| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 10/12/2004 | US6803158 Photomask and method for forming an opaque border on the same |
| 10/07/2004 | WO2004086143A2 Multi-step process for etching photomasks |
| 10/07/2004 | US20040198017 Method to solve alignment mark blinded issues and technology for application of semiconductor etching at a tiny area |
| 10/07/2004 | US20040197676 Method for forming an opening in a light-absorbing layer on a mask |
| 10/07/2004 | US20040197675 Stencil mask with charge-up prevention and method of manufacturing the same |
| 10/07/2004 | US20040197673 Photo reticles using channel assist features |
| 10/07/2004 | US20040197671 A phase shift mask |
| 10/07/2004 | US20040195704 Alignment marks and manufacturing method for the same |
| 10/07/2004 | US20040195530 Apparatus for measuring gap between mask and substrate using laser displacement sensor, and method thereof |
| 10/07/2004 | DE10338048A1 Phasenverschiebungsmaske, Verfahren zumBilden eines Musters mit einer Phasenverschiebungsmaske, Verfahren zum Herstellen einer elektronischen Vorrichtung Phase shift mask method zumBilden a pattern having a phase shift mask method for manufacturing an electronic device |
| 10/06/2004 | EP1465018A2 Correction in scanning direction of mask-to-object shift due to Z offset and non-perpendicular illumination |
| 10/06/2004 | EP1465017A2 Semiconductor wafer and exposure mask with alignment marks, mark detecting method and method of exposure |
| 10/06/2004 | EP1465009A2 Photo reticles using channel assist features |
| 10/06/2004 | CN1534387A Photoetching mark structure, photoetching projection device and method of proceeding base plate aligning |
| 10/06/2004 | CN1534385A Transferring equipment used for transferring matter and its use method and photoetching projection equipment containing said transferring equipment |
| 10/06/2004 | CN1534271A Device detection |
| 10/05/2004 | US6801315 Method and system for overlay measurement |
| 10/05/2004 | US6801314 Alignment system and method using bright spot and box structure |
| 10/05/2004 | US6801313 Grooved pattern surrounding mark pattern formed by engraving protects against deformation by thermal expansion or contraction |
| 10/05/2004 | US6801302 Plate registering system and method of operation |
| 10/05/2004 | US6801300 System and method for switching position signals during servo control of a device table |
| 10/05/2004 | US6800428 Generating enlargement pattern; conveying pattern edges; protective coatings; exposure, development |
| 09/30/2004 | WO2004083960A2 Alternating aperture phase shift photomask having light absorption layer |
| 09/30/2004 | US20040194042 Method and apparatus of evaluating layer matching deviation based on CAD information |
| 09/30/2004 | US20040192063 Method of producing a glass substrate for a mask blank and method of producing a mask blank |
| 09/30/2004 | US20040191935 Detection assembly and lithographic projection apparatus provided with such a detection assembly |
| 09/30/2004 | US20040191648 Applying optical adjustment to first pattern; dividing into zones; sampling; determination edges; calibration |
| 09/30/2004 | US20040191646 Sputtering layers of phase shifting mask on substrates; concurrent discharging various targets; reducing defects |
| 09/30/2004 | US20040191645 Method and apparatus for forming crystalline portions of semiconductor film |
| 09/30/2004 | US20040191644 Mask pattern generating method and mask pattern generating apparatus |
| 09/30/2004 | US20040191642 Multiple stepped aperture repair of transparent photomask substrates |
| 09/30/2004 | US20040191639 Surface of pattern having organosilicon release agents |
| 09/30/2004 | US20040191638 Phase shifting mask shapes; lithographic shortening; calibration; shape design ; integrated circuits |
| 09/30/2004 | US20040190008 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 09/30/2004 | US20040189995 Position detection apparatus |
| 09/30/2004 | US20040189974 Perforation and image exposure system |
| 09/30/2004 | US20040189973 Substrate exposure system |
| 09/30/2004 | US20040189966 Lithographic apparatus and device manufacturing method |
| 09/30/2004 | US20040189964 Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method |
| 09/30/2004 | US20040189963 Exposure apparatus and method |
| 09/30/2004 | US20040189960 Plate positioning and processing method and plate positioning and processing apparatus |
| 09/30/2004 | US20040187722 Alignment system for lithographic apparatus for measuring a position of an alignment mark |
| 09/29/2004 | EP1463096A1 EXPOSURE DEVICE, EXPOSURE METHOD, METHOD OF PRODUCING SEMICONDUCTOR DEVICE, ELECTROOPTIC DEVICE, AND ELECTRONIC EQUIPMENT |
| 09/29/2004 | EP1462250A2 Plate positioning and processing method and plate positioning and processing apparatus |
| 09/29/2004 | EP0963572B1 Positioning device having three coil systems mutually enclosing angles of 120 degrees, and lithographic device comprising such a positioning device |
| 09/29/2004 | CN1532633A Base board exposure device |
| 09/29/2004 | CN1532631A Base board for optical mask, optical mask blank and optical mask |
| 09/28/2004 | US6798516 Projection exposure apparatus having compact substrate stage |
| 09/28/2004 | US6798491 Exposure apparatus and an exposure method |
| 09/28/2004 | US6797439 Anti-reflective coating, the substrate, the patterned anti-reflective layer, and the patterned absorber layer arranged in that order |
| 09/28/2004 | US6797438 Method and enhancing clear field phase shift masks with border around edges of phase regions |
| 09/23/2004 | WO2004072734A3 Transmission mask with differential attenuation to improve iso-dense proximity |
| 09/23/2004 | WO2004063814A3 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 09/23/2004 | US20040185350 A thin layer material combined with a radiation-opaque layer material with different etch selectivity facilitate a multi-stage patterning treatment of an underlying mask layer and a resultant critical dimension in the patterned mask; accuracy |
| 09/23/2004 | US20040185348 optical lithography; radiation transparent; semiconductors/integrated circuits |
| 09/23/2004 | US20040184036 Substrate alignment apparatus and method, and exposure apparatus |
| 09/23/2004 | US20040184018 Abbe arm calibration system for use in lithographic apparatus |
| 09/23/2004 | DE10307523A1 Process for preparation of an auxiliary mask for structuring of semiconductor substrates, giving a photoresist film useful for Si wafers, for production of trenches for deep-trench transistors, and as a mask for dry etching processes |
| 09/23/2004 | DE102004004854A1 Fotomaske sowie Verfahren und Vorrichtung zu ihrer Herstellung Photomask and method and apparatus for the production thereof |
| 09/22/2004 | CN1531668A Template for room temperature, low pressure micro-and nano-imprint lithography |
| 09/22/2004 | CN1531019A Producing method for X-ray mask and semiconductor device |
| 09/22/2004 | CN1530747A Device manufacturing method and computer programm |
| 09/21/2004 | US6795747 Reducing asymmetrically deposited film induced registration error |
| 09/21/2004 | US6795164 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/21/2004 | US6794665 Electron beam drawing apparatus |
| 09/21/2004 | US6794625 Dynamic automatic focusing method and apparatus using interference patterns |
| 09/21/2004 | US6794263 Method of manufacturing a semiconductor device including alignment mark |
| 09/21/2004 | US6794118 Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
| 09/21/2004 | US6794117 Blending to provide photosensitive, water soluble inks; drying to produce coated receiving layer on transparent support; imaging, development; accurate proofs |
| 09/21/2004 | US6794096 Phase shifting mask topography effect correction based on near-field image properties |
| 09/21/2004 | US6792861 Image recorder with recording material feed unit |
| 09/16/2004 | WO2004079780A2 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 09/16/2004 | WO2004079779A2 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 09/16/2004 | US20040180294 Lithographic printing with polarized light |
| 09/16/2004 | US20040180275 Color filter transfer film and method of fabricating color filter panel for use in liquid crystal display device |
| 09/16/2004 | US20040180273 Methods of forming aligned structures with radiation-sensitive material |
| 09/16/2004 | US20040180272 Methods of printing structures |
| 09/16/2004 | US20040180268 Method of manufacturing photomask |
| 09/16/2004 | US20040180267 binary photomask may include glass and chrome features which form a pattern |
| 09/16/2004 | US20040179184 Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby |
| 09/16/2004 | US20040179181 Lithographic device and method for wafer alignment with reduced tilt sensitivity |
| 09/16/2004 | US20040179180 Exposure apparatus, exposure method, and device manufacturing method |
| 09/16/2004 | US20040179177 Exposure method |
| 09/16/2004 | US20040179176 Exposure apparatus |
| 09/16/2004 | US20040178570 Device and method for detecting the edge of a recording material |
| 09/16/2004 | DE20122196U1 Imprint lithography template for producing microelectronic devices, has multiple recesses of specified size and alignment marks and is transparent to activating light |
| 09/15/2004 | EP1457839A2 Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus |
| 09/15/2004 | EP1457828A2 Focus spot monitoring in a lithographic projection apparatus |
| 09/15/2004 | CN1529827A Generation of library of periodic grating diffraction signals |
| 09/10/2004 | WO2004077535A1 Projection exposing method and unit, and device producton method |
| 09/10/2004 | WO2004077534A1 Detection method of optimal position detection equation, positioning method, exposure method, device manufacturing method, and device |
| 09/10/2004 | WO2004077156A1 Photomask and its production method, and pattern forming method |
| 09/10/2004 | WO2004077155A1 Method for fabricating photomask and semiconductor device |
| 09/10/2004 | WO2004077154A2 Lithographic printing with polarized light |
| 09/10/2004 | WO2004076963A2 Apparatus and method for detecting overlay errors using scatterometry |
| 09/10/2004 | WO2004031856A3 Photomask assembly incorporating a porous frame and method for making it |
| 09/09/2004 | US20040176861 System for controlling a position of a mass |
| 09/09/2004 | US20040175635 Alternating phase shift mask design with optimized phase shapes |
| 09/09/2004 | US20040175631 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications |
| 09/09/2004 | US20040175630 overlying an absorber stack that overlies a reflective substrate; the multilayer antireflective coating has layers of nitrogen, oxygen and nitrogen combined with the predetermined metal of the upper layer of the absorber stack; making semiconductors at lower wavelengths |