Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
03/2005
03/24/2005US20050064299 Method for fabricating a mask using a hardmask and method for making a semiconductor device using the same
03/24/2005US20050064298 Multilayer coatings for EUV mask substrates
03/24/2005US20050064297 Rotary apertured interferometric lithography (RAIL)
03/24/2005US20050064054 Pattern forming apparatus
03/24/2005US20050063580 Method and system for positioning articles with respect to a processing tool
03/24/2005US20050063184 Projection display
03/24/2005US20050063030 Method of hologram exposure, mask for hologram exposure, semiconductor device, and electronic equipment
03/24/2005US20050062980 Reticle focus measurement system using multiple interferometric beams
03/24/2005US20050062967 Position measurement mehtod, exposure method, exposure device, and manufacturing method of device
03/24/2005DE10340611A1 Lithographic mask for making integrated semiconductor circuit by photolithographic process, comprising angular structure element formed by two opaque segments, with adjacent transparent structure at convex section of angular structure
03/24/2005DE102004035559A1 Verfahren zur Auswahl von Substraten für Fotomaskenrohlinge Procedures for the selection of substrates for photomask blanks
03/23/2005EP1516228A1 Patterning method
03/22/2005US6870952 Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same
03/22/2005US6870623 Position detection apparatus, alignment apparatus and methods therefor, and exposure apparatus and device manufacturing method
03/22/2005US6870599 Exposure method and apparatus, and device manufacturing method
03/22/2005US6870301 Applying two different peeling and pulling forces, one is to form an angle between two surfaces, one is to increase distance; high precision forming extremely small features on semiconductor wafer, without high temperature, high pressure
03/22/2005US6870284 Linear motor and stage apparatus, exposure apparatus, and device manufacturing method using the same
03/22/2005US6869819 Recognition method of a mark provided on a semiconductor device
03/22/2005US6869739 Creating simulated images, at different exposure dose and focus settings of the metrology imaging system, uses the developed image of the object pattern in the resist film on a substrate
03/22/2005US6869734 EUV reflective mask having a carbon film and a method of making such a mask
03/22/2005US6869733 Pellicle with anti-static/dissipative material coating to prevent electrostatic damage on masks
03/17/2005US20050059255 Wafer processing techniques with enhanced alignment
03/17/2005US20050058915 Photomask
03/17/2005US20050058914 Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method
03/17/2005US20050058912 First phase shift section and the half tone section are shifted 180 degrees with the second phase shift region; assists in balancing the intensity between light passing thru the first and second phase shift sections
03/17/2005US20050057998 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same
03/17/2005US20050057757 Low coherence grazing incidence interferometry systems and methods
03/17/2005US20050056351 Surface treatment method, process for producing near-field exposure mask using the method, and nanoimprint lithography mask
03/17/2005US20050056168 Image recording apparatus
03/17/2005DE102004026206A1 Belichtungsmaskensubstrat-Herstellungsverfahren, Belichtungsmasken-Herstellungsverfahren und Halbleitereinrichtungs-Herstellungsverfahren Exposure mask substrate manufacturing method, exposure mask manufacturing method and semiconductor device production method
03/16/2005EP1515190A2 Exposure apparatus and device fabrication method using the same
03/15/2005US6868301 Method and application of metrology and process diagnostic information for improved overlay control
03/15/2005US6867867 Interferometric stage metrology system
03/15/2005US6866987 Resolution and process window improvement using lift-off
03/15/2005US6866976 Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit
03/10/2005WO2005022600A2 Method and systems for processing overlay data
03/10/2005WO2005022269A2 Pattern recognition and metrology structure for an x-initiative layout design
03/10/2005WO2005022258A2 Photomask and method for maintaining optical properties of the same
03/10/2005US20050053852 Method of fabricating substrate with color filter
03/10/2005US20050053849 Controlling thickness of beams; elongated structures; multilayer adhesion; configurated into narrow zones
03/10/2005US20050053848 Pattern on surface of substrate ; extracting contours from image map ; generating features; analyzing, determination, positioning
03/10/2005US20050053847 Photolithography; forming semiconductors, integrated circuits; detecting defects
03/10/2005US20050053846 Phase shift assignments for alternate PSM
03/10/2005US20050053273 aligning spatial light modulators to write a second layer of patterns over a first layer of patterns on a workpiece, comprising illuminating alignment markings with radiation, detecting the markings using cameras and analyzing posistioning; phase shifting masks (PSM)
03/10/2005US20050052651 Method and system for measuring stray light
03/10/2005US20050052634 Automatic focusing apparatus
03/10/2005US20050052633 Exposure apparatus and device fabrication method using the same
03/10/2005US20050052632 Exposure technique
03/10/2005US20050051742 Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
03/09/2005EP1513012A2 Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
03/09/2005EP1512112A2 Use of overlay diagnostics for enhanced automatic process control
03/09/2005CN1591201A Image recording apparatus
03/09/2005CN1591200A Optical proximity correcting method
03/09/2005CN1591196A Lithographic apparatus and device manufacturing method
03/09/2005CN1591181A Pellicle for lithography
03/09/2005CN1591180A Mask mfg. method
03/09/2005CN1590957A Original negative, exposure method and original negative making method
03/08/2005US6864956 Dual phase grating alignment marks
03/08/2005US6864954 Exposure process and exposure device
03/08/2005US6864024 Real-time control of chemically-amplified resist processing on wafer
03/08/2005US6864020 Chromeless phase shift mask using non-linear optical materials
03/03/2005WO2005019938A1 Proportional variable resistor structures to electrically measure mask misalignment
03/03/2005US20050048741 Pattern recognition and metrology structure for an x-initiative layout design
03/03/2005US20050048654 Method of evaluating reticle pattern overlay registration
03/03/2005US20050048380 Dustproof protection film; low cost; uniformity; high light transmission; manufacturing liquid crystal display panels; pellicle film of multi-layer structure of fluorine-doped silica and fluorocarbon resin; high transmittance and high light stability against light of short wavelength
03/03/2005US20050048379 image of the structure of the lithography mask is generated by an imaging optic of a microscope; parameters of wavelength lambda , the numerical aperture NA and the coherence of the illumination sigma of the imaging optic of the microscope are chosen such that the inequality P <= lambda NA(1+ sigma )
03/03/2005US20050048378 Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle
03/03/2005US20050048377 Mask for improving lithography performance by using multi-transmittance photomask
03/03/2005US20050048376 amorphous cyclized perfluoropolymer pellicle membrane mounted between outer and inner frames attached to the reticle without using conventional adhesives
03/03/2005US20050048375 Method of making an attenuated phase-shifting mask from a mask blank
03/03/2005US20050046846 Lithography alignment
03/03/2005US20050046845 System and method of measurement, system and method of alignment, lithographic apparatus and method
03/03/2005US20050046816 Multiple mask step and scan aligner
03/03/2005DE19803229B4 Druckbild-Positionierung Print image positioning
03/03/2005DE19600427B4 Verfahren zum Ausrichten und Markieren eines Wafers A method for aligning and marking a wafer
03/03/2005DE10335816A1 Method for adjusting substrate, e.g. semiconductor wafer, prior to projection in exposure appliance, using two planes on test substrate for two subsequently exposed planes
03/03/2005DE102004008378A1 Optisches Nähenkorrekturverfahren Optical proximity correction method
03/03/2005DE10044199B4 Ablenkanordnung und Projektionssystem für geladene Teilchen Deflection device and projection system for charged particles
03/02/2005EP1510870A1 Lithographic apparatus and device manufacturing method
03/02/2005EP1510336A2 Image recording apparatus with punch unit
03/01/2005US6861657 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
03/01/2005US6861186 Method for backside alignment of photo-processes using standard front side alignment tools
03/01/2005US6861185 Method of manufacturing color filter, color filter, and display
03/01/2005US6861183 Scatter dots
03/01/2005US6861181 Photomask and method for evaluating an initial calibration for a scanning electron microscope
03/01/2005US6861180 Contact printing as second exposure of double exposure attenuated phase shift mask process
03/01/2005US6861179 Charge effect and electrostatic damage prevention method on photo-mask
03/01/2005US6861176 Hole forming by cross-shape image exposure
03/01/2005US6860204 Image exposure apparatus
02/2005
02/24/2005US20050042529 Box-in-box field-to-field alignment structure
02/24/2005US20050042526 Photomask blank and method of fabricating a photomask from the same
02/24/2005US20050042525 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method
02/24/2005US20050041256 Method and system to detect an alignment mark
02/24/2005US20050041235 Exposure apparatus, method of controlling same, and method of manufacturing devices
02/24/2005US20050041230 Projection exposure device
02/24/2005US20050040545 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby
02/24/2005DE19837037B4 Retikel, Belichtungsverfahren, Belichtungsgerät und Halbleitervorrichtung Reticle, exposure methods, exposure apparatus and semiconductor device
02/24/2005DE102004021151A1 Verfahren zum Reduzieren von Ungleichförmigkeit und Bildverkürzung in einem auf ein Substrat belichteten Bild unter Verwendung einer photolithographischen Maske, und photolithographische Maske A method for reducing non-uniformity and image shortening in an exposed image on a substrate using a photolithographic mask, and photolithographic mask
02/23/2005CN1584745A Projection exposure device
02/23/2005CN1584738A Light cover for decreasing optical approaching effect
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