| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
|---|
| 06/23/2005 | US20050137837 Management system and apparatus method therefor, and device manufacturing method |
| 06/23/2005 | US20050136346 Optimized correction of wafer thermal deformations in a lithographic process |
| 06/23/2005 | US20050136341 Designing and forming the auxiliary pattern according to the density function so as to prevent local or global variations between the desired critical dimension (CD) and actual CD from occurring |
| 06/23/2005 | US20050136339 A before-correction pattern edge defining step, a deviated position setting step, an edge selecting step, a correcting step, after-correction pattern edge defining step |
| 06/23/2005 | US20050136338 Using a photomask that can prevent critical dimension biases of pattern images of different pattern densities while forming a circuit pattern |
| 06/23/2005 | US20050136337 Method for forming wires of sub-micron-order scale |
| 06/23/2005 | US20050136336 Photomasks having offset aperatures that mitigates anisotropic optical diffraction, improves illumination and focusing, photolithography |
| 06/23/2005 | US20050136335 Sequential linewidth measurement and trimming of a patterned mask layer to form multiply trimmed patterned mask layer; precise linewidth control |
| 06/23/2005 | US20050136334 Device manufacturing method and mask for use therein |
| 06/23/2005 | US20050134865 Method for determining a map, device manufacturing method, and lithographic apparatus |
| 06/23/2005 | US20050134862 Characterization and compensation of errors in multi-axis interferometry systems |
| 06/23/2005 | US20050134816 Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby |
| 06/23/2005 | US20050133743 Method for position determination, method for overlay optimization, and lithographic projection apparatus |
| 06/23/2005 | US20050132914 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
| 06/23/2005 | DE10353798A1 Verfahren zum Erzeugen eines Abbildungsfehler vermeidenden Maskenlayouts für eine Maske A method for generating a mapping error-avoiding mask layout for a mask |
| 06/23/2005 | DE102004049735A1 Mask for microlithographic projection exposure apparatus, has pattern of opaque structures applied on support, where intermediate spaces between bar-like structures of opaque structures are filled with dielectric material |
| 06/22/2005 | EP1544682A2 Exposure apparatus, alignment method and device manufacturing method |
| 06/22/2005 | EP1544681A2 Exposure apparatus |
| 06/22/2005 | EP1543966A1 Method and apparatus for detecting the seam of a flexographic printing plate precursor |
| 06/22/2005 | EP1543451A2 Method and system for context-specific mask writing |
| 06/22/2005 | CN1207758C Exposure equipment with interferometer system |
| 06/21/2005 | US6908830 Method for printing marks on the edges of wafers |
| 06/21/2005 | US6908775 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer |
| 06/21/2005 | US6908713 EUV mask blank defect mitigation |
| 06/21/2005 | US6908514 Wafer alignment marks protected by photoresist |
| 06/21/2005 | US6908083 Recording plate or film loading device |
| 06/16/2005 | WO2005053906A1 Method of manufacturing mirrors from joined mirror blanks, x-y interferometer and method of inspecting wafers |
| 06/16/2005 | US20050130047 Method for printability enhancement of complementary masks |
| 06/16/2005 | US20050130046 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired |
| 06/16/2005 | US20050129397 Exposure device |
| 06/16/2005 | US20050128456 Method and systems for improving focus accuracy in a lithography system |
| 06/16/2005 | US20050128455 Exposure apparatus, alignment method and device manufacturing method |
| 06/16/2005 | US20050128453 Exposure apparatus |
| 06/16/2005 | US20050128452 Wavelength selecting method, position detecting method and apparatus, exposure method and apparatus, and device manufacturing method |
| 06/16/2005 | US20050128451 Alignment method |
| 06/16/2005 | US20050128398 Method for designing mask and fabricating panel |
| 06/15/2005 | EP1540665A2 Photolithography mask repair |
| 06/15/2005 | EP1540425A1 Method for aligning a substrate on a stage |
| 06/15/2005 | CN1627187A Extraction method of dangerous patterns, program and mfg. method of semiconductor |
| 06/15/2005 | CN1627185A Phase shifting mask without Cr film layer, its mfg. method, and fabricating method for semiconductor |
| 06/14/2005 | US6906805 Position detecting system and exposure apparatus using the same |
| 06/14/2005 | US6906785 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/14/2005 | US6906783 System for using a two part cover for protecting a reticle |
| 06/14/2005 | US6906303 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 06/14/2005 | US6905802 Writing exposure to blanket photoresist; overlapping patterns; attenuation phase shifting |
| 06/14/2005 | US6905801 Lithography; masking absorber anisotropic etching; reflective multilayer; forming ruthenium layer then absorber |
| 06/09/2005 | WO2005052695A1 Direct alignment in mask aligners |
| 06/09/2005 | US20050125764 Method for producing a mask layout avoiding imaging errors for a mask |
| 06/09/2005 | US20050124092 Patterning method |
| 06/09/2005 | US20050123845 Method of adjusting deviation of critical dimension of patterns |
| 06/09/2005 | US20050123844 First and second alignment marks arranged one over the other; alignment based on periodicity of the Moire pattern |
| 06/09/2005 | US20050123843 Analytical determination of position of an object with alignment marks; projector |
| 06/09/2005 | US20050123840 Opaque pattern consists of electrically conductive material; has a higher diffraction efficiency for projection wavelength polarised parallel to the structures than for projection light of the same wavelength polarised perpendicular; intermediate spaces filled withliquid and solid dielectrics |
| 06/09/2005 | US20050123839 Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the same |
| 06/09/2005 | US20050123838 Clear field annular type phase shifting mask |
| 06/09/2005 | US20050123837 Photomask features with interior nonprinting window using alternating phase shifting |
| 06/09/2005 | US20050122567 Manufacturing method of electro-optical apparatus substrate, manufacturing method of electro-optical apparatus, electro-optical apparatus substrate, electro-optical apparatus, and electronic instrument |
| 06/09/2005 | US20050122495 Method and device for imaging a mask onto a substrate |
| 06/09/2005 | DE102004053563A1 Photomaske und Verfahren zum Bilden eines Musters Photo mask and method for forming a pattern |
| 06/08/2005 | EP1538485A1 Method of Preparing a Substrate, Method of Measuring, Device Manufacturing Method, Lithographic Apparatus, Computer Program and Substrate |
| 06/08/2005 | CN1625456A Positioning device specially for offset plates |
| 06/08/2005 | CN1624589A Method of preparing a substrate, method of measuring, device manufacturing method, lithographic apparatus, computer program and substrate |
| 06/08/2005 | CN1624576A Image recorder |
| 06/07/2005 | US6903806 Stage control apparatus, exposure apparatus, and device manufacturing method |
| 06/07/2005 | US6902986 Method for defining alignment marks in a semiconductor wafer |
| 06/07/2005 | US6902855 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| 06/07/2005 | US6902851 Method for using phase-shifting mask |
| 06/02/2005 | WO2005050316A2 Method involving a mask or a reticle |
| 06/02/2005 | US20050119795 Anti-vibration technique |
| 06/02/2005 | US20050118785 Method for forming alignment pattern of semiconductor device |
| 06/02/2005 | US20050118781 Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium |
| 06/02/2005 | US20050118532 Applying an alignment mark by means of a first exposure of the photoresist, the alignment mark being positioned on the photoresist in accordance with the position of the reference mark; aligning the substrate in accordance with the alignment mark; photolithography |
| 06/02/2005 | US20050118515 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 06/02/2005 | US20050118514 Method of the adjustable matching map system in lithography |
| 06/02/2005 | US20050117794 Device manufacturing method, orientation determination method and lithographic apparatus |
| 06/02/2005 | US20050117226 Optical instrument, exposure apparatus, and device manufacturing method |
| 06/02/2005 | US20050117140 Position detector, position detecting method, and exposure apparatus having the same |
| 06/02/2005 | US20050116180 Charged-particle beam lithographic system |
| 06/02/2005 | DE10350708A1 Detecting wafer scanner translation fault in photo-lithographic structuring of semiconductor wafer, especially with RAM component, by forming overlay targets in illumination fields and detemining displacement |
| 06/02/2005 | DE10154820B4 Verfahren zum Herstellen einer Maske für Halbleiterstrukturen A method of manufacturing a mask for semiconductor structures |
| 06/01/2005 | CN1622282A Method for forming alignment pattern of semiconductor device |
| 06/01/2005 | CN1204614C Beam positioning in microlithographic writing |
| 05/31/2005 | US6901576 Phase-width balanced alternating phase shift mask design |
| 05/31/2005 | US6901314 Alignment apparatus for substrates |
| 05/31/2005 | US6900888 Method and apparatus for inspecting a pattern formed on a substrate |
| 05/31/2005 | US6900887 Method and system for measuring stray light |
| 05/31/2005 | US6900880 Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method |
| 05/31/2005 | US6900075 Mixed LVR and HVR reticle set design for the processing of gate arrays, embedded arrays and rapid chip products |
| 05/31/2005 | US6899981 Photomask and method for detecting violations in a mask pattern file using a manufacturing rule |
| 05/26/2005 | WO2005047974A2 Measurement and compensation of errors in interferometers |
| 05/26/2005 | WO2004099879A3 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same |
| 05/26/2005 | US20050112862 Crystallographic Modification of Hard mask Properties |
| 05/26/2005 | US20050112478 coating masking layers comprising inorganic phosphates having a nonlinear refractive index, to radiation transparent substrates, then applying photoresist, developing, etching to form miniature patterns and stripping the photoresists; integrated circuits; photolithography |
| 05/26/2005 | US20050112476 Phase-shift mask and fabrication thereof |
| 05/26/2005 | US20050112475 Monitoring pattern configured to obtain information required for adjusting optical system; asymmetrical diffraction grating generates positive first order diffracted light and negative first order diffracted light; probing phase shifters |
| 05/26/2005 | US20050112474 Method involving a mask or a reticle |
| 05/26/2005 | US20050112473 Transparent regions between two adjacent shielding regions and one depression; shielding pattern made of slightly translucent molybdenum silicide |
| 05/26/2005 | US20050110965 Lithographic alignment system and device manufacturing method |
| 05/26/2005 | US20050110864 Image recorder |
| 05/25/2005 | EP1532484A2 Lithographic printing with polarized light |