| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 01/20/2005 | WO2005005153A1 Method and device for accurately positioning a pattern on a substrate |
| 01/20/2005 | WO2004065287A3 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 01/20/2005 | US20050014077 Fiters; multilayer optical plates joined by adhesive; spreading of adhesive on edges; pressing |
| 01/20/2005 | US20050014076 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 01/20/2005 | US20050014075 Phase edge darkening binary masks |
| 01/20/2005 | US20050014074 Generating mask patterns for alternating phase-shift mask lithography |
| 01/20/2005 | US20050012915 Lithographic apparatus and device manufacturing method |
| 01/20/2005 | US20050012914 Multiple mask step and scan aligner |
| 01/20/2005 | DE10323378B3 Test mark arrangement for detection of alignment and measuring mark structures in lithographic structuring of substrate for integrated circuit manufacture using 5 parallel rows of differing test mark elements |
| 01/19/2005 | EP1498779A2 Marker structure for alignment or overlay |
| 01/19/2005 | CN1567096A Marking graph for X-ray photoetching alignment |
| 01/19/2005 | CN1185549C Optical nearby correcting method based on contact hole model |
| 01/18/2005 | US6844978 Bonding substrate containing optical elements; lithographical generation duplicating masters |
| 01/18/2005 | US6844933 System for processing semiconductor products |
| 01/18/2005 | US6844918 Alignment system and methods for lithographic systems using at least two wavelengths |
| 01/18/2005 | US6844696 Electromagnetic alignment and scanning apparatus |
| 01/18/2005 | US6844695 Electromagnetic alignment and scanning apparatus |
| 01/18/2005 | US6844244 Dual sided lithographic substrate imaging |
| 01/18/2005 | US6844121 Enhancing performance of projector system; high temperature deposition of optical filter material |
| 01/13/2005 | US20050009287 Alignment mark and method for manufacturing a semiconductor device having the same |
| 01/13/2005 | US20050009214 Method for aligning a wafer and apparatus for performing the same |
| 01/13/2005 | US20050008953 Design feature can be introduced into layout prior to correstion then removed prior to tapping of pattern onto reticle; printing design inot radiation sensitive material |
| 01/13/2005 | US20050008952 Methods of forming patterned reticles |
| 01/13/2005 | US20050008951 Methods of forming patterned reticles |
| 01/13/2005 | US20050008950 Methods of forming patterned reticles |
| 01/13/2005 | US20050008949 Methods of forming patterned reticles |
| 01/13/2005 | US20050008948 Suppression pattern deformation in longitudinal direction by wet washing |
| 01/13/2005 | US20050008947 Adjustment pattern; controlling exposure and focusing dosage; patterngenerated that reflects scattering |
| 01/13/2005 | US20050008946 Mask for charged particle beam exposure, and method of forming the same |
| 01/13/2005 | US20050008945 plasma/dry etching; photolithographic reticle; oxygen-free gas etches anti-reflective coating and patterned photoresistive material; integrated circuits |
| 01/13/2005 | US20050008944 Defect inspection of extreme ultraviolet lithography masks and the like |
| 01/13/2005 | US20050008943 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 01/13/2005 | US20050008942 [photomask with internal assistant pattern forenhancing resolution of multi-dimension pattern] |
| 01/13/2005 | US20050007572 Lithographic apparatus and device manufacturing method |
| 01/13/2005 | DE10309266B3 Verfahren zum Bilden einer Öffnung einer Licht absorbierenden Schicht auf einer Maske A method of forming an opening of a light-absorbing layer on a mask |
| 01/12/2005 | EP1496394A2 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 01/12/2005 | EP1496393A2 Complementary division mask, method of producing mask, and program |
| 01/12/2005 | EP1221073A4 A photolithography mask having a subresolution alignment mark window |
| 01/11/2005 | US6842889 Methods of forming patterned reticles |
| 01/11/2005 | US6842230 Exposing method |
| 01/11/2005 | US6841965 Guideless stage with isolated reaction stage |
| 01/11/2005 | US6841890 Wafer alignment mark for image processing including rectangular patterns, image processing alignment method and method of manufacturing semiconductor device |
| 01/11/2005 | US6841451 Method of fabricating semiconductor device having alignment mark |
| 01/11/2005 | US6841408 Method of alignment for buried structures formed by surface transformation of empty spaces in solid state materials |
| 01/11/2005 | US6841312 Method and apparatus for coupling a pellicle assembly to a photomask |
| 01/11/2005 | US6841311 Cleaning the surface of halftone shift masks that use MoSiON as shifter material |
| 01/11/2005 | US6841309 Damage resistant photomask construction |
| 01/11/2005 | US6841308 Phase shift lithography provides control of the phase of an exposure of light beam at a target |
| 01/11/2005 | US6841307 Photomask making method and alignment method |
| 01/06/2005 | WO2005001913A1 Stage control apparatus, stage control method, light exposure apparatus, and light exposure method |
| 01/06/2005 | WO2005001912A1 Method of measuring focus deviation in pattern exposure and pattern exposure method |
| 01/06/2005 | WO2005001898A2 Method of designing a reticle and forming a semiconductor device therewith |
| 01/06/2005 | WO2004027684B1 Photolithography mask repair |
| 01/06/2005 | US20050005256 Photomask and integrated circuit manufactured by automatically correcting design rule violations in a mask layout file |
| 01/06/2005 | US20050003284 Exposure, development of testing photoresist using photomask; forming hole pattern; measurement; adjustment |
| 01/06/2005 | US20050003280 Exposure to adjustment design pattern; shaping inclined edge zones; measurement calibration; drawing pattern using electron beams |
| 01/06/2005 | US20050003279 Positioning mask on semiconductor wafer; exposure; fading zones |
| 01/06/2005 | US20050003278 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same |
| 01/06/2005 | US20050002674 Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant |
| 01/06/2005 | US20050002553 Image pattern recording method |
| 01/06/2005 | US20050002070 Image forming apparatus and image forming method |
| 01/06/2005 | US20050002035 Exposure apparatus |
| 01/06/2005 | US20050002034 Overlay key with a plurality of crossings and method of measuring overlay accuracy using the same |
| 01/06/2005 | US20050002006 Image forming device |
| 01/06/2005 | US20050001180 System and method for monitoring the topography of a wafer surface during lithographic processing |
| 01/06/2005 | US20050001177 Apparatus and method for forming alignment layers |
| 01/05/2005 | EP1494221A2 Holographic ROM system including an alignment apparatus for aligning a holographic medium and a mask |
| 01/05/2005 | EP1494077A2 Image forming apparatus and image forming method |
| 01/05/2005 | EP1494074A1 Lithographic apparatus and device manufacturing method |
| 01/05/2005 | EP1494071A2 Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 01/05/2005 | EP1494070A2 A method, program product and apparatus for generating assist features utilizing an image field map |
| 01/05/2005 | EP1493060A2 Method and device for imaging a mask onto a substrate |
| 01/04/2005 | US6839124 Projection aligner |
| 01/04/2005 | US6838808 Stage-actuators that do not generate fluctuating magnetic fields, and stage devices comprising same |
| 01/04/2005 | US6838686 Alignment method and exposure apparatus using the method |
| 01/04/2005 | US6838682 Electron beam exposure equipment and electron beam exposure method |
| 01/04/2005 | US6838214 Method of fabrication of rim-type phase shift mask |
| 12/30/2004 | US20040267506 Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus |
| 12/30/2004 | US20040267471 Lithography tool image quality evaluating and correcting |
| 12/30/2004 | US20040265744 Stencil mask having main and auxiliary strut and method of forming the same |
| 12/30/2004 | US20040265709 Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device |
| 12/30/2004 | US20040265705 Masking; radiation patterning tool |
| 12/30/2004 | US20040263860 Focus and alignment sensors and methods for use with scanning microlens-array printer |
| 12/30/2004 | US20040263846 Lithographic apparatus, device manufacturing method and device manufacturing thereby |
| 12/30/2004 | US20040263828 Alignment measuring system and method of determining alignment in a photolithography process |
| 12/30/2004 | DE10321278A1 Illuminating mask for structuring a photo lacquer on a substrate disc for integrated circuits has a lithographic structure of reticle and pellicle in a frame held by inorganic adhesive |
| 12/29/2004 | WO2004114382A1 Method for forming pattern and method for manufacturing semiconductor device |
| 12/29/2004 | WO2004092865A3 Selection method, exposure method, selection device, exposure device, and device manufacturing method |
| 12/29/2004 | EP1491967A1 Method and apparatus for positioning a substrate on a substrate table |
| 12/29/2004 | EP1491966A1 Calibration method for a lithographic apparatus |
| 12/28/2004 | US6836316 Substrate holding apparatus and exposure apparatus using the same |
| 12/28/2004 | US6836093 Exposure method and apparatus |
| 12/28/2004 | US6835942 Dividing a processing pattern in a specified way; calculating a pattern area density for the first and second patterns in a unit region; and calculating a corrected dose for the processing pattern according to the pattern area density |
| 12/28/2004 | US6835666 Applying sacificial coating to semiconductor substrate; lithography; hard masking enclosing pattern; transferring to undercoating |
| 12/23/2004 | US20040259322 A method for printing marks on the edges of wafers |
| 12/23/2004 | US20040259005 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 12/23/2004 | US20040259004 Use of cationic surfactants makes it possible, for a given thickness of photoresist film, to significantly reduce the line width at which a line collapse is observed |
| 12/23/2004 | US20040257573 Position detecting method |
| 12/23/2004 | US20040257572 Method and apparatus for orienting semiconductor wafers in semiconductor fabrication |
| 12/23/2004 | US20040257571 Apparatus and methods for detecting overlay errors using scatterometry |