE10355960A1 Ausrichtung von Masken innerhalb von Zellen für eine verbesserte Überdeckung Alignment of masks within cells for improved coverage |
| 07/21/2004 | EP1439428A2 Level sensor for lithographic apparatus |
| 07/21/2004 | EP1439421A2 Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid |
| 07/21/2004 | CN1514306A Manufacturing method of photoetching equipment and device, and device obtained therefrom |
| 07/20/2004 | US6766211 Mmeasuring and controlling single nanometer alignment; using unique mark combined with mathematical analysis |
| 07/20/2004 | US6765647 Exposure method and device |
| 07/20/2004 | US6765218 Lithographic projection apparatus with positioning system for use with reflectors |
| 07/15/2004 | WO2004059699A2 System and method for on-the-fly eccentricity recognition |
| 07/15/2004 | WO2004059690A1 An extractor for an microcoloum, an alignment method for an extractor aperture to an electon emitter, and a measuring method and an alignment method using thereof |
| 07/15/2004 | WO2004059245A1 System and method for detecting and correcting position deviations of an object having a curved surface |
| 07/15/2004 | WO2004008246A3 Method and system for context-specific mask writing |
| 07/15/2004 | US20040138842 Method for determining rotational error portion of total misalignment error in a stepper |
| 07/15/2004 | US20040137677 Device manufacturing method and computer program |
| 07/15/2004 | US20040137340 Method for evaluating photo mask and method for manufacturing semiconductor device |
| 07/15/2004 | US20040137337 includes providing an attenuated phase shift mask comprising an etched opening extending through a thickness of a light blocking layer and an underlying light attenuating layer to reveal a quartz substrate the opening including an unetched portion |
| 07/15/2004 | US20040137336 for use in a photolithographic apparatus includes a blank layer, a layer of patterned opaque material on a surface of the blank layer and a pellicle of perfluoropolyether (PFPE) liquid that covers the surface |
| 07/15/2004 | US20040136494 Lithographic apparatus and device manufacturing method |
| 07/15/2004 | US20040135981 Exposure apparatus and method |
| 07/15/2004 | DE10259322A1 Making alignment mark in opaque layer on substrate, forms trenches of differing depth, fills selectively, then adds and polishes further layers to leave defined opaque mark |
| 07/14/2004 | CN1512545A Templet mask for charging-proof and its producing method |
| 07/13/2004 | US6762826 Substrate attracting and holding system for use in exposure apparatus |
| 07/13/2004 | US6762825 Focal point position detecting method in semiconductor exposure apparatus |
| 07/08/2004 | US20040133369 Method and system for context-specific mask inspection |
| 07/08/2004 | US20040131978 Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography |
| 07/08/2004 | US20040131977 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 07/08/2004 | US20040131953 Photomask correction method using composite charged particle beam, and device used in the correction method |
| 07/08/2004 | US20040131951 Mask, manufacturing method for mask, and manufacturing method for semiconductor device |
| 07/08/2004 | US20040131949 Single ultraviolet radiation exposure |
| 07/08/2004 | US20040131947 Having film stack with deep trenches and specific sidewall shape; radiation absorption |
| 07/08/2004 | US20040131352 Plate registering system and method of operation |
| 07/08/2004 | US20040130691 Off-axis levelling in lithographic projection apparatus |
| 07/08/2004 | US20040130690 Alignment system and methods for lithographic systems using at least two wavelengths |
| 07/08/2004 | US20040130689 Defect compensation of lithography on non-planar surface |
| 07/08/2004 | US20040129900 Device inspection |
| 07/08/2004 | US20040129383 Flexographic printing method |
| 07/07/2004 | EP1435289A1 Plate registering system and method of operation |
| 07/07/2004 | CN1510525A Dividing scale focus measuring system and method by multiple interferometric beams |
| 07/07/2004 | CN1510522A Device manufacturing method |
| 07/07/2004 | CN1510519A Photoetching device with aligning subsystem, manufacturng method for device with alignment and aligning structure |
| 07/06/2004 | US6760640 Automated manufacturing system and method for processing photomasks |
| 07/06/2004 | US6760094 Aligner |
| 07/06/2004 | US6760054 Imaging apparatus utilizing laser beams |
| 07/06/2004 | US6759171 Alternating aperture phase shifting photomask with improved intensity balancing |
| 07/01/2004 | WO2004055607A2 Apparatus for processing an object with high position accurancy |
| 07/01/2004 | WO2004054784A1 Magnification corrections employing out-of-plane distortions on a substrate |
| 07/01/2004 | US20040126907 Alignment apparatus and exposure apparatus using the same |
| 07/01/2004 | US20040126678 Substrate is divided into an active area for realizing image and a dummy area for not realizing image; filling red, green, and blue colored inks into groove of cliche |
| 07/01/2004 | US20040126676 Method of manufacturing color filter |
| 07/01/2004 | US20040126672 Data processing to design, manufacture, and/or inspect a mask to help print target pattern more accurately; integrated circuits, computers |
| 07/01/2004 | US20040126670 High performance EUV mask |
| 07/01/2004 | US20040126004 Evaluation method, position detection method, exposure method and device manufacturing method, and exposure apparatus |
| 07/01/2004 | US20040124412 Misalignment test structure and method thereof |
| 07/01/2004 | US20040124375 Method of aligning a substrate, computer program, device manufacturing method and device manufactured thereby |
| 07/01/2004 | US20040124363 Method and apparatus for inspecting a pattern formed on a substrate |
| 06/30/2004 | EP1434335A2 Alignment apparatus and exposure apparatus using the same |
| 06/30/2004 | EP1434103A2 Lithographic apparatus with alignment subsystem, device manufacturing method using alignment, and alignment structure |
| 06/30/2004 | CN1508632A Photoetching projection mask and method for producing device using same and the device obtained therefrom |
| 06/29/2004 | US6757886 Alternating phase shift mask design with optimized phase shapes |
| 06/29/2004 | US6757875 Method and apparatus of evaluating layer matching deviation based on CAD information |
| 06/29/2004 | US6757049 Apparatus and method for exposure |
| 06/29/2004 | US6756168 Determining exposure time of wafer photolithography process |
| 06/29/2004 | US6755132 Registration pin system |
| 06/24/2004 | WO2004053954A1 Exposure apparatus and method for manufacturing device |
| 06/24/2004 | WO2004053426A1 Apparatus and methods for detecting overlay errors using scatterometry |
| 06/24/2004 | WO2003104929A3 Use of overlay diagnostics for enhanced automatic process control |
| 06/24/2004 | US20040121243 Damage-resistant coatings for EUV lithography components |
| 06/24/2004 | US20040121242 Sidelobe correction for attenuated phase shift masks |
| 06/24/2004 | US20040119973 Exposure apparatus inspection method and exposure apparatus |
| 06/24/2004 | US20040119970 Test pattern, inspection method, and device manufacturing method |