G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
12/2004
12/23/2004	US20040257570 Alignment routine for optically based tools
12/23/2004	US20040257554 Wafer handling method for use in lithography patterning
12/23/2004	US20040257552 Method and device for adjusting an alignment microscope by means of a reflective alignment mask
12/23/2004	US20040257551 System to increase throughput in a dual substrate stage double exposure lithography system
12/23/2004	US20040257550 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method
12/23/2004	US20040257549 Lithographic apparatus, projection system, method of projecting and device manufacturing method
12/23/2004	US20040257545 Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus
12/16/2004	WO2004055607A3 Apparatus for processing an object with high position accurancy
12/16/2004	US20040253819 Method for crystallizing silicon
12/16/2004	US20040253525 Photomask correcting method and manufacturing method of semiconductor device
12/16/2004	US20040253524 Substrate with light shielding film; measurement flatness of substrate; calibration; forming pattern ; optical images
12/16/2004	US20040253523 Embedded bi-layer structure for attenuated phase shifting mask
12/16/2004	US20040253522 Strip-like profile on surface of masking substrate with protective coatings
12/16/2004	US20040251775 Apparatus to control displacement of a body spaced-apart from a surface
12/15/2004	EP1486828A2 Lithographic apparatus and device manufacturing method
12/15/2004	CN1180315C Method for reducing optical proximity effect
12/14/2004	US6832045 Exposure device
12/14/2004	US6830853 Providing critical dimension control; working relatively large areas of opaque material
12/09/2004	WO2004107042A1 Method for evaluating the effects of multiple exposure processes in lithography
12/09/2004	WO2004095135A3 Optical arrangement of autofocus elements for use with immersion lithography
12/09/2004	US20040250233 A die with text deposited upon the die uses semiconductor processing techniques during fabrication, included in the die are a substrate, a first paragraph in contact with the substrate, a second paragraph in contact with the substrate and aligned with the first paragraph in a column
12/09/2004	US20040248045 for forming thin line portion having a line width thinner than a minimum line width which can be optically resolved by a projection exposure system by slimming a line width of a pattern transferred on a semiconductor substrate
12/09/2004	US20040248044 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
12/09/2004	US20040248018 to produce patterns of substantially the same size but having different pitches, including fine pitches; can be selectively isotropically etched to form an undercut under the portion of the opaque layer that extends between the second and third transparent regions
12/09/2004	US20040248017 Substrate for photomask, photomask blank and photomask
12/09/2004	US20040248016 Manually or automatically inserting into the layout file after locations of the attenuating feature are determined; forming resist features of uniform width
12/09/2004	US20040245956 Methods and apparatus for positioning a substrate relative to a support stage
12/09/2004	DE10303902B4 Verfahren und Vorrichtung zum Ausrichten eines Justier-Mikroskops mittels verspiegelter Justiermaske Method and apparatus for aligning an adjusting member by means of microscope mirrored Justiermaske
12/08/2004	EP1483628A1 Full phase shifting mask in damascene process
12/08/2004	EP1483627A2 Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same
12/07/2004	US6828071 Method of aligning a wafer and masks
12/07/2004	US6828068 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
12/02/2004	WO2004090979A3 Overlay metrology mark
12/02/2004	US20040241594 Method for removing color resist for exposure alignment
12/02/2004	US20040241558 Focus detection structure
12/02/2004	US20040241555 Photoresist layer is exposed with a mask; setting transmittance of side-lobe region lower than transmittance of intermediate region.
12/02/2004	US20040241554 Substrate having first index of refraction and level of transmittance to a wavelength of light; second portions of substrate are impregnated with dope; opaque layer rising above planar upper surface; image resolution
12/02/2004	US20040240922 Image recording apparatus and image recording method
12/02/2004	US20040239910 Stage device and control method therefor, exposure apparatus, and device manufacturing method
12/02/2004	US20040239906 Exposure apparatus and device fabrication method
12/02/2004	US20040239905 Lithographic apparatus, system, method, computer program, and apparatus for height map analysis
12/02/2004	US20040239902 System and method to increase throughput in a dual substrate stage double exposure lithography system
12/02/2004	DE10320135A1 Method for positioning chromium-plated masks e.g. for the manufacture of semiconductor components, involve optically determining the position of alignment marks of substrate relative to mask structure
12/01/2004	EP1482375A2 Lithographic apparatus and device manufacturing method
12/01/2004	EP1482374A2 Method of generating mask distortion data, exposure method and method of producing semiconductor device
12/01/2004	EP1482373A1 Lithographic apparatus and device manufacturing method
12/01/2004	EP1482368A2 Exposure apparatus and device fabrication method
12/01/2004	EP1482365A2 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
12/01/2004	CN1551310A Method for manufacturing semiconductor, electrooptical device, integrated circuit and electronic device
12/01/2004	CN1550914A Assembly comprising a sensor, a method therefor and a lithographic projection apparatus
12/01/2004	CN1550913A A method of calibrating a lithographic apparatus, an alignment method, a computer program, a lithographic apparatus and a device manufacturing method
12/01/2004	CN1550910A Method of characterising a process step and device manufacturing method
12/01/2004	CN1550906A Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
11/2004
11/30/2004	US6824937 Method and system for determining optimum optical proximity corrections within a photolithography system
11/25/2004	WO2004077154A3 Lithographic printing with polarized light
11/25/2004	US20040234870 Mask blank for use in EUV lithography and method for its production
11/25/2004	US20040234868 Novel modification of mask blank to avoid charging effect
11/25/2004	US20040233444 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233443 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233442 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233441 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233440 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233439 Apparatus and methods for detecting overlay errors using scatterometry
11/25/2004	US20040233411 Projection exposure apparatus and method
11/25/2004	US20040233410 Projection exposure apparatus and method
11/25/2004	US20040233407 Exposure apparatus and method
11/25/2004	US20040233404 Exposure device and exposure method
11/25/2004	US20040232316 Displacement detecting method, displacement detecting device, calibrating method thereof, and recording device of information recording medium original disk
11/25/2004	DE102004014244A1 Winkelige Phasenform für eine verminderte Beeinträchtigung des Layouts Angular phase form of decreased degradation of the layout
11/24/2004	EP1480083A2 Lithographic apparatus and device manufacturing method
11/24/2004	CN1549060A Method for removing colour light resistance in exposure positioning producing technology
11/24/2004	CN1549057A Exposure system and method with group compensation function
11/24/2004	CN1549056A Exposure system and method
11/24/2004	CN1549053A Optical hood for reducing lens aberration and pattern shifting and method
11/23/2004	US6822740 Method of measuring displacement of optical axis, optical microscope and evaluation mark
11/23/2004	US6822727 Exposure apparatus, method of manufacturing semiconductor devices, semiconductor manufacturing plant, method of maintaining exposure apparatus, and position detector
11/23/2004	US6821693 Method for adjusting a multilevel phase-shifting mask or reticle
11/23/2004	US6821687 Photo mask for fabricating semiconductor device having dual damascene structure
11/18/2004	WO2004099879A2 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same
11/18/2004	WO2004076963A3 Apparatus and method for detecting overlay errors using scatterometry
11/18/2004	US20040229471 Periodic patterns and technique to control misalignment between two layers
11/18/2004	US20040229140 Method of forming color filter layer and method of fabricating liquid crystal display device using the same
11/18/2004	US20040229136 Photo mask blank and photo mask
11/18/2004	US20040229131 Photomask pattern
11/18/2004	US20040229130 Configuring an array of micro-mirrors in a deep ultraviolet maskless photolithography system by generating an ideal mask layout representative of image characteristics associated with a desired image; next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout
11/18/2004	US20040229129 Reducing charging effects in photolithography reticle manufacturing
11/18/2004	US20040227945 Wafer, exposure mask, method of detecting mark and method of exposure
11/18/2004	US20040227944 Mark position detection apparatus
11/18/2004	US20040227925 Exposure apparatus
11/18/2004	US20040227924 Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof
11/18/2004	US20040227919 Projection exposure apparatus and method
11/18/2004	US20040226814 Electron beam processing for mask repair
11/17/2004	EP1477862A2 A method of calibrating a lithographic apparatus, an alignment method, a computer program, a lithographic apparatus and a device manufacturing method
11/17/2004	EP1477861A1 A method of calibrating a lithographic apparatus, an alignment method, a computer program, a lithographic apparatus and a device manufacturing method
11/17/2004	EP1477860A1 Lithographic marker structure compliant with microelectronic device processing
11/17/2004	EP1477857A1 Method of characterising a process step and device manufacturing method
11/17/2004	EP1477851A1 Device manufacturing method and lithographic apparatus
11/17/2004	EP0963573B1 Alignment device and lithographic apparatus comprising such a device
11/17/2004	CN1547684A Phase-shift-moire focus monitor
11/16/2004	US6819789 Scaling and registration calibration especially in printed circuit board fabrication

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