| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 07/27/2005 | CN2713515Y Dim light phase shift light cover having double embedded layers |
| 07/27/2005 | CN1645255A Optimized calibration of thermal deformation of a wafer in a lithographic process |
| 07/21/2005 | US20050158637 comprising radiation transparent plates through which light passes, having blocking patterns for selectively blocking the light, and concave and convex portions for imprinting pateerns on photoresist films; lithography |
| 07/21/2005 | US20050158636 Photomask and method of controlling transmittance and phase of light using the photomask |
| 07/21/2005 | US20050158635 connecting optics having a lithographic structure with frames and pellicles, using inorganic adhesive comprising a potassium silicate solution, to form exposure masks for structuring photoresist layers on substrate wafers |
| 07/21/2005 | US20050157297 Periodic patterns and technique to control misalignment between two layers |
| 07/21/2005 | US20050157296 Method and apparatus for measuring optical overlay deviation |
| 07/21/2005 | US20050157281 Off-axis levelling in lithographic projection apparatus |
| 07/21/2005 | US20050157280 Lithographic projection method and apparatus |
| 07/21/2005 | US20050156335 Marks and method for multi-layer alignment |
| 07/21/2005 | US20050156334 Alignment mark system and method to improve wafer alignment search range |
| 07/21/2005 | US20050156122 Method and apparatus for aligning a substrate on a stage |
| 07/20/2005 | EP1554616A2 Improvements in or relating to multiple exposures of photosensitive material |
| 07/20/2005 | CN1641485A Exposure system, test mask for flare testing, method for evaluating lithography process |
| 07/20/2005 | CN1641484A Method of measurement, method for providing alignment marks, and device manufacturing method |
| 07/19/2005 | US6919150 Forming a substrate with windows and filling the windows multiple times, forming a support membrane over the substrate, and a mask layer is then formed and patterned |
| 07/14/2005 | WO2005064410A2 Lithographic apparatus and method of calibration |
| 07/14/2005 | WO2005031458A3 Forming partial-depth features in polymer film |
| 07/14/2005 | WO2005022258A3 Photomask and method for maintaining optical properties of the same |
| 07/14/2005 | US20050153218 Photomasks |
| 07/14/2005 | US20050153217 Pattern verification method, pattern verification system, mask manufacturing method and semiconductor device manufacturing method |
| 07/14/2005 | US20050153216 Lithography mask and lithography system for direction-dependent exposure |
| 07/14/2005 | US20050153215 Real-time configurable masking |
| 07/14/2005 | US20050153214 Single trench repair method with etched quartz for attenuated phase shifting mask |
| 07/14/2005 | US20050153213 Method for the repair of defects in photolithographic masks for patterning semiconductor wafers |
| 07/14/2005 | US20050153212 Generating simplified layout patterns from the predetermined main shapes of the mask, such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information, associated shapes are generated |
| 07/14/2005 | US20050151951 Stage alignment in lithography tools |
| 07/14/2005 | DE10142593B4 Verfahren zur gegenseitigen Justierung von Strukturen auf einer Mehrebenen-Phasenschiebemaske Procedures for the mutual adjustment of structures on a multi-level phase shift mask |
| 07/13/2005 | EP1553617A1 Method for forming pattern and method for manufacturing semiconductor device |
| 07/13/2005 | EP1340123A4 Systems and methods for exposing substrate periphery |
| 07/13/2005 | CN1638053A Method of adjusting deviation of critical dimension of patterns |
| 07/13/2005 | CN1637620A Exposure processing system, exposure processing method and method for manufacturing a semiconductor device |
| 07/13/2005 | CN1637607A Method for reducing nonuniformity of image printed on substrate using light micro-image cover and light micro- image cover |
| 07/13/2005 | CN1637596A Laser mask and method of crystallization using the same |
| 07/13/2005 | CN1637594A Exposure mask and exposure method using the same |
| 07/13/2005 | CN1210627C Alignment apparatus of array optical probe scanning integrated circuit photoetching system |
| 07/12/2005 | US6917901 Compensatory exposure tool focus corrections; photolithography |
| 07/12/2005 | US6917698 Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects |
| 07/12/2005 | US6917413 Perforation and image exposure system |
| 07/12/2005 | US6917048 Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus |
| 07/12/2005 | US6917046 Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method |
| 07/12/2005 | US6916584 Alignment methods for imprint lithography |
| 07/12/2005 | US6915743 Device and method for detecting the edge of a recording material |
| 07/07/2005 | WO2005062131A1 Lithographic apparatus and method of measurement |
| 07/07/2005 | US20050148132 Alignment method for fabrication of integrated ultrasonic transducer array |
| 07/07/2005 | US20050147913 High volume reticle (HVR) configured for registration with a low volume reticle; an array of dies; plurality of scribeswrapped around each die in array of dies; processing of gate arrays, embedded arrays and rapid chips |
| 07/07/2005 | US20050147902 Least squares analysis of position of an object with alignment marks; projector |
| 07/07/2005 | US20050147900 Coating a photoresist layer; forming a first pattern on a housing of a motor; providing a color filter; optically aligning first and second pattern; and assembling color filter and housing; high speed fabrication, accuracyl; projection technology |
| 07/07/2005 | US20050147898 Photolithography using interdependent binary masks |
| 07/07/2005 | US20050147897 Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer |
| 07/07/2005 | US20050146721 Method of measurement, method for providing alignment marks, and device manufacturing method |
| 07/07/2005 | US20050146699 Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby |
| 07/07/2005 | US20050146693 Exposure apparatus |
| 07/07/2005 | US20050146079 Lithographic method for molding a pattern |
| 07/07/2005 | US20050145805 Lithographic apparatus and device manufacturing method |
| 07/07/2005 | DE10356519A1 Process to determine a geometric shape on a semiconductor layer surface irradiates with radiation to which the layer is transparent and analyses transmitted or reflected image |
| 07/07/2005 | DE10355681A1 Direkte Justierung in Maskalignern Direct adjustment in Maskalignern |
| 07/06/2005 | EP1550002A2 Photomask assembly incorporating a porous frame and method for making it |
| 07/06/2005 | CN1209682C Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor |
| 07/05/2005 | US6914666 Method and system for optimizing parameter value in exposure apparatus and exposure apparatus and method |
| 07/05/2005 | US6914664 Lithographic apparatus, alignment method and device manufacturing method |
| 07/05/2005 | US6913857 Reduced deformation due to heat generation |
| 06/30/2005 | WO2005059655A2 A process for the fabrication of optical microstructures |
| 06/30/2005 | WO2004066027A3 Electron beam processing for mask repair |
| 06/30/2005 | US20050142462 Mask, method of production of same, and method of production of semiconductor device |
| 06/30/2005 | US20050142461 Photo mask and method for fabricating the same |
| 06/30/2005 | US20050142460 Method of fabricating a photomask |
| 06/30/2005 | US20050142459 Line photo masks and methods of forming semiconductor devices using the same |
| 06/30/2005 | US20050142458 Exposure mask and exposure method using the same |
| 06/30/2005 | US20050142457 Improving line resolution by using an overlapping exposing process; pattern bridges can be completely removed by the overlapping exposing process |
| 06/30/2005 | US20050142455 Specifying size of the defect to be detected depending on a state where the defect positions on which pixel of many pixels constituting the mask pattern |
| 06/30/2005 | US20050142454 Grid with a space smaller than a minimum pitch allowed by a design rule, and provides hole patterns at lattice points, which are the intersections of the grid; semiconductor integrated circuit manufacturing; flexibility of hole pattern arrangement and quality of hole pattern arrangement easily evaluated |
| 06/30/2005 | US20050142453 Mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved |
| 06/30/2005 | US20050142452 Polycrystalline silicon thin film having uniform crystallization characteristics |
| 06/30/2005 | US20050142451 Includes a transmissive portion defining a crystallization pattern and an alignment pattern, and a shielding portion surrounding the transmissive portion; use making an liquid crystal display (LCD) device where a driving circuit and a pixel thin film transistor are formed on a single substrate |
| 06/30/2005 | US20050142449 Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography |
| 06/30/2005 | US20050141891 Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit |
| 06/30/2005 | US20050140986 Lithographic apparatus, overlay detector, device manufacturing method, and device manufactured thereby |
| 06/30/2005 | US20050140960 Method and device for alignment of a substrate |
| 06/30/2005 | US20050140951 Lithographic apparatus |
| 06/30/2005 | US20050140861 Display device |
| 06/30/2005 | US20050140326 Positioning system and positioning method |
| 06/30/2005 | US20050139790 Lithographic apparatus and device manufacturing method |
| 06/30/2005 | US20050138988 Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby |
| 06/30/2005 | CA2549189A1 A process for the fabrication of optical microstructures |
| 06/29/2005 | EP1548806A1 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 06/29/2005 | EP1548805A1 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 06/29/2005 | EP1548507A1 Method of measurement and a substrate |
| 06/29/2005 | EP1548504A1 Thermal deformation of a wafer in a lithographic process |
| 06/29/2005 | EP1548014A1 Ultraviolet-permeable fluoropolymers and pellicles made by using the same |
| 06/29/2005 | EP1546804A1 Device for transferring a pattern to an object |
| 06/29/2005 | EP1216435B1 Method for synchronising positioning and exposure processes |
| 06/29/2005 | CN1632916A Method for manufacturing semiconductor device |
| 06/28/2005 | US6912476 Position measuring device and method for determining a position |
| 06/28/2005 | US6911301 Methods of forming aligned structures with radiation-sensitive material |
| 06/28/2005 | US6911286 Photolithographic process used in semiconductor manufacturing |
| 06/28/2005 | US6911285 Sidelobe correction for attenuated phase shift masks |
| 06/28/2005 | US6911283 Thin film coupled to a first end of the frame; stress reduction |
| 06/23/2005 | WO2005056294A1 Method and apparatus for printing a patterned layer on a flatsubstrate with a flat-type-bed |
| 06/23/2005 | US20050138597 Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes |