| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 05/25/2005 | CN1620632A Optical proximity correction for phase shifting photolithographic masks |
| 05/25/2005 | CN1619421A Exposure apparatus extendible corresponding to substrate for printed circuitboard |
| 05/25/2005 | CN1619416A Exposure mask, method for manufacturing the mask, and exposure method |
| 05/25/2005 | CN1203735C Method for producing severe tolerance imbedded elements for printing circuit board |
| 05/25/2005 | CN1203525C Exposure mask, method for manufacturing the mask, and exposure method |
| 05/25/2005 | CN1203379C Method and apparatus for aligning crystalline substrate |
| 05/24/2005 | US6897949 Exposure apparatus and a device manufacturing method using the same |
| 05/24/2005 | US6897942 Projection exposure apparatus and method |
| 05/24/2005 | US6897462 Surface position detection device and exposure apparatus and exposure method achieved by utilizing detection device |
| 05/24/2005 | US6897010 Opaque patterns; forming photoresists; exposure; photolithography |
| 05/24/2005 | US6896999 Using a microscope, which has a visible and an ultraviolet light source; uses the visible light source for aligning the wafer and for exposing a region in the first resist layer above the alignment mark without using a mask |
| 05/24/2005 | US6896998 Pattern forming method |
| 05/24/2005 | CA2259426C Composite relief image printing plates and methods for preparing same |
| 05/19/2005 | WO2005045529A2 Characterization and compensation of errors in multi-axis interferometry system |
| 05/19/2005 | WO2005045364A1 Position detection method, exposure method, position detection device, exposure device, and device manufacturing method |
| 05/19/2005 | WO2004066028A3 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 05/19/2005 | US20050106475 Mask substrate on which the patterned mask layer is arranged, has a protective layer to protect the mask layer from contact with impurity particles |
| 05/19/2005 | US20050106474 Method for controlling linewidth in advanced lithography masks using electrochemistry |
| 05/19/2005 | US20050106472 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide |
| 05/19/2005 | US20050105102 Wafer stage position calibration method and system |
| 05/19/2005 | US20050105093 Microprocessing apparatus, semiconductor device manufacturing apparatus, and device manufacturing method |
| 05/19/2005 | US20050105072 Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same |
| 05/19/2005 | US20050105071 Methods for patterning substrates having arbitrary and unexpected dimensional changes |
| 05/19/2005 | DE10335565A1 Verfahren zur Überprüfung von periodischen Strukturen auf Lithographiemasken Proceedings for review of periodic structures on lithography masks |
| 05/19/2005 | DE10297658T5 Verfahren und System zum Reparieren defekter Photomasken Method and system for repairing defective photomasks |
| 05/18/2005 | EP1531366A2 Back to front alignment with latent imaging |
| 05/18/2005 | CN1617296A Method and system for correcting web deformation during a roll-to-roll process |
| 05/18/2005 | CN1617047A Method, program product and apparatus for generating assist features utilizing an image field map |
| 05/17/2005 | US6894783 Overlay alignment mark design |
| 05/17/2005 | US6894782 Method of measuring defocusing and method of obtaining correct focusing |
| 05/17/2005 | US6894334 Active material zones separated by dielectric and channel barrier; etching using mask; overcoating aperture with tungsten, then aluminum, or alloy thereof |
| 05/17/2005 | US6894261 Position measuring system for use in lithographic apparatus |
| 05/17/2005 | US6893785 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 05/17/2005 | US6893780 Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern |
| 05/12/2005 | WO2005043243A2 Methods and apparatuses for applying wafer-alignment marks |
| 05/12/2005 | WO2004079780A3 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 05/12/2005 | US20050102263 Exposure apparatus and device manufacturing method |
| 05/12/2005 | US20050100829 Lithography method |
| 05/12/2005 | US20050100799 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 05/12/2005 | US20050100798 Device and method for providing wavelength reduction with a photomask |
| 05/12/2005 | US20050100797 Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask |
| 05/12/2005 | US20050099629 Substrate processing apparatus |
| 05/12/2005 | US20050099628 Mark for position detection, mark identification method, position detection method, exposure method, and positional information detection method |
| 05/12/2005 | US20050099613 Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus |
| 05/12/2005 | DE10392578T5 System und Verfahren zur Herstellung von gedruckten Schaltungsplatinen unter Verwendung von nichtgleichmässig modifizierten Bildern System and method for manufacture of printed circuit boards using non-uniformly modified images |
| 05/11/2005 | EP1530084A1 A method for performing transmission tuning of a mask pattern to improve process latitude |
| 05/11/2005 | EP1529746A2 Sheet member positioning device and image recording device |
| 05/11/2005 | CN2699337Y Light screen master film capable of preventing electron beam deviation caused by electric charge effect |
| 05/11/2005 | CN1614510A Photoelectric device, its substrate and manufacture, and electronic apparatus |
| 05/11/2005 | CN1201205C 曝光方法及其装置 Exposure method and apparatus |
| 05/10/2005 | US6891598 Lithographic device and method for wafer alignment with reduced tilt sensitivity |
| 05/10/2005 | US6891277 Alignment mark including insulating film with metal in groove, first film on insulating film covering metal for preventing oxidation during heat treatment in oxygen atmosphere, second insulating film between insulating film and first film |
| 05/10/2005 | US6890691 Backing layer of a donor element for adjusting the focus on an imaging laser |
| 05/06/2005 | WO2005041291A2 Mask and method for using the mask in lithographic processing |
| 05/06/2005 | WO2005040932A2 Apparatus and method for aligning surfaces |
| 05/05/2005 | US20050096779 Tunable alignment geometry |
| 05/05/2005 | US20050095824 Method for manufacturing semiconductor device |
| 05/05/2005 | US20050095802 Alignment mark structure |
| 05/05/2005 | US20050095515 Filtration measurement; measuring overlay displacement; calibration using model of optical errors |
| 05/05/2005 | US20050095513 Patterns with apertures; rectangle light shielding zones; exposure; uniform light applied to photosensitive body ; reduction of variations in line width; forming semiconductors |
| 05/05/2005 | US20050095512 Lithography mask for imaging of convex structures |
| 05/05/2005 | US20050095510 Flare measuring mask and flare measuring method of semiconductor aligner |
| 05/05/2005 | US20050094132 Process compensation for step and scan lithography |
| 05/05/2005 | US20050093378 Alignment stage apparatus |
| 05/05/2005 | US20050093102 Mixed lvr and hvr reticle set design for the processing of gate arrays, embedded arrays and rapid chip products |
| 05/05/2005 | US20050092013 Cooling technique |
| 05/04/2005 | CN1612055A Photoetching with micro trace photoresist detecting pattern and its detecting method |
| 05/04/2005 | CN1200321C Step-by-step projection photo-etching machine double set shifting exposure ultra precision positioning silicon chip bench system |
| 05/03/2005 | US6889162 Wafer target design and method for determining centroid of wafer target |
| 05/03/2005 | US6888261 Alignment mark and exposure alignment system and method using the same |
| 05/03/2005 | US6888151 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/03/2005 | US6887630 Method and apparatus for fracturing polygons on masks used in an optical lithography process |
| 05/03/2005 | US6887629 Radiation-patterning tool |
| 05/03/2005 | US6887625 Isolated areas that contrast with a background and represent features to be printed, arranged generally in an array; and a plurality of assist features smaller than said isolated areas and positioned so as to make said array more symmetric. |
| 04/28/2005 | WO2005038523A2 Imprint lithography templates having alignment marks |
| 04/28/2005 | US20050089774 for imprint lithography |
| 04/28/2005 | US20050089773 System and method for measuring overlay errors |
| 04/28/2005 | US20050089770 Printing irregularly-spaced contact holes using phase shift masks |
| 04/28/2005 | US20050089769 External pattern area surrounding the layout pattern area provides registration for accurate allignment |
| 04/28/2005 | US20050089767 Alternate aperture phase shifting mask; integrated circuit fabrication, photolithography |
| 04/28/2005 | US20050089766 Method for improving uniformity and alignment accuracy of contact hole array pattern |
| 04/28/2005 | US20050089765 Method of a floating pattern loading system in mask dry-etching critical dimension control |
| 04/28/2005 | US20050089764 Multi-step phase shift mask and methods for fabrication thereof |
| 04/28/2005 | US20050089763 photolithography mask; a tri-tone partially transmitting phase shift reticle used to form dual damascene openings |
| 04/28/2005 | US20050089762 photolithographic imaging; low resolution imaging tool |
| 04/28/2005 | US20050088638 Off-axis levelling in lithographic projection apparatus |
| 04/28/2005 | US20050088636 Scanning exposure technique |
| 04/28/2005 | US20050088133 Electromagnetic alignment and scanning apparatus |
| 04/28/2005 | US20050087578 Method and system for correcting web deformation during a roll-to-roll process |
| 04/27/2005 | EP1526411A1 Apparatus and method for aligning surface |
| 04/27/2005 | EP1341675B1 Backing layer of a donor element for adjusting the focus on an imaging laser |
| 04/27/2005 | CN1610060A Grating alignment procedure |
| 04/27/2005 | CN1199265C 半导体器件 Semiconductor devices |
| 04/26/2005 | US6886154 Multiple-exposure drawing apparatus and method thereof |
| 04/26/2005 | US6885908 Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method |
| 04/26/2005 | US6885433 Projection exposure apparatus and method |
| 04/26/2005 | US6885429 System and method for automated focus measuring of a lithography tool |
| 04/26/2005 | US6884554 Semiconductor wafer tilt compensation by wafer rotation and wafer tilt averaging |
| 04/21/2005 | WO2005036624A1 Exposure apparatus, exposure method, and device producing method |
| 04/21/2005 | WO2005036620A1 Exposure method, exposure device, and device manufacturing method |