| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 09/09/2004 | US20040175629 Stack overcoating semiconductor substrate; ruthenium or chromium layer; patterning using optical radiation |
| 09/09/2004 | US20040174511 Lithographic apparatus |
| 09/09/2004 | US20040174510 Alignment method and exposure apparatus using the method |
| 09/09/2004 | US20040174508 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/09/2004 | US20040174507 Method and system for optimizing parameter value in exposure apparatus and exposure apparatus and method |
| 09/08/2004 | EP1454112A2 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 09/08/2004 | CN1527139A Photoetching apparatus and devices producing method |
| 09/08/2004 | CN1165994C Wafer level integration of multiple optical elements |
| 09/07/2004 | US6788431 Image processing method and image reading method |
| 09/07/2004 | US6788390 Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant |
| 09/07/2004 | US6788385 Stage device, exposure apparatus and method |
| 09/07/2004 | US6787930 Alignment marks and manufacturing method for the same |
| 09/02/2004 | US20040170905 Binary OPC for assist feature layout optimization |
| 09/02/2004 | US20040170771 Moving a liquid between a substrate and a template, forming an oblique angle in a plane reducing the distance between substrate and plane and forming a dispersion |
| 09/02/2004 | US20040169862 Wafer alignment device and method |
| 09/02/2004 | US20040169861 Apparatus and method for detecting overlay errors using scatterometry |
| 09/02/2004 | US20040169833 Exposure apparatus and exposure method |
| 09/02/2004 | US20040169832 Vacuum chamber having instrument-mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same |
| 09/02/2004 | US20040169441 Apparatus to orientate a body with respect to a surface |
| 09/02/2004 | US20040169008 Forming a substrate with windows and filling the windows multiple times, forming a support membrane over the substrate, and a mask layer is then formed and patterned |
| 09/02/2004 | US20040168632 Manufacturing system in electronic devices |
| 09/02/2004 | US20040168588 Method of orientating a template with respect to a substrate in response to a force exerted on the template |
| 09/02/2004 | US20040168586 Imprint lithography template having a feature size under 250 nm |
| 09/01/2004 | CN1525251A 曝光机构和曝光方法 Exposure institutions and exposure method |
| 09/01/2004 | CN1525245A Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 09/01/2004 | CN1525142A Mark position detection equipment |
| 08/31/2004 | US6785878 Correcting a mask pattern using multiple correction grids |
| 08/31/2004 | US6785583 Management system and apparatus, method therefor, and device manufacturing method |
| 08/31/2004 | US6785005 Switching type dual wafer stage |
| 08/31/2004 | US6784974 Exposure method and exposure apparatus |
| 08/31/2004 | US6784070 Intra-cell mask alignment for improved overlay |
| 08/26/2004 | WO2004072735A1 Mask correcting method |
| 08/26/2004 | WO2004072734A2 Transmission mask with differential attenuation to improve iso-dense proximity |
| 08/26/2004 | US20040168147 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
| 08/26/2004 | US20040168146 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA |
| 08/26/2004 | US20040167743 System and method for on-the-fly eccentricity recognition |
| 08/26/2004 | US20040166420 Substrate for the micro-lithography and process of manufacturing thereof |
| 08/26/2004 | US20040166419 Resolution and process window improvement using lift-off |
| 08/26/2004 | US20040166418 Adjusting line width deviations |
| 08/26/2004 | US20040165195 Position sensor |
| 08/26/2004 | US20040165169 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby |
| 08/26/2004 | US20040165166 Exposure apparatus and production method of device using the same |
| 08/26/2004 | US20040165159 Lithographic apparatus and device manufacturing method |
| 08/26/2004 | DE10337262A1 Fotomaske, Verfahren zum Herstellen einer elektronischen Vorrichtung, Verfahren zum Herstellen einer Fotomaske Photomask, method for manufacturing an electronic device, method of manufacturing a photomask |
| 08/25/2004 | EP1450398A2 A method and an apparatus for positioning a substrate relative to a support stage |
| 08/25/2004 | EP1450211A2 Device and method for wafer alignment with reduced tilt sensitivity |
| 08/25/2004 | EP1450210A1 Apparatus and method for detecting the edge of a recording material |
| 08/25/2004 | EP1450182A2 Substrate for UV-lithography and fabrication process therefor |
| 08/25/2004 | CN1524203A A method of substrate processing and photoresist exposure |
| 08/25/2004 | CN1524202A Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
| 08/25/2004 | CN1523639A Photomask, pattern formation method using photomask and mask data creation method |
| 08/25/2004 | CN1523446A Mask graphics producing method and mask graphics producing device |
| 08/25/2004 | CN1523445A Light shield for contacting window making process and making process thereof |
| 08/24/2004 | US6781674 System and method to increase throughput in a dual substrate stage double exposure lithography system |
| 08/24/2004 | US6781669 Methods and apparatuses for substrate transporting, positioning, holding, and exposure processing, device manufacturing method and device |
| 08/24/2004 | US6780775 Design of lithography alignment and overlay measurement marks on CMP finished damascene surface |
| 08/24/2004 | US6780548 Decreased diffraction |
| 08/19/2004 | US20040161679 Loading into layout processing software the GDS data for two layers that define a transistor; generating a phase mask; inputting gate block data that includes assigned phase areas and polygate areas; generating a trim mask; providing a modified GDS |
| 08/19/2004 | US20040161678 For forming a fine pattern in fabrication of semiconductor integrated circuit devices |
| 08/19/2004 | US20040161677 Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 08/19/2004 | US20040161676 For lateral growth from a crystal nucleus and produce a crystallized semiconductor film with a large particle size |
| 08/19/2004 | US20040161675 Phase shifting lithographic process |
| 08/19/2004 | US20040161674 Graytone mask and method thereof |
| 08/19/2004 | DE10303902A1 Alignment microscope alignment method in which a reflective alignment mask is used with actual and reflected markings superimposed to indicate alignment |
| 08/18/2004 | EP1447718A2 Exposure apparatus and method |
| 08/18/2004 | EP1447715A2 Lithographic apparatus and method to detect correct clamping of an object |
| 08/18/2004 | EP1447711A2 Photomask, pattern formation method using photomask and mask data creation method |
| 08/18/2004 | CN1522098A Mask vapor deposition method and apparatus, mask, process for manufacturing display panel, display panel and electronic device |
| 08/18/2004 | CN1521568A Device and method for wafer alignment with reduced tilt sensitivity |
| 08/17/2004 | US6778280 Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components |
| 08/17/2004 | US6778258 Wafer handling system for use in lithography patterning |
| 08/17/2004 | US6777147 Method for evaluating the effects of multiple exposure processes in lithography |
| 08/17/2004 | US6777146 Adjusting line width deviations |
| 08/17/2004 | US6777144 Photolithography semiconductor photoresist |
| 08/17/2004 | US6777143 Optical lithographic exposure apparatus; suitable for double-exposure procedures in the manufacture of integrated circuits |
| 08/17/2004 | US6777139 Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby |
| 08/12/2004 | US20040157408 Dual sided lithographic substrate imaging |
| 08/12/2004 | US20040157135 For the proximity effects in the imaging of patterns in a photolithography |
| 08/12/2004 | US20040157134 Simulation based PSM clear defect repair method and system |
| 08/12/2004 | US20040156028 Both side projection exposure apparatus |
| 08/12/2004 | US20040156027 Lithographic projection mask, device manufacturing method, and device manufactured thereby |
| 08/11/2004 | EP1445654A2 Double layer patterning and technique for milling patterns |
| 08/11/2004 | CN1519955A Thin film transistor array panel, its mfg. method and mask for such panel |
| 08/11/2004 | CN1519654A Micro imaging method capable of reducing influencc of lens aberration |
| 08/11/2004 | CN1519653A Photoetching mask, its making method and making appts. |
| 08/11/2004 | CN1519647A Light mask, mfg. method of electronic device and mfg. method of light mask |
| 08/10/2004 | US6774375 Method and apparatus for forming a curved polyline on a radiation-sensitive resist |
| 08/10/2004 | US6773871 Method of machining glass |
| 08/10/2004 | US6773853 Exposing a partial area of a resist film formed on a surface of a substrate to light of different intensities; developing the resist film exposed |
| 08/10/2004 | US6772691 System and method for registering media in an imaging system |
| 08/05/2004 | WO2004066358A2 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 08/05/2004 | WO2004066028A2 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 08/05/2004 | WO2004066027A2 Electron beam processing for mask repair |
| 08/05/2004 | WO2004065287A2 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 08/05/2004 | WO2004001508A3 Method and apparatus for maskless photolithography |
| 08/05/2004 | US20040151993 Patterning light-shielding film; mounting pellicle on mask substrate; inspection; repairing defects |
| 08/05/2004 | US20040151992 Photomask, and method and apparatus for producing the same |
| 08/05/2004 | US20040151991 Photolithography mask repair |
| 08/05/2004 | US20040151990 Photomask assembly incorporating a porous frame and method for making it |
| 08/05/2004 | US20040151989 Photo mask, method of manufacturing electronic device, and method of manufacturing photo mask |