| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 04/21/2005 | WO2005022269A3 Pattern recognition and metrology structure for an x-initiative layout design |
| 04/21/2005 | WO2005010612A3 Defect inspection of extreme ultraviolet lithography masks and the like |
| 04/21/2005 | US20050084806 Wiring pattern (mask layout) in the form of a line including angled portions with a local difference in line width is divided into rectangular patterns each having a large area and node portions interconnecting the rectangular patterns; high correction accuracy |
| 04/21/2005 | US20050084782 Exposure method and exposure management system |
| 04/21/2005 | US20050084778 Reticle alignment procedure |
| 04/21/2005 | US20050084774 Production process of light amount-adjusting member, light amount-adjusting member, light amount-adjusting device and photographing apparatus |
| 04/21/2005 | US20050084772 Mask for exposing an alignment mark, and method and computer program for designing the mask |
| 04/21/2005 | US20050084771 Phase shift mask |
| 04/21/2005 | US20050084769 Manufacturable chromeless alternating phase shift mask structure with phase grating |
| 04/21/2005 | US20050084768 Attenuated phase shift mask for extreme ultraviolet lithography and method therefore |
| 04/21/2005 | US20050084767 directing pulsed laser beams through substrates and focusing it on a target located in the substrate adjacent to coating layers, to write a diffractive optical element, thus changing the scattering properties of the substrate at the target location; masks for use in photolithography |
| 04/21/2005 | US20050083507 Projection exposure system for microlithography and method for generating microlithographic images |
| 04/21/2005 | US20050083506 Projection exposure system for microlithography and method for generating microlithographic images |
| 04/21/2005 | US20050083502 Exposure device |
| 04/21/2005 | US20050083006 Electromagnetic alignment and scanning apparatus |
| 04/21/2005 | US20050082693 Image processing alignment method and method of manufacturing semiconductor device |
| 04/21/2005 | US20050082559 Mask and method for using the mask in lithographic processing |
| 04/21/2005 | DE10324502B3 Photomaske, sowie Verfahren zur Herstellung von Halbleiter-Bauelementen Photomask, and to processes for the production of semiconductor devices |
| 04/20/2005 | EP0954768B1 Method and apparatus for wafer-focusing |
| 04/19/2005 | US6882405 Off-axis levelling in lithographic projection apparatus |
| 04/14/2005 | WO2004086143A3 Multi-step process for etching photomasks |
| 04/14/2005 | US20050079683 Method for improved alignment of magnetic tunnel junction elements |
| 04/14/2005 | US20050079427 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same |
| 04/14/2005 | US20050079425 determining location-dependent density of mask structures resulting in structure density; determining location-dependent strength of loading effect with aid of structure density; determining correction values for mask structures using strength of loading effect for compensating for loading effect |
| 04/14/2005 | US20050078319 Surface profiling using an interference pattern matching template |
| 04/14/2005 | US20050078318 Methods and systems for interferometric analysis of surfaces and related applications |
| 04/14/2005 | US20050078287 Lithographic apparatus and device manufacturing method |
| 04/14/2005 | DE19754867B4 Spaltabtast-Projektionsbelichtungsgerät und Halbleitereinrichtung Spaltabtast projection exposure apparatus and semiconductor device |
| 04/13/2005 | EP1523028A2 Electron beam writing equipment and method |
| 04/13/2005 | CN1606129A Electron beam writing equipment and electron beam writing method |
| 04/13/2005 | CN1605935A Modular optical proximate correction configuration and method thereof applicable for integrated circuit |
| 04/13/2005 | CN1605934A Exposure device detecting mask, exposure device detecting method and exposure device |
| 04/13/2005 | CN1605397A Mask blanks and method of producing the same |
| 04/12/2005 | US6879868 Alignment system for lithographic apparatus for measuring a position of an alignment mark |
| 04/12/2005 | US6879382 Substrate processing apparatus |
| 04/12/2005 | US6879381 Exposure apparatus, control method for the same, and device fabricating method |
| 04/12/2005 | US6878916 Method for focus detection for optically detecting deviation of the image plane of a projection lens from the upper surface of a substrate, and an imaging system with a focus-detection system |
| 04/12/2005 | US6878506 Method for manufacturing semiconductor device |
| 04/12/2005 | US6878463 Method of machining glass |
| 04/07/2005 | WO2005031458A2 Forming partial-depth features in polymer film |
| 04/07/2005 | US20050074680 Display device particles, process for producing the same, image-display medium, and image-forming device |
| 04/07/2005 | US20050074679 Method of manufacturing semiconductor device |
| 04/07/2005 | US20050074678 photomasks for production of semiconductors; photoresists |
| 04/07/2005 | US20050074677 Optical proximity correction (OPC); modifying a mask layout to include scattering bars, which increases the amount of scattering bars included in the mask design, while minimizing the number of individual pieces of scattering bars |
| 04/07/2005 | US20050074676 Chromium oxide film serves as etching stopper formed on diamond film serving as transmitter, and absorptive tungsten layer |
| 04/07/2005 | US20050074160 Position detection technique |
| 04/07/2005 | US20050073669 Dual sided lithographic substrate imaging |
| 04/07/2005 | US20050073668 Stage device, exposure apparatus and device manufacturing method |
| 04/07/2005 | US20050073664 photoresists; radiation transparency; level shifting caused by gravitational load is prevented |
| 04/07/2005 | US20050072939 Electron beam writing equipment and electron beam writing method |
| 04/06/2005 | EP1521121A2 Cooling technique |
| 04/06/2005 | CN1603958A Alignment mark forming method, substrate in which devices are formed, and liquid discharging head using substrate |
| 04/06/2005 | CN1603950A Method for making patterns of phase shift transformation light shield used in semiconductor chips manufacturing and structure thereof |
| 04/06/2005 | CN1603949A Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 04/05/2005 | US6876946 Alignment method and apparatus therefor |
| 04/05/2005 | US6876440 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 04/05/2005 | US6876439 Method to increase throughput in a dual substrate stage double exposure lithography system |
| 04/05/2005 | US6876438 Semiconductor exposure apparatus, control method therefor, and semiconductor device manufacturing method |
| 04/05/2005 | US6876436 Interferometric alignment system for use in vacuum-based lithographic apparatus |
| 04/05/2005 | US6876435 Exposure method, plane alignment method, exposure apparatus, and device manufacturing method |
| 04/05/2005 | US6876092 Substrate provided with an alignment mark, method of designing a mask, computer program, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 04/05/2005 | US6875992 Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method |
| 04/05/2005 | US6875546 Method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 04/05/2005 | US6875544 Method for the fabrication of three-dimensional microstructures by deep X-ray lithography |
| 04/05/2005 | US6875543 Writing pattern; reflective multilayer coating |
| 03/31/2005 | WO2005029193A2 Interferometric analysis of surfaces. |
| 03/31/2005 | WO2005029192A2 Surface triangulation and profiling through a thin film coating |
| 03/31/2005 | WO2005029181A2 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 03/31/2005 | WO2004088425A3 Contact masks and lithographic patterning methods using said masks |
| 03/31/2005 | US20050070068 Alignment mark forming method, substrate in which devices are formed, and liquid discharging head using substrate |
| 03/31/2005 | US20050069790 Method for reducing an overlay error and measurement mark for carrying out the same |
| 03/31/2005 | US20050069788 Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 03/31/2005 | US20050069787 Mask blanks and method of producing the same |
| 03/31/2005 | US20050069786 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method |
| 03/31/2005 | US20050069784 Dispensing an interface material for a print head to produce layers for forming a three dimensional model and curing |
| 03/31/2005 | US20050069783 masking; selectively coding the spaced regions to define a masked read only memory (ROM) structure that causes optical interference; illumination; development; improved circuit density and reliability; miniaturization; integrated circuits |
| 03/31/2005 | US20050069782 Each full-depth producing pattern includes an area of UV light-blocking material on a transparent plate that has a smaller dimension equal to or greater than minimum resolvable size; partial-depth producing pattern has an area of UV light-blocking material with smaller dimension less than minimum size |
| 03/31/2005 | US20050069781 conventional exposure, development and baking processes; photomask includes an array of first and second phase shift regions and a non phase shift region; elimination of side-lobe effects; integrated circuits; photolithography |
| 03/31/2005 | US20050068540 Triangulation methods and systems for profiling surfaces through a thin film coating |
| 03/31/2005 | US20050068515 Method for detecting positioning errors of circuit patterns during the transfer by means of a mask into layers of a substrate of a semiconductor wafer |
| 03/31/2005 | US20050068514 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 03/31/2005 | US20050068508 Alignment mark for coarse alignment and fine alignment of a semiconductor wafer in an exposure tool |
| 03/31/2005 | US20050067379 Imprint lithography template having opaque alignment marks |
| 03/31/2005 | DE10337767A1 Verfahren zur Messung der Overlay-Verschiebung A method of measuring the overlay displacement |
| 03/30/2005 | EP1519226A2 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method |
| 03/30/2005 | CN1601698A Method of forming alignment mark |
| 03/30/2005 | CN1601387A Self-aligning method for outskirt state phase shifting light shade |
| 03/30/2005 | CN1601379A Method of mfg, wafer and method of evaluating overlapping alignment between light shade patterns |
| 03/29/2005 | US6873087 High precision orientation alignment and gap control stages for imprint lithography processes |
| 03/29/2005 | US6872630 Using V-groove etching method to reduce alignment mark asymmetric damage in integrated circuit process |
| 03/29/2005 | US6872507 Patterning microelectronics using electron beam; etching masking layer; adjustment of backscattering |
| 03/29/2005 | US6872497 Reflective mask for short wavelength lithography |
| 03/29/2005 | US6872496 Providing transparent substrate; forming first thickness of first aluminum-silicon oxide blanket attenuating phase shifting layer; forming second thickness of second aluminum-silicon oxide blanket attenuating phase shifting |
| 03/29/2005 | CA2304670C Wafer level integration of multiple optical elements |
| 03/24/2005 | US20050064676 Method of forming alignment mark |
| 03/24/2005 | US20050064344 Imprint lithography templates having alignment marks |
| 03/24/2005 | US20050064307 Dye-containing negative-type curable composition, color filter, and method of producing the same |
| 03/24/2005 | US20050064303 A pattern of a fine opening provided in the light blocking layer; optical head; for generating light; semiconductor processing for improve in fineness of microlithography |
| 03/24/2005 | US20050064301 Forming a first fine pattern which has a fine opening, having a size of not more than a wavelength of exposure light; forming a second mask; for use with microprocessing in a short time; microlithography |
| 03/24/2005 | US20050064300 The light-shielding layer is patterned to form a main pattern and a phantom pattern; eliminate optical proximity effects; substrate with the phantom pattern can be narrower; etched to form trenches in the substrate; photolithographic process to make semiconductor wafer |