G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
11/2004
11/16/2004	US6819433 Exposure apparatus including interferometer system
11/16/2004	US6819425 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/16/2004	US6819406 Aligner
11/16/2004	US6819403 Illumination optical system, exposure apparatus, and microdevice manufacturing method
11/16/2004	US6819400 Lithographic apparatus and device manufacturing method
11/16/2004	US6819399 Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask
11/16/2004	US6818532 Method of etching substrates
11/16/2004	US6818515 Method for fabricating semiconductor device with loop line pattern structure
11/16/2004	US6818365 Feed forward leveling
11/16/2004	US6818362 Photolithography reticle design
11/11/2004	WO2004066358A3 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
11/11/2004	US20040224458 Method and apparatus for manufacturing semiconductor device
11/11/2004	US20040224243 comprises silicon substrate with aperture, silicon oxide film formed on surface, single crystal silicon layer with aperture (for passing exposure beam) formed on film, and stress controlling layer for decreasing warping and high positioning precision; photomasks/photoresists
11/11/2004	US20040224242 forming focus monitor marks and exposure monitor marks on semiconductor wafers/liquid crystal displays, to measure effective exposure
11/11/2004	US20040224241 Thin film transistor array panel, manufacturing method thereof, and mask therefor
11/11/2004	US20040224239 steps of mapping a first phase onto a first mask, mapping a second phase onto a second mask, and mapping a trim onto the first mask or second mask (or both)
11/11/2004	US20040224238 maintenance of photomasks by coating photoresist layers on masks, then aligning using optical projectors, exposing and developing; microelectronics
11/11/2004	US20040224237 photomasks/photoresists; scanning electron microscopy; microelectronics
11/11/2004	US20040223157 Position measuring device, position measurement method, exposure apparatus, exposure method, and superposition measuring device and superposition measurement method
11/11/2004	US20040222385 Substrate testing device and substrate testing method
11/11/2004	US20040222187 Photoetching; adjustment mask; radiation
11/11/2004	US20040221678 Illuminated decorative shifter boot
11/11/2004	DE10317893A1 Maskierungsanordnung und Verfahren zum Herstellen von integrierten Schaltungsanordnungen Masking arrangement and method for producing integrated circuit arrangements
11/11/2004	DE10317792A1 Maskenrohling zur Verwendung in der EUV-Lithographie und Verfahren zu dessen Herstellung Mask blank for use in the EUV lithography and a process for its preparation
11/10/2004	EP1475664A2 Mask, mask blank, and methods of producing these
11/10/2004	EP1475663A2 Mask blank for use in EUV-lithography and its process of manufacture
11/09/2004	US6816568 X-ray projection exposure device, X-ray projection exposure method, and semiconductor device
11/09/2004	US6816239 Exposure apparatus, method of controlling same, and method of manufacturing devices
11/09/2004	US6815826 Alignment for buried structures formed by surface transformation of empty spaces in solid state materials
11/09/2004	US6815702 Method and apparatus for detection of an edge of a printing plate mounted on a drum imaging system
11/09/2004	US6815128 Box-in-box field-to-field alignment structure
11/04/2004	WO2004095135A2 Optical arrangement of autofocus elements for use with immersion lithography
11/04/2004	WO2004038504A3 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication
11/04/2004	WO2004027684A3 Photolithography mask repair
11/04/2004	US20040219803 Arrangement for transferring information/structures to wafers
11/04/2004	US20040219463 Easily removal of marking without defect; patterning multilayer photoresist masking layer covering marking; etching
11/04/2004	US20040219461 Parallelism adjustment device
11/04/2004	US20040219439 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
11/04/2004	US20040219437 EUV (extreme ultraviolet lithography) is transmitted onto reflection mask at grazing incident angle to develop a pattern image to a photoresist layer on surface of wafer; shape is dependent on plurality of reflective regions; controlling surface roughness and defects
11/04/2004	US20040219436 computers and/or software used for adjustment photomasks during fabrication integrated circuits
11/04/2004	US20040219435 Projecting light through a photomask using an optical projection system, sub-resolution features in clear areas adjacent to lines and spaces reduce transparency of the clear areas reduce light scattering and flare, greater degree of defocus in the pattern, less resist stripping
11/04/2004	US20040218185 Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment
11/04/2004	US20040218158 Exposure method and device
11/04/2004	US20040217435 Mask and method for making the same, and method for making semiconductor device
11/03/2004	CN1542551A Focus spot monitoring in a lithographic projection apparatus
11/02/2004	US6813002 Exposure method and apparatus, method of making exposure apparatus, device and device manufacturing method
11/02/2004	US6813001 Exposure method and apparatus
11/02/2004	US6813000 Exposure method and apparatus
11/02/2004	US6812933 Method for rendering algebraically defined two-dimensional shapes by computing pixel intensity using an edge model and signed distance to the nearest boundary
11/02/2004	US6812129 Reticle for creating resist-filled vias in a dual damascene process
11/02/2004	US6811953 Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice
11/02/2004	US6811932 Method and system for determining flow rates for contact formation
10/2004
10/28/2004	WO2004092865A2 Selection method, exposure method, selection device, exposure device, and device manufacturing method
10/28/2004	WO2004092829A2 Masking arrangement and method for producing integrated circuit arrangements
10/28/2004	US20040214097 Automated manufacturing system and method for processing photomasks
10/28/2004	US20040212801 Wafer Alignment System Using Parallel Imaging Detection
10/28/2004	US20040211922 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/28/2004	US20040211921 Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method
10/28/2004	US20040211920 Lithographic apparatus and device manufacturing method
10/27/2004	CN1541415A Design of lithography alignment and overlay measurement marks on CMP finished damascene surface
10/27/2004	CN1173224C Vertical correcting working table mechanism
10/26/2004	US6809827 Self referencing mark independent alignment sensor
10/26/2004	US6809802 Substrate attracting and holding system for use in exposure apparatus
10/26/2004	US6809002 Method of manufacturing an alignment mark
10/21/2004	WO2004090979A2 Overlay metrology mark
10/21/2004	WO2004090635A1 Method of producing photomask and photomask blank
10/21/2004	WO2004049063A3 Photomask and method for creating a protective layer on the same
10/21/2004	WO2004021081A3 Method for the production of a phase mask
10/21/2004	US20040209172 Defect correction method for a photomask
10/21/2004	US20040209171 inspected by disposing dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing the portion of the mask pattern portion with the dummy inspection pattern portion
10/21/2004	US20040209169 Defining a unique image property linked to the accurate placement of the assist features, and combines that with in-situ image simulation of the individual layout; individual device on the photomask layout are marked with error marker shapes to be subsequently corrected; computer readable media
10/21/2004	US20040207856 Design system of alignment marks for semiconductor manufacture
10/21/2004	US20040207824 Lithographic apparatus and device manufacturing method
10/21/2004	US20040207269 Lithographic apparatus and motor for use in the apparatus
10/21/2004	DE10315086A1 Semiconductor wafer alignment method, by correcting optically measured position information for adjustment mark using line profile of adjustment mark
10/20/2004	EP1469355A1 Device manufacturing method
10/20/2004	EP1469348A1 Projection system and method of use thereof
10/20/2004	CN1539074A Displacement detecting method, displacement detecting device and calibrating method thereof, and recording device of information recording medium original disk
10/20/2004	CN1538243A Projection system and method of use thereof
10/20/2004	CN1538242A Controlling position of mass in lithographic apparatus
10/20/2004	CN1538238A Mask for EUV photoetching and manufacturing method thereof
10/19/2004	US6807013 Projection aligner
10/19/2004	US6806549 Method of manufacturing semiconductor device including a step of forming element isolation trench and semiconductor device
10/19/2004	US6806477 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same
10/19/2004	US6806451 Thermal imaging medium absorbs radiation to suppress spurious reflections
10/19/2004	US6806035 Wafer serialization manufacturing process for read/write heads using photolithography and selective reactive ion etching
10/19/2004	US6806007 EUV mask which facilitates electro-static chucking
10/14/2004	WO2004088425A2 Contact masks and lithographic patterning methods using said masks
10/14/2004	US20040205687 Method and apparatus for fracturing polygons on masks used in an optical lithography process
10/14/2004	US20040204901 Position detecting method and apparatus
10/14/2004	US20040201833 Lithographic apparatus
10/14/2004	US20040201097 Semiconductor device and method for manufacturing the same
10/14/2004	DE10311855A1 Appliance for transfer of information or structures onto wafer, using stamp with raised structures produced by suitable method, e.g. photolithography in conjunction with etching
10/13/2004	CN1536640A Method for positioning substratge relatively to supporting table and its equipment
10/13/2004	CN1536438A Method for eliminating key size deviation of dense pattern and single pattern
10/13/2004	CN1171126C Optical proximity effect correcting method
10/12/2004	US6804388 Method and apparatus of registering a printed circuit board
10/12/2004	US6803993 Lithographic apparatus and device manufacturing method
10/12/2004	US6803592 Position detection method and position detector, exposure method and exposure apparatus, and device and device manufacturing method
10/12/2004	US6803178 Two mask photoresist exposure pattern for dense and isolated regions

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