| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/23/2005 | CN1190708C Mask-pattern correction method |
| 02/22/2005 | US6859260 Method and system for improving focus accuracy in a lithography system |
| 02/22/2005 | US6859223 Pattern writing apparatus and pattern writing method |
| 02/22/2005 | US6858948 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 02/22/2005 | US6858445 Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit |
| 02/22/2005 | US6858354 Method to prevent side lobe on seal ring |
| 02/17/2005 | WO2005015317A1 Pattern exposing system and pattern exposing method |
| 02/17/2005 | WO2003094582A3 A system and method for manufacturing printed circuit boards employing non-uniformly modified images |
| 02/17/2005 | WO2003075099A8 Method and system for overlay measurement |
| 02/17/2005 | US20050037288 Adjustment of printed circuit incline when imaging photolithographic patterns having asymmetrical configuration, |
| 02/17/2005 | US20050037271 For resist pattern; observation data such as electron microscopy is applied to model data created beforehand in accordance with the exposure conditions to estimate fluctuations in the exposure dose and the focal position |
| 02/17/2005 | US20050037270 Method for measuring overlay shift |
| 02/17/2005 | US20050037267 Illumination multilayer, vertical pattern through mask |
| 02/17/2005 | US20050036144 Position detecting method |
| 02/17/2005 | US20050036121 Lithographic apparatus and device manufacturing method |
| 02/16/2005 | CN1581651A Reacting force treating system of operation table device |
| 02/16/2005 | CN1581437A Optical mask, method for making figure and method for making semiconductor device |
| 02/16/2005 | CN1581434A Design of pivture, optical mask and photoetching colloid figure, and method for making smiconductor device |
| 02/15/2005 | US6856931 Mark detection method and unit, exposure method and apparatus, and device manufacturing method and device |
| 02/10/2005 | WO2005013006A1 Psm alignment method and device |
| 02/10/2005 | WO2005012990A1 Patterned optical retarder and method for manufacturing the same |
| 02/10/2005 | WO2004092829A3 Masking arrangement and method for producing integrated circuit arrangements |
| 02/10/2005 | WO2004079779A3 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 02/10/2005 | US20050032003 Multiple exposure method for forming a patterned photoresist layer |
| 02/10/2005 | US20050031995 Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same |
| 02/10/2005 | US20050031976 Adjusting shape utilizing design and vicinity patterns |
| 02/10/2005 | US20050031975 Precision photolithography; preventing overlay errors; monitoring wafer deformation and comparing to database reference marks |
| 02/10/2005 | US20050031969 Marker structure, mask pattern, alignment method and lithographic method and apparatus |
| 02/10/2005 | US20050031968 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions |
| 02/10/2005 | US20050031967 Photomask, method for fabricating a pattern and method for manufacturing a semiconductor device |
| 02/10/2005 | US20050031966 Method to improve photomask critical dimension uniformity and photomask fabrication process |
| 02/10/2005 | US20050031965 Removing the defect area by gallium chelation with a water-soluble amine polymer containing carboxyl, hydroxyl and amine groups; polymer is never specified |
| 02/10/2005 | US20050030537 Mark position measuring method and apparatus |
| 02/10/2005 | US20050030507 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/10/2005 | US20050030506 Projection exposure method and projection exposure system |
| 02/10/2005 | US20050028699 Image recorder and image recording method |
| 02/10/2005 | DE10331012A1 Measurement of geometrical shapes, especially alignment markings, on a semiconductor wafer using an optical system, whereby an optimum contrast value is used for a detected shape if a reference threshold cannot be obtained |
| 02/09/2005 | EP1110437B1 Scanning method and apparatus |
| 02/09/2005 | CN1578602A Image forming apparatus and image forming method and program |
| 02/09/2005 | CN1578595A 图像形成装置 The image forming apparatus |
| 02/09/2005 | CN1577722A Image correcting method , system and program. mask, semiconductor producing method and design pattern |
| 02/09/2005 | CN1577113A Punching device for printing original |
| 02/09/2005 | CN1577107A Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 02/09/2005 | CN1577096A Calibration method for a lithographic apparatus and device manufacturing method |
| 02/09/2005 | CN1577083A Stencil mask having main and auxiliary strut and method of forming the same |
| 02/09/2005 | CN1577080A Marker structure for alignment or overlay, mask pattern defined it and lithographic projector using the same |
| 02/09/2005 | CN1576778A Original and its producing method, exposure apparatus inspection system and method |
| 02/08/2005 | US6853451 Alignment system of semiconductor exposure apparatus and diaphragm unit of the alignment system |
| 02/08/2005 | US6853441 Projection aligner |
| 02/08/2005 | US6853440 Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination |
| 02/08/2005 | US6852989 Positioning system for use in lithographic apparatus |
| 02/08/2005 | US6852456 Reducing asymmetrically deposited film induced registration error |
| 02/08/2005 | US6852455 Amorphous carbon absorber/shifter film for attenuated phase shift mask |
| 02/03/2005 | WO2005010986A1 In-print method and in-print device |
| 02/03/2005 | WO2005010612A2 Defect inspection of extreme ultraviolet lithography masks and the like |
| 02/03/2005 | WO2004083960A3 Alternating aperture phase shift photomask having light absorption layer |
| 02/03/2005 | US20050028131 Method for creating alternating phase masks |
| 02/03/2005 | US20050027388 Reducing asymmetrically deposited film induced registration error |
| 02/03/2005 | US20050026396 Method of etching substrates |
| 02/03/2005 | US20050026340 Method for fabricating semiconductor device, and electro-optical device, integrated circuit and electronic apparatus including the semiconductor device |
| 02/03/2005 | US20050026050 Exposure mask and mask pattern production method |
| 02/03/2005 | US20050026049 Method for forming an opening on an alternating phase shift mask |
| 02/03/2005 | US20050026048 Proximity correcting lithography mask blanks |
| 02/03/2005 | US20050026047 comprises line-shaped features and ladder-shaped assists; improved image contrast, resolution, and uniformity |
| 02/03/2005 | US20050026045 consists of a mask barrier and a set of contact barriers; mask barrier surrounds a mask formed on a reticle, while the contact barriers are affixed between the mask and contact spots on a reticle |
| 02/03/2005 | US20050025352 Position detecting method |
| 02/03/2005 | US20050024643 Calibration method for a lithographic apparatus and device manufacturing method |
| 02/03/2005 | US20050023709 Alignment mark and alignment method using the same for photolithography to eliminating process bias error |
| 02/03/2005 | DE10330467A1 Verfahren zur Erstellung von alternierenden Phasenmasken Process for the preparation of alternating phase masks |
| 02/03/2005 | DE10329865A1 Semiconductor wafer alignment method during formation of structures in the photosensitive surface layer using masks, whereby the last illumination field of one step is used as the first illumination field of the next |
| 02/03/2005 | DE10148021B4 Meßstruktur zur Bestimmung der Positionsgenauigkeit eines Halbleiterwafers zu einer Maske Measuring structure for determining the positional accuracy of a semiconductor wafer to a mask |
| 02/02/2005 | EP1502283A2 Method of etching substrates |
| 02/02/2005 | CN1574364A Memory array with loop line pattern structure and fabricating method thereof |
| 02/02/2005 | CN1573576A Lithographic apparatus and device manufacturing method |
| 02/02/2005 | CN1573569A Exposure method for exposure device |
| 02/02/2005 | CN1573558A Light mask manufacturing method capable of avoiding electron beam offset due to charge effect |
| 02/02/2005 | CN1573557A Method for removing shading defects of light mask and semiconductor device manufacturing method thereof |
| 02/02/2005 | CN1573556A Position correction in y of mask object shift due to Z offset and non-perpendicular illumination |
| 02/02/2005 | CN1573538A Attenuated phase shifting mask having embedded bi-layer structure for and method for making same |
| 02/01/2005 | US6850330 Reticle focus measurement system using multiple interferometric beams |
| 02/01/2005 | US6849957 Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof |
| 02/01/2005 | US6849858 Apparatus and method for forming alignment layers |
| 02/01/2005 | US6849393 Phase shifting lithographic process |
| 01/27/2005 | WO2005008753A1 Template creation method and device, pattern detection method, position detection method and device, exposure method and device, device manufacturing method, and template creation program |
| 01/27/2005 | WO2005008752A1 Exposure device, exposure method, and device manufacturing method |
| 01/27/2005 | US20050022150 Optical proximity correction method |
| 01/27/2005 | US20050019678 Method of selecting photomask blank substrates |
| 01/27/2005 | US20050019677 quadrangular, which has a pair of strip-like regions with a 2 mm edge portion excluded at each end; good surface flatness at the time of wafer exposure |
| 01/27/2005 | US20050019676 Method of selecting photomask blank substrates |
| 01/27/2005 | US20050019674 Suppress the loading effect and achieve a high CD (critical dimension) accuracy when forming a highly accurate pattern by dry etching; photomask blank having, on the light-transmissive substrate, a chromium film, an etching mask film having a resistance against etching of the chromium film, and a resist |
| 01/27/2005 | US20050019673 Attenuated film with etched quartz phase shift mask |
| 01/27/2005 | US20050018167 Method and apparatus for positioning a substrate on a substrate table |
| 01/27/2005 | US20050018161 Positioning method, and positioning apparatus |
| 01/27/2005 | US20050018159 Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method |
| 01/27/2005 | US20050018156 Lithographic apparatus and device manufacturing method |
| 01/27/2005 | US20050016685 Substrate holding technique |
| 01/27/2005 | DE10327613A1 Formation of preferably square hole on an alternating phase mask useful in electronics for the lithographic structuring of contact planes in preparation of integrated circuits, and in semiconductor technology |
| 01/26/2005 | EP1499474A1 Positioning device, especially for offset plates |
| 01/25/2005 | US6848066 Using photolithography tool; conveying substrate; automatic focusing predetermination of image onto semiconductor surface using computer |
| 01/25/2005 | US6847432 Alignment system and projection exposure apparatus |